DE102006008975A1 - Coating substrate in vacuum deposition installation comprises pre-heating substrate in first chamber in-situ after closing first vacuum valve - Google Patents

Abstract

Coating a substrate in a vacuum deposition installation comprises pre-heating the substrate (16, 17) in a first chamber (1, 2) in-situ after closing a first vacuum valve (4, 5). An independent claim is also included for a vacuum deposition installation for carrying out the above coating.

Description

The The invention relates to a method for coating a substrate in a vacuum coating system, wherein the substrate is before or in a first chamber is placed on a substrate holder. The first chamber is then counteracted by means of a first vacuum valve the atmosphere closed and then evacuated. The substrate is connected to the transport device in a second chamber, which is designed as a coating chamber and is separated from the first chamber by a vacuum valve, after opening the transported second vacuum valve and in this after closing the second vacuum valve coated. The substrate is coated before coating preheated by means of a heater.

Farther The invention relates to a vacuum coating system for carrying out the Process. This can be closed with a first vacuum valve against the atmosphere. It is a second vacuum chamber that connects to the first vacuum chamber and over a second vacuum valve is separable therefrom. Farther is the vacuum coating system with a substrate holder, the on a transport device through the first into the second vacuum chamber is movable on a movement path, and with a heating device Mistake.

It are vacuum coating systems of the type mentioned as a multi-chamber vacuum systems for vapor deposition of substrates with thermal insulation layers, which consist of several process chambers. According to the state of the art in the first chamber or before usually the substrates are attached to a substrate holder.

To an evacuation process step is entered in this first chamber Chamber valve open and the substrate holder with the substrates in a second heated Chamber moves in which the substrates are heated. After this Heating the substrates, another chamber valve is opened and the substrate holder with the substrates is in a further chamber, a vaporization chamber, led.

is the substrate holder is designed as a sting with a transport device the substrate holder with the substrates after steaming again back to the input chamber moved, in which the substrates are cooled and removed from this afterwards.

In in the case that the transport device is designed as a trolley, the substrate holder is cooled with the substrates and subsequently the Substrates removed from a sampling chamber.

Attachments, in which the transport device is designed as a sting, are preferably designed so that a feed of the vapor deposition chamber can be symmetrical.

It a good utilization of the plant is made possible by that mutually one sting from the right or from the left into the vapor deposition chamber is moved. Such systems usually consist of at least five in series switched chambers.

There the sliding sting about the length from a loading and heating chamber, results in a double-Sting system a total length nine times the chamber length. This size chamber length is considerably disadvantageous. The successive chambers bring also the disadvantage with that with a necessary Maintenance or repair in one of the chambers the connected chambers are also not ready.

Of the Invention is based on the object, on the one hand, the great length expansion to reduce the plant construction and on the other hand, an execution of Improve repairs to the system while the sputtering process is in progress.

The Process-side solution according to the invention Task is achieved by pre-heating after the closing of the first vacuum valve takes place in situ in the first chamber.

There after closing the first vacuum valve is evacuated the first chamber happens the heating of the substrate already under extensive exclusion of atmospheric influences. Consequently For example, an oxidation of the heater or the substrate surface can be avoided. On the other hand, the first chamber as a vacuum lock operated and used as a preheating station, so that itself an additional Preheating station unnecessary can, reducing the overall length shortened becomes.

In a cheap one Embodiment of the method according to the invention is provided that the heater before closing the first vacuum valve outside the first chamber is held by this vacuum-tight, held. After closing of the first vacuum valve, the heater is at least during the Preheating the substrate introduced into the first chamber and at the latest before reopening the first vacuum valve vacuum-tight again separated from the first chamber spent.

To heat the substrate is the be moving heater after an evacuation phase moved into the first chamber and led back to the starting point after the successful heating.

In order to will it be possible the heater constantly to keep at heating temperature, thereby avoiding temperature changes can be. On the one hand, the heating device is ready for immediate use at any time and the heating phase can be kept short. On the other hand will by the vacuum-tight movement of the heater while they are not required allowing the heater to remain in a vacuum, which in turn is atmospheric Disturbing influences avoided can be.

With this solution according to the invention is the Number of chambers is reduced in the transport direction and results a shortening z. B. the double-stinging system of about 9 chamber lengths five chamber lengths.

There the moving heater when steaming, unlike the The prior art, separated from the first chamber, becomes one Steaming of the heating device, which mostly consists of graphite heaters, prevented by scattering vapor when vapor deposition of the substrates.

at closed third vacuum valve can be on the heater repairs carried out even if a substrate is in the sputtering phase, for example, even if a sting in the vacuum coating system is inserted.

It but it is also possible operate the vacuum coating system as a continuous system. This ensures that the sputtering process in the evaporation chamber is solidified by circulating sequentially substrates in a sputtering process step in experience the vaporization chamber while with the other Substrates in upstream and downstream chambers the pre- and post-processing Process steps executed become.

In a cheap one Variant of the method according to the invention is also provided that the substrate by means of a Sting in the second chamber and discharged from this, wherein the heating device after retracting the sting into the first chamber until retraction the Sting is introduced into the second chamber in the first chamber.

In order to is achieved that the sputtering process in the vapor deposition chamber is steadied by successively substrates, from one side were introduced into the vacuum coating chamber, a sputtering process step experienced in the vapor deposition chamber, while each other substrates be removed from a sampling chamber.

The Arrangement-side inventive solution of Task is achieved by a third chamber is provided next to the trajectory and next to the first Chamber is arranged between the first and the third Chamber a third vacuum valve is arranged, and that the heater from the third to the first chamber and vice versa is designed to be movable.

The third chamber thus serves to store the heater during the Time when they are not warming up of the substrate needed becomes. After a retraction of the substrate in the first chamber is in this creates a vacuum. Subsequently, the third vacuum valve open become. Because in the third vacuum chamber during the whole process Vacuum can be kept, the vacuum is in the first chamber after an opening of the third vacuum valve not or only slightly disturbed. Now the heater can be moved into the first chamber and warmed up there the substrate. When the substrate is preheated, the function of the heater is Fulfills. These can now be driven back to the third chamber. Also can now the third vacuum valve will be closed.

Now The substrate is moved into the second chamber and coated there. For this purpose, the second vacuum valve is opened.

To the coating is cooled again the substrate. In a discontinuous working vacuum coating equipment, i. one that does not have one Realized continuous operation, this cooling process is back in the first Chamber done. This is also possible since the heater is already extended out of the first chamber could. In this case it is enough So the first chamber has three functions: a lock function, the function of a preheat chamber and the function of a cooling chamber. The integration of these three functions in the first chamber at a discontinuous vacuum coating system shows particularly clear, which advantages are achieved with the invention can, for this the three functions only a single chamber in the trajectory is required, whereby the longitudinal extent of the Plant can be significantly reduced.

In an embodiment of the arrangement according to the invention is provided that the third vacuum valve is designed as a flapper valve. Thus, a relatively simple construction can be realized.

In a further embodiment the transport device is designed as a sting. The use of a sting is a particularly simple realization of a transport device, by which a discontinuous operation is realized. As above already shown, are the invention significant disadvantages in the construction of discontinuous systems avoided, so that in the embodiment with a Sting a little technical Achieve effort with a reduction of disadvantages.

For a better one Utilization of the second chamber is further provided that mirror image to the second chamber, the first and third chambers a second time is arranged.

By This configuration makes it possible to second chamber from two sides to load, thereby increasing the load to increase the coating station.

The Invention will be explained in more detail with reference to an embodiment. The associated Drawing figure shows the schematic structure of a double-Sting-steaming plant.

Here are two first chambers 1 . 2 provided on both sides of a second chamber designed as evaporation chamber 3 are arranged. The first chambers 1 . 2 are opposite atmosphere with first vacuum valves 4 . 5 closable. Between the first chambers 1 . 2 and the second chamber 3 are second vacuum valves 6 . 7 arranged.

In the second chamber 3 becomes a cloud of steam 8th generated. At the first chambers 1 . 2 each are third chambers 9 . 10 arranged. The third chambers 9 . 10 can also with their first chambers 1 . 2 be integrated. The third chambers 9 . 10 are from their respective first chambers 1 . 2 via third vacuum valves 11 . 12 separated. The third vacuum valves 11 . 12 are designed as flap valves.

In the third chambers 9 . 10 are heating devices 13 . 14 arranged in the trajectory 15 the substrates 16 . 17 are movable.

For the introduction of a substrate 16 . 17 one and the other side will each have a sting 18 . 19 whose function is explained below on one page. At the introduction of the Sting 18 with the substrate attached thereto 16 in the first chamber 1 is a first vacuum valve 4 , open. The third vacuum valve 11 is closed.

With the positioning of the substrate 16 becomes the first vacuum valve 4 closed and the now closed first chamber 1 is evacuated.

After the evacuation of the first chamber 1 becomes the third vacuum valve 11 opened and the heater 13 in the first chamber 1 and around the substrate 16 positioned so that it is heated.

When the heating process is complete, the heater will turn on 13 back to her starting point in the third chamber 9 guided and the third vacuum valve 11 will be closed.

Now, the second vacuum valve 6 and thus the second chamber 3 and the substrate 16 moved to the designated place and the second chamber 3 closed, leaving in the cloud of steam 8th the evaporation of the substrate 16 can be done.

After completion of the sputtering process, the postprocessing process steps are processed, so that subsequently in the first chamber 1 again cooled substrate 16 is removed.

Then the same process is repeated on the other side. In the process, the substrate becomes 17 already in the first chamber 2 heated up while the substrate 16 in the second chamber 3 is coated so that the best possible utilization of the second chamber 3 can be achieved.

1

first chamber

2

first chamber

3

second chamber

4

first vacuum valve

5

first vacuum valve

6

second vacuum valve

7

second vacuum valve

8th

steam cloud

9

third chamber

10

third chamber

11

third vacuum valve

12

third vacuum valve

13

heater

14

heater

15

trajectory

16

substratum

17

substratum

18

Sting

19

Sting

Claims (7)

A method of coating a substrate in a vacuum deposition equipment, wherein the substrate is deposited on a sub-body before or in a first chamber The first chamber is then closed by means of a first vacuum valve against atmosphere and then evacuated, the substrate with the transport device in a second chamber, which is designed as a coating chamber and separated by a vacuum valve from the first chamber, after opening the second vacuum valve transported and is coated in this after closing the second vacuum valve and wherein the substrate is preheated before coating by means of a heating device, characterized in that the preheating after closing of the first vacuum valve ( 4 ; 5 ) in situ in the first chamber ( 1 ; 2 ) he follows. Method according to claim 1, characterized in that the heating device ( 13 ; 14 ) before closing the first vacuum valve ( 4 ; 5 ) outside the first chamber ( 1 ; 2 ), held by this vacuum-tight, held and after closing the first vacuum valve ( 4 ; 5 ) at least during the preheating of the substrate ( 16 ; 17 ) into the first chamber ( 1 ; 2 ) and at the latest before a reopening of the first vacuum valve ( 4 ; 5 ) again vacuum-tight from the first chamber ( 1 ; 2 ) is spent separately. Method according to claim 1 or 2, characterized in that the substrate ( 16 ; 17 ) by means of a sting ( 18 ; 19 ) into the second chamber ( 3 ) and deployed therefrom, the heating device ( 13 ; 14 ) after retracting the sting ( 18 ; 19 ) into the first chamber ( 1 ; 2 ) until the sting ( 18 ; 19 ) into the second chamber ( 3 ) into the first chamber ( 1 ; 2 ) is introduced. Vacuum coating apparatus for carrying out the method according to claim 1 or 2, comprising a first vacuum chamber which is closable with a first vacuum valve against atmosphere, a second vacuum chamber, which is connected to the first vacuum chamber and a second vacuum valve is separable therefrom, a substrate holder, the a transport device is movable through the first into the second vacuum chamber on a movement path, and with a heating device, characterized in that a third chamber ( 9 ; 10 ) is provided next to the trajectory ( 15 ) and next to the first chamber ( 1 ; 2 ) is arranged that between the first ( 1 ; 2 ) and the third chamber ( 9 ; 10 ) a third vacuum valve ( 11 ; 12 ) and that the heating device ( 13 ; 14 ) of the third ( 9 ; 10 ) into the first chamber ( 1 ; 2 ) and vice versa is designed to be movable. Vacuum coating system according to claim 4, characterized in that the third vacuum valve ( 11 ; 12 ) is designed as a flap valve. Vacuum coating system according to claim 4 or 5, characterized in that the transport device as Sting ( 18 ; 19 ) is executed. Vacuum coating system according to claim 6, characterized in that a mirror image of the second chamber ( 3 ) the first ( 1 ; 2 ) and third chamber ( 9 ; 10 ) is arranged a second time.