DE3480243D1 - Method of manufacturing thin-film integrated devices - Google Patents
Method of manufacturing thin-film integrated devicesInfo
- Publication number
- DE3480243D1 DE3480243D1 DE8484901397T DE3480243T DE3480243D1 DE 3480243 D1 DE3480243 D1 DE 3480243D1 DE 8484901397 T DE8484901397 T DE 8484901397T DE 3480243 T DE3480243 T DE 3480243T DE 3480243 D1 DE3480243 D1 DE 3480243D1
- Authority
- DE
- Germany
- Prior art keywords
- film integrated
- integrated devices
- manufacturing thin
- thin
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
- H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
- H10D64/691—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator comprising metallic compounds, e.g. metal oxides or metal silicates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/10—Metal-oxide dielectrics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/6737—Thin-film transistors [TFT] characterised by the electrodes characterised by the electrode materials
- H10D30/6739—Conductor-insulator-semiconductor electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/675—Group III-V materials, Group II-VI materials, Group IV-VI materials, selenium or tellurium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
-
- H10P14/6314—
-
- H10P14/6329—
-
- H10P14/69391—
-
- H10P14/69393—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Electroluminescent Light Sources (AREA)
- Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58057552A JPS59182572A (ja) | 1983-03-31 | 1983-03-31 | 薄膜トランジスタとその製造方法 |
| JP58098343A JPS59224098A (ja) | 1983-06-02 | 1983-06-02 | 薄膜発光素子 |
| PCT/JP1984/000145 WO1984003992A1 (en) | 1983-03-31 | 1984-03-29 | Thin-film integrated device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3480243D1 true DE3480243D1 (en) | 1989-11-23 |
Family
ID=26398611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8484901397T Expired DE3480243D1 (en) | 1983-03-31 | 1984-03-29 | Method of manufacturing thin-film integrated devices |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4602192A (de) |
| EP (1) | EP0139764B1 (de) |
| DE (1) | DE3480243D1 (de) |
| WO (1) | WO1984003992A1 (de) |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4890150A (en) * | 1985-12-05 | 1989-12-26 | North American Philips Corporation | Dielectric passivation |
| US4803536A (en) * | 1986-10-24 | 1989-02-07 | Xerox Corporation | Electrostatic discharge protection network for large area transducer arrays |
| JPH0240891A (ja) * | 1988-07-29 | 1990-02-09 | Toshiba Corp | 薄膜型エレクトロルミネッセンス表示素子 |
| JP2952887B2 (ja) * | 1989-05-20 | 1999-09-27 | 富士通株式会社 | 半導体装置およびその製造方法 |
| JPH0758635B2 (ja) * | 1989-11-24 | 1995-06-21 | 富士ゼロックス株式会社 | El駆動回路 |
| JPH0766246B2 (ja) * | 1989-12-15 | 1995-07-19 | 富士ゼロックス株式会社 | El駆動回路 |
| JP2794678B2 (ja) | 1991-08-26 | 1998-09-10 | 株式会社 半導体エネルギー研究所 | 絶縁ゲイト型半導体装置およびその作製方法 |
| US6713783B1 (en) | 1991-03-15 | 2004-03-30 | Semiconductor Energy Laboratory Co., Ltd. | Compensating electro-optical device including thin film transistors |
| JP2873632B2 (ja) | 1991-03-15 | 1999-03-24 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US5177406A (en) * | 1991-04-29 | 1993-01-05 | General Motors Corporation | Active matrix vacuum fluorescent display with compensation for variable phosphor efficiency |
| US7253440B1 (en) * | 1991-10-16 | 2007-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having at least first and second thin film transistors |
| US6759680B1 (en) | 1991-10-16 | 2004-07-06 | Semiconductor Energy Laboratory Co., Ltd. | Display device having thin film transistors |
| US7071910B1 (en) | 1991-10-16 | 2006-07-04 | Semiconductor Energy Laboratory Co., Ltd. | Electrooptical device and method of driving and manufacturing the same |
| JP2784615B2 (ja) * | 1991-10-16 | 1998-08-06 | 株式会社半導体エネルギー研究所 | 電気光学表示装置およびその駆動方法 |
| JPH05315608A (ja) * | 1992-05-13 | 1993-11-26 | Tadahiro Omi | 半導体装置 |
| US5302966A (en) | 1992-06-02 | 1994-04-12 | David Sarnoff Research Center, Inc. | Active matrix electroluminescent display and method of operation |
| US5587329A (en) * | 1994-08-24 | 1996-12-24 | David Sarnoff Research Center, Inc. | Method for fabricating a switching transistor having a capacitive network proximate a drift region |
| JPH08129360A (ja) * | 1994-10-31 | 1996-05-21 | Tdk Corp | エレクトロルミネセンス表示装置 |
| US5550066A (en) * | 1994-12-14 | 1996-08-27 | Eastman Kodak Company | Method of fabricating a TFT-EL pixel |
| US6853083B1 (en) * | 1995-03-24 | 2005-02-08 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transfer, organic electroluminescence display device and manufacturing method of the same |
| US5640067A (en) * | 1995-03-24 | 1997-06-17 | Tdk Corporation | Thin film transistor, organic electroluminescence display device and manufacturing method of the same |
| US5952789A (en) * | 1997-04-14 | 1999-09-14 | Sarnoff Corporation | Active matrix organic light emitting diode (amoled) display pixel structure and data load/illuminate circuit therefor |
| US6538554B1 (en) | 1997-04-18 | 2003-03-25 | Berger, Ii Robert E. | Resistors formed of aluminum-titanium alloys |
| US6072278A (en) * | 1997-08-06 | 2000-06-06 | Alliedsignal Inc. | High capacitance pixel for electronic displays |
| US6060406A (en) * | 1998-05-28 | 2000-05-09 | Lucent Technologies Inc. | MOS transistors with improved gate dielectrics |
| US8853696B1 (en) * | 1999-06-04 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and electronic device |
| US6552403B1 (en) * | 1999-11-05 | 2003-04-22 | North Carolina State University | Binary non-crystalline oxide analogs of silicon dioxide for use in gate dielectrics |
| JP4827294B2 (ja) * | 1999-11-29 | 2011-11-30 | 株式会社半導体エネルギー研究所 | 成膜装置及び発光装置の作製方法 |
| TW490714B (en) | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| US6307322B1 (en) | 1999-12-28 | 2001-10-23 | Sarnoff Corporation | Thin-film transistor circuitry with reduced sensitivity to variance in transistor threshold voltage |
| US20020011205A1 (en) | 2000-05-02 | 2002-01-31 | Shunpei Yamazaki | Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device |
| US7517551B2 (en) * | 2000-05-12 | 2009-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a light-emitting device |
| WO2002075710A1 (en) * | 2001-03-21 | 2002-09-26 | Canon Kabushiki Kaisha | Circuit for driving active-matrix light-emitting element |
| US7006883B2 (en) * | 2001-10-10 | 2006-02-28 | Semiconductor Energy Laboratory Co., Ltd. | Production system for composite product and production method for manufacturing of same |
| CN1623179A (zh) * | 2002-01-29 | 2005-06-01 | 奎斯尔显示器有限公司 | 发光设备的驱动电路和应用该电路的矩阵显示板 |
| SG113448A1 (en) * | 2002-02-25 | 2005-08-29 | Semiconductor Energy Lab | Fabrication system and a fabrication method of a light emitting device |
| EP1369499A3 (de) * | 2002-04-15 | 2004-10-20 | Semiconductor Energy Laboratory Co., Ltd. | Verfahren und Vorrichtung zur Herstellung eines lichtemittierenden Bauteils |
| US20030221620A1 (en) * | 2002-06-03 | 2003-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Vapor deposition device |
| JP2004047503A (ja) * | 2002-07-08 | 2004-02-12 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| KR101006938B1 (ko) | 2002-09-20 | 2011-01-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조 시스템 및 발광장치 제작방법 |
| JP4216707B2 (ja) * | 2003-12-25 | 2009-01-28 | 株式会社東芝 | 半導体装置の製造方法 |
| US7291522B2 (en) * | 2004-10-28 | 2007-11-06 | Hewlett-Packard Development Company, L.P. | Semiconductor devices and methods of making |
| CN104396346B (zh) * | 2012-06-21 | 2017-05-10 | Beneq有限公司 | 透明无机薄膜电致发光显示器元件及其制造方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1067831A (en) * | 1964-03-11 | 1967-05-03 | Ultra Electronics Ltd | Improvements in thin film circuits |
| US3556966A (en) * | 1968-01-19 | 1971-01-19 | Rca Corp | Plasma anodizing aluminium coatings on a semiconductor |
| SE348216B (de) * | 1968-08-12 | 1972-08-28 | Western Electric Co | |
| US3663870A (en) * | 1968-11-13 | 1972-05-16 | Tokyo Shibaura Electric Co | Semiconductor device passivated with rare earth oxide layer |
| DE1923265B2 (de) * | 1969-05-07 | 1972-06-22 | Licentia Patent Verwaltungs GmbH, 6000 Frankfurt | Verfahren zum herstellen eines feldeffekttransistors mit isolierter steuerelektrode |
| US3878549A (en) * | 1970-10-27 | 1975-04-15 | Shumpei Yamazaki | Semiconductor memories |
| JPS4954850A (de) * | 1972-09-28 | 1974-05-28 | ||
| US3997411A (en) * | 1973-06-20 | 1976-12-14 | Siemens Aktiengesellschaft | Method for the production of a thin film electric circuit |
| GB1424980A (en) * | 1973-06-20 | 1976-02-11 | Siemens Ag | Thin-film electrical circuits |
| JPS5310283A (en) * | 1976-07-15 | 1978-01-30 | Matsushita Electric Ind Co Ltd | 54)mos type semiconductor integrated circuit |
| GB1565551A (en) * | 1977-01-06 | 1980-04-23 | Westinghouse Electric Corp | Thin film transistor |
| JPS5824915B2 (ja) * | 1977-10-11 | 1983-05-24 | シャープ株式会社 | 薄膜el素子 |
| JPS5852284Y2 (ja) * | 1980-02-08 | 1983-11-29 | 富士通株式会社 | スパッタリング用タ−ゲット |
| JPS6040160B2 (ja) * | 1980-08-28 | 1985-09-09 | 松下電器産業株式会社 | 電場発光素子 |
| JPS5823191A (ja) * | 1981-07-31 | 1983-02-10 | シャープ株式会社 | 薄膜el素子 |
-
1984
- 1984-03-29 DE DE8484901397T patent/DE3480243D1/de not_active Expired
- 1984-03-29 US US06/678,547 patent/US4602192A/en not_active Expired - Lifetime
- 1984-03-29 WO PCT/JP1984/000145 patent/WO1984003992A1/ja not_active Ceased
- 1984-03-29 EP EP84901397A patent/EP0139764B1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0139764A1 (de) | 1985-05-08 |
| US4602192A (en) | 1986-07-22 |
| EP0139764A4 (de) | 1986-11-05 |
| WO1984003992A1 (en) | 1984-10-11 |
| EP0139764B1 (de) | 1989-10-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8320 | Willingness to grant licences declared (paragraph 23) |