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DE19983981T1 - Elektrode für Entladungsoberflächenbehandlung, Verfahren zum Herstellen der Elektrode für die Entladungsoberflächenbehandlung und Entladungsoberflächenbehandlungs-Verfahren - Google Patents

Elektrode für Entladungsoberflächenbehandlung, Verfahren zum Herstellen der Elektrode für die Entladungsoberflächenbehandlung und Entladungsoberflächenbehandlungs-Verfahren

Info

Publication number
DE19983981T1
DE19983981T1 DE19983981T DE19983981T DE19983981T1 DE 19983981 T1 DE19983981 T1 DE 19983981T1 DE 19983981 T DE19983981 T DE 19983981T DE 19983981 T DE19983981 T DE 19983981T DE 19983981 T1 DE19983981 T1 DE 19983981T1
Authority
DE
Germany
Prior art keywords
surface treatment
discharge surface
treatment electrode
manufacturing
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19983981T
Other languages
English (en)
Inventor
Akihiro Goto
Toshio Moro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE19983981T1 publication Critical patent/DE19983981T1/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/24—After-treatment of workpieces or articles
    • B22F2003/248—Thermal after-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Powder Metallurgy (AREA)
DE19983981T 1999-09-30 1999-11-29 Elektrode für Entladungsoberflächenbehandlung, Verfahren zum Herstellen der Elektrode für die Entladungsoberflächenbehandlung und Entladungsoberflächenbehandlungs-Verfahren Ceased DE19983981T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP1999/005364 WO2001023641A1 (en) 1999-09-30 1999-09-30 Electric discharge surface treating electrode and production method thereof and electric discharge surface treating method
PCT/JP1999/006630 WO2001024961A1 (en) 1999-09-30 1999-11-29 Electrode for discharge surface treating and production method thereof and discharge surface treating method

Publications (1)

Publication Number Publication Date
DE19983981T1 true DE19983981T1 (de) 2002-10-10

Family

ID=14236849

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19983981T Ceased DE19983981T1 (de) 1999-09-30 1999-11-29 Elektrode für Entladungsoberflächenbehandlung, Verfahren zum Herstellen der Elektrode für die Entladungsoberflächenbehandlung und Entladungsoberflächenbehandlungs-Verfahren

Country Status (7)

Country Link
US (1) US20060021868A1 (de)
JP (1) JP4439781B2 (de)
CN (2) CN1284649C (de)
CH (1) CH693872A5 (de)
DE (1) DE19983981T1 (de)
TW (1) TW500815B (de)
WO (2) WO2001023641A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100529182C (zh) 2002-07-30 2009-08-19 三菱电机株式会社 放电表面处理用电极、放电表面处理方法及放电表面处理装置
CN100360712C (zh) * 2002-09-24 2008-01-09 石川岛播磨重工业株式会社 高温构件的擦动面的涂覆方法及高温构件和放电表面处理用电极
US9284647B2 (en) * 2002-09-24 2016-03-15 Mitsubishi Denki Kabushiki Kaisha Method for coating sliding surface of high-temperature member, high-temperature member and electrode for electro-discharge surface treatment
WO2004033755A1 (ja) * 2002-10-09 2004-04-22 Ishikawajima-Harima Heavy Industries Co., Ltd. 回転体及びそのコーティング方法
JP4040493B2 (ja) * 2003-02-24 2008-01-30 株式会社ミツトヨ 放電加工用電極
CA2524672C (en) 2003-05-29 2010-04-20 Mitsubishi Denki Kabushiki Kaisha Electrode for electric discharge surface treatment, electric discharge surface treating method, and electric discharge surface treating apparatus
WO2004106587A1 (ja) * 2003-05-29 2004-12-09 Mitsubishi Denki Kabushiki Kaisha 放電表面処理用電極、放電表面処理用電極の製造方法、放電表面処理装置および放電表面処理方法
CN1798873B (zh) 2003-06-04 2010-08-25 三菱电机株式会社 放电表面处理用电极和其制造方法以及其保存方法
KR100753275B1 (ko) 2003-06-05 2007-08-29 미쓰비시덴키 가부시키가이샤 방전 표면 처리용 전극, 방전 표면 처리용 전극의 제조방법과 평가 방법, 방전 표면 처리 장치 및 방전 표면 처리방법
EP1632587A4 (de) * 2003-06-10 2009-07-29 Mitsubishi Electric Corp Elektrode zum beschichten mittels elektrischer entladung und evaluierungsverfahren dafür und verfahren zum beschichten mittels elektrischer entladung
WO2004113587A1 (ja) * 2003-06-10 2004-12-29 Ishikawajima-Harima Heavy Industries Co., Ltd. 金属部品、タービン部品、ガスタービンエンジン、表面処理方法、及び蒸気タービンエンジン
JP4608220B2 (ja) * 2004-01-29 2011-01-12 三菱電機株式会社 放電表面処理用電極および放電表面処理方法
CN101374975B (zh) * 2006-09-11 2012-01-11 三菱电机株式会社 放电表面处理用电极的制造方法及放电表面处理用电极
CN101595246B (zh) 2006-12-27 2012-06-13 三菱电机株式会社 放电表面处理用电极及其制造方法
US8372313B2 (en) * 2007-11-19 2013-02-12 Mitsubishi Electric Corporation Electrical-discharge surface-treatment electrode and metal coating film formed using the same
JP2013095935A (ja) * 2011-10-28 2013-05-20 Eagle Industry Co Ltd 放電表面処理用電極
JP4984015B1 (ja) * 2011-11-22 2012-07-25 三菱電機株式会社 放電表面処理用電極および放電表面処理用電極の製造方法
CN103436883B (zh) * 2013-08-07 2016-04-20 青岛科技大学 基于电火花沉积制备的自润滑涂层刀具及其制备方法
CN103692034B (zh) * 2013-12-19 2016-01-06 华南理工大学 一种对形状复杂的外表面进行放电加工的装置
JP6227206B1 (ja) 2016-12-28 2017-11-08 三菱電機株式会社 放電表面処理電極の製造方法および皮膜体の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2642654A (en) * 1946-12-27 1953-06-23 Econometal Corp Electrodeposited composite article and method of making the same
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
US4373127A (en) * 1980-02-06 1983-02-08 Minnesota Mining And Manufacturing Company EDM Electrodes
JPH06182626A (ja) * 1992-12-17 1994-07-05 Hitachi Ltd 高耐食性表面処理方法
JP3002621B2 (ja) * 1993-10-15 2000-01-24 尚武 毛利 放電加工による表面処理方法およびその装置
JP3271844B2 (ja) * 1993-12-31 2002-04-08 科学技術振興事業団 液中放電による金属材料の表面処理方法
JP3363284B2 (ja) * 1995-04-14 2003-01-08 科学技術振興事業団 放電加工用電極および放電による金属表面処理方法
JP3537939B2 (ja) * 1996-01-17 2004-06-14 独立行政法人 科学技術振興機構 液中放電による表面処理方法
CN1185366C (zh) * 1998-05-13 2005-01-19 三菱电机株式会社 放电表面处理用电极及制造方法、放电表面处理方法及设备

Also Published As

Publication number Publication date
WO2001023641A1 (en) 2001-04-05
CH693872A5 (de) 2004-03-31
CN1184044C (zh) 2005-01-12
CN1284649C (zh) 2006-11-15
TW500815B (en) 2002-09-01
US20060021868A1 (en) 2006-02-02
WO2001024961A1 (en) 2001-04-12
CN1367726A (zh) 2002-09-04
CN1504292A (zh) 2004-06-16
JP4439781B2 (ja) 2010-03-24

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: C23C 26/00

R016 Response to examination communication
R016 Response to examination communication
R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final

Effective date: 20131009