DE10326324B4 - Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte - Google Patents

Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte Download PDF

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Publication number: DE10326324B4
Authority: DE; Germany
Prior art keywords: optionally substituted; radicals; radical; alkyl; optionally
Prior art date: 2003-06-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE2003126324

Other languages

German (de)

English (en)

Other versions

DE10326324A1 (de

Inventor

Hans-Joachim Dr. Timpe

Harald Dr. Baumann

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kodak Graphic Communications GmbH

Original Assignee

Kodak Polychrome Graphics GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-06-11

Filing date

2003-06-11

Publication date

2007-02-08

2003-06-11 Application filed by Kodak Polychrome Graphics GmbH filed Critical Kodak Polychrome Graphics GmbH

2003-06-11 Priority to DE2003126324 priority Critical patent/DE10326324B4/de

2004-06-08 Priority to PCT/EP2004/006185 priority patent/WO2004111731A1/fr

2005-01-05 Publication of DE10326324A1 publication Critical patent/DE10326324A1/de

2007-02-08 Application granted granted Critical

2007-02-08 Publication of DE10326324B4 publication Critical patent/DE10326324B4/de

2023-06-12 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

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238000000576 coating method Methods 0.000 title claims abstract description 38
239000011248 coating agent Substances 0.000 title claims abstract description 35
239000002243 precursor Substances 0.000 title claims abstract description 32
YNGDWRXWKFWCJY-UHFFFAOYSA-N 1,4-Dihydropyridine Chemical compound C1C=CNC=C1 YNGDWRXWKFWCJY-UHFFFAOYSA-N 0.000 title claims abstract description 27
238000000034 method Methods 0.000 title claims description 9
238000003384 imaging method Methods 0.000 title claims description 4
230000008569 process Effects 0.000 title claims description 3
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125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 41
150000003254 radicals Chemical class 0.000 claims abstract description 32
239000000203 mixture Substances 0.000 claims abstract description 28
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239000000178 monomer Substances 0.000 claims abstract description 16
125000003107 substituted aryl group Chemical group 0.000 claims abstract description 15
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239000003999 initiator Substances 0.000 claims abstract description 6
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125000001424 substituent group Chemical group 0.000 claims description 27
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CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
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ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
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ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
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MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
RPUJTMFKJTXSHW-UHFFFAOYSA-N 1-(methoxymethoxy)ethanol Chemical compound COCOC(C)O RPUJTMFKJTXSHW-UHFFFAOYSA-N 0.000 description 1
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QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
ZWFRXFUJUMAUTM-UHFFFAOYSA-N 2,4,5-trinaphthalen-1-yl-2-(2,4,5-trinaphthalen-1-ylimidazol-2-yl)imidazole Chemical compound C1=CC=C2C(C3(N=C(C(=N3)C=3C4=CC=CC=C4C=CC=3)C=3C4=CC=CC=C4C=CC=3)C3(C=4C5=CC=CC=C5C=CC=4)N=C(C(=N3)C=3C4=CC=CC=C4C=CC=3)C=3C4=CC=CC=C4C=CC=3)=CC=CC2=C1 ZWFRXFUJUMAUTM-UHFFFAOYSA-N 0.000 description 1
ALHLRQWXKHIGBF-UHFFFAOYSA-N 2,4,5-triphenyl-2-(2,4,5-triphenylimidazol-2-yl)imidazole Chemical compound C1=CC=CC=C1C1=NC(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C=CC=CC=2)(C=2C=CC=CC=2)N=C1C1=CC=CC=C1 ALHLRQWXKHIGBF-UHFFFAOYSA-N 0.000 description 1
GBIGNLWRIURKAK-UHFFFAOYSA-N 2,4-bis(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4-phenylimidazol-2-yl]-5-(3,4-dimethoxyphenyl)-5-phenyl-1h-imidazole Chemical compound C1=C(OC)C(OC)=CC=C1C1(C=2C=CC=CC=2)C(C=2C(=CC=CC=2)Cl)=NC(C2(N=C(C=N2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)(C=2C(=CC=CC=2)Cl)N1 GBIGNLWRIURKAK-UHFFFAOYSA-N 0.000 description 1
VBBHWVIJCMGVMR-UHFFFAOYSA-N 2-(1,3-benzodioxol-5-yl)-2-[2-(1,3-benzodioxol-5-yl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound C1=C2OCOC2=CC=C1C(N=1)(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C=C3OCOC3=CC=2)N=C(C=2C=CC=CC=2)C=1C1=CC=CC=C1 VBBHWVIJCMGVMR-UHFFFAOYSA-N 0.000 description 1
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GKMCBABQMZZZDL-UHFFFAOYSA-N 2-(2,4-dimethoxyphenyl)-2-[2-(2,4-dimethoxyphenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound COC1=CC(OC)=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC(OC)=CC=2)OC)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GKMCBABQMZZZDL-UHFFFAOYSA-N 0.000 description 1
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BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
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239000003431 cross linking reagent Substances 0.000 description 1
LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
238000006352 cycloaddition reaction Methods 0.000 description 1
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PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
230000004069 differentiation Effects 0.000 description 1
BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 1
238000003618 dip coating Methods 0.000 description 1
KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
238000010494 dissociation reaction Methods 0.000 description 1
230000005593 dissociations Effects 0.000 description 1
ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
239000003792 electrolyte Substances 0.000 description 1
229940093499 ethyl acetate Drugs 0.000 description 1
UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
229940116333 ethyl lactate Drugs 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
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125000002541 furyl group Chemical group 0.000 description 1
229920000159 gelatin Polymers 0.000 description 1
239000008273 gelatin Substances 0.000 description 1
235000019322 gelatine Nutrition 0.000 description 1
235000011852 gelatine desserts Nutrition 0.000 description 1
FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
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230000006872 improvement Effects 0.000 description 1
230000000977 initiatory effect Effects 0.000 description 1
239000010954 inorganic particle Substances 0.000 description 1
LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
125000001261 isocyanato group Chemical group *N=C=O 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
208000013469 light sensitivity Diseases 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000001459 lithography Methods 0.000 description 1
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
239000006224 matting agent Substances 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
229940057867 methyl lactate Drugs 0.000 description 1
XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical class O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 description 1
VXLFYNFOITWQPM-UHFFFAOYSA-N n-phenyl-4-phenyldiazenylaniline Chemical compound C=1C=C(N=NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 VXLFYNFOITWQPM-UHFFFAOYSA-N 0.000 description 1
229920001220 nitrocellulos Polymers 0.000 description 1
150000004010 onium ions Chemical class 0.000 description 1
239000011146 organic particle Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
238000006025 oxidative dimerization reaction Methods 0.000 description 1
150000002924 oxiranes Chemical class 0.000 description 1
NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
239000002245 particle Substances 0.000 description 1
238000005191 phase separation Methods 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
239000011574 phosphorus Substances 0.000 description 1
IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
239000004033 plastic Substances 0.000 description 1
229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
239000004584 polyacrylic acid Substances 0.000 description 1
229920000515 polycarbonate Polymers 0.000 description 1
239000004417 polycarbonate Substances 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
229910000027 potassium carbonate Inorganic materials 0.000 description 1
230000002335 preservative effect Effects 0.000 description 1
239000000047 product Substances 0.000 description 1
BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
125000002755 pyrazolinyl group Chemical group 0.000 description 1
125000004076 pyridyl group Chemical group 0.000 description 1
229920005989 resin Polymers 0.000 description 1
239000011347 resin Substances 0.000 description 1
229930195734 saturated hydrocarbon Natural products 0.000 description 1
230000008313 sensitization Effects 0.000 description 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
229910052911 sodium silicate Inorganic materials 0.000 description 1
PYODKQIVQIVELM-UHFFFAOYSA-M sodium;2,3-bis(2-methylpropyl)naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(CC(C)C)C(CC(C)C)=CC2=C1 PYODKQIVQIVELM-UHFFFAOYSA-M 0.000 description 1
239000011877 solvent mixture Substances 0.000 description 1
230000003595 spectral effect Effects 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
239000007858 starting material Substances 0.000 description 1
PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
235000021286 stilbenes Nutrition 0.000 description 1
239000000758 substrate Substances 0.000 description 1
150000005846 sugar alcohols Polymers 0.000 description 1
125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
239000000725 suspension Substances 0.000 description 1
230000002195 synergetic effect Effects 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
238000012360 testing method Methods 0.000 description 1
ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
229930192474 thiophene Natural products 0.000 description 1
239000004408 titanium dioxide Substances 0.000 description 1
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
229960002622 triacetin Drugs 0.000 description 1
239000001003 triarylmethane dye Substances 0.000 description 1
150000003852 triazoles Chemical class 0.000 description 1
238000002211 ultraviolet spectrum Methods 0.000 description 1
229920006305 unsaturated polyester Polymers 0.000 description 1
229920006337 unsaturated polyester resin Polymers 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
230000004304 visual acuity Effects 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1
239000008096 xylene Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Materials For Photolithography (AREA)
Polymerisation Methods In General (AREA)

DE2003126324 2003-06-11 2003-06-11 Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte Expired - Fee Related DE10326324B4 (de)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
DE2003126324 DE10326324B4 (de)	2003-06-11	2003-06-11	Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte
PCT/EP2004/006185 WO2004111731A1 (fr)	2003-06-11	2004-06-08	Compositions sensibles aux rayonnements contenant un sensibilisateur a base de 1,4-dihydropyridine et elements imageables a base desdites compositions

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE2003126324 DE10326324B4 (de)	2003-06-11	2003-06-11	Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte

Publications (2)

Publication Number	Publication Date
DE10326324A1 DE10326324A1 (de)	2005-01-05
DE10326324B4 true DE10326324B4 (de)	2007-02-08

Family

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DE2003126324 Expired - Fee Related DE10326324B4 (de)	2003-06-11	2003-06-11	Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte

Country Status (2)

Country	Link
DE (1)	DE10326324B4 (fr)
WO (1)	WO2004111731A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10356847B4 (de) *	2003-12-05	2005-10-06	Kodak Polychrome Graphics Gmbh	Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US8389203B2 (en)	2007-05-08	2013-03-05	Esko-Graphics Imaging Gmbh	Exposing printing plates using light emitting diodes
EP2194429A1 (fr)	2008-12-02	2010-06-09	Eastman Kodak Company	Compositions de gommage avec nanoparticules pour l'amélioration de la sensibilité aux éraflures et des zones sans images des plaques d'impression lithographiques
EP2196851A1 (fr)	2008-12-12	2010-06-16	Eastman Kodak Company	Précurseurs de plaque d'impression lithographique à action négative comportant une liaison réactive contenant des caractéristiques aliphatiques bi ou polycycliques
EP2284005B1 (fr)	2009-08-10	2012-05-02	Eastman Kodak Company	Précurseurs de plaque d'impression lithographique dotés d'agents de réticulation à base de bêta-hydroxyalkylamide
EP2293144B1 (fr)	2009-09-04	2012-11-07	Eastman Kodak Company	Procédé pour le séchage de plaques d'impression lithographique consécutif à un processus à étape unique

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DE2758209A1 (de) *	1977-12-27	1979-06-28	Du Pont Deutschland	Lichtempfindliches aufzeichnungsmaterial
DE2758210A1 (de) *	1977-12-27	1979-06-28	Du Pont Deutschland	Lichtempfindliches aufzeichnungsmaterial
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US4292394A (en) *	1978-11-13	1981-09-29	E. I. Du Pont De Nemours And Company	Process for preparing multicolor toned images on a single photosensitive layer
DE3048490A1 (de) *	1980-12-22	1982-07-01	Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf	Lichtempfindliches aufzeichnungsmaterial
DE3540796C1 (de) *	1985-11-16	1987-04-16	Du Pont Deutschland	Verfahren zur Herstellung von zur Vorlage positiven aus Pulvern bestehenden Mustern
DE3540804C1 (de) *	1985-11-16	1987-04-16	Du Pont Deutschland	Verfahren zur Herstellung von zur Vorlage negativen,aus mehreren verschiedenen Pulvern bestehenden Mustern
DE4228141C1 (de) *	1992-08-25	1993-09-30	Du Pont Deutschland	Verfahren zur Herstellung von Bildern
DE4228790C1 (de) *	1992-08-29	1993-11-25	Du Pont Deutschland	Tonbares strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Mehrfarbenbildern mittels solch eines Gemischs

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DE3335309C1 (de) *	1983-09-29	1984-08-16	Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf	Photographisches Aufzeichnungsverfahren unter Verwendung lichthaertbarer Materialien
DD287796A5 (de) *	1989-09-14	1991-03-07	Tech Hochschule C Schorlemmer	Spektral sensibilisiertes photopolymerisierbares material

2003
- 2003-06-11 DE DE2003126324 patent/DE10326324B4/de not_active Expired - Fee Related
2004
- 2004-06-08 WO PCT/EP2004/006185 patent/WO2004111731A1/fr not_active Ceased

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DE2710417A1 (de) *	1976-03-17	1977-09-29	Du Pont	Photopolymerisierbare massen und verfahren zur erzeugung von positiven oder negativen bildern
DE2758209A1 (de) *	1977-12-27	1979-06-28	Du Pont Deutschland	Lichtempfindliches aufzeichnungsmaterial
DE2758210A1 (de) *	1977-12-27	1979-06-28	Du Pont Deutschland	Lichtempfindliches aufzeichnungsmaterial
DE2945564A1 (de) *	1978-11-13	1980-05-22	Du Pont	Verfahren zur herstellung von mehrfarbenbildern
US4292394A (en) *	1978-11-13	1981-09-29	E. I. Du Pont De Nemours And Company	Process for preparing multicolor toned images on a single photosensitive layer
DE3048490A1 (de) *	1980-12-22	1982-07-01	Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf	Lichtempfindliches aufzeichnungsmaterial
DE3540796C1 (de) *	1985-11-16	1987-04-16	Du Pont Deutschland	Verfahren zur Herstellung von zur Vorlage positiven aus Pulvern bestehenden Mustern
DE3540804C1 (de) *	1985-11-16	1987-04-16	Du Pont Deutschland	Verfahren zur Herstellung von zur Vorlage negativen,aus mehreren verschiedenen Pulvern bestehenden Mustern
DE4228141C1 (de) *	1992-08-25	1993-09-30	Du Pont Deutschland	Verfahren zur Herstellung von Bildern
DE4228790C1 (de) *	1992-08-29	1993-11-25	Du Pont Deutschland	Tonbares strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Mehrfarbenbildern mittels solch eines Gemischs

Also Published As

Publication number	Publication date
WO2004111731A1 (fr)	2004-12-23
DE10326324A1 (de)	2005-01-05

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DE10356847B4 (de)	2005-10-06	Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE10255667B4 (de)	2006-05-11	Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
DE102004055733B3 (de)	2006-05-04	Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren
DE3822921C2 (fr)	1993-03-11
DE10307451A1 (de)	2004-09-16	Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE68921867T2 (de)	1995-07-20	Photopolymerisierbare Zusammensetzung.
DE10255663A1 (de)	2004-07-08	Strahlungsempfindliche Elemente
US8632937B2 (en)	2014-01-21	UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
DE102006000783B3 (de)	2007-04-26	Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen
DE102004003143A1 (de)	2005-08-18	Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren
DE10326324B4 (de)	2007-02-08	Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte
DE102005007615B3 (de)	2006-11-02	Verfahren zur Herstellung von Lithographie-Druckplatten
DE10255664B4 (de)	2006-05-04	Für lithographische Druckplatten geeignete Photopolymerzusammensetzung
DE69715702T2 (de)	2003-06-12	Flachdruckplatte für Abziehentwicklung
DE102004022137B3 (de)	2005-09-08	π-verzweigte Sensibilisatoren enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE102004034362A1 (de)	2006-02-09	Lithographie-Druckplatten mit hoher Auflagenbeständigkeit
DE10326326B4 (de)	2005-06-30	1,4-Dihydropyridin enthaltende IR-empfindliche Zusammensetzung und deren Verwendung zur Herstellung von bebilderbaren Elementen
JP4806019B2 (ja)	2011-11-02	平版印刷版に適したフォトポリマー組成物
US20060154169A1 (en)	2006-07-13	Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon

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2005-01-05	OP8	Request for examination as to paragraph 44 patent law
2007-08-02	8364	No opposition during term of opposition
2008-04-10	8327	Change in the person/name/address of the patent owner	Owner name: KODAK GRAPHIC COMMUNICATIONS GMBH, 37520 OSTER, DE
2013-04-18	R119	Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee	Effective date: 20130101