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DE602005003192D1 - Verfahren zur Herstellung eines hydrophoben Kieselsäurepulvers - Google Patents

Verfahren zur Herstellung eines hydrophoben Kieselsäurepulvers

Info

Publication number
DE602005003192D1
DE602005003192D1 DE602005003192T DE602005003192T DE602005003192D1 DE 602005003192 D1 DE602005003192 D1 DE 602005003192D1 DE 602005003192 T DE602005003192 T DE 602005003192T DE 602005003192 T DE602005003192 T DE 602005003192T DE 602005003192 D1 DE602005003192 D1 DE 602005003192D1
Authority
DE
Germany
Prior art keywords
hydrophobic
silica
silica powder
hydrophobic silica
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602005003192T
Other languages
English (en)
Other versions
DE602005003192T2 (de
Inventor
Keiko Yoshitake
Hirokazu Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of DE602005003192D1 publication Critical patent/DE602005003192D1/de
Application granted granted Critical
Publication of DE602005003192T2 publication Critical patent/DE602005003192T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Silicon Compounds (AREA)
DE602005003192T 2004-11-16 2005-11-16 Verfahren zur Herstellung eines hydrophoben Kieselsäurepulvers Expired - Lifetime DE602005003192T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004331319 2004-11-16
JP2004331319 2004-11-16

Publications (2)

Publication Number Publication Date
DE602005003192D1 true DE602005003192D1 (de) 2007-12-20
DE602005003192T2 DE602005003192T2 (de) 2008-08-28

Family

ID=35759142

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005003192T Expired - Lifetime DE602005003192T2 (de) 2004-11-16 2005-11-16 Verfahren zur Herstellung eines hydrophoben Kieselsäurepulvers

Country Status (4)

Country Link
US (1) US20060112860A1 (de)
EP (1) EP1657283B1 (de)
AT (1) ATE377632T1 (de)
DE (1) DE602005003192T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2275039T3 (es) 2003-04-24 2007-06-01 Goldschmidt Gmbh Procedimiento para la produccion de revestimientos laminares desprendibles, repelentes de la suciedad y del agua.
US8034173B2 (en) 2003-12-18 2011-10-11 Evonik Degussa Gmbh Processing compositions and method of forming the same
US20070202425A1 (en) * 2006-02-27 2007-08-30 Kousuke Satou Toner and image forming apparatus
US8202502B2 (en) * 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
US8435474B2 (en) * 2006-09-15 2013-05-07 Cabot Corporation Surface-treated metal oxide particles
US8455165B2 (en) * 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
US20080070146A1 (en) 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
TWI436947B (zh) * 2007-03-27 2014-05-11 扶桑化學工業股份有限公司 膠體矽石及其製法
JP4579265B2 (ja) * 2007-04-25 2010-11-10 信越化学工業株式会社 高度の流動性を有する疎水性球状シリカ微粒子、その製造方法、それを用いた静電荷像現像用トナー外添剤およびそれを含有する有機樹脂組成物
JP5194563B2 (ja) 2007-05-28 2013-05-08 信越化学工業株式会社 耐擦傷性コーティング組成物、及び被覆物品
JP2009015260A (ja) * 2007-07-09 2009-01-22 Sharp Corp トナー用外添剤、それを用いたトナーおよび画像形成装置
EP2145929B1 (de) * 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
TWI488746B (zh) * 2009-02-13 2015-06-21 Toyo Aluminium Kk 層積體及容器
JP5591530B2 (ja) * 2009-06-24 2014-09-17 日揮触媒化成株式会社 シリカ系微粒子分散ゾルの製造方法、シリカ系微粒子分散ゾル、該分散ゾルを含む塗料組成物、硬化性塗膜および硬化性塗膜付き基材
JP5477192B2 (ja) * 2010-06-23 2014-04-23 富士ゼロックス株式会社 シリカ粒子の製造方法
JP5811620B2 (ja) 2010-12-13 2015-11-11 富士ゼロックス株式会社 シリカ粒子の製造方法
JP5906635B2 (ja) * 2011-09-26 2016-04-20 富士ゼロックス株式会社 シリカ粒子分散液の製造方法
EP2634083B1 (de) 2012-03-02 2015-07-08 Sea-Bird Electronics, Inc Fluidbasierter Auftriebsausgleich
CN103451946A (zh) * 2012-05-31 2013-12-18 陈曦 一种多功能纤维的制备方法
CN104745145A (zh) * 2013-12-26 2015-07-01 安集微电子（上海）有限公司 一种二氧化硅颗粒改性的制备方法及应用
EP3153470A4 (de) * 2014-06-03 2018-03-14 AZ Electronic Materials (Luxembourg) S.à.r.l. Verfahren zur herstellung von oberflächenmodifizierten siliciumdioxidnanopartikeln sowie oberflächenmodifizierte siliciumdioxidnanopartikel
DE102015211812A1 (de) * 2015-06-25 2016-12-29 Wacker Chemie Ag Wirtschaftliches Verfahren zur Herstellung von organisch modifizierten Lyo- oder Aerogelen
CN111040472B (zh) * 2019-11-12 2021-09-14 中国石油天然气集团公司 改性纳米二氧化硅及其改性方法、防腐涂料和涂层
CN113213492B (zh) * 2021-05-26 2022-11-22 华北水利水电大学 超疏水二氧化硅气凝胶及其制备方法、超疏水多孔膜及其制备方法和应用
KR102722973B1 (ko) 2021-08-31 2024-10-28 닛산 가가쿠 가부시키가이샤 표면처리 실리카함유 무기산화물 입자 분산액 및 그의 제조방법
CN115246729A (zh) * 2022-08-08 2022-10-28 温州吉邦科技发展有限公司 一种抗裂防渗的干混抹灰砂浆及其加工工艺

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2403783C2 (de) * 1974-01-26 1982-10-21 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung hydrophobierter pyrogener Kieselsäure
JPS58145614A (ja) 1982-02-23 1983-08-30 Shokubai Kasei Kogyo Kk 有機溶剤に均質に分散可能な粉末状シリカとその製造法
JPH0764544B2 (ja) 1989-12-15 1995-07-12 信越化学工業株式会社 シリカ粉末の製造方法
JP3284743B2 (ja) 1994-04-19 2002-05-20 東レ株式会社 粒子分散性に優れたポリエステル組成物の製造方法
DE19756831A1 (de) * 1997-12-19 1999-07-01 Wacker Chemie Gmbh Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt
US5919298A (en) * 1998-01-12 1999-07-06 Dow Corning Corporation Method for preparing hydrophobic fumed silica
DE69927427T2 (de) * 1998-05-18 2006-03-16 Shin-Etsu Chemical Co., Ltd. Mit Silan oberflächenbehandelte Kieselsäureteilchen, Verfahren zu ihrer Herstellung und ihre Verwendung
JP3756339B2 (ja) 1998-05-18 2006-03-15 信越化学工業株式会社 シラン表面処理シリカ系微粒子、その製造方法およびそれを含有する有機樹脂組成物
US6051672A (en) * 1998-08-24 2000-04-18 Dow Corning Corporation Method for making hydrophobic non-aggregated colloidal silica
JP2000256008A (ja) 1999-03-08 2000-09-19 Tokuyama Corp 疎水性煙霧シリカ及びその製造方法
US6184408B1 (en) * 1999-04-28 2001-02-06 Dow Corning Corporation Method for preparation of hydrophobic precipitated silica
JP4828032B2 (ja) 2001-03-05 2011-11-30 株式会社トクヤマ 疎水性シリカ粉末およびその製造方法
JP2004168559A (ja) 2002-11-15 2004-06-17 Nippon Aerosil Co Ltd 高分散高疎水性シリカ粉末とその製造方法

Also Published As

Publication number Publication date
EP1657283B1 (de) 2007-11-07
ATE377632T1 (de) 2007-11-15
US20060112860A1 (en) 2006-06-01
DE602005003192T2 (de) 2008-08-28
EP1657283A1 (de) 2006-05-17

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Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: KATO, HIROKAZU, SODEGAURA-SHI, CHIBA, JP

Inventor name: YOSHITAKE, KEIKO, SODEGAURA-SHI, CHIBA, JP

8364 No opposition during term of opposition