DE1224112B - Acid galvanic nickel bath - Google Patents
Acid galvanic nickel bathInfo
- Publication number
- DE1224112B DE1224112B DED40436A DED0040436A DE1224112B DE 1224112 B DE1224112 B DE 1224112B DE D40436 A DED40436 A DE D40436A DE D0040436 A DED0040436 A DE D0040436A DE 1224112 B DE1224112 B DE 1224112B
- Authority
- DE
- Germany
- Prior art keywords
- bath
- nickel
- ring system
- galvanic nickel
- nickel bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 44
- 229910052759 nickel Inorganic materials 0.000 title claims description 22
- 239000002253 acid Substances 0.000 title description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 229940124530 sulfonamide Drugs 0.000 claims description 4
- 150000003456 sulfonamides Chemical class 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 2
- 150000003458 sulfonic acid derivatives Chemical class 0.000 claims description 2
- 239000000080 wetting agent Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000013049 sediment Substances 0.000 description 3
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 2
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- ZGTHJWXZUZSQOQ-UHFFFAOYSA-N [Na].[SH2]=N.[SH2]=N Chemical compound [Na].[SH2]=N.[SH2]=N ZGTHJWXZUZSQOQ-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- VWVZFHRDLPHBEG-UHFFFAOYSA-N 1-(chloromethyl)-4-methylsulfanylbenzene Chemical group CSC1=CC=C(CCl)C=C1 VWVZFHRDLPHBEG-UHFFFAOYSA-N 0.000 description 1
- JXVJGPMIPPKYAS-UHFFFAOYSA-N 4-(chloromethyl)benzenesulfonyl chloride Chemical compound ClCC1=CC=C(S(Cl)(=O)=O)C=C1 JXVJGPMIPPKYAS-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 241000272534 Struthio camelus Species 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
- C07D213/20—Quaternary compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/04—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to the ring carbon atoms
- C07D215/10—Quaternary compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
DEUTSCHESGERMAN
PATENTAMTPATENT OFFICE
AUSLEGESCHRIFTEDITORIAL
Int. Cl.:Int. Cl .:
C23bC23b
Deutsche Kl.: 48 a-5/08German class: 48 a-5/08
Nummer: 1224112Number: 1224112
Aktenzeichen: D 40436 VI b/48 aFile number: D 40436 VI b / 48 a
Anmeldetag: 4. Dezember 1962Filing date: December 4, 1962
Auslegetag: 1. September 1966Opening day: September 1, 1966
Es wurde gefunden, daß organische Verbindungen t mit wenigstens einer cyclischen quartären Ammoniumgruppe und wenigstens einem durch ein Sulfonsäurederivat substituierten aromatischen Ringsystem im Molekül, bei denen das durch eine Sulfonamide Disulfimid- oder Sulfocarbonamidgruppe substituierte aromatische Ringsystem direkt oder mittels eines dieser Substituenten über einen kurzkettigen aliphatischen Rest an das quartäre Stickstoffatom des heterocyclischen Ringes gebunden ist, in sauren galvanischen Nickelbädern hervorragende glanzgebende und einebnende Eigenschaften entfalten. Es ist bereits bekannt, Diaryldisulfimide bzw. durch Halogen substituierte Diaryldisulfimide als Glanzmittel in galvanischen Nickelbädern einzusetzen. Des weiteren sind bereits Sulfocarbonimide als Glanzmittel in galvanischen Nickelbädern verwendet worden. Endlich hat man auch die inneren Salze von Pyridinalkansulfonsäuren als Einebnungsmittel in sauren galvanischen Nickelbädern gebraucht. Allen diesen Produkten haftet jedoch der Nachteil an, daß damit Spitzeneffekte nur in Kombination mit anderen Zusatzmitteln, wie Glanz-, Einebnungs-, Porenverhütungs- und Netzmitteln, zu erzielen sind.It has been found that organic compounds t with at least one cyclic quaternary ammonium group and at least one aromatic ring system substituted by a sulfonic acid derivative in the molecule, in which the aromatic ring system substituted by a sulfonamide disulfimide or sulfocarbonamide group directly or by means of one of these substituents via a short-chain aliphatic radical is bound to the quaternary nitrogen atom of the heterocyclic ring, develop excellent gloss-giving and leveling properties in acidic galvanic nickel baths. It is already known to use diaryldisulfimides or halogen-substituted diaryldisulfimides as brighteners in galvanic nickel baths. Furthermore, sulfocarbonimides have already been used as brighteners in galvanic nickel baths. Finally, the inner salts of pyridine alkanesulfonic acids have also been used as leveling agents in acidic galvanic nickel baths. However, all of these products have the disadvantage that they can only achieve peak effects in combination with other additives, such as gloss, leveling, anti-pore and wetting agents.
Weiterhin hat man bereits ein Chinolinderivat, welches eine quartäre Ammoniumgruppe und eine Sulfonamidgruppe am gleichen heterocyclischen Ringsystem aufweist, als Zusatz für galvanische Nickelbäder beschrieben. Auch diese Verbindung wirkt lediglich als Grundglänzer und muß zur Erzielung von guten Glanz- und Einebnungseffekten mit anderen Zusatzmitteln kombiniert werden. Demgegenüber entfalten die erfindungsgemäßen Produkte auf Grund ihres andersartigen Aufbaues eine Doppelwirkung mit überdurchschnittlicher Leistung auf jedem Wirkungsgebiet, sie ergeben Hochglanz und gleichzeitig gute Einebnung.Furthermore, one already has a quinoline derivative, which has a quaternary ammonium group and a Has sulfonamide group on the same heterocyclic ring system, as an additive for galvanic nickel baths described. This connection, too, only acts as a basic shine and must be achieved in order to achieve this of good gloss and leveling effects can be combined with other additives. In contrast Due to their different structure, the products according to the invention develop a double effect with above-average performance in every area of activity, they result in high gloss and at the same time good leveling.
Bei Verwendung der erfindungsgemäßen Mittel bedarf es lediglich noch eines Zusatzes an Netzmitteln, um zu Hochleistungsbädern zu gelangen, die auch unter schwierigsten Bedingungen allen Ansprüchen gerecht werden. Gegenüber bekannten Nickelbädern besitzen die erfindungsgemäßen Bäder folgende Vorteile:When using the agents according to the invention, all that is required is an addition of wetting agents, to get to high-performance pools that can be used even under the most difficult conditions Meet demands. Compared to known nickel baths, the baths according to the invention have the following advantages:
Da sie außer Netzmitteln, die keine schwierige analytische überwachung erfordern, keiner weiteren Zusätze bedürfen, ist die Steuerung der Bäder einfach, weil nur eine Badkomponente kontrolliert zu werden braucht. Die analytische Kontrolle der erfindungsgemäßen Wirksubstanzen gestaltet sich besonders leicht, weil sie eine starke Ultraviolettabsorption Saures galvanisches NickelbadSince they do not have any other than wetting agents, which do not require difficult analytical monitoring If additions are required, the control of the baths is easy because only one bath component has to be controlled needs. The analytical control of the active substances according to the invention turns out to be special light because they have strong ultraviolet absorption. Acid nickel electroplating bath
Anmelder:Applicant:
Dehydag Deutsche Hydrierwerke G. m. b. H.,Dehydag Deutsche Hydrierwerke G. m. B. H.,
Düsseldorf, Henkelstr. 67Düsseldorf, Henkelstr. 67
Als Erfinder benannt:Named as inventor:
Dr. Wennemar Strauss, Düsseldorf-Holthausen; Dr. Alfred Kirstahler, DüsseldorfDr. Wennemar Strauss, Düsseldorf-Holthausen; Dr. Alfred Kirstahler, Düsseldorf
aufweisen. Die Substanzen brauchen zu ihrer Erfassung im Ultraviolett nicht erst durch Fällung, Ausschütteln mit organischen Lösungsmitteln oder ähnliche Manipulationen isoliert zu werden, sondern es genügt, 1 cm3 der Badflüssigkeit mit Wasser auf 100 cm3 zu verdünnen und hiervon die Extinktion zu messen.exhibit. In order to detect them in the ultraviolet, the substances do not need to be isolated by precipitation, shaking out with organic solvents or similar manipulations, but it is sufficient to dilute 1 cm 3 of the bath liquid to 100 cm 3 with water and then measure the extinction.
Die Bäder sind wesentlich wirtschaftlicher als die bisherigen Badkombinationen, da die elektrochemische Zersetzung der erfindungsgemäß verwendeten Mittel weitaus geringer ist als die bekannter Produkte. Als weiterer Vorteil ergibt sich bei Verwendung der erfindungsgemäßen Mittel die leichte Regenerierbarkeit des Bades mittels Aktivkohle.The baths are much more economical than the previous bath combinations, because the electrochemical Decomposition of the agents used according to the invention is far less than that of known products. Another advantage of using the agents according to the invention is that they are easy The bath can be regenerated using activated carbon.
Die erfindungsgemäß verwendeten Produkte geben nicht nur ausgezeichnete Glanz- und Einebnungseffekte, sondern zeichnen sich weiterhin durch eine außerordentlich gute Glanz- und Einebnungstiefenstreuung aus, die sich bis in Gebiete kleinster Stromdichten erstreckt bei einer für alle praktischen Bedürfnisse ausreichenden Temperaturtoleranz.The products used according to the invention not only give excellent gloss and leveling effects, but are also characterized by an extraordinarily good degree of gloss and leveling depth which extends into areas of the lowest current densities with one that is practical for all Needs sufficient temperature tolerance.
Die erfindungsgemäß zu verwendenden Produkte sind charakterisiert durch wenigstens eine cyclische quartäre Ammoniumgruppe, die sich beispielsweise von heterocyclischen tertiären Basen, wie Pyridin, Chinolin, Isochinolin, Pyrimidin, Pyrazin, Thiazol, ableiten kann und durch wenigstens eine an einThe products to be used according to the invention are characterized by at least one cyclic product quaternary ammonium group, derived for example from heterocyclic tertiary bases, such as pyridine, Quinoline, isoquinoline, pyrimidine, pyrazine, thiazole, can be derived and through at least one to one
609 658/349609 658/349
aromatisches Ringsystem gebundene Sulfonamid-, Disulfimid- oder Sulfocarbonimidgruppe, wobei das aromatische Ringsystem direkt oder mittels einer dieser Gruppen über einen kurzkettigen aliphatischen Rest an das quartäre Stickstoffatom des heterocyclischen Ringes gebunden ist.sulfonamide, disulfimide or sulfocarbonimide group attached to the aromatic ring system, the aromatic ring system directly or by means of one of these groups via a short-chain aliphatic Remainder is bonded to the quaternary nitrogen atom of the heterocyclic ring.
Man gelangt zu diesen Produkten in bekannter Weise, indem man derartige tertiäre Basen mit solchen Sulfonamid-, Disulfimid- bzw. Sulfocarbonimidverbindungen umsetzt, die ein externes austauschbares Halogenatom enthalten, das sie zur Quaternierungsreaktion befähigt.These products are obtained in a known manner by using such tertiary bases converts such sulfonamide, disulfimide or sulfocarbonimide compounds that have an external replaceable Contain halogen atom, which enables them to quaternize.
Dementsprechend erhält man beispielsweise eine erfindungsgemäß wirksame Verbindung der FormelAccordingly, for example, a compound of the formula which is active according to the invention is obtained
N-CH2-N-CH 2 -
■ SO2NH2 Cl- (1)■ SO 2 NH 2 Cl- (1)
indem man l-Chlormethyl-benzol-4-sulfamid mit einer äquimolekularen Menge Pyridin in wäßrigem Medium oder in überschüssigem Pyridin bei 80 bis 900C umsetzt.by l-chloromethyl-benzene-4-sulfamide is reacted with an equimolar amount of pyridine in aqueous medium or in an excess of pyridine at 80 to 90 0 C.
In analoger Weise gelangt man zu der erfindungsgemäß verwendbaren VerbindungThe compound which can be used according to the invention is obtained in an analogous manner
N-CH2 N-CH 2
y ν SO2-N- SO2 y ν SO 2 -N- SO 2
CH3 CH 3
indem man 1-Chlormethyl-benzol-4-sulfochlorid, oder in überschüssigem Pyridin bei 80 bis 9O0C welches durch Chlorieren von p-Toluolsulfochlorid zur Reaktion bringt.by reacting 1-chloromethyl-benzene-4-sulfonyl chloride, or in an excess of pyridine at 80 to 9O 0 C which is reacted by chlorination of p-toluenesulfonyl chloride.
erhältlich ist, im wäßrigen Medium mit p-Toluol- 20 Als weitere erfindungsgemäß wirksame Verbinsulfamid - Natrium zu 4 - Chlormethyl - 4'- methyldiphenyl-disulfimid-Natrium kondensiert und das gebildete Disulfimid-Natriumsalz mit einer äquimolekularen Menge Pyridin in wäßrigem Mediumis obtainable in an aqueous medium with p-toluene-20 As a further active compound according to the invention - Sodium to 4 - chloromethyl - 4'-methyldiphenyl disulfimide sodium condensed and the disulfimide sodium salt formed with an equimolecular amount of pyridine in an aqueous medium
düngen, welche die charakteristischen Gruppierungen besitzen und in analoger Weise erhalten werden können, sind anzuführen:fertilize, which have the characteristic groupings and are obtained in an analogous manner can include:
- SO2 — NH — CH2CH2 — N
+
Cl-- SO 2 - NH - CH 2 CH 2 - N +
Cl-
SO2-N-SO2-^ V-CH8-N*SO 2 -N-SO 2 - ^ V-CH 8 -N *
SO2-N-CO-CH2-N'^SO 2 -N-CO-CH 2 -N '^
CH3 CH 3
Die erfindungsgemäßen Mittel werden den galvanischen Nickelbädern in Mengen von 50 mg bis 5 g pro Liter, vorzugsweise in Mengen von 100 bis 500 mg pro Liter Badflüssigkeit zugesetzt. Die Produkte können in den galvanischen Bädern auch als schwerlösliche, allmählich in Lösung gehendeThe agents according to the invention are the galvanic nickel baths in amounts of 50 mg to 5 g per liter, preferably in amounts of 100 to 500 mg per liter of bath liquid added. the Products can also be found in the galvanic baths as poorly soluble, gradually dissolving
Bodenkörper eingesetzt bzw. in Lösefiltern eingebaut werden. Dabei entstehen selbstregulierende Bäder, die nur noch geringer Wartung bedürfen. Besonders vorteilhaft macht sich hierbei die hohe Beständigkeit der Verbindungen im Galvanisierungsbetrieb bemerkbar. Soil bodies can be used or installed in dissolving filters. This creates self-regulating baths, that require little maintenance. The high resistance is particularly advantageous here noticeable of the connections in the electroplating shop.
Setzt man einem Nickelbad vom Watts-Typ pro Liter Badflüssigkeit 50 bis 150 mg der Verbindung der Formel (2) und 0,1 g Natriumdodecylsulfat als Netzmittel zu, so erhält man im Stromdichtebereich von 0,1 bis 8 A/dm2 bei 55 0C duktile, haftfeste, hochglänzende und gut eingeebnete Nickelüberzüge.If 50 to 150 mg of the compound of the formula (2) and 0.1 g of sodium dodecyl sulfate are added as a wetting agent to a Watts-type nickel bath per liter of bath liquid, the current density is from 0.1 to 8 A / dm 2 at 55 ° C ductile, strong, high-gloss and well-leveled nickel coatings.
Versetzt man ein Nickelbad vom Watts-Typ pro Liter Badflüssigkeit mit 0,4 g des Produktes der Formel (7) und 0,1 g Natriumdodecylsulfat als Netzmittel, so werden im Stromdichtebereich von 0,1 bis 7 A/dm2 bei 53 0C duktile und haftfeste Nickelüberzüge von hohem Glanz und guter Einebnung erhalten.If 0.4 g of the product of the formula (7) and 0.1 g of sodium dodecyl sulfate as wetting agent are added to a Watts-type nickel bath per liter of bath liquid, the current density in the range from 0.1 to 7 A / dm 2 at 53 ° C. Ductile and firmly adhering nickel coatings of high gloss and good leveling are obtained.
Zu einem Nickelbad vom Watts-Typ werden pro Liter Badflüssigkeit 0,2 bis 0,4 g der erfindungsgemäßen Formel (9) und 0,1 g Natriumdodecylsulfat als Netzmittel gegeben. Die im Stromdichtebereich von 0,1 bis 8 A/dm2 bei 55 0C erhaltenen Nickelüberzüge sind haftfest, duktil und zeigen ausgezeichneten Hochglanz und starke Einebnung.0.2 to 0.4 g of the formula (9) according to the invention and 0.1 g of sodium dodecyl sulfate as a wetting agent are added per liter of bath liquid to a nickel bath of the Watts type. The current density in the range of 0.1 to 8 A / dm 2 of nickel coatings obtained at 55 0 C are adherent, ductile and show excellent high gloss and strong leveling.
B e i s ρ i el 4B e i s ρ i el 4
Ein galvanisches Nickelbad vom Watts-Typ, welches pro Liter Badflüssigkeit 0,1 g Natriumdodecylsulfat als Netzmittel enthält, wird mit dem Produkt der Formel (4) als Bodenkörper betrieben. Das Bad ergibt im Stromdichtebereich von 0,1 bis 7 A/dm2 bei 55 0C Nickelüberzüge von hohem Glanz und guter Einebnung.A galvanic nickel bath of the Watts type, which contains 0.1 g of sodium dodecyl sulfate per liter of bath liquid as a wetting agent, is operated with the product of the formula (4) as the sediment. In the current density range from 0.1 to 7 A / dm 2 at 55 ° C., the bath gives nickel coatings of high gloss and good leveling.
In ein Nickelbad vom Watts-Typ, welches pro Liter Badflüssigkeit 0,1 g Natriumdodecylsulfat als Netzmittel enthält, gibt man in einem Lösefilter die Verbindung der Formel (6) als Bodenkörper. Das Bad liefert bei 55 0C im Stromdichtebereich von 0,1 bis 4 A/dm2 duktile, haftfeste und gut glänzende Nickelüberzüge mit einer mittleren Einebnung. In a nickel bath of the Watts type, which contains 0.1 g of sodium dodecyl sulfate per liter of bath liquid as a wetting agent, the compound of the formula (6) is added as a sediment in a dissolving filter. The bath at 55 0 C provides the current density range of 0.1 to 4 A / dm 2 ductile, adherent and well-bright nickel coatings with an average leveling.
Ein Nickelbad vom Watts-Typ, welches pro Liter Badflüssigkeit 0,1 g Natriumdodecylsulfat als Netzmittel enthält, wird mit einem Produkt der Formel (5) als Bodenkörper betrieben. Das selbstregulierende Bad liefert bei 60°C im Stromdichtebereich von 0,1 bis 3 A/dm2 duktile, festhaftende, hochglänzende und gut eingeebnete Nickelüberzüge. Auf Grund der guten Glanztiefenstreuung eignet sich das Bad besonders für die Massengalvanisierung, z. B. im Trommel- oder Glockenverfahren.A Watts-type nickel bath, which contains 0.1 g of sodium dodecyl sulfate per liter of bath liquid as a wetting agent, is operated with a product of the formula (5) as the sediment. The self-regulating bath provides ductile, firmly adhering, high-gloss and well-leveled nickel coatings at 60 ° C. in the current density range from 0.1 to 3 A / dm 2. Due to the good gloss depth distribution, the bath is particularly suitable for bulk electroplating, e.g. B. in the drum or bell process.
Claims (2)
1. Acidic galvanic nickel bath of usual composition with a content of compounds which have at least one cyclic quaternary ammonium group and at least one sulfonic acid derivative located on an aromatic ring system in the molecule, characterized in that it contains compounds in which the by a sulfonamide, disulfimide - or sulfocarbonimide-substituted aromatic ring system is bonded directly or by means of one of these substituents via a short-chain aliphatic radical to the quaternary nitrogen atom of the heterocyclic ring.
Französische Patentschrift Nr. 998 186.Considered publications:
French patent specification No. 998 186.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED40436A DE1224112B (en) | 1962-12-04 | 1962-12-04 | Acid galvanic nickel bath |
| GB44077/63A GB1056284A (en) | 1962-12-04 | 1963-11-08 | Improvements in and relating to acid nickel electroplating baths |
| US325174A US3282811A (en) | 1962-12-04 | 1963-11-20 | Acid nickel electroplating baths and processes |
| FR955870A FR1376212A (en) | 1962-12-04 | 1963-12-03 | Nickel acid baths for electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED40436A DE1224112B (en) | 1962-12-04 | 1962-12-04 | Acid galvanic nickel bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1224112B true DE1224112B (en) | 1966-09-01 |
Family
ID=7045399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DED40436A Pending DE1224112B (en) | 1962-12-04 | 1962-12-04 | Acid galvanic nickel bath |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3282811A (en) |
| DE (1) | DE1224112B (en) |
| GB (1) | GB1056284A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5235952B2 (en) * | 2010-08-20 | 2013-07-10 | 富士フイルム株式会社 | Twitter ion type organic salt |
| CN113979986A (en) * | 2021-10-22 | 2022-01-28 | 南京工业大学 | Preparation method of cyclic carbonate and preparation method of sulfonamide bifunctional quaternary ammonium salt catalyst |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR998186A (en) * | 1949-10-25 | 1952-01-15 | Udylite Corp | Improvements to electrolytic nickel deposits using an acid bath |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA610888A (en) * | 1960-12-20 | Kirstahler Alfred | Organic halogen-substituted disulfimides in nickel electroplating baths | |
| US2644788A (en) * | 1951-03-31 | 1953-07-07 | Harshaw Chem Corp | Electrodeposition of nickel |
| US2644789A (en) * | 1951-08-02 | 1953-07-07 | Harshaw Chem Corp | Electrodeposition of nickel |
| US2658867A (en) * | 1952-03-06 | 1953-11-10 | Harshaw Chem Corp | Electrodeposition of nickel |
| US2757133A (en) * | 1952-06-10 | 1956-07-31 | Harshaw Chem Corp | Electrodeposition of nickel |
| DE1066068B (en) * | 1957-06-05 | 1959-09-24 | Langbein-Pfanhauser Werke Aktiengesellschaft, Neuß | Electrolyte for galvanic deposition of mirror-shining, leveled, ductile nickel deposits |
| DE1134258B (en) * | 1959-05-06 | 1962-08-02 | Dehydag Gmbh | Acid galvanic nickel bath |
| US3206383A (en) * | 1964-03-26 | 1965-09-14 | Kappel Mario | Electrolyte for use in the galvanic deposition of bright leveling nickel coatings |
-
1962
- 1962-12-04 DE DED40436A patent/DE1224112B/en active Pending
-
1963
- 1963-11-08 GB GB44077/63A patent/GB1056284A/en not_active Expired
- 1963-11-20 US US325174A patent/US3282811A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR998186A (en) * | 1949-10-25 | 1952-01-15 | Udylite Corp | Improvements to electrolytic nickel deposits using an acid bath |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1056284A (en) | 1967-01-25 |
| US3282811A (en) | 1966-11-01 |
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