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DE112007001228A5 - Beschichteter Korper und Verfahren zu seiner Herstellung - Google Patents

Beschichteter Korper und Verfahren zu seiner Herstellung Download PDF

Info

Publication number
DE112007001228A5
DE112007001228A5 DE112007001228T DE112007001228T DE112007001228A5 DE 112007001228 A5 DE112007001228 A5 DE 112007001228A5 DE 112007001228 T DE112007001228 T DE 112007001228T DE 112007001228 T DE112007001228 T DE 112007001228T DE 112007001228 A5 DE112007001228 A5 DE 112007001228A5
Authority
DE
Germany
Prior art keywords
preparation
coated body
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE112007001228T
Other languages
English (en)
Other versions
DE112007001228B4 (de
Inventor
Joachim Gussone
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cemecon AG
Original Assignee
Cemecon AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cemecon AG filed Critical Cemecon AG
Publication of DE112007001228A5 publication Critical patent/DE112007001228A5/de
Application granted granted Critical
Publication of DE112007001228B4 publication Critical patent/DE112007001228B4/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0227Pretreatment of the material to be coated by cleaning or etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0044Mechanical working of the substrate, e.g. drilling or punching
    • H05K3/0047Drilling of holes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322Composite web or sheet
    • Y10T428/24331Composite web or sheet including nonapertured component

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
DE112007001228.5T 2006-06-02 2007-06-01 Beschichteter Körper und Verfahren zu seiner Herstellung Active DE112007001228B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006026253.0 2006-06-02
DE102006026253A DE102006026253A1 (de) 2006-06-02 2006-06-02 Beschichteter Körper und Verfahren zu seiner Herstellung
PCT/EP2007/004859 WO2007140931A1 (de) 2006-06-02 2007-06-01 Beschichteter körper und verfahren zu seiner herstellung

Publications (2)

Publication Number Publication Date
DE112007001228A5 true DE112007001228A5 (de) 2009-05-20
DE112007001228B4 DE112007001228B4 (de) 2024-07-18

Family

ID=38544297

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102006026253A Withdrawn DE102006026253A1 (de) 2006-06-02 2006-06-02 Beschichteter Körper und Verfahren zu seiner Herstellung
DE112007001228.5T Active DE112007001228B4 (de) 2006-06-02 2007-06-01 Beschichteter Körper und Verfahren zu seiner Herstellung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102006026253A Withdrawn DE102006026253A1 (de) 2006-06-02 2006-06-02 Beschichteter Körper und Verfahren zu seiner Herstellung

Country Status (4)

Country Link
US (1) US20100003456A1 (de)
JP (1) JP2009538985A (de)
DE (2) DE102006026253A1 (de)
WO (1) WO2007140931A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013218446A1 (de) 2013-09-13 2015-03-19 Cemecon Ag Werkzeug sowie Verfahren zum Zerspanen von faserverstärktenMaterialien
DE102014105132A1 (de) * 2014-04-10 2015-10-15 Thyssenkrupp Ag Verfahren zur Nachbearbeitung einer Großverzahnung und Wendeschneidplatte zur Nachbearbeitung einer Großverzahnung
DE102014210371A1 (de) 2014-06-02 2015-12-03 Gühring KG Diamantbeschichtetes spanabhebendes Werkzeug und Verfahren zu seiner Herstellung
DE102015208742A1 (de) * 2015-05-12 2016-11-17 Gühring KG Spanabhebendes Werkzeug
DE102015208743A1 (de) * 2015-05-12 2016-11-17 Gühring KG Spanabhebendes Werkzeug
JP6922188B2 (ja) * 2015-11-12 2021-08-18 三菱ケミカル株式会社 端部部材、感光体ドラムユニット、プロセスカートリッジ
US9965751B1 (en) 2016-12-29 2018-05-08 Capital One Services, Llc Mobile device multi-feed scanner
DE102017204109B4 (de) 2017-03-13 2019-03-14 Gühring KG Verwendung einer mit Fremdatomen dotierten Diamantschicht zur Erfassung des Abnutzungsgrades einer undotierten diamantenen Funktionsschicht eines Werkzeugs
US10745802B2 (en) 2017-03-22 2020-08-18 Mitsubishi Materials Corporation Diamond-coated cemented carbide cutting tool
EP3415797A1 (de) * 2017-06-12 2018-12-19 Huhnseal AB Dynamische mechanische versiegelungsanordnung
US20240217000A1 (en) * 2021-06-11 2024-07-04 Kyocera Corporation Coated tool and cutting tool
KR20250067135A (ko) * 2022-09-05 2025-05-14 카본콤피텐스 게엠베하 중간 층 및 다이아몬드 층으로 코팅된 기판을 제조하는 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5082359A (en) * 1989-11-28 1992-01-21 Epion Corporation Diamond films and method of growing diamond films on nondiamond substrates
US5236740A (en) 1991-04-26 1993-08-17 National Center For Manufacturing Sciences Methods for coating adherent diamond films on cemented tungsten carbide substrates
US5650059A (en) * 1995-08-11 1997-07-22 Credo Tool Company Method of making cemented carbide substrate
JPH11216602A (ja) 1998-01-30 1999-08-10 Mitsubishi Materials Corp 人工ダイヤモンド被覆層がすぐれた密着性を有する表面被覆超硬合金製切削工具
WO2004031437A1 (de) * 2002-09-27 2004-04-15 Cemecon Ag Beschichtungsverfahren und beschichteter körper

Also Published As

Publication number Publication date
WO2007140931A1 (de) 2007-12-13
JP2009538985A (ja) 2009-11-12
US20100003456A1 (en) 2010-01-07
DE112007001228B4 (de) 2024-07-18
DE102006026253A1 (de) 2007-12-06

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Legal Events

Date Code Title Description
R082 Change of representative

Representative=s name: KALKOFF & PARTNER PATENTANWAELTE, DE

R082 Change of representative

Representative=s name: KALKOFF & PARTNER PATENTANWAELTE, DE

Representative=s name: ,

R012 Request for examination validly filed
R005 Application deemed withdrawn due to failure to request examination
R409 Internal rectification of the legal status completed
R409 Internal rectification of the legal status completed
R005 Application deemed withdrawn due to failure to request examination

Effective date: 20140603

R012 Request for examination validly filed

Effective date: 20140513

R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final