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DE10336745A1 - Trägervorrichtung für magnetisierbare Substrate - Google Patents

Trägervorrichtung für magnetisierbare Substrate Download PDF

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Publication number
DE10336745A1
DE10336745A1 DE10336745A DE10336745A DE10336745A1 DE 10336745 A1 DE10336745 A1 DE 10336745A1 DE 10336745 A DE10336745 A DE 10336745A DE 10336745 A DE10336745 A DE 10336745A DE 10336745 A1 DE10336745 A1 DE 10336745A1
Authority
DE
Germany
Prior art keywords
substrates
carrier device
magnetizable
magnetizable substrates
dollar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10336745A
Other languages
English (en)
Inventor
Ralf Henn
Armin Scharping
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE10336745A priority Critical patent/DE10336745A1/de
Priority to UAA200601313A priority patent/UA83236C2/ru
Priority to US10/568,137 priority patent/US20060238286A1/en
Priority to PCT/DE2004/001448 priority patent/WO2005014878A1/de
Priority to JP2006519754A priority patent/JP2007506942A/ja
Priority to EP04738870A priority patent/EP1656468A1/de
Publication of DE10336745A1 publication Critical patent/DE10336745A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L23/00—Devices or apparatus for measuring or indicating or recording rapid changes, such as oscillations, in the pressure of steam, gas, or liquid; Indicators for determining work or energy of steam, internal-combustion, or other fluid-pressure engines from the condition of the working fluid
    • G01L23/08—Devices or apparatus for measuring or indicating or recording rapid changes, such as oscillations, in the pressure of steam, gas, or liquid; Indicators for determining work or energy of steam, internal-combustion, or other fluid-pressure engines from the condition of the working fluid operated electrically
    • G01L23/18—Devices or apparatus for measuring or indicating or recording rapid changes, such as oscillations, in the pressure of steam, gas, or liquid; Indicators for determining work or energy of steam, internal-combustion, or other fluid-pressure engines from the condition of the working fluid operated electrically by resistance strain gauges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Patch Boards (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

Mit der vorliegenden Erfindung wird eine Trägervorrichtung für magnetisierbare Substrate, wie z. B. Edelstahlsubstrate, vorgeschlagen, die sich insbesondere zur Prozessierung von Dünnschichtsubstraten eignet. DOLLAR A Dazu umfasst die erfindungsgemäße Trägervorrichtung mindestens ein magnetisch wirkendes Grundelement (1) mit mindestens einer Aufnahme (7) für ein Substrat (2).
DE10336745A 2003-08-11 2003-08-11 Trägervorrichtung für magnetisierbare Substrate Withdrawn DE10336745A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE10336745A DE10336745A1 (de) 2003-08-11 2003-08-11 Trägervorrichtung für magnetisierbare Substrate
UAA200601313A UA83236C2 (en) 2003-08-11 2004-07-01 Switchgear
US10/568,137 US20060238286A1 (en) 2003-08-11 2004-07-07 Carrier device for magnetizable substrate
PCT/DE2004/001448 WO2005014878A1 (de) 2003-08-11 2004-07-07 Trägervorrichtung für magnetisierbare substrate
JP2006519754A JP2007506942A (ja) 2003-08-11 2004-07-07 磁化可能な基板のための支持装置
EP04738870A EP1656468A1 (de) 2003-08-11 2004-07-07 Trägervorrichtung für magnetisierbare substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10336745A DE10336745A1 (de) 2003-08-11 2003-08-11 Trägervorrichtung für magnetisierbare Substrate

Publications (1)

Publication Number Publication Date
DE10336745A1 true DE10336745A1 (de) 2005-03-10

Family

ID=34129529

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10336745A Withdrawn DE10336745A1 (de) 2003-08-11 2003-08-11 Trägervorrichtung für magnetisierbare Substrate

Country Status (6)

Country Link
US (1) US20060238286A1 (de)
EP (1) EP1656468A1 (de)
JP (1) JP2007506942A (de)
DE (1) DE10336745A1 (de)
UA (1) UA83236C2 (de)
WO (1) WO2005014878A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT510420B1 (de) * 2011-04-08 2012-04-15 Bosch Gmbh Robert Verfahren zum gasnitrieren von hochdruckkomponenten
CN111390589A (zh) * 2020-04-10 2020-07-10 陕西柴油机重工有限公司 一种v型柴油机开档、主轴承孔及底面的加工方法及系统

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10121581B2 (en) 2014-09-29 2018-11-06 Apple Inc. Method for magnetizing multiple zones in a monolithic piece of magnetic material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU654694A1 (ru) * 1976-10-19 1979-03-30 Предприятие П/Я Г-4598 Устройство дл нанесени покрытий из газовой фазы
JPH0240468B2 (ja) * 1982-09-07 1990-09-11 Taiho Kogyo Co Ltd Hankyutainotanmenkakoyojigu
JPH03101206A (ja) * 1989-09-14 1991-04-26 Fuji Photo Film Co Ltd スパッタ装置
DE4227848B4 (de) * 1991-11-28 2009-05-07 Robert Bosch Gmbh Bauteilträger und Verfahren zum Halten eines aus einem ferromagnetischen Werkstoff ausgebildeten Bauteils
EP0709828B1 (de) * 1994-05-09 2001-08-01 Sony Corporation Magnetkopf und herstellungsverfahren
DE19831064C2 (de) * 1998-07-10 2000-05-18 Bosch Gmbh Robert Vorrichtung zum Halten von aus ferromagnetischem Werkstoff bestehenden Bauteilen
DE19901624A1 (de) * 1999-01-18 2000-09-14 Helmut Fischer Gmbh & Co Bauteilträger
SE514666C2 (sv) * 1999-07-05 2001-04-02 Sandvik Ab Metod för fixering av skär vid PVD-beläggning
DE19934114A1 (de) * 1999-07-21 2001-01-25 Bosch Gmbh Robert Substrat und Werkstückträger zur Aufnahme des Substrates
US7517498B2 (en) * 2003-08-19 2009-04-14 Agilent Technologies, Inc. Apparatus for substrate handling

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT510420B1 (de) * 2011-04-08 2012-04-15 Bosch Gmbh Robert Verfahren zum gasnitrieren von hochdruckkomponenten
CN111390589A (zh) * 2020-04-10 2020-07-10 陕西柴油机重工有限公司 一种v型柴油机开档、主轴承孔及底面的加工方法及系统

Also Published As

Publication number Publication date
EP1656468A1 (de) 2006-05-17
JP2007506942A (ja) 2007-03-22
US20060238286A1 (en) 2006-10-26
UA83236C2 (en) 2008-06-25
WO2005014878A1 (de) 2005-02-17

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee