[go: up one dir, main page]

DE60007287T2 - Verfahren und vorrichtung zum beschichten mittels bogenentladung - Google Patents

Verfahren und vorrichtung zum beschichten mittels bogenentladung Download PDF

Info

Publication number
DE60007287T2
DE60007287T2 DE60007287T DE60007287T DE60007287T2 DE 60007287 T2 DE60007287 T2 DE 60007287T2 DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T2 DE60007287 T2 DE 60007287T2
Authority
DE
Germany
Prior art keywords
reactant
plasma
coating
substrate
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60007287T
Other languages
English (en)
Other versions
DE60007287D1 (de
Inventor
Dominic Iacovangelo
Milton Borst
Calvin Jerabek
Peter Marzano
Lee-Mean Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of DE60007287D1 publication Critical patent/DE60007287D1/de
Publication of DE60007287T2 publication Critical patent/DE60007287T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228Gas flow assisted PVD deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422Arrangement for selecting ions or species in the plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Road Signs Or Road Markings (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
DE60007287T 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung Expired - Lifetime DE60007287T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/271,655 US6365016B1 (en) 1999-03-17 1999-03-17 Method and apparatus for arc plasma deposition with evaporation of reagents
PCT/US2000/003028 WO2000055388A2 (en) 1999-03-17 2000-02-04 Method and apparatus for arc deposition

Publications (2)

Publication Number Publication Date
DE60007287D1 DE60007287D1 (de) 2004-01-29
DE60007287T2 true DE60007287T2 (de) 2004-10-21

Family

ID=23036497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60007287T Expired - Lifetime DE60007287T2 (de) 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung

Country Status (6)

Country Link
US (1) US6365016B1 (de)
EP (1) EP1161574B1 (de)
JP (1) JP4733273B2 (de)
AT (1) ATE256763T1 (de)
DE (1) DE60007287T2 (de)
WO (1) WO2000055388A2 (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6793775B2 (en) * 2001-03-13 2004-09-21 Mikhail I. Gouskov Multiple torch—multiple target method and apparatus for plasma outside chemical vapor deposition
US7879411B2 (en) * 2001-04-30 2011-02-01 University Of Virginia Patent Foundation Method and apparatus for efficient application of substrate coating
JP4738636B2 (ja) * 2001-05-29 2011-08-03 株式会社テクノ菱和 防爆型無発塵イオナイザー
JP2003011661A (ja) * 2001-06-25 2003-01-15 Exatec Llc 自動車用固定グレイジングを提供するためのパネルおよび方法
US6660538B2 (en) * 2001-10-29 2003-12-09 Energy Photovoltaics Non-contacting deposition control of chalcopyrite thin films
DE10153760A1 (de) * 2001-10-31 2003-05-22 Fraunhofer Ges Forschung Verfahren zur Herstellung einer UV-absorbierenden transparenten Abriebschutzschicht
FR2842536B1 (fr) * 2002-07-19 2005-06-03 Commissariat Energie Atomique Reacteur electrolytique
US6740586B1 (en) * 2002-11-06 2004-05-25 Advanced Technology Materials, Inc. Vapor delivery system for solid precursors and method of using same
US6890656B2 (en) 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US7163749B2 (en) * 2002-12-20 2007-01-16 General Electric Company Process for depositing finely dispersed organic-inorganic films and articles made therefrom
EP1597409A1 (de) * 2003-02-20 2005-11-23 General Electric Company Vorrichtung und verfahren zur grossflächenbeschichtung auf ebenen oberflächen
CA2460296C (en) * 2003-05-23 2012-02-14 Sulzer Metco Ag A hybrid method for the coating of a substrate by a thermal application of the coating
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
US20110104381A1 (en) * 2004-01-15 2011-05-05 Stefan Laure Plasma Treatment of Large-Scale Components
EP1725699A1 (de) * 2004-03-09 2006-11-29 Exatec, LLC. Plasmabeschichtungssystem für nichtplanare substrate
DE102004014618B3 (de) * 2004-03-23 2005-11-10 Eads Space Transportation Gmbh Elektrothermisches Impuls-Triebwerk
US7300617B2 (en) * 2004-05-13 2007-11-27 David Gerling Method of making fusion cast articles
DE112006001571A5 (de) * 2005-04-11 2008-03-27 Dr. Laure Plasmatechnologie Gmbh Vorrichtung und Verfahren zur Plasmabeschichtung
US9180423B2 (en) 2005-04-19 2015-11-10 SDCmaterials, Inc. Highly turbulent quench chamber
US20090104377A1 (en) * 2005-08-29 2009-04-23 Yoshida Hidehiro Vapor deposition head apparatus and method of coating by vapor deposition
JP2007191761A (ja) * 2006-01-19 2007-08-02 Idemitsu Kosan Co Ltd 積層構造、それを用いた電気回路用電極及びその製造方法
US8082878B2 (en) * 2006-04-20 2011-12-27 Saint-Gobain Glass France Thermal evaporation apparatus, use and method of depositing a material
CA2582312C (en) * 2006-05-05 2014-05-13 Sulzer Metco Ag A method for the manufacture of a coating
US7939181B2 (en) 2006-10-11 2011-05-10 Oerlikon Trading Ag, Trubbach Layer system with at least one mixed crystal layer of a multi-oxide
ES2366350T3 (es) * 2007-02-26 2011-10-19 Dr. Laure Plasmatechnologie Gmbh Dispositivo y procedimiento para el revestimiento y tratamiento superficial asistidos por plasma de componentes voluminosos.
US8481449B1 (en) 2007-10-15 2013-07-09 SDCmaterials, Inc. Method and system for forming plug and play oxide catalysts
US8168268B2 (en) * 2008-12-12 2012-05-01 Ovishinsky Innovation, LLC Thin film deposition via a spatially-coordinated and time-synchronized process
DE102009010497A1 (de) * 2008-12-19 2010-08-05 J-Fiber Gmbh Mehrdüsiger rohrförmiger Plasma-Abscheidebrenner zur Herstellung von Vorformen als Halbzeuge für optische Fasern
JP5507882B2 (ja) * 2009-05-08 2014-05-28 国立大学法人茨城大学 酸化亜鉛透明導電膜の製造方法及びこの方法を実施するための製造装置
US8652992B2 (en) 2009-12-15 2014-02-18 SDCmaterials, Inc. Pinning and affixing nano-active material
US8803025B2 (en) 2009-12-15 2014-08-12 SDCmaterials, Inc. Non-plugging D.C. plasma gun
US9126191B2 (en) 2009-12-15 2015-09-08 SDCmaterials, Inc. Advanced catalysts for automotive applications
US8043954B1 (en) 2010-03-30 2011-10-25 Primestar Solar, Inc. Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
US8525019B2 (en) 2010-07-01 2013-09-03 Primestar Solar, Inc. Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules
US8580353B2 (en) * 2010-07-08 2013-11-12 Applied Vacuum Coating Technologies Co., Ltd. Method for treating surface of glass substrate and apparatus for performing same
US8669202B2 (en) 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts
US8541069B2 (en) * 2011-04-11 2013-09-24 United Technologies Corporation Method of guided non-line of sight coating
KR101879175B1 (ko) * 2011-10-20 2018-08-20 삼성전자주식회사 화학 기상 증착 장치
US9156025B2 (en) 2012-11-21 2015-10-13 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
US9511352B2 (en) 2012-11-21 2016-12-06 SDCmaterials, Inc. Three-way catalytic converter using nanoparticles
WO2015013545A1 (en) 2013-07-25 2015-01-29 SDCmaterials, Inc. Washcoats and coated substrates for catalytic converters
DE102013219199A1 (de) * 2013-09-24 2015-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Neues Bewitterungsverfahren für Proben
EP3060335A4 (de) 2013-10-22 2017-07-19 SDCMaterials, Inc. Katalysatordesign für schwerlast-dieselverbrennungsmotoren
EP3068517A4 (de) 2013-10-22 2017-07-05 SDCMaterials, Inc. Zusammensetzungen aus mager-nox-falle
CN106470752A (zh) 2014-03-21 2017-03-01 Sdc材料公司 用于被动nox吸附(pna)系统的组合物
AT517694B1 (de) * 2015-11-12 2017-04-15 Inocon Tech Ges M B H Vorrichtung und Verfahren zum Aufbringen einer Beschichtung
JP7166759B2 (ja) * 2015-12-04 2022-11-08 アプライド マテリアルズ インコーポレイテッド Hdp-cvdチャンバのアーク発生を防止するための高度なコーティング方法および材料
EP3417085A1 (de) * 2016-05-10 2018-12-26 Applied Materials, Inc. Verfahren zum betrieb einer abscheidungsvorrichtung und abscheidungsvorrichtung
DE102017003042B3 (de) 2017-03-29 2018-08-16 Rodenstock Gmbh Gradienten-Hartschicht mit sich änderndem E-Modul
US10612122B2 (en) * 2017-08-25 2020-04-07 Vladimir E. Belashchenko Plasma device and method for delivery of plasma and spray material at extended locations from an anode arc root attachment
US10707477B2 (en) * 2017-09-15 2020-07-07 Dyson Technology Limited High energy density multilayer battery cell with thermally processed components and method for making same

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3220973A (en) 1965-11-30 Cross-linked polycarbonate resinous compositions
US3312659A (en) 1967-04-04 Catalytic preparation of polycarbon- ates from bisphenol and a carbonate precursor
US3161615A (en) 1957-02-05 1964-12-15 Gen Electric Resinous copolymeric polycarbonate of a mixture of dihydric phenols
US3313777A (en) 1959-12-18 1967-04-11 Eastman Kodak Co Linear polyesters and polyester-amides from 2, 2, 4, 4-tetraalkyl-1, 3-cyclobutanediols
US3312660A (en) 1962-07-03 1967-04-04 Union Carbide Corp Process for preparing polycarbonates by self-condensation of bisphenol dichloroformate
US3576656A (en) 1968-03-11 1971-04-27 Nasa Stabilized zinc oxide coating compositions
US3625848A (en) 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3666614A (en) 1969-06-24 1972-05-30 Union Carbide Corp Glass-polycarbonate resin laminates
US3989672A (en) 1972-10-30 1976-11-02 General Electric Company Process for preparing aromatic carbonate polymers
US4210699A (en) 1978-11-01 1980-07-01 General Electric Company Abrasion resistant silicone coated polycarbonate article
US4224378A (en) 1978-11-01 1980-09-23 General Electric Company Abrasion resistant organopolysiloxane coated polycarbonate article
US4200681A (en) 1978-11-13 1980-04-29 General Electric Company Glass coated polycarbonate articles
US4194038A (en) 1979-01-25 1980-03-18 Allied Chemical Corporation Poly(ester-carbonates) from dicarboxylic acid chlorides
US4242381A (en) 1979-04-18 1980-12-30 General Electric Company Method of providing a polycarbonate article with a uniform and durable silica filled organopolysiloxane coating
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
DE3014258A1 (de) 1980-04-14 1981-10-15 Heinrich Dr. 6236 Eschborn Winter Verfahren zum aufbringen von metallischen, metalloidischen oder keramischen schichten mit verbesserten strukturellen eigenschaften durch plasmaspruehen
US4454275A (en) 1981-02-20 1984-06-12 General Electric Company Flame retardant copolyester-carbonate compositions
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
JPS61268356A (ja) * 1985-01-09 1986-11-27 Nippon Denso Co Ltd 触媒担体へのアルミナの担持方法
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4842941A (en) 1987-04-06 1989-06-27 General Electric Company Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby
JPH0770058B2 (ja) * 1987-04-16 1995-07-31 富士写真フイルム株式会社 磁気記録媒体の製造方法及び製造装置
CA1264025A (en) 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
NL8701530A (nl) 1987-06-30 1989-01-16 Stichting Fund Ond Material Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.
US5051308A (en) 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
US4927704A (en) 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
EP0327639B1 (de) 1987-08-24 1992-01-08 General Electric Company Abnutzungsbeständiger plastartikel und verfahren zu seiner herstellung
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
DE58909180D1 (de) * 1988-03-23 1995-05-24 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung von Werkstücken.
DE3821131A1 (de) 1988-06-23 1989-12-28 Bayer Ag Verfahren zur herstellung von kunststofformkoerpern mit verbesserter witterungsbestaendigkeit
US4948485A (en) 1988-11-23 1990-08-14 Plasmacarb Inc. Cascade arc plasma torch and a process for plasma polymerization
US5152866A (en) * 1989-01-13 1992-10-06 Hughes Aircraft Company Plasma/radiation assisted molecular beam epitaxy method
EP0385475A3 (de) * 1989-03-02 1991-04-03 Asahi Glass Company Ltd. Verfahren zur Herstellung eines durchsichtigen leitenden Films
US5104634A (en) * 1989-04-20 1992-04-14 Hercules Incorporated Process for forming diamond coating using a silent discharge plasma jet process
EP0460206A1 (de) 1989-12-22 1991-12-11 General Electric Company Polyestercarbonatzusammensetzung
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
WO1992013517A1 (en) 1991-02-05 1992-08-20 Sun Smart, Inc. Visibly transparent uv sunblock agents and methods of making same
US5156882A (en) 1991-12-30 1992-10-20 General Electric Company Method of preparing UV absorbant and abrasion-resistant transparent plastic articles
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
US5480722A (en) 1992-07-03 1996-01-02 Asahi Glass Company Ltd. Ultraviolet ray absorbent glass and method for preparing the same
US5302271A (en) * 1992-08-25 1994-04-12 Northeastern University Anodic vacuum arc deposition system
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
DE4235199C1 (de) 1992-10-19 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4236264C1 (de) 1992-10-27 1993-09-02 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 80636 Muenchen, De
US5298587A (en) 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
JPH06330326A (ja) 1993-03-26 1994-11-29 Shin Etsu Chem Co Ltd シリカ薄膜の製造方法
US5463013A (en) 1993-04-27 1995-10-31 Teijin Chemicals, Ltd. Modified aromatic polycarbonate resin, modified aromatic polyester carbonate resin, modified polyarylate, and molded articles therefrom
US5433786A (en) 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
US5691010A (en) * 1993-10-19 1997-11-25 Sanyo Electric Co., Ltd. Arc discharge plasma CVD method for forming diamond-like carbon films
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5571332A (en) 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
KR100418145B1 (ko) 1995-10-13 2005-01-31 다우 글로벌 테크놀로지스 인크. 피복된플라스틱기판을포함하는적층물
US5827580A (en) * 1996-03-27 1998-10-27 Regents Of The University Of California Low temperature formation of electrode having electrically conductive metal oxide surface
US5952061A (en) * 1996-12-27 1999-09-14 Stanley Electric Co., Ltd. Fabrication and method of producing silicon films
US6213049B1 (en) 1997-06-26 2001-04-10 General Electric Company Nozzle-injector for arc plasma deposition apparatus
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
US5976636A (en) * 1998-03-19 1999-11-02 Industrial Technology Research Institute Magnetic apparatus for arc ion plating

Also Published As

Publication number Publication date
WO2000055388A2 (en) 2000-09-21
JP4733273B2 (ja) 2011-07-27
EP1161574B1 (de) 2003-12-17
EP1161574A1 (de) 2001-12-12
ATE256763T1 (de) 2004-01-15
JP2003518553A (ja) 2003-06-10
WO2000055388A3 (en) 2001-06-28
DE60007287D1 (de) 2004-01-29
US6365016B1 (en) 2002-04-02

Similar Documents

Publication Publication Date Title
DE60007287D1 (de) Verfahren und vorrichtung zum beschichten mittels bogenentladung
ATE148507T1 (de) Vorrichtung und verfahren zum beschichten von substraten mittels plasmaentladung
EP1509332B2 (de) Aufbringen eines beschichtungsmaterials auf ein substrat
US8828498B2 (en) Method of coating a surface with a water and oil repellant polymer layer
MX9701062A (es) Proceso y aparato para la deposicion de plasma por chorro.
TR200400076T4 (tr) Bir kılıf oluşturmaya yarayan metot ve aparat
TW200605194A (en) Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
TW347416B (en) Post treatment method for in-situ cleaning
AU2003207794A1 (en) Corona-generated chemical vapor deposition on a substrate
TW358963B (en) Method and apparatus for depositing deep UV photoresist films
GB0618471D0 (en) Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume
KR20160124534A (ko) 기판 처리 장치
ATE338340T1 (de) Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzen
ATE181116T1 (de) Verfahren und vorrichtung zur behandlung von substratoberflächen
DE102008044024A1 (de) Beschichtungsverfahren sowie Beschichtungsvorrichtung
ATE301204T1 (de) Verfahren und vorrichtung zur beschichtung von substraten
EP0154814A3 (de) Gegenstände überzogen durch Plasma aktivierte chemische Dampfabscheidung aus der Gasphase, Vorrichtung und Verfahren zur Herstellung dieser Gegenstände
KR20170075163A (ko) 가스분사부 및 이를 구비하는 원자층 증착장치
KR100295617B1 (ko) 고진공마그네트론스퍼터링방법
EP1921659A3 (de) System und Verfahren zur Steuerung der elektromagnetischen Strahlung während einer PECVD-Entladungsprozesses
WO2002036851A1 (de) Verfahren und vorrichtung zur oberflächenbehandlung elektrisch isolierender substrate
JPH04168281A (ja) 大気圧グロープラズマ装置
JP3291088B2 (ja) 被膜形成方法
JPS6318056A (ja) ア−ク式蒸発源
EP1002888A2 (de) Verfahren und Einrichtung zur Behandlung eines Substrates in einem Hochfrequenzplasma

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SABIC INNOVATIVE PLASTICS IP B.V., BERGEN OP Z, NL

8328 Change in the person/name/address of the agent

Representative=s name: PATENT- UND RECHTSANWAELTE BARDEHLE, PAGENBERG, DO