DE60007287T2 - Verfahren und vorrichtung zum beschichten mittels bogenentladung - Google Patents
Verfahren und vorrichtung zum beschichten mittels bogenentladung Download PDFInfo
- Publication number
- DE60007287T2 DE60007287T2 DE60007287T DE60007287T DE60007287T2 DE 60007287 T2 DE60007287 T2 DE 60007287T2 DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T2 DE60007287 T2 DE 60007287T2
- Authority
- DE
- Germany
- Prior art keywords
- reactant
- plasma
- coating
- substrate
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Road Signs Or Road Markings (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/271,655 US6365016B1 (en) | 1999-03-17 | 1999-03-17 | Method and apparatus for arc plasma deposition with evaporation of reagents |
| PCT/US2000/003028 WO2000055388A2 (en) | 1999-03-17 | 2000-02-04 | Method and apparatus for arc deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60007287D1 DE60007287D1 (de) | 2004-01-29 |
| DE60007287T2 true DE60007287T2 (de) | 2004-10-21 |
Family
ID=23036497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60007287T Expired - Lifetime DE60007287T2 (de) | 1999-03-17 | 2000-02-04 | Verfahren und vorrichtung zum beschichten mittels bogenentladung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6365016B1 (de) |
| EP (1) | EP1161574B1 (de) |
| JP (1) | JP4733273B2 (de) |
| AT (1) | ATE256763T1 (de) |
| DE (1) | DE60007287T2 (de) |
| WO (1) | WO2000055388A2 (de) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6261694B1 (en) | 1999-03-17 | 2001-07-17 | General Electric Company | Infrared reflecting coatings |
| US6793775B2 (en) * | 2001-03-13 | 2004-09-21 | Mikhail I. Gouskov | Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition |
| US7879411B2 (en) * | 2001-04-30 | 2011-02-01 | University Of Virginia Patent Foundation | Method and apparatus for efficient application of substrate coating |
| JP4738636B2 (ja) * | 2001-05-29 | 2011-08-03 | 株式会社テクノ菱和 | 防爆型無発塵イオナイザー |
| JP2003011661A (ja) * | 2001-06-25 | 2003-01-15 | Exatec Llc | 自動車用固定グレイジングを提供するためのパネルおよび方法 |
| US6660538B2 (en) * | 2001-10-29 | 2003-12-09 | Energy Photovoltaics | Non-contacting deposition control of chalcopyrite thin films |
| DE10153760A1 (de) * | 2001-10-31 | 2003-05-22 | Fraunhofer Ges Forschung | Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht |
| FR2842536B1 (fr) * | 2002-07-19 | 2005-06-03 | Commissariat Energie Atomique | Reacteur electrolytique |
| US6740586B1 (en) * | 2002-11-06 | 2004-05-25 | Advanced Technology Materials, Inc. | Vapor delivery system for solid precursors and method of using same |
| US6890656B2 (en) | 2002-12-20 | 2005-05-10 | General Electric Company | High rate deposition of titanium dioxide |
| US7163749B2 (en) * | 2002-12-20 | 2007-01-16 | General Electric Company | Process for depositing finely dispersed organic-inorganic films and articles made therefrom |
| EP1597409A1 (de) * | 2003-02-20 | 2005-11-23 | General Electric Company | Vorrichtung und verfahren zur grossflächenbeschichtung auf ebenen oberflächen |
| CA2460296C (en) * | 2003-05-23 | 2012-02-14 | Sulzer Metco Ag | A hybrid method for the coating of a substrate by a thermal application of the coating |
| US7282244B2 (en) * | 2003-09-05 | 2007-10-16 | General Electric Company | Replaceable plate expanded thermal plasma apparatus and method |
| US20110104381A1 (en) * | 2004-01-15 | 2011-05-05 | Stefan Laure | Plasma Treatment of Large-Scale Components |
| EP1725699A1 (de) * | 2004-03-09 | 2006-11-29 | Exatec, LLC. | Plasmabeschichtungssystem für nichtplanare substrate |
| DE102004014618B3 (de) * | 2004-03-23 | 2005-11-10 | Eads Space Transportation Gmbh | Elektrothermisches Impuls-Triebwerk |
| US7300617B2 (en) * | 2004-05-13 | 2007-11-27 | David Gerling | Method of making fusion cast articles |
| DE112006001571A5 (de) * | 2005-04-11 | 2008-03-27 | Dr. Laure Plasmatechnologie Gmbh | Vorrichtung und Verfahren zur Plasmabeschichtung |
| US9180423B2 (en) | 2005-04-19 | 2015-11-10 | SDCmaterials, Inc. | Highly turbulent quench chamber |
| US20090104377A1 (en) * | 2005-08-29 | 2009-04-23 | Yoshida Hidehiro | Vapor deposition head apparatus and method of coating by vapor deposition |
| JP2007191761A (ja) * | 2006-01-19 | 2007-08-02 | Idemitsu Kosan Co Ltd | 積層構造、それを用いた電気回路用電極及びその製造方法 |
| US8082878B2 (en) * | 2006-04-20 | 2011-12-27 | Saint-Gobain Glass France | Thermal evaporation apparatus, use and method of depositing a material |
| CA2582312C (en) * | 2006-05-05 | 2014-05-13 | Sulzer Metco Ag | A method for the manufacture of a coating |
| US7939181B2 (en) | 2006-10-11 | 2011-05-10 | Oerlikon Trading Ag, Trubbach | Layer system with at least one mixed crystal layer of a multi-oxide |
| ES2366350T3 (es) * | 2007-02-26 | 2011-10-19 | Dr. Laure Plasmatechnologie Gmbh | Dispositivo y procedimiento para el revestimiento y tratamiento superficial asistidos por plasma de componentes voluminosos. |
| US8481449B1 (en) | 2007-10-15 | 2013-07-09 | SDCmaterials, Inc. | Method and system for forming plug and play oxide catalysts |
| US8168268B2 (en) * | 2008-12-12 | 2012-05-01 | Ovishinsky Innovation, LLC | Thin film deposition via a spatially-coordinated and time-synchronized process |
| DE102009010497A1 (de) * | 2008-12-19 | 2010-08-05 | J-Fiber Gmbh | Mehrdüsiger rohrförmiger Plasma-Abscheidebrenner zur Herstellung von Vorformen als Halbzeuge für optische Fasern |
| JP5507882B2 (ja) * | 2009-05-08 | 2014-05-28 | 国立大学法人茨城大学 | 酸化亜鉛透明導電膜の製造方法及びこの方法を実施するための製造装置 |
| US8652992B2 (en) | 2009-12-15 | 2014-02-18 | SDCmaterials, Inc. | Pinning and affixing nano-active material |
| US8803025B2 (en) | 2009-12-15 | 2014-08-12 | SDCmaterials, Inc. | Non-plugging D.C. plasma gun |
| US9126191B2 (en) | 2009-12-15 | 2015-09-08 | SDCmaterials, Inc. | Advanced catalysts for automotive applications |
| US8043954B1 (en) | 2010-03-30 | 2011-10-25 | Primestar Solar, Inc. | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device |
| US8525019B2 (en) | 2010-07-01 | 2013-09-03 | Primestar Solar, Inc. | Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules |
| US8580353B2 (en) * | 2010-07-08 | 2013-11-12 | Applied Vacuum Coating Technologies Co., Ltd. | Method for treating surface of glass substrate and apparatus for performing same |
| US8669202B2 (en) | 2011-02-23 | 2014-03-11 | SDCmaterials, Inc. | Wet chemical and plasma methods of forming stable PtPd catalysts |
| US8541069B2 (en) * | 2011-04-11 | 2013-09-24 | United Technologies Corporation | Method of guided non-line of sight coating |
| KR101879175B1 (ko) * | 2011-10-20 | 2018-08-20 | 삼성전자주식회사 | 화학 기상 증착 장치 |
| US9156025B2 (en) | 2012-11-21 | 2015-10-13 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
| US9511352B2 (en) | 2012-11-21 | 2016-12-06 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
| WO2015013545A1 (en) | 2013-07-25 | 2015-01-29 | SDCmaterials, Inc. | Washcoats and coated substrates for catalytic converters |
| DE102013219199A1 (de) * | 2013-09-24 | 2015-03-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Neues Bewitterungsverfahren für Proben |
| EP3060335A4 (de) | 2013-10-22 | 2017-07-19 | SDCMaterials, Inc. | Katalysatordesign für schwerlast-dieselverbrennungsmotoren |
| EP3068517A4 (de) | 2013-10-22 | 2017-07-05 | SDCMaterials, Inc. | Zusammensetzungen aus mager-nox-falle |
| CN106470752A (zh) | 2014-03-21 | 2017-03-01 | Sdc材料公司 | 用于被动nox吸附(pna)系统的组合物 |
| AT517694B1 (de) * | 2015-11-12 | 2017-04-15 | Inocon Tech Ges M B H | Vorrichtung und Verfahren zum Aufbringen einer Beschichtung |
| JP7166759B2 (ja) * | 2015-12-04 | 2022-11-08 | アプライド マテリアルズ インコーポレイテッド | Hdp-cvdチャンバのアーク発生を防止するための高度なコーティング方法および材料 |
| EP3417085A1 (de) * | 2016-05-10 | 2018-12-26 | Applied Materials, Inc. | Verfahren zum betrieb einer abscheidungsvorrichtung und abscheidungsvorrichtung |
| DE102017003042B3 (de) | 2017-03-29 | 2018-08-16 | Rodenstock Gmbh | Gradienten-Hartschicht mit sich änderndem E-Modul |
| US10612122B2 (en) * | 2017-08-25 | 2020-04-07 | Vladimir E. Belashchenko | Plasma device and method for delivery of plasma and spray material at extended locations from an anode arc root attachment |
| US10707477B2 (en) * | 2017-09-15 | 2020-07-07 | Dyson Technology Limited | High energy density multilayer battery cell with thermally processed components and method for making same |
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-
1999
- 1999-03-17 US US09/271,655 patent/US6365016B1/en not_active Expired - Lifetime
-
2000
- 2000-02-04 JP JP2000605803A patent/JP4733273B2/ja not_active Expired - Fee Related
- 2000-02-04 AT AT00907176T patent/ATE256763T1/de not_active IP Right Cessation
- 2000-02-04 WO PCT/US2000/003028 patent/WO2000055388A2/en not_active Ceased
- 2000-02-04 DE DE60007287T patent/DE60007287T2/de not_active Expired - Lifetime
- 2000-02-04 EP EP00907176A patent/EP1161574B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000055388A2 (en) | 2000-09-21 |
| JP4733273B2 (ja) | 2011-07-27 |
| EP1161574B1 (de) | 2003-12-17 |
| EP1161574A1 (de) | 2001-12-12 |
| ATE256763T1 (de) | 2004-01-15 |
| JP2003518553A (ja) | 2003-06-10 |
| WO2000055388A3 (en) | 2001-06-28 |
| DE60007287D1 (de) | 2004-01-29 |
| US6365016B1 (en) | 2002-04-02 |
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