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DE60138327D1 - Zusammensetzung zur Filmerzeugung, Verfahren zur Filmerzeugung und Filme auf Basis von Siliciumoxid - Google Patents

Zusammensetzung zur Filmerzeugung, Verfahren zur Filmerzeugung und Filme auf Basis von Siliciumoxid

Info

Publication number
DE60138327D1
DE60138327D1 DE60138327T DE60138327T DE60138327D1 DE 60138327 D1 DE60138327 D1 DE 60138327D1 DE 60138327 T DE60138327 T DE 60138327T DE 60138327 T DE60138327 T DE 60138327T DE 60138327 D1 DE60138327 D1 DE 60138327D1
Authority
DE
Germany
Prior art keywords
film
silica
forming method
making composition
based film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60138327T
Other languages
English (en)
Inventor
Eiji Hayashi
Kouichi Hasegawa
Seo Youngsoo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000051136A external-priority patent/JP2001115028A/ja
Priority claimed from JP2000108307A external-priority patent/JP2001294808A/ja
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE60138327D1 publication Critical patent/DE60138327D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • H10P14/6342—
    • H10P14/6686—
    • H10P14/6922—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
DE60138327T 2000-02-28 2001-02-26 Zusammensetzung zur Filmerzeugung, Verfahren zur Filmerzeugung und Filme auf Basis von Siliciumoxid Expired - Lifetime DE60138327D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000051136A JP2001115028A (ja) 1999-08-12 2000-02-28 膜形成用組成物、膜の形成方法およびシリカ系膜
JP2000108307A JP2001294808A (ja) 2000-04-10 2000-04-10 膜形成用組成物、膜の形成方法およびシリカ系膜

Publications (1)

Publication Number Publication Date
DE60138327D1 true DE60138327D1 (de) 2009-05-28

Family

ID=26586214

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60138327T Expired - Lifetime DE60138327D1 (de) 2000-02-28 2001-02-26 Zusammensetzung zur Filmerzeugung, Verfahren zur Filmerzeugung und Filme auf Basis von Siliciumoxid

Country Status (5)

Country Link
US (1) US6413647B1 (de)
EP (1) EP1127929B1 (de)
KR (1) KR100710789B1 (de)
DE (1) DE60138327D1 (de)
TW (1) TWI290573B (de)

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JP4139710B2 (ja) * 2003-03-10 2008-08-27 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004292641A (ja) * 2003-03-27 2004-10-21 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
US20040198882A1 (en) * 2003-03-31 2004-10-07 Fuji Photo Film Co., Ltd. Silica-containing coating composition for forming films and method for forming silica-containing films
JP2004307694A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置。
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004307692A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
KR100645682B1 (ko) * 2003-04-17 2006-11-13 주식회사 엘지화학 유기실록산 수지 및 이를 이용한 절연막
KR20070001070A (ko) * 2003-10-31 2007-01-03 제이에스알 가부시끼가이샤 적층체 및 그의 형성 방법, 절연막, 반도체 장치, 및 막형성용 조성물
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005159033A (ja) * 2003-11-26 2005-06-16 Jsr Corp 膜形成用組成物およびその製造方法
EP1615260A3 (de) * 2004-07-09 2009-09-16 JSR Corporation Auf organischem Siliziumoxid basierende Schicht, Zusammensetzung, und Verfahren zur Herstellung davon, und Halbleiteranordnung
JP4355939B2 (ja) * 2004-07-23 2009-11-04 Ｊｓｒ株式会社 半導体装置の絶縁膜形成用組成物およびシリカ系膜の形成方法
WO2006051799A1 (ja) * 2004-11-11 2006-05-18 Kaneka Corporation 硬化性組成物
JP5120547B2 (ja) 2006-02-02 2013-01-16 Ｊｓｒ株式会社 有機シリカ系膜およびその形成方法、半導体装置の絶縁膜形成用組成物およびその製造方法、ならびに配線構造体および半導体装置
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
US20090096106A1 (en) 2007-10-12 2009-04-16 Air Products And Chemicals, Inc. Antireflective coatings
US8551463B2 (en) 2007-10-22 2013-10-08 Living Proof, Inc. Hair care compositions and methods of treating hair
US8226934B2 (en) * 2007-10-22 2012-07-24 Living Proof, Inc. Hair care compositions and methods of treating hair using same
TW200936501A (en) * 2008-02-04 2009-09-01 Nippon Chemical Ind Colloidal silica consisting of silica particles fixing nitrogen contained alkaline compound
MY177445A (en) * 2008-05-26 2020-09-15 Basf Se Method of making porous materials and porous materials prepared thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5882583B2 (ja) * 2010-02-04 2016-03-09 東京応化工業株式会社 エアギャップ形成用シリカ系被膜形成材料及びエアギャップ形成方法
US8763700B2 (en) 2011-09-02 2014-07-01 Robert Ray McDaniel Dual function proppants
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US8993072B2 (en) 2011-09-27 2015-03-31 Air Products And Chemicals, Inc. Halogenated organoaminosilane precursors and methods for depositing films comprising same
CN104080869B (zh) * 2012-02-02 2017-03-08 日产化学工业株式会社 低折射率膜形成用组合物
US10100247B2 (en) 2013-05-17 2018-10-16 Preferred Technology, Llc Proppant with enhanced interparticle bonding
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
US9862881B2 (en) 2015-05-13 2018-01-09 Preferred Technology, Llc Hydrophobic coating of particulates for enhanced well productivity
KR101702863B1 (ko) * 2016-08-22 2017-02-06 주식회사 이레하이테크이앤씨 콘크리트의 내구성과 표면강화성능을 증진시키는 침투성 무기계 도막 양생제 조성물 및 이의 제조방법
KR102461623B1 (ko) * 2016-10-05 2022-11-01 가부시끼가이샤 쓰리본드 코팅제 조성물
US11208591B2 (en) 2016-11-16 2021-12-28 Preferred Technology, Llc Hydrophobic coating of particulates for enhanced well productivity
US10696896B2 (en) 2016-11-28 2020-06-30 Prefferred Technology, Llc Durable coatings and uses thereof
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Also Published As

Publication number Publication date
EP1127929B1 (de) 2009-04-15
US20020086167A1 (en) 2002-07-04
TWI290573B (en) 2007-12-01
US6413647B1 (en) 2002-07-02
EP1127929A2 (de) 2001-08-29
EP1127929A3 (de) 2002-12-18
KR20010085653A (ko) 2001-09-07
KR100710789B1 (ko) 2007-04-23

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