DE60128975D1 - Mikrolithographischer Projektionsapparat - Google Patents

Mikrolithographischer Projektionsapparat

Info

Publication number: DE60128975D1
Authority: DE; Germany
Prior art keywords: projection apparatus; microlithographic projection; microlithographic; projection
Prior art date: 2000-01-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE60128975T

Other languages

English (en)

Other versions

DE60128975T2 (de

Inventor

Johannes Mulkens

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

ASML Netherlands BV

Original Assignee

ASML Netherlands BV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-01-20

Filing date

2001-01-18

Publication date

2007-08-02

2001-01-18 Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV

2007-08-02 Application granted granted Critical

2007-08-02 Publication of DE60128975D1 publication Critical patent/DE60128975D1/de

2008-02-28 Publication of DE60128975T2 publication Critical patent/DE60128975T2/de

2021-01-19 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- H10P76/00—
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Microscoopes, Condenser (AREA)

DE60128975T 2000-01-20 2001-01-18 Mikrolithographischer Projektionsapparat Expired - Fee Related DE60128975T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
EP00300418		2000-01-20
EP00300418		2000-01-20

Publications (2)

Publication Number	Publication Date
DE60128975D1 true DE60128975D1 (de)	2007-08-02
DE60128975T2 DE60128975T2 (de)	2008-02-28

Family

ID=8172657

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE60128975T Expired - Fee Related DE60128975T2 (de)	2000-01-20	2001-01-18	Mikrolithographischer Projektionsapparat

Country Status (5)

Country	Link
US (1)	US6522387B2 (de)
JP (1)	JP2001237183A (de)
KR (1)	KR100585461B1 (de)
DE (1)	DE60128975T2 (de)
TW (1)	TWI283798B (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5729331A (en) *	1993-06-30	1998-03-17	Nikon Corporation	Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP4238390B2 (ja)	1998-02-27	2009-03-18	株式会社ニコン	照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6833904B1 (en)	1998-02-27	2004-12-21	Nikon Corporation	Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
US6717651B2 (en)	2000-04-12	2004-04-06	Nikon Corporation	Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
JP2003007598A (ja) *	2001-06-25	2003-01-10	Mitsubishi Electric Corp	フォーカスモニタ方法およびフォーカスモニタ用装置ならびに半導体装置の製造方法
JP2004335639A (ja) *	2003-05-06	2004-11-25	Fuji Photo Film Co Ltd	投影露光装置
JP2004342711A (ja) *	2003-05-14	2004-12-02	Nikon Corp	照明光学装置、露光装置、および露光方法
US7119883B2 (en) *	2004-10-13	2006-10-10	Asml Holding N.V.	Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light
US7508489B2 (en) *	2004-12-13	2009-03-24	Carl Zeiss Smt Ag	Method of manufacturing a miniaturized device
US7342644B2 (en) *	2004-12-29	2008-03-11	Asml Netherlands B.V.	Methods and systems for lithographic beam generation
WO2006084479A1 (en) *	2005-02-12	2006-08-17	Carl Zeiss Smt Ag	Microlithographic projection exposure apparatus
US7324185B2 (en) *	2005-03-04	2008-01-29	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US8248577B2 (en)	2005-05-03	2012-08-21	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
EP2115535B9 (de)	2007-02-06	2013-01-09	Carl Zeiss SMT GmbH	Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage
DE102007045396A1 (de) *	2007-09-21	2009-04-23	Carl Zeiss Smt Ag	Bündelführender optischer Kollektor zur Erfassung der Emission einer Strahlungsquelle
US20090097001A1 (en) *	2007-10-15	2009-04-16	Qimonda Ag	Non-Telecentric Lithography Apparatus and Method of Manufacturing Integrated Circuits
JP2008172272A (ja) *	2008-03-21	2008-07-24	Carl Zeiss Smt Ag	マイクロリソグラフィ投影露光装置
WO2010005491A1 (en) *	2008-06-30	2010-01-14	Corning Incorporated	Telecentricity corrector for microlithographic projection system
JP6980443B2 (ja) *	2017-07-28	2021-12-15	キヤノン株式会社	露光装置及び物品製造方法
US10365211B2 (en)	2017-09-26	2019-07-30	Kla-Tencor Corporation	Systems and methods for metrology beam stabilization
WO2022147625A1 (en) *	2021-01-08	2022-07-14	National Research Council Of Canada	A method for correcting ray distortions in tomographic 3d printing
DE102021120952B3 (de) *	2021-08-11	2022-11-10	Carl Zeiss Smt Gmbh	Verfahren zur Korrektur eines Telezentriefehlers einer Abbildungsvorrichtung und Maskeninspektionsmikroskop
EP4650875A1 (de)	2024-05-13	2025-11-19	ASML Netherlands B.V.	Vorrichtung zur korrektur der beleuchtungsgleichmässigkeit mit einer durchlässigen korrekturplatte mit variierendem parameterprofil

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH05323232A (ja) *	1992-05-25	1993-12-07	Asahi Optical Co Ltd	偏倍可能な投影装置
JPH05343292A (ja) *	1992-06-08	1993-12-24	Nikon Corp	露光装置
JPH0697047A (ja) *	1992-09-11	1994-04-08	Nikon Corp	照明光学系
JPH06342748A (ja) *	1993-06-02	1994-12-13	Nikon Corp	位置検出装置
JP3359123B2 (ja) *	1993-09-20	2002-12-24	キヤノン株式会社	収差補正光学系
JPH07106230A (ja) *	1993-10-07	1995-04-21	Nikon Corp	プロキシミティ露光装置
JPH07283911A (ja) *	1994-04-05	1995-10-27	Canon Inc	画像読取装置
JP3279090B2 (ja) *	1994-09-09	2002-04-30	株式会社ニコン	照明装置および露光装置
US5739899A (en) *	1995-05-19	1998-04-14	Nikon Corporation	Projection exposure apparatus correcting tilt of telecentricity
JP3743576B2 (ja) *	1995-07-11	2006-02-08	株式会社ニコン	投影露光装置、及びそれを用いた半導体素子又は液晶表示素子の製造方法
JPH09311277A (ja) *	1996-05-20	1997-12-02	Nikon Corp	反射屈折光学系
JP2691341B2 (ja) *	1996-05-27	1997-12-17	株式会社ニコン	投影露光装置
JP3728613B2 (ja) *	1996-12-06	2005-12-21	株式会社ニコン	走査型露光装置の調整方法及び該方法を使用する走査型露光装置
US6333777B1 (en) *	1997-07-18	2001-12-25	Canon Kabushiki Kaisha	Exposure apparatus and device manufacturing method
DE19809395A1 (de) *	1998-03-05	1999-09-09	Zeiss Carl Fa	Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
JPH11352404A (ja) *	1998-06-08	1999-12-24	Nikon Corp	投影露光装置及びデバイス製造方法並びに反射屈折光学系

2000
- 2000-12-27 TW TW089127977A patent/TWI283798B/zh not_active IP Right Cessation
2001
- 2001-01-18 JP JP2001010551A patent/JP2001237183A/ja active Pending
- 2001-01-18 US US09/761,837 patent/US6522387B2/en not_active Expired - Fee Related
- 2001-01-18 DE DE60128975T patent/DE60128975T2/de not_active Expired - Fee Related
- 2001-01-18 KR KR1020010002935A patent/KR100585461B1/ko not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JP2001237183A (ja)	2001-08-31
DE60128975T2 (de)	2008-02-28
KR100585461B1 (ko)	2006-06-02
US6522387B2 (en)	2003-02-18
KR20010076350A (ko)	2001-08-11
US20010012101A1 (en)	2001-08-09
TWI283798B (en)	2007-07-11

Publication	Publication Date	Title
DE60118669D1 (de)	2006-05-24	Lithographischer Projektionsapparat
DE60127050D1 (de)	2007-04-19	Lithographischer Projektionsapparat
DE60128879D1 (de)	2007-07-26	Belichtungsapparat
DE60020638D1 (de)	2005-07-14	Lithographischer Projektionsapparat
DE60020620D1 (de)	2005-07-14	Lithographischer Projektionsapparat
DE60026461D1 (de)	2006-05-04	Lithographischer Projektionsapparat
DE60134922D1 (de)	2008-09-04	Lithographischer Apparat
DE60128975D1 (de)	2007-08-02	Mikrolithographischer Projektionsapparat
DE60232568D1 (de)	2009-07-23	Belichtungsapparat
DE60131203D1 (de)	2007-12-13	Lithographischer Apparat
DE60113887T2 (de)	2006-06-14	Projektor
DE60221180D1 (de)	2007-08-30	Lithographischer Apparat
DE60114985D1 (de)	2005-12-22	Bildprojektionsgerät
DE60100212D1 (de)	2003-06-05	Bilderzeugungsgerät
DE10193433T1 (de)	2002-10-31	Maskeninspektionsgerät
DE60235137D1 (de)	2010-03-11	Projektionsvorrichtung
DE60141801D1 (de)	2010-05-27	Bilderzeugungsgerät
DE50211190D1 (de)	2007-12-27	Projektionsbelichtungsanlage
DE69933918D1 (de)	2006-12-21	Lithographischer Projektionsapparat
DE60025449D1 (de)	2006-04-06	Bilderzeugungsgerät
DE60323584D1 (de)	2008-10-30	Lithographischer Projektionsapparat
DE60025303D1 (de)	2006-03-30	Lithographischer Projektionsapparat
DE60143834D1 (de)	2011-02-24	Bilderzeugungsgerät
DE50103723D1 (de)	2004-10-28	6-Spiegel-Mikrolithographie-Projektionsobjektiv
DE60030204D1 (de)	2006-10-05	Lithographischer Projektionsapparat

Legal Events

Date	Code	Title	Description
2008-07-10	8364	No opposition during term of opposition
2009-11-19	8339	Ceased/non-payment of the annual fee