DE60040040D1 - Belichtungsverfahren und Abtastbelichtungsapparat - Google Patents

Belichtungsverfahren und Abtastbelichtungsapparat

Info

Publication number: DE60040040D1
Authority: DE; Germany
Prior art keywords: exposure; scanning; exposure apparatus; exposure method; scanning exposure
Prior art date: 1999-09-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE60040040T

Other languages

English (en)

Inventor

Michio Kohno

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-09-01

Filing date

2000-08-30

Publication date

2008-10-09

2000-08-30 Application filed by Canon Inc filed Critical Canon Inc

2008-10-09 Application granted granted Critical

2008-10-09 Publication of DE60040040D1 publication Critical patent/DE60040040D1/de

2020-08-31 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- H10P76/00—
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Toxicology (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

DE60040040T 1999-09-01 2000-08-30 Belichtungsverfahren und Abtastbelichtungsapparat Expired - Fee Related DE60040040D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP24715299A JP3548464B2 (ja)	1999-09-01	1999-09-01	露光方法及び走査型露光装置

Publications (1)

Publication Number	Publication Date
DE60040040D1 true DE60040040D1 (de)	2008-10-09

Family

ID=17159220

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE60040040T Expired - Fee Related DE60040040D1 (de)	1999-09-01	2000-08-30	Belichtungsverfahren und Abtastbelichtungsapparat

Country Status (5)

Country	Link
US (1)	US6603530B1 (de)
EP (1)	EP1081553B1 (de)
JP (1)	JP3548464B2 (de)
KR (1)	KR20010030209A (de)
DE (1)	DE60040040D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10140208C2 (de)	2001-08-16	2003-11-06	Zeiss Carl	Optische Anordnung
US7213963B2 (en)	2003-06-09	2007-05-08	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
WO2005022614A1 (ja)	2003-08-28	2005-03-10	Nikon Corporation	露光方法及び装置、並びにデバイス製造方法
WO2005078774A1 (ja) *	2004-02-13	2005-08-25	Nikon Corporation	露光方法及び装置、並びにデバイス製造方法
US7312851B2 (en) *	2004-06-23	2007-12-25	Nikon Corporation	Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop
WO2006025408A1 (ja) *	2004-08-31	2006-03-09	Nikon Corporation	露光装置及びデバイス製造方法
US20080204682A1 (en) *	2005-06-28	2008-08-28	Nikon Corporation	Exposure method and exposure apparatus, and device manufacturing method
US7649611B2 (en)	2005-12-30	2010-01-19	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7511799B2 (en) *	2006-01-27	2009-03-31	Asml Netherlands B.V.	Lithographic projection apparatus and a device manufacturing method
KR100762245B1 (ko) *	2006-09-29	2007-10-01	주식회사 하이닉스반도체	포토마스크의 패턴 결함 수정 방법
SG143178A1 (en) *	2006-11-27	2008-06-27	Asml Netherlands Bv	Lithographic apparatus, device manufacturing method and computer program product
US7903234B2 (en) *	2006-11-27	2011-03-08	Asml Netherlands B.V.	Lithographic apparatus, device manufacturing method and computer program product
KR101492287B1 (ko)	2007-03-27	2015-02-11	칼 짜이스 에스엠테 게엠베하	편평하게 조사된 보정광을 이용한 광학 소자의 보정
US20080285000A1 (en) *	2007-05-17	2008-11-20	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
NL2005449A (en)	2009-11-16	2012-04-05	Asml Netherlands Bv	Lithographic method and apparatus.
JP5165731B2 (ja) *	2010-06-30	2013-03-21	東京エレクトロン株式会社	局所露光装置及び局所露光方法
NL2007498A (en)	2010-12-23	2012-06-27	Asml Netherlands Bv	Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
DE102019205271A1 (de) *	2019-04-11	2020-10-15	Carl Zeiss Smt Gmbh	Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
JP7378265B2 (ja) *	2019-10-18	2023-11-13	キヤノン株式会社	露光装置、露光方法及び物品の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5999722A (ja)	1982-11-29	1984-06-08	Canon Inc	半導体焼付露光制御方法
JPH02309626A (ja) *	1989-05-24	1990-12-25	Fujitsu Ltd	露光装置
USRE36799E (en) *	1990-06-13	2000-08-01	Nikon Corporation	Projection optical apparatus using plural wavelengths of light
JP3301153B2 (ja) *	1993-04-06	2002-07-15	株式会社ニコン	投影露光装置、露光方法、及び素子製造方法
KR960000179B1 (ko) *	1993-06-12	1996-01-03	현대전자산업주식회사	에너지 절약형 포토마스크
JP3341269B2 (ja) *	1993-12-22	2002-11-05	株式会社ニコン	投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JP3368091B2 (ja)	1994-04-22	2003-01-20	キヤノン株式会社	投影露光装置及びデバイスの製造方法
US5883704A (en) *	1995-08-07	1999-03-16	Nikon Corporation	Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
US5596413A (en) *	1995-08-17	1997-01-21	Lucent Technologies Inc.	Sub-micron through-the-lens positioning utilizing out of phase segmented gratings
JP3805829B2 (ja) *	1996-06-05	2006-08-09	株式会社東芝	スキャン露光装置およびスキャン露光方法
JP3790833B2 (ja)	1996-08-07	2006-06-28	株式会社ニコン	投影露光方法及び装置
EP0823662A2 (de) *	1996-08-07	1998-02-11	Nikon Corporation	Projektionsbelichtungsapparat
JPH1054932A (ja)	1996-08-08	1998-02-24	Nikon Corp	投影光学装置及びそれを装着した投影露光装置
DE69817663T2 (de) *	1997-04-23	2004-06-24	Nikon Corp.	Optischer Belichtungsapparat und optisches Reinigungsverfahren

1999
- 1999-09-01 JP JP24715299A patent/JP3548464B2/ja not_active Expired - Fee Related
2000
- 2000-08-30 DE DE60040040T patent/DE60040040D1/de not_active Expired - Fee Related
- 2000-08-30 US US09/650,904 patent/US6603530B1/en not_active Expired - Fee Related
- 2000-08-30 EP EP00307453A patent/EP1081553B1/de not_active Expired - Lifetime
- 2000-09-01 KR KR1020000051440A patent/KR20010030209A/ko not_active Ceased

Also Published As

Publication number	Publication date
US6603530B1 (en)	2003-08-05
EP1081553A3 (de)	2004-08-11
JP2001076993A (ja)	2001-03-23
EP1081553B1 (de)	2008-08-27
JP3548464B2 (ja)	2004-07-28
EP1081553A2 (de)	2001-03-07
KR20010030209A (ko)	2001-04-16

Publication	Publication Date	Title
DE60026258D1 (de)	2006-04-27	Bildverarbeitungsverfahren und Bildverarbeitungsvorrichtung
DE60126387D1 (de)	2007-03-22	Bilderzeugungsverfahren und Bilderzeugungsgerät
DE69915225D1 (de)	2004-04-08	Bildverarbeitungsvorrichtung und Bildverarbeitungsverfahren
DE60023970D1 (de)	2005-12-22	Bildverarbeitungsgerät und -verfahren
DE60035549D1 (de)	2007-08-30	Bildaufzeichnungsgerät und Verfahren
DE60126461D1 (de)	2007-03-22	Bilderzeugungsverfahren und Bilderzeugungsvorrichtung
DE60138073D1 (de)	2009-05-07	Bildverarbeitungsverfahren und Bildverarbeitungsvorrichtung
DE69923694D1 (de)	2005-03-17	Abtastvorrichtung und -verfahren
ATE311741T1 (de)	2005-12-15	Ernteverfahren und erntevorrichtung
DE69829264D1 (de)	2005-04-14	Bilderzeugungsgerät und Bilderzeugungsverfahren
DE60045044D1 (de)	2010-11-11	Angesichtsphotographiervorrichtung und -verfahren
DE69932862D1 (de)	2006-09-28	Bildaufzeichnungsgerät und -verfahren
DE60040040D1 (de)	2008-10-09	Belichtungsverfahren und Abtastbelichtungsapparat
SG83810A1 (en)	2001-10-16	Exposure method and exposure apparatus
DE60021321D1 (de)	2005-08-25	Bilderzeugungsverfahren und Gerät
NO20002584L (no)	2000-11-20	Brønnreferanseapparat og fremgangsmÕte
DE69833998D1 (de)	2006-05-18	Bilderzeugungsverfahren und -vorrichtung
SG87085A1 (en)	2002-03-19	Scanning exposure method and scanning type exposure apparatus
DE69933908D1 (de)	2006-12-21	Abbildungsvorrichtung und -Verfahren
DE60024050D1 (de)	2005-12-22	Bildkommunikationsgerät und Verfahren
DE69802063D1 (de)	2001-11-22	Belichtungsapparat und Verfahren
DE69911848D1 (de)	2003-11-13	Bilderzeugungsgerät und Bildherstellungsverfahren
DE69921926D1 (de)	2004-12-23	Bilderzeugungsgerät und Verfahren
DE60123548D1 (de)	2006-11-16	Bilderzeugungsvorrichtung und Bilderzeugungsverfahren
DE60133238D1 (de)	2008-04-30	Bilderzeugungsverfahren und Bilderzeugungsvorrichtung

Legal Events

Date	Code	Title	Description
2009-09-17	8364	No opposition during term of opposition
2010-06-24	8339	Ceased/non-payment of the annual fee