CN201158704Y - Substrate warming frame for vacuum plating - Google Patents
Substrate warming frame for vacuum plating Download PDFInfo
- Publication number
- CN201158704Y CN201158704Y CNU2008200101500U CN200820010150U CN201158704Y CN 201158704 Y CN201158704 Y CN 201158704Y CN U2008200101500 U CNU2008200101500 U CN U2008200101500U CN 200820010150 U CN200820010150 U CN 200820010150U CN 201158704 Y CN201158704 Y CN 201158704Y
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- evaporation source
- stove
- stone
- standing
- metal plate
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Abstract
The utility model relates to a heating chip holder for supporting the vacuum coating of a chip, belonging to the devices for making various films, which comprises an evaporation source, a drive assembly, a supporting assembly and a stepping motor magnetic rotation shaft, wherein the stepping motor magnetic rotation shaft is installed on the supporting assembly, the evaporation source is arranged on the drive assembly, and is connected with the stepping motor magnetic rotation shaft through the drive assembly. The utility model can rotate in the chip coating process, increases the evenness of the coating, and guarantees the quality of the coating. The distance between target material and the chip can be adjusted, which can be chosen for different films, thereby enlarging the optional range of the target materials, and increasing the coating efficiency. The furnace disc of the evaporation source has simple structure, which well breaks through the difficulty that resistance is difficult to fix and tie, avoids the short-circuit caused by the heated deformation of the resistance to release from the furnace disc, prolongs the service life of the evaporation source, and increases the reliability of the evaporation source, and a chip baffle can play protective role for the chip to avoid contamination.
Description
Technical field
The utility model relates to the equipment of preparation kind film, specifically a kind of heated substrate frame that is used for the vacuum plating of carrying substrates.
Background technology
The application of vacuum coating technology has spreaded all over every field, and the method for plated film has a variety of, and comparatively commonly used is vacuum vapor plating, is to make the evaporation of film material by the evaporation source heating.Evaporation source commonly used has resistance-type heating evaporation source, electron beam formula evaporation source, hollow hot-cathode beam-plasma evaporation source, induction type heating evaporation source etc., and wherein resistance-type heating evaporation source is used more.As the important link of vacuum plating, evaporation source is in when design, should be noted that following some: the first, evaporation source will make the film material that higher rate of evaporation is arranged, and can store enough film materials; The second, the rate of evaporation of film material should be able to be controlled easily; The 3rd, evaporation source will have reliable stability in the work for a long time; The 4th, evaporation source need have long work-ing life.Its resistance wire of existing evaporation source is difficult to fixing and constraint, and reliability is relatively poor, and work-ing life is not high yet, is difficult to satisfy above-mentioned requirement.
And the substrate frame of using at present, target and substrate are relatively-stationary, and no matter target is selected any material, and distance is all non-adjustable, has therefore limited the range of choice of target, has also reduced the efficient of plated film.In addition, existing substrate frame is in coating process, and substrate is fixed, and the plated film lack of homogeneity is of low quality.Have, plated film is exposed outside again, is easy to contaminatedly, has reduced film quality.
The utility model content
In order to solve the problem that above-mentioned existing substrate frame and evaporation source exist, the purpose of this utility model is to provide that a kind of substrate holder is rotatable, the heated substrate frame of the uniform vacuum plating of plated film.
Another purpose of the present utility model is to provide the heated substrate frame of the telescopic vacuum plating of a kind of evaporation source, applicable to different film materials.
The purpose of this utility model is achieved through the following technical solutions:
The utility model comprises evaporation source, transmission component, supporting component and the rotating shaft of stepper-motor magnetic force, and the rotating shaft of stepper-motor magnetic force is installed on the supporting component, and evaporation source is arranged on the transmission component and by transmission component and stepper-motor magnetic force rotating shaft interlock.
Wherein: described supporting component constitutes by in the middle of first and second supporting disk a plurality of support bars being set, and the rotating shaft of stepper-motor magnetic force is installed on second supporting disk; Straight moving shift fork also is installed on second supporting disk, which is provided with telescoping mechanism; Telescoping mechanism is between first and second supporting disk, and an end connects straight moving shift fork, and the other end passes and be provided with fixing holder by first supporting disk, is evenly equipped with a plurality of fixed links that are connected with evaporation source in fixing holder; Telescoping mechanism is a four-bar mechanism; Described transmission component comprises head rod, rotates holder, dwang and first and second gear, one end of head rod links to each other with the rotating shaft of stepper-motor magnetic force, the other end is passed by supporting component and connects first gear, second gear and first meshed transmission gear; Rotate holder and be installed on second gear, in the rotation holder, be evenly equipped with a plurality of dwangs that are connected with evaporation source; Described evaporation source comprises stone or metal plate for standing a stove on as a precaution against fire, stone or metal plate for standing a stove on as a precaution against fire frame, substrate holder, heating mantles, heat shield and cartridge type heat shield, and the bottom of heating mantles is connected with dwang, and the substrate holder is fixed in the top of heating mantles, rotates with dwang with heating mantles; The stone or metal plate for standing a stove on as a precaution against fire chord position is in the inside of heating mantles, be connected with fixed link, and the stone or metal plate for standing a stove on as a precaution against fire that is covered with the cartridge type heat shield is installed in the top of stone or metal plate for standing a stove on as a precaution against fire frame, is provided with heat shield between stone or metal plate for standing a stove on as a precaution against fire and stone or metal plate for standing a stove on as a precaution against fire frame; Have first groove in the substrate holder; The both sides of resistance wire are evenly equipped with a plurality of second grooves on the stone or metal plate for standing a stove on as a precaution against fire; Have the thermocouple intake at the center of stone or metal plate for standing a stove on as a precaution against fire, the both sides that resistance wire is introduced, outlet lays respectively at the thermocouple intake; The magnetic force rotating shaft is installed on the supporting component, and it is connected with the substrate baffle plate by second union lever, and the substrate baffle plate can rotate around second union lever by the magnetic force rotating shaft; The four-core lead assemblies also is installed on supporting component, which is provided with four electrodes, two resistance wires that connect on heating power supply and the evaporation source wherein, two other connects temperature sensor and temperature indicator.
Advantage of the present utility model and positively effect are:
1. substrate of the present utility model is rotatable in coating process, has improved the homogeneity of plated film greatly, has guaranteed film quality.
2. the distance between target of the present utility model and the substrate can be regulated, and can select different distances at different film materials, thereby enlarge the range of choice of target, has improved plated film efficient; And the telescoping mechanism motion flexibly, and is flexible apart from big.
3. the stone or metal plate for standing a stove on as a precaution against fire of evaporation source is simple in structure, second groove that is provided with has been broken through resistance wire well and has been difficult to difficult point fixing and constraint, avoid resistance wire to throw off stone or metal plate for standing a stove on as a precaution against fire and cause short circuit, prolonged the work-ing life of evaporation source, improved the reliability of evaporation source because of temperature distortion.
Thermocouple be fixed on the substrate holder under, can measure Heating temperature exactly.
5. first groove that is provided with in the substrate holder of the present utility model has increased thermal resistance, has reduced thermal conduction, has played the effect of heat build-up effectively.
6. substrate baffle plate of the present utility model plays protective effect to substrate, has shielded pollution, has improved film quality.
7. simple in structure, the good reliability of the utility model, high efficiency.
Description of drawings
Fig. 1 is one of one-piece construction synoptic diagram of the present utility model;
Fig. 2 is the sectional view of evaporation source among Fig. 1;
Fig. 3 is the vertical view of stone or metal plate for standing a stove on as a precaution against fire among Fig. 2;
Fig. 4 is the A-A view of Fig. 3;
Fig. 5 is two of an one-piece construction synoptic diagram of the present utility model;
Wherein: 1 is the substrate baffle plate, and 2 is evaporation source, and 3 is dwang, 4 is fixed link, and 5 are fixing holder, and 6 is first gear, 7 is first supporting disk, and 8 is head rod, and 9 is support bar, 10 is second union lever, and 11 is second supporting disk, and 12 is the four-core lead assemblies, 13 is the rotating shaft of stepper-motor magnetic force, and 14 is straight moving shift fork, and 15 is the magnetic force rotating shaft, 16 is telescoping mechanism, and 17 is second gear, and 18 for rotating holder, 19 is first groove, and 20 is stone or metal plate for standing a stove on as a precaution against fire, and 21 is the stone or metal plate for standing a stove on as a precaution against fire frame, 22 is the substrate holder, 23 is the cartridge type heat shield, and 24 is heating mantles, and 25 is heat shield, 26 is terminal stud, 27 is screw, and 28 is second groove, and 29 is the resistance wire intake, 30 is the thermocouple intake, and 31 is the resistance wire outlet.
Embodiment
The utility model is described in further detail below in conjunction with accompanying drawing.
As Fig. 1 and shown in Figure 5, the utility model comprises evaporation source 2, transmission component, supporting component and stepper-motor magnetic force rotating shaft 13.Supporting component is made up of first and second supporting disk 7,11 and support bar 9, first supporting disk 7 is a trilateral, first supporting disk 11 is circular, fixedlys connected with an end of three support bars 9 respectively on three angles of first supporting disk 7, and the other end of three support bars 9 is fixed on second supporting disk 11.On second supporting disk 11, be separately installed with four-core lead assemblies 12, stepper-motor magnetic force rotating shaft 13, directly moving shift fork 14 and magnetic force rotating shaft 15.Transmission component comprises head rod 8, rotates holder 18, dwang 3 and first and second gear 6,17, one end of head rod 8 links to each other with stepper-motor magnetic force rotating shaft 13, the other end is passed by first supporting disk 7 and connects first gear, 6, the second gears 17 and first gear, 6 engaged transmission; Rotate holder 18 and be installed on second gear 17, in rotation holder 18, be evenly equipped with a plurality of dwangs 3.A ccontaining telescoping mechanism 16 (present embodiment is a four-bar mechanism) between first and second supporting disk 7,11, the one end links to each other with straight moving shift fork 14, and the other end passes and is provided with fixing holder 5 by first supporting disk 7, is evenly equipped with a plurality of fixed links 4 in fixing holder 5.One end of second union lever 10 connects magnetic force rotating shaft 15, and the other end is connected with substrate baffle plate 1, and substrate baffle plate 1 can be around 10 rotations of second union lever by the driving of magnetic force rotating shaft 15.Four-core lead assemblies 12 is provided with four electrodes, two resistance wires that connect on heating power supply and the evaporation source 2 wherein, two other connects temperature sensor and temperature indicator, heating power supply is received by four-core lead assemblies 12 on the resistance wire of evaporation source 2, selects the resistance wire of differing materials according to different Heating temperatures.
Shown in Fig. 2～4, evaporation source 2 comprises stone or metal plate for standing a stove on as a precaution against fire 20 and stone or metal plate for standing a stove on as a precaution against fire frame 21, substrate holder 22, heating mantles 24, heat shield 25 and the cartridge type heat shield of being made by the stupalith mould 23, the bottom of heating mantles 24 is connected with dwang 3, substrate holder 22 is fixed on the top of heating mantles 24 by pin, with heating mantles 24 with dwang 3 rotations.Stone or metal plate for standing a stove on as a precaution against fire frame 21 be positioned at heating mantles 24 inside, be connected with fixed link 5, the stone or metal plate for standing a stove on as a precaution against fire 20 that is covered with cartridge type heat shield 23 is installed in the top of stone or metal plate for standing a stove on as a precaution against fire frame 21, is provided with heat shield 25 between stone or metal plate for standing a stove on as a precaution against fire 20 and stone or metal plate for standing a stove on as a precaution against fire frame 21.Substrate holder 22 and heating mantles 24 can rotate and stone or metal plate for standing a stove on as a precaution against fire frame 21 can not rotate but can stretch under the driving of telescoping mechanism 16, can realize the substrate heating, can realize that again substrate rotates, and makes rete more even.Heating mantles 24, heat shield 25 and cartridge type heat shield 23 form the heat guard space, can reduce calorific loss.The upper and lower surface of substrate holder 22 all has first groove 19, has increased thermal resistance, has reduced thermal conduction, has played the effect of heat build-up effectively.The both sides of resistance wire are evenly equipped with a plurality of second grooves 28 on the stone or metal plate for standing a stove on as a precaution against fire 20, in the process of heating, can prevent that resistance wire from throwing off stone or metal plate for standing a stove on as a precaution against fire because of temperature distortion and causing short circuit.Have thermocouple intake 30 at the center of stone or metal plate for standing a stove on as a precaution against fire 20, the both sides that resistance wire is introduced, outlet 29,31 lays respectively at thermocouple intake 30.Stone or metal plate for standing a stove on as a precaution against fire 20 is provided with terminal stud 26, and screw 27 is fastened on the terminal stud 26, is used to connect resistance wire and lead.Thermocouple be fixed on substrate holder 22 under, therefore, take off data is near the true temperature of substrate.
Principle of work of the present utility model is: when the substrate film forming, magnetic force rotating shaft 15 drives 10 rotations of second union lever, and substrate baffle plate 1 is outwarded winding.By the directly moving shift fork 14 of manual regulation, make it drive telescoping mechanism 16 motions, fix holder 5 under the drive of telescoping mechanism 16, the distance of the stone or metal plate for standing a stove on as a precaution against fire frame 21 elastic needs in the control evaporation source 2, flexible distance is decided on the film material.Stepper-motor magnetic force rotating shaft 13 work, drive head rod 8 rotations, by the engaged transmission of first and second gear 6,17, drive heating mantles 24 and on substrate holder 22 rotations, substrate holder 22 is heated to the temperature that needs when rotating, carry out the homogeneity of plated film and maintenance plated film.When not working, substrate baffle plate 1 rotated to block substrate, prevent to pollute the purity of substrate.
It is the thread resistance-type heating source that 1500 ℃ siderochrome aluminium is made that present embodiment is selected fusing point for use, its Heating temperature height, temperature can freely be controlled, the thermal distortion of heater strip is little to the influence in work-ing life of evaporation source, by the flexible distance of the stone or metal plate for standing a stove on as a precaution against fire frame adjusted and the speed of rotation of substrate holder, can control the performance of plated film well.Substrate speed of rotation of the present utility model can be selected in 5～60 rev/mins of scopes, and different film materials select different rotating speeds at the uniform velocity to rotate.
Claims (9)
1. the heated substrate frame of a vacuum plating, it is characterized in that: comprise evaporation source (2), transmission component, supporting component and stepper-motor magnetic force rotating shaft (13), stepper-motor magnetic force rotating shaft (13) is installed on the supporting component, and evaporation source (2) is arranged on the transmission component and by transmission component and stepper-motor magnetic force rotating shaft (13) interlock.
2. press the heated substrate frame of the described vacuum plating of claim 1, it is characterized in that: described supporting component constitutes by a plurality of support bars (9) are set in the middle of first and second supporting disk (7,11), and stepper-motor magnetic force rotating shaft (13) is installed on second supporting disk (11); Straight moving shift fork (14) also is installed on second supporting disk (11), which is provided with telescoping mechanism (16); Telescoping mechanism (16) is positioned between first and second supporting disk (7,11), one end connects straight moving shift fork (14), the other end passes and is provided with fixing holder (5) by first supporting disk (7), is evenly equipped with a plurality of fixed links (4) that are connected with evaporation source (2) in fixing holder (5).
3. by the heated substrate frame of the described vacuum plating of claim 2, it is characterized in that: described telescoping mechanism (16) is a four-bar mechanism.
4. press the heated substrate frame of claim 1 or 2 described vacuum platings, it is characterized in that: described transmission component comprises head rod (8), rotates holder (18), dwang (3) and first and second gear (6,17), one end of head rod (8) links to each other with stepper-motor magnetic force rotating shaft (13), the other end is passed by supporting component and connects first gear (6), second gear (17) and first gear (6) engaged transmission; Rotate holder (18) and be installed on second gear (17), in rotation holder (18), be evenly equipped with a plurality of dwangs (3) that are connected with evaporation source (2).
5. press the heated substrate frame of claim 1 or 2 described vacuum platings, it is characterized in that: described evaporation source (2) comprises stone or metal plate for standing a stove on as a precaution against fire (20), stone or metal plate for standing a stove on as a precaution against fire frame (21), substrate holder (22), heating mantles (24), heat shield (25) and cartridge type heat shield (23), the bottom of heating mantles (24) is connected with dwang (3), substrate holder (22) is fixed in the top of heating mantles (24), rotates with dwang (3) with heating mantles (24); Stone or metal plate for standing a stove on as a precaution against fire frame (21) be positioned at heating mantles (24) inside, be connected with fixed link (5), the stone or metal plate for standing a stove on as a precaution against fire (20) that is covered with cartridge type heat shield (23) is installed in the top of stone or metal plate for standing a stove on as a precaution against fire frame (21), is provided with heat shield (25) between stone or metal plate for standing a stove on as a precaution against fire (20) and stone or metal plate for standing a stove on as a precaution against fire frame (21).
6. by the heated substrate frame of the described vacuum plating of claim 5, it is characterized in that: have first groove (19) in the described substrate holder (22).
7. by the heated substrate frame of the described vacuum plating of claim 5, it is characterized in that: the both sides that described stone or metal plate for standing a stove on as a precaution against fire (20) is gone up resistance wire are evenly equipped with a plurality of second grooves (28); Have thermocouple intake (30) at the center of stone or metal plate for standing a stove on as a precaution against fire (20), the both sides that resistance wire is introduced, outlet (29,31) lays respectively at thermocouple intake (30).
8. press the heated substrate frame of claim 1 or 2 described vacuum platings, it is characterized in that: magnetic force rotating shaft (15) is installed on the described supporting component, it is connected with substrate baffle plate (1) by second union lever (10), and substrate baffle plate (1) can rotate around second union lever (10) by magnetic force rotating shaft (15).
9. press the heated substrate frame of claim 1 or 2 described vacuum platings, it is characterized in that: four-core lead assemblies (12) also is installed on supporting component, which is provided with four electrodes, two resistance wires that connect on heating power supply and the evaporation source (2) wherein, two other connects temperature sensor and temperature indicator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200101500U CN201158704Y (en) | 2008-01-11 | 2008-01-11 | Substrate warming frame for vacuum plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200101500U CN201158704Y (en) | 2008-01-11 | 2008-01-11 | Substrate warming frame for vacuum plating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201158704Y true CN201158704Y (en) | 2008-12-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008200101500U Expired - Fee Related CN201158704Y (en) | 2008-01-11 | 2008-01-11 | Substrate warming frame for vacuum plating |
Country Status (1)
| Country | Link |
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| CN (1) | CN201158704Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101899650A (en) * | 2010-04-30 | 2010-12-01 | 苏州索乐机电设备有限公司 | Substrate heating furnace of MOCVD |
| CN102605349A (en) * | 2012-03-27 | 2012-07-25 | 中国科学院电工研究所 | Substrate heating device |
| CN103103484A (en) * | 2011-11-11 | 2013-05-15 | 中国科学院沈阳科学仪器研制中心有限公司 | Magnetron sputtering system with single-heating self-rotation disc |
| CN106801223A (en) * | 2017-02-01 | 2017-06-06 | 东南大学 | A kind of pair of thermal source vertical-type atmosphere reacting furnace |
| CN114959659A (en) * | 2022-03-31 | 2022-08-30 | 松山湖材料实验室 | Heating device for sample heating |
-
2008
- 2008-01-11 CN CNU2008200101500U patent/CN201158704Y/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101899650A (en) * | 2010-04-30 | 2010-12-01 | 苏州索乐机电设备有限公司 | Substrate heating furnace of MOCVD |
| CN103103484A (en) * | 2011-11-11 | 2013-05-15 | 中国科学院沈阳科学仪器研制中心有限公司 | Magnetron sputtering system with single-heating self-rotation disc |
| CN102605349A (en) * | 2012-03-27 | 2012-07-25 | 中国科学院电工研究所 | Substrate heating device |
| CN102605349B (en) * | 2012-03-27 | 2014-06-25 | 中国科学院电工研究所 | Substrate heating device |
| CN106801223A (en) * | 2017-02-01 | 2017-06-06 | 东南大学 | A kind of pair of thermal source vertical-type atmosphere reacting furnace |
| CN106801223B (en) * | 2017-02-01 | 2019-04-09 | 东南大学 | A double heat source vertical atmosphere reaction furnace |
| CN114959659A (en) * | 2022-03-31 | 2022-08-30 | 松山湖材料实验室 | Heating device for sample heating |
| CN114959659B (en) * | 2022-03-31 | 2023-11-28 | 松山湖材料实验室 | Heating device for heating sample |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081203 Termination date: 20120111 |