CN1714315A - 用于感光树脂组合物的涂敷性能改善剂和含有这种改善剂的感光树脂组合物 - Google Patents
用于感光树脂组合物的涂敷性能改善剂和含有这种改善剂的感光树脂组合物 Download PDFInfo
- Publication number
- CN1714315A CN1714315A CNA200380104035XA CN200380104035A CN1714315A CN 1714315 A CN1714315 A CN 1714315A CN A200380104035X A CNA200380104035X A CN A200380104035XA CN 200380104035 A CN200380104035 A CN 200380104035A CN 1714315 A CN1714315 A CN 1714315A
- Authority
- CN
- China
- Prior art keywords
- resin composition
- photosensitive resin
- coating
- substrate
- unevenness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Abstract
Description
| 鳞片不均匀性 | 凸缘宽度(mm) | |
| 实施例1 | ◎ | 7.0 |
| 实施例2 | ◎ | 7.5 |
| 对比例1 | × | 4.0 |
| 对比例2 | ○ | 15.5 |
| 对比例3 | × | 4.0 |
Claims (3)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002341331A JP3844236B2 (ja) | 2002-11-25 | 2002-11-25 | 感光性樹脂組成物塗布性向上剤を含有する感光性樹脂組成物 |
| JP341331/2002 | 2002-11-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1714315A true CN1714315A (zh) | 2005-12-28 |
| CN100547486C CN100547486C (zh) | 2009-10-07 |
Family
ID=32375852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200380104035XA Expired - Lifetime CN100547486C (zh) | 2002-11-25 | 2003-11-14 | 感光树脂组合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060052498A1 (zh) |
| EP (1) | EP1598700A1 (zh) |
| JP (1) | JP3844236B2 (zh) |
| KR (1) | KR100945386B1 (zh) |
| CN (1) | CN100547486C (zh) |
| TW (1) | TWI298079B (zh) |
| WO (1) | WO2004049066A1 (zh) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101215381B (zh) * | 2008-01-14 | 2011-02-16 | 杭州师范大学 | 一种甲基苯基含氢硅油的制备方法 |
| CN104834183A (zh) * | 2014-02-06 | 2015-08-12 | 东友精细化工有限公司 | 热固性油墨组合物 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101325740B1 (ko) * | 2006-02-07 | 2013-11-20 | 에이지이엠코리아 주식회사 | 포토레지스트 및 이를 이용한 포토레지스트 패턴의 제조방법 |
| KR101428718B1 (ko) | 2007-02-02 | 2014-09-24 | 삼성디스플레이 주식회사 | 감광성 유기물, 이의 도포 방법, 이를 이용한 유기막 패턴형성 방법, 이로써 제조되는 표시 장치 |
| US9972271B2 (en) * | 2016-05-12 | 2018-05-15 | Novatek Microelectronics Corp. | Display panel |
| KR102752172B1 (ko) | 2019-10-11 | 2025-01-10 | 주식회사 동진쎄미켐 | 포지티브형 감광성 수지 조성물, 및 이를 이용한 디스플레이 소자 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62170392A (ja) * | 1986-01-24 | 1987-07-27 | Riso Kagaku Corp | 感熱性孔版原紙 |
| JP2978206B2 (ja) * | 1990-04-28 | 1999-11-15 | 東レ・ダウコーニング・シリコーン株式会社 | ジフェニルシロキサン・ジメチルシロキサン共重合体の製造方法 |
| US5320923A (en) * | 1993-01-28 | 1994-06-14 | Hewlett-Packard Company | Reusable, positive-charging organic photoconductor containing phthalocyanine pigment, hydroxy binder and silicon stabilizer |
| JPH07281018A (ja) * | 1994-04-06 | 1995-10-27 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
| US5604039A (en) * | 1996-01-22 | 1997-02-18 | Eastman Kodak Company | Thermally stable release agents |
| TW505521B (en) * | 1997-06-25 | 2002-10-11 | Kao Corp | Hair cosmetics |
| GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
| JP2000003047A (ja) * | 1998-06-17 | 2000-01-07 | Nippon Paint Co Ltd | 感光性樹脂組成物およびそれを用いるパターン形成方法 |
| CN1170204C (zh) * | 1999-02-15 | 2004-10-06 | 克拉瑞特金融(Bvi)有限公司 | 敏射线树脂组合物 |
| JP3357014B2 (ja) | 1999-07-23 | 2002-12-16 | 大日本印刷株式会社 | 光硬化性樹脂組成物及び凹凸パターンの形成方法 |
| JP2001064356A (ja) * | 1999-08-30 | 2001-03-13 | Takeda Chem Ind Ltd | 感光性樹脂およびそれを用いたレジストインキ組成物 |
| JP2001166128A (ja) * | 1999-09-30 | 2001-06-22 | Toray Ind Inc | カラーフィルター用硬化性樹脂溶液組成物、透明保護膜、カラーフィルターおよび液晶表示装置 |
| US6300025B1 (en) * | 2000-06-01 | 2001-10-09 | Lexmark International, Inc. | Photoconductors with polysiloxane and polyvinylbutyral blends |
| JP2003131371A (ja) * | 2001-10-24 | 2003-05-09 | Kanegafuchi Chem Ind Co Ltd | 難燃性の感光性ドライフィルムレジスト |
| KR100518533B1 (ko) * | 2002-06-14 | 2005-10-04 | 삼성전자주식회사 | 에폭시 링을 포함하는 베이스 폴리머와 실리콘 함유가교제로 이루어지는 네가티브형 레지스트 조성물 및 이를이용한 반도체 소자의 패턴 형성 방법 |
-
2002
- 2002-11-25 JP JP2002341331A patent/JP3844236B2/ja not_active Expired - Lifetime
-
2003
- 2003-11-11 US US10/535,029 patent/US20060052498A1/en not_active Abandoned
- 2003-11-14 WO PCT/JP2003/014506 patent/WO2004049066A1/ja not_active Ceased
- 2003-11-14 KR KR1020057009025A patent/KR100945386B1/ko not_active Expired - Lifetime
- 2003-11-14 CN CNB200380104035XA patent/CN100547486C/zh not_active Expired - Lifetime
- 2003-11-14 EP EP03772776A patent/EP1598700A1/en not_active Withdrawn
- 2003-11-20 TW TW092132491A patent/TWI298079B/zh not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101215381B (zh) * | 2008-01-14 | 2011-02-16 | 杭州师范大学 | 一种甲基苯基含氢硅油的制备方法 |
| CN104834183A (zh) * | 2014-02-06 | 2015-08-12 | 东友精细化工有限公司 | 热固性油墨组合物 |
| CN104834183B (zh) * | 2014-02-06 | 2019-11-12 | 东友精细化工有限公司 | 热固性油墨组合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20050085055A (ko) | 2005-08-29 |
| KR100945386B1 (ko) | 2010-03-05 |
| TWI298079B (en) | 2008-06-21 |
| WO2004049066A1 (ja) | 2004-06-10 |
| JP2004177513A (ja) | 2004-06-24 |
| TW200502693A (en) | 2005-01-16 |
| CN100547486C (zh) | 2009-10-07 |
| JP3844236B2 (ja) | 2006-11-08 |
| US20060052498A1 (en) | 2006-03-09 |
| EP1598700A1 (en) | 2005-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10976659B2 (en) | Photoresists comprising novolak resin blends | |
| TWI518117B (zh) | 光阻用樹脂組成物 | |
| JP5329999B2 (ja) | パターン形成方法 | |
| CN1771466A (zh) | 用于光敏树脂组合物的基底附着力促进剂以及包含该促进剂的光敏树脂组合物 | |
| US20040197696A1 (en) | Photoresist compositions | |
| TW200849329A (en) | Pattern forming method and composition for the same | |
| KR102127533B1 (ko) | 포지티브형 레지스트 조성물 | |
| CN1170205C (zh) | 用于辊涂的辐射敏感性树脂组合物和辊涂方法 | |
| CN1714315A (zh) | 用于感光树脂组合物的涂敷性能改善剂和含有这种改善剂的感光树脂组合物 | |
| US6384103B1 (en) | Radiation-sensitive resin composition | |
| KR20040069994A (ko) | Lcd 제조용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법 | |
| JP3245207B2 (ja) | 感放射線性樹脂組成物 | |
| JP4558443B2 (ja) | レジスト組成物 | |
| CN1226670C (zh) | 敏射线树脂组合物及改进该组合物的防干蚀刻性能的方法 | |
| TWI644173B (zh) | 正型感光性樹脂組成物及其應用 | |
| KR101308267B1 (ko) | 수·유계 용매에 용해성을 가지는 실리콘계 계면활성제를함유하는 양성 포토레지스트 조성물 | |
| TWI676864B (zh) | 正型感光性樹脂組成物、圖案化膜及凸塊的製造方法 | |
| JP6138067B2 (ja) | ノボラック樹脂ブレンドを含むフォトレジスト | |
| JP2004045618A (ja) | ポジ型ホトレジスト組成物およびレジストパターンの形成方法 | |
| KR20110041127A (ko) | 포토레지스트 조성물 | |
| KR20030076191A (ko) | 포지티브형 포토레지스트 조성물 및 액정표시소자 제조용레지스트패턴의 형성방법 | |
| JP2004045707A (ja) | ポジ型ホトレジスト組成物およびレジストパターンの形成方法 | |
| KR20120058191A (ko) | 도포성이 우수한 포지티브 포토레지스트 조성물 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: AZ ELECTRONIC MATERIALS IP (JAPAN) K.K. Free format text: FORMER OWNER: AZ ELECTRONIC MATERIAL (JAPAN) CO., LTD. Effective date: 20120521 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20120521 Address after: Tokyo, Japan Patentee after: AZ electronic material IP (Japan) Co.,Ltd. Address before: Tokyo, Japan Patentee before: AZ ELECTRONIC MATERIALS (JAPAN) Kabushiki Kaisha |
|
| ASS | Succession or assignment of patent right |
Owner name: MERCK PATENT GMBH Free format text: FORMER OWNER: AZ ELECTRONIC MATERIALS IP (JAPAN) K.K. Effective date: 20150409 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150409 Address after: Darmstadt Patentee after: MERCK PATENT GmbH Address before: Tokyo, Japan Patentee before: AZ electronic material IP (Japan) Co.,Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20091007 |
|
| CX01 | Expiry of patent term |