DE602006007889D1 - Belichtungsverfahren und -vorrichtung - Google Patents

Belichtungsverfahren und -vorrichtung

Info

Publication number: DE602006007889D1
Authority: DE; Germany
Prior art keywords: exposure method; exposure
Prior art date: 2005-03-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

DE602006007889T

Other languages

English (en)

Inventor

Kenji Yamazoe

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-03-01

Filing date

2006-02-28

Publication date

2009-09-03

2006-02-28 Application filed by Canon Inc filed Critical Canon Inc

2009-09-03 Publication of DE602006007889D1 publication Critical patent/DE602006007889D1/de

2026-03-01 Anticipated expiration legal-status Critical

Status Active legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70125—Use of illumination settings tailored to particular mask patterns
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

DE602006007889T 2005-03-01 2006-02-28 Belichtungsverfahren und -vorrichtung Active DE602006007889D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2005056007A JP4612849B2 (ja)	2005-03-01	2005-03-01	露光方法、露光装置及びデバイス製造方法

Publications (1)

Publication Number	Publication Date
DE602006007889D1 true DE602006007889D1 (de)	2009-09-03

Family

ID=36589082

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE602006007889T Active DE602006007889D1 (de)	2005-03-01	2006-02-28	Belichtungsverfahren und -vorrichtung

Country Status (6)

Country	Link
US (1)	US7359033B2 (de)
EP (1)	EP1698940B1 (de)
JP (1)	JP4612849B2 (de)
KR (1)	KR100752492B1 (de)
DE (1)	DE602006007889D1 (de)
TW (1)	TWI307115B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4750525B2 (ja) *	2005-10-14	2011-08-17	キヤノン株式会社	露光方法及びデバイス製造方法
EP1857879A1 (de) *	2006-05-15	2007-11-21	Advanced Mask Technology Center GmbH & Co. KG	Beleuchtungssystem und Photolithographiegerät
JP4914272B2 (ja)	2007-04-02	2012-04-11	エルピーダメモリ株式会社	投影露光用のレチクル、該投影露光用のレチクルの製造方法及び該レチクルを用いた半導体装置
JP2009043789A (ja) *	2007-08-06	2009-02-26	Elpida Memory Inc	パターン形成方法及びマスク
NL1036123A1 (nl) *	2007-11-13	2009-05-14	Asml Netherlands Bv	Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
JP2010199347A (ja) *	2009-02-26	2010-09-09	Canon Inc	露光方法及びデバイス製造方法
NL2005738A (en) *	2009-12-15	2011-06-16	Asml Holding Nv	Improved polarization designs for lithographic apparatus.
JP6363903B2 (ja) *	2014-07-31	2018-07-25	株式会社キーエンス	光学的情報読取装置
DE102021211975A1 (de) *	2021-10-25	2023-04-27	Carl Zeiss Smt Gmbh	Verfahren zur Nachbildung einer Ziel-Wellenfront eines abbildenden optischen Produktions-Systems sowie Metrologiesystem zur Durchführung des Verfahrens

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3119217B2 (ja) *	1997-10-31	2000-12-18	日本電気株式会社	フォトマスクおよびフォトマスクを使用した露光方法
US7217503B2 (en)	2001-04-24	2007-05-15	Canon Kabushiki Kaisha	Exposure method and apparatus
JP3937903B2 (ja)	2001-04-24	2007-06-27	キヤノン株式会社	露光方法及び装置
DE10124803A1 (de) *	2001-05-22	2002-11-28	Zeiss Carl	Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP3958163B2 (ja) *	2002-09-19	2007-08-15	キヤノン株式会社	露光方法
EP1429190B1 (de) *	2002-12-10	2012-05-09	Canon Kabushiki Kaisha	Belichtungsapparat und -verfahren
JP3997199B2 (ja) *	2002-12-10	2007-10-24	キヤノン株式会社	露光方法及び装置
EP1450206B1 (de) *	2003-02-21	2016-04-20	Canon Kabushiki Kaisha	Maske und ihr herstellungs- und belichtungsverfahren, herstellungsprozess für halbleiterbauteile
US7090964B2 (en) *	2003-02-21	2006-08-15	Asml Holding N.V.	Lithographic printing with polarized light
KR101503992B1 (ko) *	2003-04-09	2015-03-18	가부시키가이샤 니콘	노광 방법 및 장치, 그리고 디바이스 제조 방법
JP4684584B2 (ja) *	2003-07-23	2011-05-18	キヤノン株式会社	マスク及びその製造方法、並びに、露光方法
TWI379344B (en) *	2004-02-06	2012-12-11	Nikon Corp	Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
TW200600829A (en) *	2004-06-16	2006-01-01	Nikon Corp	Optical system, exposure device, and exposure method
WO2006016469A1 (ja) *	2004-08-10	2006-02-16	Nikon Corporation	照明光学装置、露光装置、および露光方法
TWI453796B (zh) *	2005-01-21	2014-09-21	尼康股份有限公司	偏光變更單元以及元件製造方法

2005
- 2005-03-01 JP JP2005056007A patent/JP4612849B2/ja not_active Expired - Fee Related
2006
- 2006-02-28 EP EP06110470A patent/EP1698940B1/de not_active Not-in-force
- 2006-02-28 KR KR1020060019035A patent/KR100752492B1/ko not_active Expired - Fee Related
- 2006-02-28 DE DE602006007889T patent/DE602006007889D1/de active Active
- 2006-02-28 US US11/363,038 patent/US7359033B2/en not_active Expired - Fee Related
- 2006-03-01 TW TW095106821A patent/TWI307115B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
EP1698940A3 (de)	2007-12-05
KR20060096896A (ko)	2006-09-13
US20060197934A1 (en)	2006-09-07
TWI307115B (en)	2009-03-01
JP2006245115A (ja)	2006-09-14
EP1698940B1 (de)	2009-07-22
TW200727337A (en)	2007-07-16
JP4612849B2 (ja)	2011-01-12
EP1698940A2 (de)	2006-09-06
KR100752492B1 (ko)	2007-08-27
US7359033B2 (en)	2008-04-15

Publication	Publication Date	Title
TWI348596B (en)	2011-09-11	Exposure apparatus and method
DE602006020651D1 (de)	2011-04-28	Kalibrierverfahren und -vorrichtung
DE602006009191D1 (de)	2009-10-29	Bildaufnahmegerät und -verfahren
EP1943080A4 (de)	2012-09-12	Streckblasformverfahren und -vorrichtung
DE602006012746D1 (de)	2010-04-22	Lithografische Vorrichtung und Herstellungsverfahren
DE602006020556D1 (de)	2011-04-21	Bilddecodierungsvorrichtung und bilddecodierungsverfahren
ITMO20060087A1 (it)	2007-09-18	Apparato e metodo di elettrostimolazione
FI20060449L (fi)	2006-11-18	Mammografiamenetelmä ja mammografialaite
EP1848377A4 (de)	2009-12-30	Schulterarthroplastievorrichtung und -verfahren
NL1028549A1 (nl)	2005-10-03	Patroonbelichtingswerkwijze en patroonbelichtingsinrichting.
DE602006015126D1 (de)	2010-08-12	Randbelichtungsapparat, Beschichtungs- und Entwicklungsapparat und Randbelichtungsmethode
DE602006011600D1 (de)	2010-02-25	Audiocodierungseinrichtung und audiocodierungsverfahren
DE602006001473D1 (de)	2008-07-31	Druckvorrichtung und Druckverfahren
DE602006014957D1 (de)	2010-07-29	Audiocodierungseinrichtung und audiocodierungsverfahren
EP1975980A4 (de)	2010-08-04	Belichtungseinrichtung und herstellungsverfahren dafür
DE602006019371D1 (de)	2011-02-17	Bewegungunterstützungsverfahren und -Vorrichtung
EP1922588A4 (de)	2011-06-08	Strukturbelichtungsverfahren und strukturbelichtungsvorrichtung
DE602006008518D1 (de)	2009-10-01	Bilderzeugungsgerät und -system
DE602006008680D1 (de)	2009-10-08	Bildverarbeitungsvorrichtung und -verfahren
FI20050921L (fi)	2007-03-16	Automaattivalotusmenetelmä ja -järjestelmä
DE602006020672D1 (de)	2011-04-28	Bildverarbeitungsvorrichtung und Bildverarbeitungsverfahren
DE602006007889D1 (de)	2009-09-03	Belichtungsverfahren und -vorrichtung
DE602006006244D1 (de)	2009-05-28	Bildaufzeichnungsgerät und Verfahren
DE602006020989D1 (de)	2011-05-12	Bildverarbeitungseinrichtung und bildverarbeitungsverfahren
DE602005003624D1 (de)	2008-01-17	Bildverarbeitungsvorrichtung und - verfahren

Legal Events

Date	Code	Title	Description
2010-08-12	8364	No opposition during term of opposition