[go: up one dir, main page]

DE60013901D1 - Photolithographisches verfahren, maskenrohlinge und verfahren zu deren herstellung - Google Patents

Photolithographisches verfahren, maskenrohlinge und verfahren zu deren herstellung

Info

Publication number
DE60013901D1
DE60013901D1 DE60013901T DE60013901T DE60013901D1 DE 60013901 D1 DE60013901 D1 DE 60013901D1 DE 60013901 T DE60013901 T DE 60013901T DE 60013901 T DE60013901 T DE 60013901T DE 60013901 D1 DE60013901 D1 DE 60013901D1
Authority
DE
Germany
Prior art keywords
production
mask blanks
photolithographic
photolithographic method
blanks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60013901T
Other languages
English (en)
Other versions
DE60013901T2 (de
Inventor
S Priestley
R Sempolinski
C Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of DE60013901D1 publication Critical patent/DE60013901D1/de
Publication of DE60013901T2 publication Critical patent/DE60013901T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60013901T 1999-11-15 2000-10-12 Photolithographisches verfahren, maskenrohlinge und verfahren zu deren herstellung Expired - Fee Related DE60013901T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US16562599P 1999-11-15 1999-11-15
US165625P 1999-11-15
US458254 1999-12-09
US09/458,254 US6410192B1 (en) 1999-11-15 1999-12-09 Photolithography method, photolithography mask blanks, and method of making
PCT/US2000/028223 WO2001037052A1 (en) 1999-11-15 2000-10-12 Photolithography method, photolithography mask blanks, and method of making

Publications (2)

Publication Number Publication Date
DE60013901D1 true DE60013901D1 (de) 2004-10-21
DE60013901T2 DE60013901T2 (de) 2005-09-29

Family

ID=26861545

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60013901T Expired - Fee Related DE60013901T2 (de) 1999-11-15 2000-10-12 Photolithographisches verfahren, maskenrohlinge und verfahren zu deren herstellung

Country Status (6)

Country Link
US (3) US6410192B1 (de)
EP (1) EP1240556B1 (de)
JP (1) JP2003515192A (de)
KR (1) KR100716860B1 (de)
DE (1) DE60013901T2 (de)
WO (1) WO2001037052A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033938A (ja) * 1999-07-22 2001-02-09 Oki Electric Ind Co Ltd ハーフトーン位相シフトマスクの特性補正方法
US6915665B2 (en) * 2000-10-31 2005-07-12 Corning Incorporated Method of inducing transmission in optical lithography preforms
CN1514943A (zh) 2001-05-16 2004-07-21 康宁股份有限公司 来自立方体材料的较佳晶体取向光学元件
US20030027055A1 (en) * 2001-08-01 2003-02-06 Ball Laura J. Method and feedstock for making photomask material
KR20040035780A (ko) 2001-09-14 2004-04-29 코닝 인코포레이티드 포토리소그라피 방법 및 최소 공간분산을 갖는 유브이투과용 플루오라이드 결정
US6669920B2 (en) 2001-11-20 2003-12-30 Corning Incorporated Below 160NM optical lithography crystal materials and methods of making
EP1456142B1 (de) * 2001-12-21 2007-03-07 Corning Incorporated Schmelzquarzglas enthaltend aluminium
US6630418B2 (en) * 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
US6672111B2 (en) * 2001-12-21 2004-01-06 Corning Incorporated Method and apparatus for adding metals to fused silica
US7075905B2 (en) 2002-09-11 2006-07-11 Qualcomm Incorporated Quality indicator bit (QIB) generation in wireless communications systems
JP2005255423A (ja) 2004-03-09 2005-09-22 Asahi Glass Co Ltd 合成石英ガラス製フォトマスク基板およびフォトマスク
JP4776891B2 (ja) * 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
US20050242471A1 (en) * 2004-04-30 2005-11-03 Bhatt Sanjiv M Methods for continuously producing shaped articles
USD543160S1 (en) 2004-05-17 2007-05-22 Hoya Corporation Photomask blank
USD537048S1 (en) * 2004-05-17 2007-02-20 Hoya Corporation Photomask blank
US7275397B2 (en) * 2004-05-21 2007-10-02 Corning Incorporated Method of molding a silica article
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
EP1853971B1 (de) * 2005-02-09 2010-10-20 Asahi Glass Company, Limited Maskenrohlinge
JP2006251781A (ja) * 2005-02-09 2006-09-21 Asahi Glass Co Ltd マスクブランクス
JP4692745B2 (ja) * 2005-02-25 2011-06-01 株式会社ニコン マスク基板、フォトマスク、露光方法、露光装置の管理方法、及びデバイス製造方法
WO2007032818A2 (en) * 2005-09-12 2007-03-22 Zoltan Laboratories Llc Compounds and compositions to control abnormal cell growth
JP4675745B2 (ja) * 2005-10-25 2011-04-27 株式会社東芝 フォトマスク用基板の選別方法、フォトマスク作製方法及び半導体装置製造方法
JP4752695B2 (ja) * 2006-09-15 2011-08-17 ソニー株式会社 マスクパターン補正方法，マスクパターン補正装置およびそのプログラム
JP2008070730A (ja) * 2006-09-15 2008-03-27 Sony Corp マスクブランクス選定方法、複屈折性指標の算出方法、リソグラフィ方法、マスクブランクス選定装置、複屈折性指標算出装置およびそのプログラム
JP5637146B2 (ja) * 2009-12-04 2014-12-10 旭硝子株式会社 インプリントモールド用石英系ガラス基材の製造方法およびインプリントモールドの製造方法
US11111176B1 (en) 2020-02-27 2021-09-07 Applied Materials, Inc. Methods and apparatus of processing transparent substrates

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4286052A (en) * 1980-01-10 1981-08-25 Ppg Industries, Inc. Method for making stained glass photomasks using stabilized glass
EP0401845B2 (de) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung
US5043002A (en) 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5410428A (en) 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
JPH05139778A (ja) * 1991-11-15 1993-06-08 Asahi Glass Co Ltd フオトマスク用高耐熱性石英ガラス基板
JPH05178632A (ja) * 1991-12-26 1993-07-20 Asahi Glass Co Ltd 光学用高耐熱性石英ガラスとその製造方法
US5702495A (en) 1993-02-10 1997-12-30 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US5332702A (en) 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
FR2706445B1 (fr) * 1993-06-18 1995-09-08 Holophane Procédé de fabrication de glace de phare, glace ainsi obtenue et moule pour la mise en Óoeuvre de ce procédé.
US5415953A (en) 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter
US5599371A (en) 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US6087283A (en) 1995-01-06 2000-07-11 Nikon Corporation Silica glass for photolithography
JP3064857B2 (ja) 1995-03-28 2000-07-12 株式会社ニコン 光リソグラフィー用光学部材および合成石英ガラスの製造方法
JPH0912323A (ja) * 1995-06-29 1997-01-14 Nikon Corp 紫外線照射による緻密化が抑制された石英ガラス部材
US5698484A (en) 1995-09-12 1997-12-16 Corning Incorporated Method and containment vessel for producing fused silica glass and the fused silica blank produced
JP3979666B2 (ja) 1995-09-12 2007-09-19 コーニング インコーポレイテッド 溶融シリカガラスの製造に於ける、炉、その使用方法及び炉によって製造された光学製品
WO1997010184A1 (en) 1995-09-12 1997-03-20 Corning Incorporated Boule oscillation patterns for producing fused silica glass
EP0780345A1 (de) 1995-12-22 1997-06-25 Corning Incorporated Optisches Element für UV-Transmission
JP2000505036A (ja) 1996-02-21 2000-04-25 コーニング インコーポレイテッド 純粋な溶融シリカ、炉および方法
US5935733A (en) 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
JP3965734B2 (ja) 1997-09-11 2007-08-29 株式会社ニコン 石英ガラスおよびその製造方法
JPH1184248A (ja) 1997-09-12 1999-03-26 Nikon Corp 反射屈折縮小光学系
JPH11116248A (ja) * 1997-10-13 1999-04-27 Nikon Corp 合成石英ガラス部材
US6376401B1 (en) * 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
WO2000017115A1 (en) 1998-09-22 2000-03-30 Corning Incorporated Burners for producing boules of fused silica glass
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
JP3627907B2 (ja) 1999-05-21 2005-03-09 信越化学工業株式会社 フォトマスク用合成石英ガラス基板の製造方法
JP2001019465A (ja) 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
US6541168B2 (en) * 2000-04-28 2003-04-01 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks

Also Published As

Publication number Publication date
US20020187407A1 (en) 2002-12-12
EP1240556B1 (de) 2004-09-15
EP1240556A4 (de) 2003-03-19
KR20030008213A (ko) 2003-01-24
US6410192B1 (en) 2002-06-25
WO2001037052A1 (en) 2001-05-25
JP2003515192A (ja) 2003-04-22
US6758063B2 (en) 2004-07-06
US6475682B2 (en) 2002-11-05
DE60013901T2 (de) 2005-09-29
US20020090518A1 (en) 2002-07-11
KR100716860B1 (ko) 2007-05-09
EP1240556A1 (de) 2002-09-18

Similar Documents

Publication Publication Date Title
DE60013901D1 (de) Photolithographisches verfahren, maskenrohlinge und verfahren zu deren herstellung
DE60208373D1 (de) Polyaryleneether-polyolefinzusammensetzung, verfahren zu deren herstellung und formassen daraus
DE60020163D1 (de) Fotomaske, verfahren zu ihrer herstellung
DE60125394D1 (de) Tintenstrahltinte und verfahren zu deren herstellung
ATE551940T1 (de) Mehrschichtfolie und verfahren zu deren herstellung
DE69924980D1 (de) Feuerverzögernde konzentrate und verfahren zu deren herstellung
DE60133016D1 (de) Polyamidsäure, polyimid,verfahren zu deren herstellung und polyimidfilm
DE69815126D1 (de) Pyrimidinderivate und verfahren zu deren herstellung
ATE279506T1 (de) Tabletten und verfahren zu deren herstellung
DE59904632D1 (de) Epithilonderivate, verfahren zu deren herstellung und deren verwendung
DE60029337D1 (de) Celluloseether und verfahren zu deren herstellung
DE60022660D1 (de) Gasdichte beschichtungszusammensetzung, verfahren zu deren herstellung und gasdichter beschichtungsfilm
DE50107925D1 (de) Hochvolt-diode und verfahren zu deren herstellung
DE60226707D1 (de) Kunsthaare und verfahren zu deren herstellung
DE59914950D1 (de) Feldeffektgesteuerter transistor und verfahren zu dessen herstellung
EP1054607A4 (de) Mikrohaftverschluss und verfahren zu dessen herstellung
DE60021682D1 (de) Rostfreie stahplatte für schattenmaske, schattenmaske und verfahren zu deren herstellung
DE60238703D1 (de) Photokatalysator und verfahren zu seiner herstellung
DE59913422D1 (de) Femfet-vorrichtung und verfahren zu deren herstellung
DE60020066D1 (de) Mehrschichtfolie und verfahren zu deren herstellung
DE60045077D1 (de) Hitzebeständige, expandierte graphitplatten und verfahren zu deren herstellung
DE10081263D2 (de) Schraubverbindung und Verbindungsmittel hierfür sowie Verfahren zu deren Herstellung
DE59912402D1 (de) Polycyclische thiazolidin-2-yliden amine, verfahren zu ihrer herstellung und ihre verwendung als arzneimittel
DE60126787D1 (de) Lageranordnung und verfahren zu deren herstellung
DE60038384D1 (de) Polyarylen und verfahren zu dessen herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee