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DE60043998D1 - Reduction de la contamination superficielle causee par des radiations - Google Patents

Reduction de la contamination superficielle causee par des radiations

Info

Publication number
DE60043998D1
DE60043998D1 DE60043998T DE60043998T DE60043998D1 DE 60043998 D1 DE60043998 D1 DE 60043998D1 DE 60043998 T DE60043998 T DE 60043998T DE 60043998 T DE60043998 T DE 60043998T DE 60043998 D1 DE60043998 D1 DE 60043998D1
Authority
DE
Germany
Prior art keywords
contamination
causee
radiations
superficial
par
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60043998T
Other languages
English (en)
Inventor
Leonard E Klebanoff
Richard H Stulen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EUV LLC
Original Assignee
EUV LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EUV LLC filed Critical EUV LLC
Application granted granted Critical
Publication of DE60043998D1 publication Critical patent/DE60043998D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Radiation-Therapy Devices (AREA)
DE60043998T 2000-12-21 2000-12-21 Reduction de la contamination superficielle causee par des radiations Expired - Lifetime DE60043998D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/035394 WO2002052347A1 (en) 2000-12-21 2000-12-21 Mitigation of radiation induced surface contamination

Publications (1)

Publication Number Publication Date
DE60043998D1 true DE60043998D1 (de) 2010-04-22

Family

ID=21742108

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60043998T Expired - Lifetime DE60043998D1 (de) 2000-12-21 2000-12-21 Reduction de la contamination superficielle causee par des radiations

Country Status (5)

Country Link
EP (1) EP1344110B1 (de)
JP (1) JP4790970B2 (de)
AT (1) ATE460688T1 (de)
DE (1) DE60043998D1 (de)
WO (1) WO2002052347A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6724460B2 (en) * 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
EP1403715A3 (de) * 2002-09-30 2006-01-18 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
KR100585472B1 (ko) * 2002-09-30 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
EP1431830A3 (de) * 2002-12-20 2004-10-20 ASML Netherlands B.V. Lithographischer Gerät und Verfahren zur Herstellung einer Vorrichtung
SG135934A1 (en) 2002-12-20 2007-10-29 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
TWI299505B (en) * 2003-04-08 2008-08-01 Cymer Inc Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source
GB0408543D0 (en) * 2004-04-16 2004-05-19 Boc Group Plc Cleaning of multi-layer mirrors
US20060196525A1 (en) * 2005-03-03 2006-09-07 Vrtis Raymond N Method for removing a residue from a chamber
JP4599342B2 (ja) * 2005-12-27 2010-12-15 エーエスエムエル ネザーランズ ビー．ブイ． 光学装置、リソグラフィ装置、および、デバイス製造方法
EP2157584A3 (de) * 2008-08-14 2011-07-13 ASML Netherlands B.V. Strahlungsquelle, Lithografiegerät und Herstellungsverfahren für ein Bauteil
JP5381607B2 (ja) * 2009-10-19 2014-01-08 富士通セミコンダクター株式会社 極端紫外光利用装置
WO2016157315A1 (ja) * 2015-03-27 2016-10-06 ギガフォトン株式会社 極端紫外光生成装置及びその設計方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2752386B1 (fr) * 1996-08-14 1998-09-11 Commissariat Energie Atomique Procede de nettoyage ou de decontamination d'un objet au moyen d'un faisceau laser ultraviolet et dispositif pour sa mise en oeuvre
JPH11224839A (ja) * 1998-02-04 1999-08-17 Canon Inc 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法
JP2000091207A (ja) * 1998-09-14 2000-03-31 Nikon Corp 投影露光装置及び投影光学系の洗浄方法
TW548524B (en) * 2000-09-04 2003-08-21 Asm Lithography Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby

Also Published As

Publication number Publication date
JP2004537157A (ja) 2004-12-09
EP1344110B1 (de) 2010-03-10
WO2002052347A1 (en) 2002-07-04
ATE460688T1 (de) 2010-03-15
EP1344110A1 (de) 2003-09-17
JP4790970B2 (ja) 2011-10-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition