DE102018200178A1 - Projection exposure machine with reduced parasitic deformation of components - Google Patents

Abstract

The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a kinematics (30) which is connected to a component (50) of the projection exposure apparatus (1) at at least one breakpoint (40) and the component (50) having a support structure (FIG. 32), wherein means are provided to minimize during a movement of the kinematics (30) at the breakpoint (40) introduced into the component (50) resulting forces and moments, wherein the means at least one actuator (33.3) for changing the Geometry of kinematics (30) include.

Description

The invention relates to a projection exposure apparatus for semiconductor lithography.

Projection exposure apparatuses for semiconductor lithography with holding and positioning means for optical elements are known from the general state of the art. The optical components used for imaging for the application described above, which may be in particular mirrors, must be positioned with the highest precision in order to ensure a sufficient image quality.

From the US 5 986 827 A For example, a manipulator or a lifting and tilting device for an optical element is known. The manipulator has three identical spring units, a structure on which the spring units are mounted, and three linear actuators. For the lifting and tilting mechanism, an inner ring, which carries the optical element, provided with three so-called bipods, each comprising two V-shaped rods arranged with spring joints at their ends. These are connected to one another at one end and are intended to transfer forces only along their longitudinal axis. The end of each bipod, on which the rods are brought together, is in each case attached to a lever. The lever is rotatably mounted and can be fixed with screws. By tilting the respective lever with the set screws, the inner ring can be both the height adjusted and tilted together with the optical element.

A disadvantage of the in the US 986 827 A shown arrangement is the very large space requirement, resulting from the separation of Bipod and lever. Since for manufacturing reasons, the bipods and the levers must be assembled from different parts, the Bipod spring joints must also compensate for the additional manufacturing and assembly tolerances, which is why the bipods are relatively soft, so that the element mounted by them can be undesirably excited to vibrate

Furthermore, from the DE 103 44 178 A1 the Applicant a holding and positioning device for an optical element known. This aims to suppress unwanted vibration of the optical element by a rigid connection. The holding and positioning device can compensate by a manipulator unit in addition the differences in length between the optical element and a base body, with which the manipulator unit is connected, with a change in temperature. As a result, the forces on the optical element are not undesirably high and deformations or even damage to the optical element are avoided. By the use of solid-state joints, it is also possible to compensate for unevenness in joining surfaces, without undesirably deforming the optical element.

So that the optical element is mounted as stiff as possible against vibrations in its plane, it can also be provided that three manipulator units are arranged such that a reference point lies in the geometric center of gravity of the triangle formed by the manipulator units. The thus performed holding and positioning device makes it possible to move the optical element exactly normal to its plane and to tilt two independent axes in the plane. Thus, unwanted aberrations are already largely avoided.

Furthermore, from the WO 2006/000352 A1 the Applicant a holding and positioning device for an optical element known. The device described in the cited document is intended to provide the most rigid connection and positioning of an optical component in 6 Degrees of freedom relative to other optical components afford, the adjustment is realized by means of levers. To minimize the forces and moments acting on the optical element leaf springs are present.

Despite the precautionary measures described above, not all radial forces or radial, tangential and axial torques on the optical element can be eliminated because the manipulator units are constructed with solid-state hinge units which require forces and torques for movement or deformation. The resulting parasitic loads lead to a distortion of the optical element affecting the imaging accuracy.

The object of the present invention is to specify a projection exposure apparatus in which the aforementioned parasitic parasitic loads are eliminated or are reduced to a negligible extent.

This object is achieved by a device having the features of independent claim 1. The subclaims relate to advantageous developments and variants of the invention.

A projection exposure apparatus according to the invention for semiconductor lithography comprises a kinematics which is connected to a component of the projection exposure apparatus at at least one breakpoint and connects the component to a support structure. The kinematics are designed for the guided movement of the component in a certain number of degrees of freedom and comprises a means for minimizing the resultant forces and moments introduced into the component during a movement of the kinematics. According to the invention, the means comprise at least one actuator for changing the geometry of the kinematics.

The achievable active controllable adjustment of the moving kinematics results in extended possibilities for reducing parasitic loads. In particular, for EUV systems it is also possible to make actuator pins or bipod legs stiffer. In this way, higher control bandwidths can be achieved without increasing the deformations of mirror surfaces with the same travel paths.

In a further preferred embodiment of the invention, the actuator is adapted to move the kinematics at least one end remote from the breakpoint.

In particular, the kinematics may comprise at least one leg and the actuator may be adapted to move the kinematics in leg longitudinal direction and at at least one end remote from the breakpoint in a second direction, which is different from the leg longitudinal direction.

This can be achieved in particular by the fact that the actuator is connected via a lever with the kinematics.

The lever makes it possible to realize a translation between the actuator and the kinematics and to position the actuator advantageous when, for example, in extension of the kinematics no space is available. The kinematics can be further made more compact by the use of a lever and the selection of the actuator can be further simplified by a suitable choice of the gear ratio of the lever.

In a further preferred alternative embodiment, a hinge of the lever is arranged so that a movement of the kinematics simultaneously leads to a change in the geometry of the kinematics.

If the swivel joint on the perpendicular to the longitudinal axis of the limb is tilted at the end of the kinematics remote from the breakpoint, which is also referred to as the foot of the kinematics, the tilting joint only shifts along the longitudinal axis of the limb when the control lever is rotated by small angles about the swivel joint ,

If, however, the pivot point with an offset to the perpendicular to the longitudinal axis of the leg is arranged through the base point of the kinematics, this leads to a longitudinal and to a transverse displacement of the foot point of the kinematics and thus to a change in the geometry of the kinematics.

In particular, the kinematics may be a bipod with two bipod legs.

The radial torque due to the deformation of the undisplaced leg of the bipod when moving an actuator in the longitudinal direction of the other Bipodschenkels can then be largely eliminated by the leg, which was moved in the leg longitudinal direction, initiates a gegenrichtichtetes equal bending moment as the adjacent leg in the breakpoint , The counterbending moment can be generated by a transverse movement of the leg to its actuated longitudinal movement. Thus, the actuator or the arrangement of the rotary joint for a leg causes both a longitudinal displacement and a transverse displacement, whereby the respective joints are bent in opposite directions on the legs.

Are the two bending moments the same size, because the legs are constructed identically, and the transverse displacement of a leg is equal to the transverse movement of the other leg, then the bending moments cancel each other at the breakpoint, so that no radial torque introduced into the mirror, and this is not deformed thereby.

The difference between a displacement of the Bipodschenkels with pure longitudinal offset and a shift according to the inventive solution with a longitudinal and transverse offset is illustrated by a FEM simulation. In this case, the foot of a Bipodschenkels is offset in its longitudinal direction by 0.100 mm, while the foot of the other Bipodschenkels longitudinal and transverse direction is displaced a total of 0.141 mm, which corresponds to a longitudinal offset of 0.100 mm and a perpendicular offset of 0.100 mm. The following table shows the result. Plane plate 200mm × 10mm; Zerodur longitudinal offset Longitudinal and transverse offset 0.100mm 0.141mm Inner evaluation diameter d1 (Mm) 0100 0100 External evaluation diameter d2 (Mm) 180000 180000 evaluation area A12 (Mm ^ 2) 25446.893 25446.893 Number of nodes n (-) 10757 10757 Area / Node A knot (Mm ^ 2) 2366 2366 Maximum normal shift vni.max (Nm) 65557.000 65550.000 Minimum normal shift vni.min (Nm) -18400,000 -18398,000 Max./Min.-Differenz delta.vni (Nm) 83957.000 83948.000 RMS without Zernike deduction RMS.o (Nm) 29150.775 29147.401 RMS after deduction Zernike 1..4 RMS.def (Nm) 7442 4631 RMS after deduction Zernike 1 ... 36 RMS.res (Nm) 0409 0309 Z-offset Z1 (Nm) 23567.916 23565.199 Tilt around minus y-axis Z2 (Nm) 42417.941 42412.961 Tilt around x-axis Z3 (Nm) -6,690 20103 defocus Z4 (Nm) -0,016 -0,039 2 ripple Z5 (Nm) 13322 13410 2 ripple Z6 (Nm) -18,413 4907 coma Z7 (Nm) -1,598 -1,629 coma Z8 (Nm) -2,117 -2,163 Spooky aberration Z9 (Nm) -0,001 -0,008 3-waviness Z10 (Nm) 0061 0117 3-waviness Z11 (Nm) -5,411 -0,126 sec2 ripple Z12 (Nm) -0,996 -1,003 sec2 ripple Z13 (Nm) 1340 0775 sec. coma Z14 (Nm) -0,007 -0,027 sec. coma Z15 (Nm) 0016 0007 sec. Sphaerischer aberration Z16 (Nm) 0004 0009

In the table the difference in the deformation becomes clear. Due to the additional transverse offset of the actuated bipod leg, the Z6 dual ripple becomes 73% from -18,413 nm to 4,907 nm and the Z11 Three-wave ripple reduced from -5,411 nm to -0,126 nm. The relatively high Z5 Two-ripples of about 13.4 nm in both cases are due to the parasitic tangential moment, since a large Z5 deformation does not occur in the load cases in the table in which the mirror is supported only by axial and tangential forces.

In a further embodiment of the invention, a compensation element may be present which supports a movement of the kinematics in such a way that forces or moments, which act on the component at the breakpoint due to the inherent rigidity of the kinematics, are reduced.

For this purpose, the compensation of tangential torque and radial force by an active compensation element, such as a force-controlled actuator or take place in that a compensation element is used with negative stiffness, which includes, for example, an elastic element and kinematics. An element then has a negative stiffness if it has a sectionally falling force-displacement curve. This creates a force in the deflection, which at least partially compensates the restoring force of a bipod.

In a particularly preferred embodiment, the compensation element may comprise at least one prestressed leaf spring. The respective deflection of the leaf springs is used to compensate for the forces and moments resulting from the inherent rigidity of a bipod.

In a further advantageous embodiment of the invention, the compensation element can be mechanically connected to the kinematics via a lever.

• 1 den prinzipiellen Aufbau einer EUV-Projektionsbelichtungsanlage, in welcher die Erfindung verwirklicht sein kann,
• 2 exemplarisch eine aus dem Stand der Technik bekannte Manipulatoreinheit,
• 3a/b eine Detailansicht einer bekannten Manipulatoreinheit,
• 4 exemplarisch eine aus dem Stand der Technik bekannt Manipulatoreinheit,
• 5 eine Detailansicht einer bekannten Manipulatoreinheit,
• 6 eine schematische Ansicht einer ersten Ausführungsform der Erfindung,
• 7 eine Detailansicht der ersten Ausführungsform der Erfindung,
• 8 eine schematische Ansicht einer zweiten Ausführungsform der Erfindung,
• 9 eine schematische Darstellung der Wirkungsweise eines Kompensationsmechanismus für die parasitäre Radialkraft, und
• 10 eine schematische Darstellung der Wirkungsweise eines Kompensationselementes für die parasitäre Radialkraft.

Embodiments and variants of the invention will be explained in more detail with reference to the drawing. Show it

• 1 the basic structure of an EUV projection exposure apparatus in which the invention can be realized,
• 2 an example of a known from the prior art manipulator unit,
• 3a / b is a detailed view of a known manipulator unit,
• 4 by way of example a manipulator unit known from the prior art,
• 5 a detailed view of a known manipulator unit,
• 6 a schematic view of a first embodiment of the invention,
• 7 a detailed view of the first embodiment of the invention,
• 8th a schematic view of a second embodiment of the invention,
• 9 a schematic representation of the operation of a compensation mechanism for the parasitic radial force, and
• 10 a schematic representation of the operation of a compensation element for the parasitic radial force.

1 shows an example of the basic structure of an EUV projection exposure system 1 for microlithography, in which the invention can find application. An illumination system of the projection exposure apparatus 1 points next to a light source 3 an illumination optics 4 for illuminating an object field 5 in an object plane 6 on. One by the light source 3 generated EUV radiation 14 as optical useful radiation is by means of a light source in the 3 integrated collector aligned so that they are in the area of a Zwischenfokusebene 15 undergoes an intermediate focus before moving to a field facet mirror 2 meets. After the field facet mirror 2 becomes the EUV radiation 14 from a pupil facet mirror 16 reflected. With the aid of the pupil facet mirror 16 and an optical assembly 17 with mirrors 18 . 19 and 20 become field facets of the field facet mirror 2 in the object field 5 displayed.

Illuminated is a in the object field 5 arranged reticle 7 that of a schematically represented Reticlehalter 8th is held. A merely schematically illustrated projection optics 9 serves to represent the object field 5 in a picture field 10 into an image plane 11 , Pictured is a structure on the reticle 7 on a photosensitive layer in the area of the image field 10 in the picture plane 11 arranged wafers 12 , by a wafer holder also shown in detail 13 is held. The light source 3 can emit useful radiation, in particular in a wavelength range between 5 nm and 30 nm.

The invention can also be used in a DUV system, which is not shown. A DUV system is in principle like the EUV system described above 1 constructed, in a DUV system mirrors and lenses can be used as optical elements and the light source of a DUV system emits a useful radiation in a wavelength range of 100 nm to 300 nm.

On the basis of in 2 exemplarily shown from the prior art manipulator unit 30 will be explained below the problem underlying the invention. In the example shown, the manipulator unit 30 as a so-called bipod with a base 32 , two actuators 33.1 . 33.2 and two thighs 35.1 and 35.2 executed. The longitudinal axes of the legs 35.1 and 35.2 intersect at a breakpoint 40 on a to be held or moved optical element, which in the example shown as a mirror 50 is executed. The breakpoint 40 is the point at which forces and moments in the mirror 50 be initiated.

As indicated by the double arrows not indicated in the figure, the actuators shift 33.1 and 33.2 the thigh 35.1 and 35.2 along its longitudinal axis opposite the base 32 so that is at the breakpoint 40 for the mirror 50 gives a tangential and / or axial displacement.

Every thigh 35.1 and 35.2 has a total of four tilting joints 34.1 . 34.2 . 34.3 and 34.4 on, which make the leg in the two transverse directions yielding to translations and tilting. This will transfer the legs 35.1 and 35.2 mainly a force along their longitudinal directions. The tilting joints 34.1 . 34.2 . 34.3 and 34.4 are executed in the example shown as a solid state joints in the manner of leaf springs. The choice of solid joints is particularly advantageous because such joints have no bearing clearance and generate no abrasion during operation, by which particles could reduce the imaging quality of the associated optical system.

A disadvantage of this bipod arrangement, in which the actuators 33.1 and 33.2 the thigh 35.1 and 35.2 Only move along their longitudinal direction, some parasitic loads are in the mirror 50 be initiated and a deformation of the mirror 50 to lead. These parasitic loads are due, in particular, to the elastic properties of the tilting joints or solid-state joints used, which are in the form of leaf springs 37 Exercise restoring forces.

The conditions are based on the 3a and 3b once again clarified. As in 3a the leg is shown 35.1 by means of the actuator 33.1 along its longitudinal direction around the way v _{longitudinally} shifted, with the thigh 35.2 this shift as a transverse movement by an "s-shaped bending" of his joints 34.1 and 34.4 must balance. For the sake of clarity of presentation are in the 3a the in the 2 not shown further joints shown.

From the schematic representation in 3b it turns out that the joint 34.4 on the thigh 35.2 is bent by the angle + a, while the joint 34.1 on the thigh 35.2 must be bent by the angle -a.

This results in the bending moment curve for the leg 35.2 with a zero crossing in the middle between the joints 34.1 and 34.4 provided that both joints have the same flexural rigidity. While the joint 34.1 on the thigh 35.2 bent by the bending moment, the joint must 34.1 on the thigh 35.1 remain stretched for kinematic reasons and thus can not transmit bending moment. Because thus the bending moment for the joint 34.1 on the thigh 35.2 not over the thigh 35.1 can be intercepted, this radial bending moment from the mirror 50 supported, resulting in a deformation of the mirror 50 follows.

Similar effects arise for radial deflections or tangential tilting of the bipod. The thereby avoidable deformation mechanisms are caused by the fact that the breakpoint 40 on the bipod does not lie in the origin of the major axis system of rigidity of the bipod. Only in this case, all avoidable deformations are excluded. The origin of the main axis system provides the best breakpoint with the least deformation (inevitable deformations). Is the breakpoint 40 not at the origin of the major axis system of stiffness, avoidable deformations can be partially but not completely compensated by additional actuator traverses.

4 shows a kinematics of the prior art, in which the leg 35.2 in its longitudinal direction v _{longitudinally} not as at 2 directly via an actuator 33.1 . 33.2 but via a lever 51.2 to which the actuator 33.2 attacks, is moved.

5 shows in detail the joint 34.5 , which is designed so that it as a hinge for the lever 51.2 serves. The swivel joint 34.5 is always on the lot 53 to the leg longitudinal axis 52 through the joint 34.4 , so that upon rotation of the control lever 51.2 around small angles the joint 34.4 only a displacement v _{along the longitudinal} axis of the leg 52 on the thigh 35.2 is transmitted.

In an advantageous embodiment, the joints 34.5 designed as solid-state joints that have no bearing clearance and no traverse hysteresis due to friction.

6 shows a first embodiment of the manipulator unit according to the invention 30 , In contrast to the state of the art from image 5 is the hinge 34.5 not in the lot 53 to the leg longitudinal axis 52 through the joint 34.4 , but is shifted by an offset Δs to the Lot. The structure is otherwise identical to that in 4 and 5 ,

The offset Δs of the detail in 7 shown rotary joint 34.5 opposite the joint 34.4 in thigh longitudinal direction 52 causes, in addition to the leg _longitudinal displacement v _{longitudinally} targeted transverse displacements v _across the leg 35.2 can be applied to the bending moments of the unactuated leg 35.1 and the control lever 51.1 balance, leaving the mirror 50 at his breakpoint 40 no radial momentum must support.

The by the rotation around the swivel joint 34.5 caused movement of the joint 34.4 , which corresponds to the foot of the leg, so is in a component v _along in leg axial direction 52 and split into a component v _across in the transverse direction.

8th shows a second embodiment of the invention with reference to another exemplary kinematics 30 , The thigh 35.1 This is directly, ie without lever, by an actuator 33.1 moved in its longitudinal direction. In addition, an actuator 33.3 move the base of the leg v _transversely and in the transverse direction.

In a particularly advantageous embodiment, the actuator ( 33.1 . 33.2 . 33.3 ) at the foot of the thigh ( 35.1 . 35.2 ) also be designed so that he (the thigh ( 35.1 . 35.2 ) can move both in its longitudinal direction and in one or more transverse directions.

In the example shown, so the radial bending moment at the breakpoint 40 in the process of an actuator according to 3 thereby reducing that leg 35.1 in the breakpoint 40 an opposite equal bending moment as the leg 35.2 initiates. The counter-bending moment is in the in the 8th shown embodiment by a transverse movement of the leg 35.1 generated to his aktuierten longitudinal movement. The actuator 33.1 effected for the thigh 35.1 both a longitudinal displacement v _along and a transverse displacement v _across , whereby the joint 34.1 on the thigh 35.1 in the opposite direction to the joint 34.1 on the thigh 35.2 is bent. Are the two bending moments the same size, because the legs 35.1 and 35.2 are constructed identically, and the transverse displacement v _across the leg 35.1 the same size as the transverse movement of the thigh 35.2 that the longitudinal movement of the thigh 35.1 corresponds, then lift the bending moments at the breakpoint 40 each other, so no radial torque in the mirror 50 Introduced and the mirror 50 is not deformed.

In the following 9 and 10 a possibility is described, in addition deformations in the joints 34.2 . 34.3 which are due to radial displacements and / or tangential tilting, to reduce or even eliminate completely. The desired effect can be achieved by providing the bipod with a preloaded system which counteracts those forces and moments exerted by the bipod itself over a certain range of motion, up to a complete compensation of the forces and moments. Ideally, the optical element mounted by means of the bipod can then be moved without force and torque in the actuation direction of the bipod over a certain range.

9 shows in a schematic representation connected to the fixed world bipodes 39 in undeflected position. In this position, the bipod practices 39 no forces or moments on with him at the breakpoint 40 connected, not shown in the figure element, which on the inherent rigidity or inherent elasticity of the bipod 39 would be to lead back. Next to the bipod 39 grabs the breakpoint 40 the lever 38 which also has a decoupling joint 41 with the compensation element 36 connected is. Also the compensation element 36 is with the fixed world over two parallelogram guides 42 connected, on which two outer plates 43 are movably arranged. The outer plates are in each case by means of the biasing force indicated by the two arrows inward via extending in the direction of force leaf springs 37 against a central element 44 pressed, which in turn on the above-mentioned decoupling joint 41 with the lever 38 connected is. In the in 9 configuration shown is the bipod 39 in its zero position.

10 now illustrates the operation of the compensation element 36 at a deflection from the zero position. The breakpoint 40 For example, due to an actuation of the held element elsewhere, it moved slightly to the right in relation to the fixed world. This results in the in the 10 well recognizable deformation of the bipod 39 , The now due to its inherent rigidity, a restoring force and a restoring moment at the breakpoint 40 exercises, as by the two arrows at the breakpoint 40 is indicated. The deflection of the breakpoint 40 However, also leads to a deflection of the lever 38 and thus to a deflection of the central element 44 of the compensation element 36 , which in turn results in a deflection of the leaf springs 37 results. During the bipod 39 , the decoupling joint 41 and the leaf springs 37 are increasingly deformed and thus absorb deformation energy, are the prestressed parallelogram 42 by the radial movement of the central element 44 and the associated "bending shortening" of the leaf springs 37 relaxed (the outer plates 43 move to the central element 44 down), or less deformed, so that the leaf springs 37 Give deformation energy to the system. Are the given deformation energy of the prestressed parallelogram guides 42 with the absorbed energy of deformation of the bipod 39 , the decoupling spring 41 and the leaf springs 37 in balance, the bipod can 39 without the mirror 50 initiated forces are deflected. Due to the prestressed parallelogram guides 42 Freeing deformation energy now exercises the compensation element 36 the indicated by the arrow force on the lever 38 from, first, to a compensating force and second, due to the lever arm between the central element 44 and the breakpoint 40 also leads to a compensating moment, which of the force and the moment, resulting from the inherent rigidity of the bipod 39 result, counteract. With a suitable design of the compensation element 36 Thus, a complete compensation of the parasitic forces and moments can be achieved.

LIST OF REFERENCE NUMBERS

1

Projection exposure system

2

Field facet mirror

3

light source

4

illumination optics

5

object field

6

object level

7

reticle

8th

Reticlehalter

9

projection optics

10

field

11

image plane

12

wafer

13

wafer holder

14

EUV radiation

15

Between the focal plane

16

Pupil facet mirror

17

module

18

mirror

19

mirror

20

mirror

30

Kinematics, manipulator unit

32

Support structure, base

33.1, 33.2

actuators

34.1, 34.2, 34.3, 34.4 34.5

tilting joints

35.1, 35.2

leg

36

compensation element

37

leaf spring

38

lever

39

bipod

40

halt

41

decoupling joint

42

Parallellogrammführung

43

outer plates

44

central element

50

Component, mirror

51.1, 51.2

lever

52

leg longitudinal axis

53

Lot to the thigh axis

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• US 5986827 A [0003]
• US 986827 A [0004]
• DE 10344178 A1 [0005]
• WO 2006/000352 A1 [0007]

Claims (9)

A projection exposure apparatus (1) for semiconductor lithography, comprising a kinematics (30) which is connected to a component (50) of the projection exposure apparatus (1) at at least one breakpoint (40) and connects the component (50) to a support structure (32), wherein means are provided to minimize during a movement of the kinematics (30) the resulting forces and moments introduced at the holding point (40) into the component (50), characterized in that the means comprise at least one actuator (33.3) for changing the geometry of the Kinematics (30) include. Projection exposure system (1) according to Claim 1 , characterized in that the actuator (33.3) is adapted to move the kinematics (30) at least one end remote from the holding point (40). Projection exposure system (1) according to Claim 2 , characterized in that the kinematics comprises at least one leg (35.1, 35.2) and the actuator (33.1, 33.2, 33.3) is adapted to the kinematics (30) in leg longitudinal direction and at least one end remote from the holding point (40) in a second direction, which is different from the leg longitudinal direction to move. Projection exposure system (1) according to Claim 3 , characterized in that the actuator (33.1, 33.2) is connected to the kinematics (30) via a lever (51.1, 51.2). Projection exposure system (1) according to Claim 4 , characterized in that a pivot (34.5) of the lever (51.1, 51.2) is arranged so that a movement of the kinematics (30) simultaneously leads to a change in the geometry of the kinematics (30). Projection exposure apparatus (1) according to one of the preceding claims, characterized in that the kinematics (30) is a bipod with two bipod legs. Projection exposure apparatus (1) according to one of the preceding claims, characterized in that a compensation element (36) is provided, which supports a movement of the kinematics (30) in such a way that forces or moments which due to the inherent rigidity of the kinematics (30) at the breakpoint ( 40) acting on the component (50) can be reduced. Projection exposure system (1) according to Claim 7 , characterized in that the compensation element (36) comprises at least one prestressed leaf spring (37). Projection exposure system (1) according to Claim 7 or 8th , characterized in that the compensation element (36) via a lever (38) is mechanically connected to the kinematics (30).

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