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CN203838473U - Masking granularity detecting device - Google Patents

Masking granularity detecting device Download PDF

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Publication number
CN203838473U
CN203838473U CN201420138725.2U CN201420138725U CN203838473U CN 203838473 U CN203838473 U CN 203838473U CN 201420138725 U CN201420138725 U CN 201420138725U CN 203838473 U CN203838473 U CN 203838473U
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CN
China
Prior art keywords
mask
granularity
particle size
synchronous belt
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN201420138725.2U
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Chinese (zh)
Inventor
孙鹤源
王长刚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN201420138725.2U priority Critical patent/CN203838473U/en
Application granted granted Critical
Publication of CN203838473U publication Critical patent/CN203838473U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

The utility model provides a masking granularity detecting device. The masking granularity detecting device comprises a mask, an absorption table, a granularity exchange mechanism, a granularity detecting device and an environment protecting device, wherein the granularity exchange mechanism performs lifting motion to convey the mask to a granularity detecting station, the mask is subjected to vacuum absorption and fixing by the absorption table, the granularity detection is performed by the granularity detecting device, and the environment protecting device is used for isolating the granularity detecting device from the outside environment. Motion accuracy and repeatability are guaranteed by the granularity exchange mechanism, the safety problem of material exchange during granularity detection is solved through an effective safety interlock mechanism, and the working environment problem of the granularity detecting device is solved through the environment protecting device. By means of the detecting process of the masking granularity detecting device, high accuracy, high stability, high safety and clean working environment of the granularity detecting device can be simultaneously achieved.

Description

Mask granularity detection device
Technical Field
The utility model relates to the technical field of machinery, in particular to mask granularity detection device.
Background
A lithographic apparatus is an apparatus that images exposure of a mask pattern onto a silicon wafer or glass substrate. The mask transfer system, which is an important component of the lithographic apparatus, is responsible for the transfer of material between the exposure imaging unit (mask table) and the cassette (material interface). During exposure of the mask, particles on the mask have certain influence on measurement, can be wiped away when the particle size is larger than 100 microns, has no influence on measurement when the particle size is smaller than 10 microns, and cannot be wiped away when the particle size is 10-100 microns. Therefore, in order to detect 10-100 micron particles on the mask, the mask needs to be subjected to particle size detection.
The granularity detection unit in the mask transmission system is used for detecting particles on the upper surface and the lower surface of the mask, the yield of the photoetching machine is reduced to 0 by the large-size particles on the mask, and the performance of the device in the aspects of speed and reliability is influenced by the small-size particles while the yield is reduced by the imaging quality.
In the working process of a granularity detection unit of the existing mask transmission system, firstly, a plate fork of a plate exchange manipulator places a mask plate at a handover station of a granularity handover mechanism, and the granularity handover mechanism carries out handover; then, placing the mask plate on a detection station of a granularity detection device, and carrying out granularity detection on the granularity detection device; and finally, after the detection is finished, the particle size is transferred to the plate exchange manipulator through the particle size transfer mechanism and then transferred to the mask table through the plate exchange manipulator.
From the above process, it can be found that the yield of the lithography machine can be effectively increased by adding the granularity detection in the mask transmission process. A good granularity check out test set can improve whole mask transmission efficiency, makes the exposure quality of lithography machine obtain the guarantee. However, the existing granularity detection equipment has more requirements on the environment in the use link, and particles generated by the movement of the movement axis often bring equipment faults to the granularity detection equipment and influence the use of the equipment; the mask plate needs to be moved to a detection station, and a moving unit with high precision, high stability and high safety is needed.
SUMMERY OF THE UTILITY MODEL
In order to solve the above technical problem, the utility model provides a mask granularity detection device, include: the device comprises a mask plate, a plate suction table, a granularity handover mechanism, granularity detection equipment and an environment protection device; wherein,
the granularity handover mechanism carries out lifting motion to convey the mask plate to a granularity detection station, the mask plate is fixed by the vacuum adsorption of the plate adsorption platform, and granularity detection is carried out by the granularity detection equipment;
the environment protection device is used for isolating the granularity detection equipment from the external environment.
Further, in the mask particle size detecting apparatus, the plate suction table includes: the plate sucking table surface, the vacuum interface and the mask existence sensor;
the plate suction table surface bears the vacuum interface and the mask existence sensor;
the vacuum interface is used for vacuum adsorption and fixing the mask plate;
the mask presence sensor is configured to sense whether the reticle is present.
Further, in the mask particle size detecting apparatus, the particle size handover mechanism includes: the device comprises a spline, a lead screw, a direct current motor and a synchronous belt pulley; the direct current motor drives the synchronous belt pulley and the lead screw to transmit, so that the spline is guided.
Further, in the mask particle size detecting apparatus, the particle size handover mechanism further includes: and the encoder is used for feeding back the lifting precision of the moving shaft consisting of the direct current motor, the synchronous belt pulley, the lead screw and the spline.
Further, in the mask particle size detecting apparatus, the particle size handover mechanism further includes: and the station sensor is used for sensing whether the moving shaft consisting of the direct current motor, the synchronous belt pulley, the lead screw and the spline moves to the granularity detection station or not.
Further, in the mask particle size detecting apparatus, the environmental protection apparatus includes:
synchronous belts are arranged on two sides of the synchronous belt;
the linear cylinder is connected with the synchronous belt through a fixing plate and arranged on one side of the synchronous belt;
the dust cover is connected with the synchronous belt through a connecting piece and arranged on the other side of the synchronous belt;
the guide rail is connected with the dust cover;
the opening and closing detection sensor is arranged on one side of the dust cover;
the synchronous belt, the linear cylinder, the dust cover, the guide rail and the opening and closing detection sensor are arranged in a dust-proof frame.
Further, in the mask particle size detecting apparatus, the dust-proof frame includes: and (4) extracting the particle interface.
Furthermore, the mask granularity detection device further comprises a granularity detection maintenance unit which is connected with the granularity detection equipment.
Further, the mask particle size detecting apparatus includes:
the drawing slide rail mechanism is connected with the granularity detection equipment;
and the positioning self-locking structure is arranged opposite to the drawing slide rail mechanism.
The utility model provides a mask granularity detection device has following beneficial effect: the granularity handover mechanism ensures the movement precision and repeatability; the safety problem of material handover during granularity detection is solved through an effective safety interlocking mechanism; the working environment problem of the granularity detection equipment is solved through the environment protection device. Through the utility model discloses a detect the flow, make granularity check out test set have high accuracy, high stability, high security and cleaner operational environment simultaneously.
Drawings
FIG. 1 is a schematic diagram of the mask particle size detection apparatus of the present invention interfacing with a swap robot;
FIG. 2 is a schematic diagram of a mask granularity detecting apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic view of a plate sucking table of a mask granularity detecting device according to an embodiment of the present invention;
FIG. 4 is a schematic view of a granularity switching mechanism of the mask granularity detecting apparatus according to an embodiment of the present invention;
FIGS. 5-6 are schematic views of an environment protection apparatus for a mask granularity inspection apparatus according to an embodiment of the present invention;
FIG. 7 is a schematic diagram of a granularity detection maintenance unit of a mask granularity detection apparatus according to an embodiment of the present invention;
fig. 8 is a flowchart of the mask granularity detecting apparatus according to an embodiment of the present invention.
Detailed Description
The mask granularity detecting apparatus according to the present invention will be described in detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more fully apparent from the following description and appended claims. It should be noted that the drawings are in simplified form and are not to precise scale, and are provided for convenience and clarity in order to facilitate the description of the embodiments of the present invention.
As shown in fig. 1, carrying out mask bench version process exchange version manipulator 2 and transporting, add a granularity and detect the link in this transportation, consequently the utility model provides a mask granularity detection device 1, will mask granularity detection device 1 with exchange version manipulator 2's version fork hands over, and installation frame 3 does mask granularity detection device 1 with exchange version manipulator 2 provides the platform.
Please refer to fig. 2, which is a schematic diagram of a mask granularity detecting apparatus according to an embodiment of the present invention. As shown in fig. 2, the mask granularity detecting apparatus includes: a mask plate (not shown in the figure), a plate absorbing table 1b, a granularity handover mechanism 1c, an environment protection device 1d and granularity detection equipment 1 e; wherein,
the granularity handover mechanism 1c carries out lifting motion to convey the mask to a granularity detection station, the mask is fixed by the adsorption platform 1b in a vacuum adsorption mode, and granularity detection is carried out by the granularity detection equipment 1 e; the environment protection device 1d is configured to isolate the granularity detection apparatus 1e from an external environment.
Please refer to fig. 3, which is a schematic diagram of a plate sucking table of a mask granularity detecting apparatus according to an embodiment of the present invention. As shown in fig. 3, the plate suction table includes: a plate sucking table surface 1b-1, a vacuum interface 1b-2 and a mask existence sensor 1 b-3; the plate suction table top 1b-1 bears the vacuum interface 1b-2 and the mask existence sensor 1 b-3; the vacuum interface 1b-2 is used for vacuum adsorption and fixing the mask; the mask presence sensor 1b-3 is used for sensing whether the mask plate is present or not. When the mask plate reaches the granularity detection station, the mask existence sensor 1b-3 detects whether the mask plate is effective, if so, the vacuum interface 1b-2 is opened for vacuum adsorption, and the positioning and fixing of the mask plate are ensured.
Please refer to fig. 4, which is a schematic diagram of a granularity handover mechanism of a mask granularity detecting apparatus according to an embodiment of the present invention. As shown in fig. 4, the granularity handover mechanism includes: the device comprises a spline 1c-1, a screw rod 1c-2, a direct current motor 1c-3 and a synchronous belt pulley 1 c-4; the direct current motor 1c-3 drives the synchronous pulley 1c-4 and the lead screw 1c-2 to transmit, so that the spline 1c-1 is guided. The motion shaft formed by the direct current motor 1c-3, the synchronous belt pulley 1c-4, the screw rod 1c-2 and the spline 1c-1 completes the linear lifting motion required by the handover motion.
Further, granularity handing-over mechanism still includes: the encoder 1c-5 is an incremental encoder selected in the implementation, and feeds back the lifting precision of a moving shaft consisting of the direct current motor 1c-3, the synchronous belt pulley 1c-4, the lead screw 1c-2 and the spline 1c-1, so that an effective closed-loop control system is formed, and the repeatability and the handover precision of the moving shaft are ensured.
Further, granularity handing-over mechanism still includes: and the station sensors 1c-7 are used for sensing whether the movement shaft formed by the direct current motor, the synchronous belt pulley, the lead screw and the spline moves to the granularity detection station or not. The station sensors 1c-7 of the moving shaft form safety interlock on the work flow with other station flows in the whole flow, and the safety of handover is provided.
Further, granularity handing-over mechanism still includes: and the mechanical limit 1c-6 is used for limiting the motion trail of the motion shaft.
Please refer to fig. 5, which is a schematic diagram of an environmental protection apparatus of a mask granularity detecting apparatus according to an embodiment of the present invention. As shown in fig. 5, the environmental protection apparatus includes:
synchronous belts 1d-8, wherein synchronous belt wheels 1d-9 are arranged on two sides of the synchronous belts 1 d-8;
the linear cylinder 1d-5 is connected with the synchronous belt 1d-8 through a fixing plate 1d-7 and arranged on one side of the synchronous belt 1 d-8;
the dust cover 1d-4 is connected with the synchronous belt 1d-8 through a connecting piece 1d-6 and is arranged on the other side of the synchronous belt 1 d-8;
the guide rail 1d-3 is connected with the dust cover 1 d-4;
an opening and closing detection sensor 1d-2 arranged at one side of the dust cover 1 d-4;
the linear cylinder 1d-5 drives the dust cover 1d-4 to move on the guide rail 1d-3, so that the opening and closing purpose is achieved, and the opening and closing detection sensor 1d-2 detects the effectiveness of the opening and closing of the dust cover 1 d-4.
The synchronous belt 1d-8, the linear cylinder 1d-5, the dust cover 1d-4, the guide rail 1d-3 and the opening and closing detection sensor 1d-2 are arranged in a dust-proof frame 1 d-1.
As further shown in fig. 6, the dust-proof frame includes: the particle extraction port 1d-1-1 is used for sealing the particle size connection position, and a good detection environment is provided.
Preferably, in an embodiment of the present invention, the granularity detecting device 1e needs to be regularly maintained according to a maintenance period, and for convenience of maintenance, as shown in fig. 7, a granularity detecting and maintaining unit is disposed on one side of the granularity detecting device 1e, the granularity detecting and maintaining unit includes a pull slide rail mechanism 3a and a positioning self-locking structure 3b, and the pull slide rail mechanism 3a is connected to the granularity detecting device 1 e; the positioning self-locking structure 3b is arranged opposite to the drawing slide rail mechanism 3 a. When maintenance is needed, the positioning self-locking structure 3b is opened, the granularity detection equipment 1e is pulled to a maintenance area through the pull slide rail mechanism 3a, and the granularity detection equipment returns after maintenance is finished; when the positioning self-locking mechanism is pushed back to the original position, the positioning self-locking mechanism 3b is locked, and the accuracy of the transfer station is ensured.
The utility model provides a mask granularity detection device work flow is shown in figure 8, when handing-over version manipulator centre gripping mask version motion to handing-over station, environment protection device's dust cover is opened, detect the back that targets in place, granularity handing-over mechanism raises, reach the handing-over station with the exchange version manipulator, station sensor is effective back, it is effective to inhale the mask existence sensor of version platform, open vacuum interface and adsorb mask version, fix mask version location and fixed, the version fork of exchange version manipulator is opened, granularity handing-over mechanism moves to detecting the station, station sensor is effective, granularity check out test set detects mask version and exists, vacuum interface closes. And detecting the mask plates by the granularity detection equipment, after the detection is finished, switching the mask plates to a plate exchange mechanical arm in the same sequence, and finally conveying the mask plates to a mask table to finish mask transmission.
The above description is only for the preferred embodiment of the present invention and is not intended to limit the scope of the present invention, and any modification and modification made by those skilled in the art according to the above disclosure are all within the scope of the claims.

Claims (9)

1. A mask granularity detecting apparatus, comprising: the device comprises a mask plate, a plate suction table, a granularity handover mechanism, granularity detection equipment and an environment protection device; wherein,
the granularity handover mechanism carries out lifting motion to convey the mask to a granularity detection station, the mask is fixed by the vacuum adsorption of the mask adsorption platform, and granularity detection is carried out by the granularity detection equipment;
the environment protection device is used for isolating the granularity detection equipment from the external environment.
2. The mask graininess detecting apparatus as claimed in claim 1, wherein said plate suction table comprises: the plate sucking table surface, the vacuum interface and the mask existence sensor;
the plate suction table surface bears the vacuum interface and the mask existence sensor;
the vacuum interface is used for vacuum adsorption and fixing the mask plate;
the mask presence sensor is configured to sense whether the reticle is present.
3. The mask particle size detection apparatus of claim 1, wherein the particle size interface mechanism comprises: the device comprises a spline, a lead screw, a direct current motor and a synchronous belt pulley; the direct current motor drives the synchronous belt pulley and the lead screw to transmit, so that the spline is guided.
4. The mask particle size detection apparatus of claim 3, wherein the particle size interface mechanism further comprises: and the encoder is used for feeding back the lifting precision of the moving shaft consisting of the direct current motor, the synchronous belt pulley, the lead screw and the spline.
5. The mask particle size detection apparatus of claim 3, wherein the particle size interface mechanism further comprises: and the station sensor is used for sensing whether the moving shaft consisting of the direct current motor, the synchronous belt pulley, the lead screw and the spline moves to the granularity detection station or not.
6. The mask particle size detection apparatus of claim 1, wherein said environmental protection apparatus comprises:
synchronous belts are arranged on two sides of the synchronous belt;
the linear cylinder is connected with the synchronous belt through a fixing plate and arranged on one side of the synchronous belt;
the dust cover is connected with the synchronous belt through a connecting piece and arranged on the other side of the synchronous belt;
the guide rail is connected with the dust cover;
the opening and closing detection sensor is arranged on one side of the dust cover;
the synchronous belt, the linear cylinder, the dust cover, the guide rail and the opening and closing detection sensor are arranged in a dust-proof frame.
7. The mask grain size detection apparatus of claim 6, wherein the dust-proof frame comprises: and (4) extracting the particle interface.
8. The mask particle size detecting apparatus of claim 1, further comprising a particle size detection maintenance unit connected to the particle size detecting device.
9. The mask particle size detecting apparatus of claim 8, wherein the particle size detection maintenance unit comprises:
the drawing slide rail mechanism is connected with the granularity detection equipment;
and the positioning self-locking structure is arranged opposite to the drawing slide rail mechanism.
CN201420138725.2U 2014-03-25 2014-03-25 Masking granularity detecting device Expired - Lifetime CN203838473U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420138725.2U CN203838473U (en) 2014-03-25 2014-03-25 Masking granularity detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201420138725.2U CN203838473U (en) 2014-03-25 2014-03-25 Masking granularity detecting device

Publications (1)

Publication Number Publication Date
CN203838473U true CN203838473U (en) 2014-09-17

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Application Number Title Priority Date Filing Date
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Country Status (1)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807574A (en) * 2014-12-30 2016-07-27 上海微电子装备有限公司 Mask transmission device, exposure device and mask transmission method
CN110361936A (en) * 2018-03-26 2019-10-22 上海微电子装备(集团)股份有限公司 Mask thickness detection apparatus, storing mechanism, transmission mechanism and lithography system
TWI696885B (en) * 2018-08-14 2020-06-21 台灣積體電路製造股份有限公司 Method for handling mask and lithography apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807574A (en) * 2014-12-30 2016-07-27 上海微电子装备有限公司 Mask transmission device, exposure device and mask transmission method
CN105807574B (en) * 2014-12-30 2018-03-02 上海微电子装备(集团)股份有限公司 Mask transmitting device, exposure device and mask transmission method
CN110361936A (en) * 2018-03-26 2019-10-22 上海微电子装备(集团)股份有限公司 Mask thickness detection apparatus, storing mechanism, transmission mechanism and lithography system
TWI696885B (en) * 2018-08-14 2020-06-21 台灣積體電路製造股份有限公司 Method for handling mask and lithography apparatus
US10877382B2 (en) 2018-08-14 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method for handling mask and lithography apparatus

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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai

Patentee after: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd.

Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai

Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT Co.,Ltd.

CP01 Change in the name or title of a patent holder
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Granted publication date: 20140917

CX01 Expiry of patent term