CN1677138A - Radiation sensitive composition for color filter, color filter and color liquid crystal display device - Google Patents

Abstract

The present invention provides a radiation sensitive composition for a color filter comprising (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E) a photopolymerization initiator and (F) a solvent, wherein the dispersant (B) comprises an acrylic copolymer obtained through living anionic polymerization and having an amine value (unit; mgKOH/g) and an acid value (unit; mgKOH/g) each greater than 0.

Description

Radiation sensitive composition for color filter, color filter and color liquid crystal display device

technical field

The invention relates to a radiation-sensitive composition for color filters, a color filter and a color liquid crystal display device. Specifically, the present invention relates to a radiation-sensitive composition for color filters that can be used to manufacture color filters, a color filter formed from the composition, and a color liquid crystal display device having the color filter, wherein the color filter Sheets are used in transmissive or reflective color liquid crystal display devices, color imaging tube components, and the like.

Background technique

It is known that when a colored radiation-sensitive composition is used to manufacture a color filter, a film of the colored radiation-sensitive composition is usually formed on a substrate or a substrate on which a light-shielding layer of a desired pattern is formed in advance, and the color filter is passed through a color filter having a desired pattern shape. A method in which a photomask is irradiated with radiation (hereinafter referred to as "exposure"), then developed and dissolved to remove unexposed parts, and then post-baked with cre-n-o-bun or a hot plate to form pixel patterns of various colors (Refer to JP-A-2-144502 and JP-A-3-53201). However, in the above method, particularly when the pigment concentration contained in the colored radiation-sensitive composition is high, residue or scum sometimes occurs on the unexposed portion of the substrate or on the light-shielding layer at the time of development.

Increasing the ejection pressure of the developer is effective to avoid the above-mentioned residue or scum, but on the other hand, there are disadvantages of pattern defects or peeling off. A colored radiation-sensitive composition in which pattern chipping or peeling does not occur under pressure.

In addition, in recent years, along with the increase in size of liquid crystal display devices, the number of substrates on which color filters are formed has gradually increased. Therefore, in the exposure process for forming a color filter, a so-called "fraction exposure" method of fractional exposure is used, but the total time required for exposure increases. Therefore, from the viewpoint of improving productivity, there is a need for a colored radiation-sensitive composition capable of forming a pixel pattern even with a short exposure time.

However, when the existing colored radiation-sensitive composition forms a pixel pattern with a short exposure time (ie, low exposure dose), the pattern may be missing or peeled off during development, which may not meet the requirements. In addition, in the case of a low exposure amount, the coating film composed of the colored radiation-sensitive composition is insufficiently cured, and the surface smoothness of the pattern is significantly impaired, resulting in problems such as poor alignment of liquid crystals. In addition, conventional colored radiation-sensitive compositions generally tend to increase in viscosity over time, and there is a problem that they cannot be stored for a long time after preparation.

Therefore, there is an urgent need to develop a radiation-sensitive composition for color filters that has good adhesion to the substrate, has sufficient developability and pattern surface smoothness even at low exposure levels, and has good storage stability.

Contents of the invention

The object of the present invention is to provide a radiation-sensitive color filter that has good adhesion to the substrate, has sufficient developability and pattern surface smoothness even at low exposure levels, and is also excellent in storage stability. combination.

Another subject of this invention is to provide the color filter formed from the said composition of this invention.

Another object of the present invention is to provide a liquid crystal display device having the color filter of the present invention.

Other subjects and advantages of the present invention will be clarified by the following description.

First, according to the present invention, the above-mentioned problems of the present invention are solved by the following radiation-sensitive composition for color filters, which is characterized in that the composition comprises: (A) pigment; (B) dispersant; (C) Alkali-soluble resin comprising (c1) a carboxyl group-containing unsaturated monomer containing (meth)acrylic acid, (c2) maleimide substituted at N-position, and (c3) selected from styrene, α-methyl Styrene, p-hydroxy-α-methylstyrene, methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (methyl) ) acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, glycerol mono(meth)acrylate, polystyrene macromer and polymethyl methacrylate macromer (D) a polyfunctional monomer; (E) a photopolymerization initiator and (F) a solvent, wherein the (B) dispersant contains an acrylic copolymer, and the acrylic copolymer It is obtained by living anionic polymerization, and its amine value (unit mg KOH/g) and acid value (unit mg KOH/g) are both greater than 0.

Second, according to the present invention, the above-mentioned problems of the present invention are solved by the following radiation-sensitive composition for color filters, which is characterized in that the composition comprises: (A) pigment; (B) dispersant; (C) alkali soluble resin; (D) polyfunctional monomer; (E) photopolymerization initiator and (F) solvent, and the composition is pre-dispersed by (A) pigment in containing (B) dispersant, (C) alkali-soluble Prepared in the medium of resin and (F) solvent, wherein said (B) dispersant contains acrylic copolymer, the acrylic copolymer is obtained through living anion polymerization, and its amine value (unit mg KOH/g) and acid value (unit mg KOH/g) are greater than 0.

Thirdly, according to the present invention, the above-mentioned problems of the present invention can be solved by a color filter formed from each of the above-mentioned radiation-sensitive compositions for color filters.

Fourth, according to the present invention, the above-mentioned problems of the present invention can be solved by a liquid crystal display device including the above-mentioned color filter.

The radiation-sensitive composition for color filters of the present invention has good adhesion to a substrate, has sufficient developability and pattern surface smoothness even at a low exposure dose, and is also excellent in storage stability and the like.

Therefore, the radiation-sensitive composition for color filters of the present invention is very suitable for forming various color filters represented by color filters for color liquid crystal display devices in the field of electronics industry.

Detailed ways

The present invention will be described in detail below.

Radiation sensitive composition for color filter

-(A) Pigment-

There is no special limitation on the pigment in the present invention, and it can be any one of organic pigments and inorganic pigments. Among them, organic pigments are particularly preferable from the viewpoint of pursuit of high purity, high transmittance, color development and heat resistance of color filters.

The above-mentioned organic pigments include, for example, compounds classified in pigments in the Dyers Index (C.I.; issued by The Society of Dyers and Colourists), and specifically, substances having the following Dyers Index (C.I.) numbers are listed.

C.I. Pigment Yellow 12, C.I. Pigment Yellow 13, C.I. Pigment Yellow 14, C.I. Pigment Yellow 17, C.I. Pigment Yellow 20, C.I. Pigment Yellow 24, C.I. Pigment Yellow 31, C.I. Pigment Yellow 55, C.I. Pigment Yellow 83, C.I. C.I. Pigment Yellow 109, C.I. Pigment Yellow 110, C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150, C.I. Pigment Yellow 153, C.I. Pigment Yellow 154, C.I. Pigment Yellow 155, C.I. C.I. Pigment Yellow 211;

C.I. Pigment Orange 36, C.I. Pigment Orange 43, C.I. Pigment Orange 51, C.I. Pigment Orange 61, C.I. Pigment Orange 71;

Pigment Red 9, C.I. Pigment Red 97, C.I. Pigment Red 122, C.I. Pigment Red 123, C.I. Pigment Red 149, C.I. Pigment Red 168, C.I. Pigment Red 176, C.I. Pigment Red 177, C.I. Pigment Red 180, C.I. Pigment Red 185, C.I. Pigment Red 207, C.I. Pigment Red 208, C.I. Pigment Red 209, C.I. Pigment Red 215, C.I. Pigment Red 224, C.I. Pigment Red 242, C.I. Pigment Red 243, C.I. Pigment Red 254;

C.I. Pigment Violet 19, C.I. Pigment Violet 23, C.I. Pigment Violet 29;

C.I. Pigment Blue 15, C.I. Pigment Blue 60, C.I. Pigment Blue 15:3, C.I. Pigment Blue 15:4, C.I. Pigment Blue 15:6;

C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Green 136, C.I. Pigment Green 210;

C.I. Pigment Brown 23, C.I. Pigment Brown 25.

These organic pigments may be used alone or in combination of two or more.

In the present invention, the organic pigment can be used after being purified by recrystallization method, reprecipitation method, solvent washing method, sublimation method, vacuum heating method or a combination of these methods.

The above-mentioned inorganic pigments include, for example, titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide red (red iron oxide (III)), cadmium red, ultramarine blue, dark blue, chromium oxide green, Cobalt green, umber, titanium black, synthetic iron black, carbon black, etc.

These inorganic pigments may be used alone or in combination of two or more.

In addition, in the present invention, the above-mentioned pigment may be used in combination with one or more dyes or natural pigments depending on circumstances.

In the present invention, if necessary, the surface of the pigment particle can be modified and used with a polymer. The polymer for modifying the surface of the pigment particles includes, for example, polymers described in JP-A-8-259876, various commercially available polymers or oligomers for pigment dispersion, and the like.

-(B)-dispersant

The dispersant in the present invention contains an acrylic copolymer (hereinafter referred to as "acrylic dispersant (B1)", which is obtained by living anion polymerization, and its amine value (unit mg KOH/g, the same below) Both the acid value (unit mg KOH/g, the same below) are greater than 0.

The amine value of the acrylic dispersant (B1) is preferably 10-100, more preferably 15-50. The acid value of the acrylic dispersant (B1) is preferably 5-50, more preferably 10-30. At this time, if the amine value of the acrylic dispersant (B1) is 0, the storage stability of the obtained composition tends to decrease, and when the acid value of the acrylic dispersant (B1) is 0, the adhesion to the substrate will be reduced. tends to decrease.

As a commercial item of an acrylic dispersant (B1), Disperbyk-2001 (amine value=29, acid value=19, BYK company) etc. are mentioned.

In the present invention, the acrylic dispersant (B1) may be used alone or in combination of two or more.

In the present invention, the acrylic dispersant (B1) can be used in combination with other dispersants.

Said other dispersants include polyethylene oxide alkyl ethers such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, polyethylene oxide oleyl ether; polyethylene oxide Polyethylene oxide alkyl phenyl ethers such as n-octyl phenyl ether, polyethylene oxide n-nonyl phenyl ether, etc. Polyethylene glycol dilaurate, polyethylene glycol distearate, etc. Ethylene glycol diesters; sorbitan fatty acid esters; fatty acid-modified polyesters; tertiary amine-modified polyurethanes; ), Polyflo- (manufactured by Kyoeisha Chemical Co., Ltd.), Eftoptop (manufactured by To-Chem Prodactus Co., Ltd.), Megafactuk (manufactured by Dainippon Inki ), Asahiga-do, Sa-Fron (the above substances are manufactured by Asahi Whistle Co., Ltd.), Disperbyk-101, Disperbyk-103, Disperbyk-107, Disperbyk-110, Disperbyk-111, Disperbyk-115, Disperbyk-130, Disperbyk -160, Disperbyk-161, Disperbyk-162, Disperbyk-163, Disperbyk-164, Disperbyk-165, Disperbyk-166, Disperbyk-170, Disperbyk-180, Disperbyk-182, Disperbyk-2000 (manufactured by Co., Ltd.), Solsper-S5000, Solsper-s12000, Solsper-s13240, Solsper-s13940, Solsper-s17000, Solsper-s20000, Solsper-s22000, Solsper-s24000, Solsper-s24000GR , ソルスパ-スS26000, ソルスパ-スS27000, ソルスパ-スS28000 (the above substances are manufactured by Abishia Co., Ltd.), EFKA46, EFKA47, EFKA48, EFKA745, EFKA4540, EFKA4550, EFKA6750, EFKA LP4008, EFKA LP400LP4010, EFKA LP4015, EFKA LP4050, EFKA LP4055, EFKA LP4560, EFKA LP4800, EFKA Polymer400, EFKA Polymer 401, EFKA Polymer 402, EFKA Polymer 403, EFKA Polymer 450, EFKA Polymer 451, EFKA Polymer 401, EFKA Polymer 402, EFKA Polymer 403, EFKA Polymer 450, EFKA Polymer 451, EFKA Polymer 5 Manufactured by Ajispa-PB-822 (manufactured by Ajinomoto Fine Technology Co., Ltd.), etc.

The other dispersants mentioned above may be used alone or in combination of two or more.

The usage ratio of other dispersants is preferably 0 to 75% by weight, more preferably 0 to 50% by weight, based on the total amount of the acrylic dispersant (B1) and other dispersants. When other dispersants are used in a proportion exceeding 75% by weight, a good balance of developability, surface smoothness and storage stability may not be ensured.

In the present invention, the amount (in terms of solid content) of the acrylic dispersant (B1) used is preferably 1 to 50 parts by weight, more preferably 3 to 30 parts by weight, based on 100 parts by weight of the (A) pigment. If the amount of acrylic dispersant (B1) is less than 1 part by weight, the resulting composition tends to decrease in storage stability; on the other hand, if the amount of acrylic dispersant (B1) is higher than 50 parts by weight, there is a tendency to Tendency to generate residue on the substrate.

-(C) Alkali-soluble resin-

As long as the alkali-soluble resin in the present invention acts as a binder for the (A) pigment and is soluble in the developer used in the development step in the production of the color filter, particularly preferably in an alkaline developer, there is no Special limited. Among them, alkali-soluble resins with carboxyl groups are preferred, more preferably ethylenically unsaturated monomers with one or more carboxyl groups in the molecule (hereinafter referred to as "carboxyl-containing unsaturated monomers") and other copolymerizable ethylenically unsaturated monomers. A copolymer (hereinafter referred to as "carboxyl group-containing copolymer") of an unsaturated monomer (hereinafter referred to as "copolymerizable unsaturated monomer").

Carboxy-containing unsaturated monomers include, for example:

(Meth)acrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid and other unsaturated monocarboxylic acids;

Maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid and other unsaturated dicarboxylic acids or their anhydrides;

Unsaturated polycarboxylic acids or their anhydrides with three or more valences;

Mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)acryloyloxyethyl] phthalate and other dibasic or more than dibasic polycarboxylic acids Mono[(meth)acryloyloxyalkyl]esters;

Mono(meth)acrylates of polymers having carboxyl and hydroxyl groups at both ends, such as ω-carboxypolycaprolactone mono(meth)acrylate, and the like.

Among these carboxyl group-containing unsaturated monomers, mono[2-acryloyloxyethyl]phthalate is commercially available under the trade name M-5400 (manufactured by Toagosei Co., Ltd.).

The above carboxyl group-containing unsaturated monomers can be used alone or in combination of two or more.

In addition, copolymerizable unsaturated monomers include, for example:

Maleimide;

N-phenylmaleimide, N-o-hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N-p-hydroxyphenylmaleimide, N-benzyl Maleimide, N-cyclohexylmaleimide, N-succinimide-3-maleimide benzoate, N-succinimide-4-maleimide Leimide butyrate, N-succinimidyl-6-maleimide hexanoate, N-succinimidyl-3-maleimide propionate, N-(acridine N-position substituted maleimides such as pyridyl) maleimide;

Styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, p-hydroxy-α-methylstyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o -Aromatic vinyl compounds such as vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, etc.;

Indene, 1-methylindene and other indene;

Methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate ester, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl ( Meth)acrylate, 3-Hydroxypropyl (meth)acrylate, 2-Hydroxybutyl (meth)acrylate, 3-Hydroxybutyl (meth)acrylate, 4-Hydroxybutyl (methyl) ) acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, 2-methoxyethyl (meth)acrylate base) acrylate, 2-phenoxyethyl (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxytriethylene glycol (meth)acrylate, methoxypropylene glycol ( Meth)acrylate, methoxydipropylene glycol (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0 ^2,6 ]dec-8-yl (meth)acrylate, 2-Hydroxy-3-phenoxypropyl (meth)acrylate, glycerol mono(meth)acrylate and other unsaturated carboxylic acid esters;

2-aminoethyl (meth)acrylate, 2-dimethylaminoethyl (meth)acrylate, 2-aminopropyl (meth)acrylate, 2-dimethylaminopropyl (meth)acrylic acid Unsaturated carboxylic acid aminoalkyl esters such as ester, 3-aminopropyl (meth)acrylate, 3-dimethylaminopropyl (meth)acrylate;

Unsaturated carboxylic acid glycidyl esters such as glycidyl (meth)acrylate;

Vinyl carboxylates such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate;

Vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether and other unsaturated ethers;

(Meth)acrylonitrile, α-chloroacrylonitrile, vinylidene cyanide and other vinyl cyanide compounds;

(Meth)acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth)acrylamide and other unsaturated amides;

1,3-butadiene, isoprene, chloroprene and other aliphatic conjugated dienes;

Macromonomers with a single (meth)acryloyl group at the end of the polymer molecular chain such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate, polysiloxane, etc.

These copolymerizable unsaturated monomers may be used alone or in combination of two or more.

The carboxyl group-containing copolymer in the present invention preferably (c1) contains (meth)acrylic acid as an essential component, and contains succinic acid mono[2-(meth)acryloyloxyethyl] ester and/or ω-carboxypoly Caprolactone (kacrolacton) mono(meth)acrylate carboxyl unsaturated monomer; (c2) maleimide substituted at N-position; and (c3) selected from styrene, α-methylstyrene , p-hydroxy-α-methylstyrene, methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylic acid Other copolymerizability of esters, allyl (meth)acrylate, benzyl (meth)acrylate, glycerol mono(meth)acrylate, polystyrene macromers and polymethylmethacrylate macromers A copolymer of at least one type of unsaturated monomer (hereinafter referred to as "carboxyl group-containing copolymer (C1)").

Preferred specific examples of the carboxyl group-containing copolymer (C1) include, for example:

(Meth)acrylic acid/N-phenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/N-m-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/N-p-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-cyclohexylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/α-methylstyrene/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/N-phenylmaleimide/styrene/n-butyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/2-ethylhexyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/p-hydroxy-α-methylstyrene/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/N-phenylmaleimide/styrene/n-butyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/2-ethylhexyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/2-hydroxyethyl (meth)acrylate/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/benzyl (meth)acrylate/glycerol mono(meth)acrylate copolymer;

(Meth)acrylic acid/N-p-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate/glycerol mono(meth)acrylate copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/phenyl (meth)acrylate/2-hydroxyethyl (meth)acrylate/polystyrene macromonomer copolymer;

(Meth)acrylic acid/N-phenylmaleimide/styrene/phenyl(meth)acrylate/2-hydroxyethyl(meth)acrylate/polymethylmethacrylate macromer copolymer;

(Meth)acrylic acid/mono[2-(meth)acryloyloxyethyl]succinate/N-phenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/mono[2-(meth)acryloyloxyethyl]succinate/N-p-hydroxyphenylmaleimide/styrene/benzyl(meth)acrylate copolymerization thing;

(Meth)acrylic acid/mono[2-(meth)acryloyloxyethyl]succinate/N-phenylmaleimide/styrene/allyl (meth)acrylate copolymer;

(Meth)acrylic acid/mono[2-(meth)acryloyloxyethyl]succinate/N-cyclohexylmaleimide/styrene/allyl (meth)acrylate copolymer;

(Meth)acrylic acid/mono[2-(meth)acryloyloxyethyl]succinate/N-cyclohexylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/omega-carboxypolycaprolactone mono(meth)acrylate/N-m-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/omega-carboxypolycaprolactone mono(meth)acrylate/N-p-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/ω-carboxypolycaprolactone mono(meth)acrylate/N-phenylmaleimide/styrene/benzyl(meth)acrylate/glycerol mono(meth)acrylate ester copolymer;

(Meth)acrylic acid/omega-carboxypolycaprolactone mono(meth)acrylate/N-p-hydroxyphenylmaleimide/styrene/benzyl (meth)acrylate/glycerol mono(meth)acrylate base) acrylate copolymer, etc.

In addition, carboxyl group-containing copolymers other than carboxyl group-containing copolymer (C1) include, for example:

(meth)acrylic acid/methyl (meth)acrylate copolymer;

(meth)acrylic acid/benzyl (meth)acrylate copolymer;

(Meth)acrylic acid/2-hydroxyethyl (meth)acrylate/benzyl (meth)acrylate copolymer;

(meth)acrylic acid/methyl(meth)acrylate/polystyrene macromer copolymer;

(Meth)acrylic acid/methyl (meth)acrylate/polymethyl methacrylate macromer copolymer;

(meth)acrylic acid/benzyl (meth)acrylate/polystyrene macromonomer copolymer;

(meth)acrylic acid/benzyl (meth)acrylate/polymethyl methacrylate macromer copolymer;

(Meth)acrylic acid/2-hydroxyethyl (meth)acrylate/benzyl (meth)acrylate/polystyrene macromonomer copolymer;

(Meth)acrylic acid/2-hydroxyethyl (meth)acrylate/benzyl (meth)acrylate/polymethyl methacrylate macromer copolymer, etc.

In the carboxyl group-containing copolymer, the copolymerization ratio of the carboxyl group-containing unsaturated monomer is preferably 5 to 50% by weight, more preferably 10 to 40% by weight. When the polymerization ratio is lower than 5% by weight, the resulting radiation-sensitive composition tends to have a reduced solubility in alkali developing solution, and when it is higher than 50% by weight, the solubility in alkaline developing solution is too large, and the resulting radiation-sensitive composition tends to be less soluble in alkaline developing solution. During liquid development, there is a tendency to cause the pixel to fall off from the substrate or the film on the surface of the pixel to crack.

The Mw of the alkali-soluble resin measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) is preferably 3,000 to 300,000, more preferably 5,000 to 100,000.

In addition, Mn of the alkali-soluble resin measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) is preferably 3,000 to 60,000, more preferably 5,000 to 25,000.

The ratio (Mw/Mn) of Mw to Mn of the alkali-soluble resin is preferably 1-5, more preferably 1-4.

In the present invention, by using an alkali-soluble resin having the above-mentioned specific range of Mw and Mn, a radiation-sensitive composition with good developability can be obtained, whereby a pixel pattern with a sharp image edge can be formed, and it is difficult to form a pixel pattern on the unexposed portion of the substrate during development. Formation of residue, scum and residual film etc. on the shading layer.

In the present invention, the alkali-soluble resins may be used alone or in combination of two or more kinds.

In the present invention, the usage-amount of the alkali-soluble resin is preferably 10 to 1,000 parts by weight, more preferably 20 to 500 parts by weight, relative to 100 parts by weight of the (A) pigment. If the amount of the alkali-soluble resin used is less than 10 parts by weight, for example, alkali developability may decrease, or scum or residual film may occur on the substrate or light-shielding layer of the unexposed portion. On the other hand, if the amount of the alkali-soluble resin used is more than 1,000 parts by weight, the pigment concentration is relatively reduced, so it may be difficult to achieve the target color density as a film.

-(D) Polyfunctional monomer-

The polyfunctional monomer of the present invention is a monomer having two or more polymerizable unsaturated bonds.

Multifunctional monomers include, for example:

Di(meth)acrylates of alkylene glycols such as ethylene glycol and propylene glycol;

Di(meth)acrylates of polyalkylene glycols such as polyethylene glycol and polypropylene glycol;

Glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol and other poly(meth)acrylates of trivalent or higher polyhydric alcohols or their dicarboxylic acid modified products;

Polyester, epoxy resin, polyurethane resin, alkyd resin, silicone resin, spiro ring resin and other oligomeric (meth)acrylates;

Di(meth)acrylates of hydroxylated polymers at both ends, such as poly1,3-butadiene having hydroxyl groups at both ends, polyisoprene having hydroxyl groups at both ends, and polycaprolactone having hydroxyl groups at both ends, or

Tris[2-(meth)acryloyloxyethyl]phosphate and the like.

Among the above-mentioned polyfunctional monomers, poly(meth)acrylates of trivalent or higher polyhydric alcohols or their dicarboxylic acid modified products are preferred, specifically trimethylolpropane tri(meth)acrylate, Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like. In terms of pixel intensity and surface smoothness, and it is difficult to form scum and residual film on the substrate and light-shielding layer of the unexposed part, trimethylolpropane triacrylate, pentaerythritol triacrylate and dipentaerythritol are particularly preferred. Hexaacrylate.

The above polyfunctional monomers may be used alone or in combination of two or more.

In this invention, it is preferable that the usage-amount of a polyfunctional monomer is 5-500 weight part with respect to 100 weight part of (C) alkali-soluble resins, More preferably, it is 20-300 weight part. If the amount of the multifunctional monomer is less than 5 parts by weight, there is a tendency for the pixel strength and surface smoothness to decrease, and when the amount of the multifunctional monomer is higher than 500 parts by weight, for example, the alkali developability decreases, or There is a tendency to generate scum, residual film, etc. on the substrate or light-shielding layer of the unexposed portion.

In the present invention, a part of the polyfunctional monomer can be replaced with a monofunctional monomer having one polymerizable unsaturated bond.

As the above-mentioned monofunctional monomer, other than the same monomers as the carboxyl group-containing unsaturated monomers or copolymerizable unsaturated monomers listed in (C) Alkali-soluble resin, N-(meth)acryloylmorpholine, N -In addition to vinylpyrrolidone and N-vinyl-ε-caprolactam, M-5600 (trade name, manufactured by Toagosei Co., Ltd.) etc. are mentioned.

The above-mentioned monofunctional monomers may be used alone or in combination of two or more kinds.

In the present invention, the usage ratio of the monofunctional monomer is preferably less than or equal to 90% by weight, more preferably less than or equal to 50% by weight, based on the total amount of the polyfunctional monomer and the monofunctional monomer. If the usage ratio of the monofunctional monomer is higher than 90% by weight, pixel strength or surface smoothness may be insufficient.

In this invention, it is preferable that the total usage-amount of a polyfunctional monomer and a monofunctional monomer is 5-500 weight part with respect to 100 weight part of (C) alkali-soluble resins, More preferably, it is 20-300 weight part. If the total amount used is less than 5 parts by weight, there is a tendency for the pixel strength and surface smoothness to decrease, and when it exceeds 500 parts by weight, for example, alkali developability decreases, or the substrate or light-shielding layer of the unexposed portion Tendency to generate scum or residual film easily.

-(E) Photopolymerization initiator-

In the present invention, the photopolymerization initiator is capable of generating the above-mentioned (D) polyfunctional monomer and the monofunctional monomer used according to the case by exposure to radiation such as visible light, ultraviolet rays, far ultraviolet rays, electron rays, and X-rays. The active species of compound that initiates polymerization.

The photopolymerization initiator includes, for example, acetophenone compounds, biimidazole compounds, triazine compounds, benzoin compounds, benzophenone compounds, α-diketone compounds, polynuclear quinone compounds, xanthone compounds, diazo compounds, etc.

In the present invention, the photopolymerization initiators may be used alone or in combination of two or more. The photopolymerization initiator in the present invention is preferably at least one selected from acetophenone compounds, biimidazole compounds and triazine compounds.

Among the preferred photopolymerization initiators of the present invention, specific examples of acetophenone compounds include 2-hydroxy-2-methyl-1-phenylacetone-1, 2-methyl-1-(4-methylthiophenyl )-2-morpholinoacetone-1, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) butanone-1, 1-hydroxycyclohexyl phenyl ketone, 2, 2-dimethoxy-1,2-diphenylethanone-1, etc.

Among the above-mentioned acetophenone compounds, particularly preferred 2-methyl-1-(4-methylthiophenyl)-2-morpholinoacetone-1, 2-benzyl-2-dimethylamino-1-(4 -morpholinophenyl) butanone-1 and the like.

The above acetophenone compounds can be used alone or in combination of two or more.

In the present invention, when an acetophenone compound is used as a photopolymerization initiator, the amount used is preferably 0.01 to 100 parts by weight relative to 100 parts by weight of the total weight of (D) polyfunctional monomers and monofunctional monomers, More preferably, it is 1-80 weight part, More preferably, it is 5-60 weight part. If the amount of the acetophenone compound used is less than 0.01 parts by weight, curing by exposure may be insufficient, making it difficult to obtain a colored layer in which pixel patterns are arranged in a predetermined arrangement. On the other hand, if the amount is more than 100 parts by weight, the formed pixels tend to be easily peeled off from the substrate at the time of development.

In addition, specific examples of the above-mentioned biimidazole compounds include, for example, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1, 2'-biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2'-biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dichlorobenzene base)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5 , 5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5'-tetraphenyl-1,2'-bis Imidazole, 2,2'-bis(2,4-dibromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2, 4,6-tribromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, etc.

Among the above-mentioned biimidazole compounds, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'- Bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorobenzene base)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, etc. Particular preference is given to 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole.

The above-mentioned biimidazole compounds have good solubility in solvents, will not produce foreign matter such as insolubles and precipitates, and have high sensitivity. The curing reaction can be fully carried out through low-energy exposure, and no curing will occur in the unexposed part. Therefore, the film after exposure is clearly divided into a cured portion that is insoluble in the developer and an uncured portion that is highly soluble in the developer. Thereby, a high-definition colored layer in which pixel patterns without undercut are arranged in a predetermined arrangement can be formed.

The above-mentioned biimidazole compounds can be used alone or in combination of two or more.

In the present invention, when a biimidazole compound is used as a photopolymerization initiator, the amount used is preferably 0.01 to 40 parts by weight relative to 100 parts by weight of the total weight of (D) polyfunctional monomer and monofunctional monomer, More preferably, it is 1-30 weight part, More preferably, it is 1-20 weight part. If the amount of the biimidazole compound used is less than 0.01 parts by weight, curing by exposure may be insufficient, making it difficult to obtain a colored layer in which pixel patterns are arranged in a predetermined arrangement. On the other hand, if the amount is more than 40 parts by weight, the formed pixels tend to be easily peeled off from the substrate at the time of development.

-Hydrogen donor-

In the present invention, when a biimidazole compound is used as a photopolymerization initiator, it is preferable to use it together with a hydrogen donor described below because the sensitivity can be further improved.

The term "hydrogen donor" refers to a compound capable of donating a hydrogen atom to a radical generated from a biimidazole compound by exposure.

The hydrogen donor in the present invention is preferably a thiol compound, an amine compound, etc. defined below.

The thiol compound includes a benzene ring or a heterocyclic ring as the core, and contains 1 or more, preferably 1 to 3, more preferably 1 to 2 mercapto groups directly bonded to the core (hereinafter referred to as as "thiol hydrogen donor").

The amine compounds include compounds with a benzene ring or a heterocyclic ring as the core and one or more, preferably 1 to 3, more preferably 1 to 2 amino groups directly connected to the core (hereinafter referred to as "amine hydrogen donor").

In addition, these hydrogen donors may have both a mercapto group and an amino group.

These hydrogen donors are described more specifically below.

The thiol-based hydrogen donor may contain one or more benzene rings or heterocycles, or may contain both benzene rings and heterocycles. When two or more of the above-mentioned rings are contained, a condensed ring may or may not be formed.

In addition, when the thiol-type hydrogen donor has two or more mercapto groups, as long as at least one free mercapto group remains, one or more of the remaining mercapto groups may be substituted by an alkyl group, an aralkyl group or an aryl group. And as long as at least one free mercapto group remains, it may have a structural unit in which two sulfur atoms are bonded through a divalent organic group such as an alkylene group, or a structural unit in which two sulfur atoms are bonded in the form of a disulfide.

In addition, the thiol hydrogen donor may be substituted by a carboxyl group, alkoxycarbonyl group, substituted alkoxycarbonyl group, phenoxycarbonyl group, substituted phenoxycarbonyl group, nitril group, etc. other than the mercapto group.

Specific examples of the thiol hydrogen donor include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2,5-dimercapto-1,3,4-thiadiazole , 2-mercapto-2,5-dimethylaminopyridine, etc.

Among the above-mentioned thiol hydrogen donors, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, etc. are preferable, and 2-mercaptobenzothiazole is particularly preferable.

Next, the amine hydrogen donor may contain one or more benzene rings or heterocycles, or may contain both benzene rings and heterocycles. When two or more of the above-mentioned rings are contained, a condensed ring may or may not be formed.

In addition, the amine hydrogen donor can have one or more amino groups substituted by alkyl or substituted alkyl, and can also be substituted by carboxyl, alkoxycarbonyl, substituted alkoxycarbonyl, phenoxycarbonyl in places other than amino , Substituted phenoxycarbonyl and nitrile etc. substitutions.

Specific examples of the amine hydrogen donor include 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4-diethylaminophenethyl Ketones, 4-dimethylaminophenyl ethyl ketone, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile, etc.

Among the above-mentioned amine hydrogen donors, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, etc. are preferred, and 4,4'-bis (Diethylamino)benzophenone.

In addition, the amine hydrogen donor functions as a sensitizer when a photopolymerization initiator other than the biimidazole compound is used.

In the present invention, hydrogen donors may be used alone or in combination of two or more. In view of the fact that the formed pixel is not easy to fall off from the substrate during development, and the intensity and sensitivity of the pixel are high, it is preferable to use one or more thiol hydrogen donors in combination with one or more amine hydrogen donors. body.

Specific preferred examples of combinations of thiol hydrogen donors and amine hydrogen donors include 2-mercaptobenzothiazole/4,4'-bis(dimethylamino)benzophenone, 2-mercaptobenzothiazole/4, 4'-bis(diethylamino)benzophenone, 2-mercaptobenzoxazole/4,4'-bis(dimethylamino)benzophenone, 2-mercaptobenzoxazole/4,4' - Bis(diethylamino)benzophenone and the like. More preferred combinations include 2-mercaptobenzothiazole/4,4'-bis(diethylamino)benzophenone, 2-mercaptobenzoxazole/4,4'-bis(diethylamino)benzophenone Ketones and the like, and a particularly preferable combination is 2-mercaptobenzothiazole/4,4'-bis(diethylamino)benzophenone.

In the combination of the thiol hydrogen donor and the amine hydrogen donor, the weight ratio of the thiol hydrogen donor to the amine hydrogen donor is preferably 1:1 to 1:4, more preferably 1:1 to 1: 3.

In the present invention, when a hydrogen donor is used in combination with a biimidazole compound, the amount of the hydrogen donor used is preferably 0.01 to 40 parts by weight based on 100 parts by weight of the total of (D) polyfunctional monomers and monofunctional monomers. parts, more preferably 1 to 30 parts by weight, even more preferably 1 to 20 parts by weight. If the amount of the hydrogen donor is less than 0.01 parts by weight, the sensitivity improvement effect tends to decrease, and when the amount exceeds 40 parts by weight, the formed pixels tend to be easily peeled off from the substrate during development.

In addition, specific examples of the aforementioned triazine compounds include 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, Oxazine, 2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(furan-2-yl ) vinyl] -4,6-bis(trichloromethyl)-s-triazine, 2-[2-(4-diethylamino-2-methylphenyl) vinyl]-4,6-two (Trichloromethyl)-s-triazine, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)-s-triazine, 2 -(4-methoxyphenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxystyryl]-4,6-bis(trichloromethyl) Triazine compounds with halomethyl groups, such as base)-s-triazine and 2-(4-n-butoxyphenyl]-4,6-bis(trichloromethyl)-s-triazine.

Among the above-mentioned triazine compounds, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)-s-triazine is particularly preferable.

The above-mentioned triazine compounds can be used alone or in combination of two or more kinds.

In the present invention, when a triazine compound is used as a photopolymerization initiator, the amount of the triazine compound used is preferably 0.01 to 40 parts by weight relative to the total weight of (D) polyfunctional monomer and monofunctional monomer. Parts by weight, more preferably 1 to 30 parts by weight, still more preferably 1 to 20 parts by weight. If the amount of the triazine compound is less than 0.01 parts by weight, then it is likely that the curing by exposure will be insufficient, and it will be difficult to obtain a colored layer in which the pixel pattern is configured according to a predetermined arrangement, and when the amount is higher than 40 parts by weight, the formed image The pigment tends to be easily peeled off from the substrate during development.

-Additive ingredients-

The radiation-sensitive composition for color filters of the present invention may contain various additive components as necessary.

Examples of the above-mentioned additive components include organic acids or organic amino compounds (other than the above-mentioned hydrogen donors) that have the effect of further improving the solubility of the radiation-sensitive composition in an alkaline developer and further suppressing the insoluble matter remaining after development. )wait.

The above-mentioned organic acid is preferably an aliphatic carboxylic acid or a phenyl-containing carboxylic acid having one or more carboxyl groups in the molecule.

The aliphatic carboxylic acids include, for example:

Formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, hexanoic acid, diethylacetic acid, heptanoic acid, octanoic acid and other aliphatic monocarboxylic acids;

Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brasilic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid Aliphatic dicarboxylic acids such as malonic acid, methylsuccinic acid, tetramethylsuccinic acid, cyclohexanedicarboxylic acid, itaconic acid, citraconic acid, maleic acid, fumaric acid, and mesaconic acid;

Aliphatic tricarboxylic acids such as propanetricarboxylic acid, aconitic acid, and camphortricarboxylic acid, etc.

In addition, the above-mentioned phenyl-containing carboxylic acid may include, for example, a compound in which a carboxyl group is directly connected to a phenyl group, or a compound in which a carboxyl group is connected to a phenyl group through a divalent carbon chain, and the like.

Phenyl-containing carboxylic acids include, for example:

Aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, 2,3-dimethylbenzoic acid, 3,5-dimethylbenzoic acid;

Aromatic dicarboxylic acids such as phthalic acid, isophthalic acid, and terephthalic acid;

Trimellitic acid, trimellitic acid, trimellitic acid, pyromellitic acid and other three or more aromatic polycarboxylic acids; or

Phenylacetic acid, hydrogenated atropic acid, hydrogenated cinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, cinnamiriden acid, kumaric acid, umbelliferic acid, and the like.

Among the above-mentioned organic acids, the aliphatic carboxylic acid is preferably an aliphatic dicarboxylic acid in terms of alkali solubility, solubility in a solvent described later, and prevention of scum or residual film on the unexposed portion of the substrate and the light-shielding layer. Particularly preferred are malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid, and the like, phenyl-containing carboxylic acids are preferably aromatic dicarboxylic acids, and phthalic acid is particularly preferred.

The above organic acids may be used alone or in combination of two or more.

The amount of the organic acid used is preferably 15 parts by weight or less, more preferably 10 parts by weight or less, based on 100 parts by weight of the total of components (A) to (E) and additive components. If the amount of the organic acid used is less than 15 parts by weight, the adhesion between the formed pixel and the substrate tends to decrease.

In addition, the above-mentioned organic amino compound is preferably an aliphatic amine or a phenylamine containing one or more amino groups in the molecule.

The aliphatic amines include, for example:

N-propylamine, isopropylamine, n-butylamine, isobutylamine, sec-butylamine, tert-butylamine, n-pentylamine, n-hexylamine and other mono(cyclo)alkylamines;

Methyl ethylamine, diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine Amine, di-sec-butylamine, di-tert-butylamine and other di(cyclo)alkylamines;

Dimethyl, ethylamine, methyl, diethylamine, triethylamine, dimethyl, n-propylamine, diethyl, n-propylamine, methyl, di-n-propylamine, ethyl Di-n-propylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, tri-sec-butylamine, tri-tert-butylamine and other tri(cyclo)alkylamines;

2-aminoethanol, 3-amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol and other mono(cyclic) alkanolamines;

Two (ring) alkanolamines such as diethanolamine, di-n-propanolamine, diisopropanolamine, di-n-butanolamine, and diisobutanolamine;

Triethanolamine, tri-n-propanolamine, triisopropanolamine, tri-n-butanolamine, triisobutanolamine and other tri(cyclic) alkanolamines;

3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 3-dimethylamino- 1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3-propanediol, 2-diethylamino-1,3-propanediol and other amino (cyclo)alkanediols;

Aminocarboxylic acids such as β-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, etc.

Phenyl-containing amines include, for example, compounds in which the amino group is directly linked to the phenyl group, compounds in which the amino group is linked to the phenyl group through a divalent carbon chain, and the like.

Phenylamines include, for example:

Aniline, o-methylaniline, m-methylaniline, p-methylaniline, p-ethylaniline, 1-naphthylamine, 2-naphthylamine, N,N-dimethylaniline, N,N-di Aromatic amines such as ethylaniline, p-methyl-N, N-dimethylaniline;

o-aminobenzyl alcohol, m-aminobenzyl alcohol, p-aminobenzyl alcohol, p-dimethylaminobenzyl alcohol, p-diethylaminobenzyl alcohol and other aminobenzyl alcohols;

o-aminophenol, m-aminophenol, p-aminophenol, p-dimethylaminophenol, p-diethylaminophenol and other aminophenols;

Aminobenzoic acids such as m-aminobenzoic acid, p-aminobenzoic acid, p-dimethylaminobenzoic acid, p-diethylaminobenzoic acid, and the like.

Among the above-mentioned organic amino compounds, the aliphatic amines are preferably mono(cyclic)alkanolamines and amino groups from the viewpoints of solubility in solvents described later, and prevention of scum or residual film on unexposed substrates and light-shielding layers. (Cyclo)alkanediols, particularly preferably 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino-1,3- Propylene glycol, 4-amino-1,2-butanediol and the like. Phenyl-containing amines are preferably aminophenols, and particularly preferably o-aminophenol, m-aminophenol, p-aminophenol and the like.

The above organic amino compounds may be used alone or in combination of two or more.

The amount of the organic amino compound used is preferably 15 parts by weight or less, more preferably 10 parts by weight or less, based on 100 parts by weight of the total of components (A) to (E) and additive components. If the amount of the organic amino compound exceeds 15 parts by weight, the adhesion between the formed pixel and the substrate tends to decrease.

In addition, additive ingredients other than the above include, for example:

Dispersion aids such as blue pigment derivatives such as copper phthalocyanine derivatives or yellow pigment derivatives;

Fillers such as glass and alumina;

High molecular compounds such as polyvinyl alcohol, polyethylene glycol monoalkyl ether, poly(fluoroalkyl acrylate);

Non-ionic, cationic, anionic and other surfactants;

Vinyltrimethoxysilane, Vinyltriethoxysilane, Vinyltris(2-methoxyethoxy)silane, N-(2-Aminoethyl)-3-Aminopropyl·Methyl·Di Methoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-Glycidoxypropyl Methyl Dimethoxysilane, 2-(3,4-Epoxycyclohexyl) Ethyl Trimethoxysilane, 3-Chloropropyl Methyl Dimethoxysilane Oxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and other adhesion promoters;

2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol and other antioxidants;

2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, alkoxybenzophenones and other UV absorbers;

Anticoagulants such as sodium polyacrylate;

Thermal radical generators such as 1,1'-azobis(cyclohexa-1-carbonitrile), 2-phenylazo-4-methoxy-2,4-dimethylvaleronitrile, etc.

(F) solvent

The solvent in the present invention can be appropriately selected from a solvent that disperses or dissolves (A) to (E) components and additives constituting the radiation-sensitive composition, does not react with these components, and has moderate volatility.

Such solvents include, for example:

Methanol, ethanol, benzyl alcohol and other alcohols;

Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, Diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether Dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. base ether;

Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-propyl ether acetate, ethylene glycol mono-n-butyl ether acetate, diethylene glycol mono Methyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-propyl ether acetate, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate , propylene glycol monoethyl ether acetate, 3-methoxybutyl acetate, etc. (poly)alkylene glycol monoalkyl ether acetate;

Diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers;

Methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, diacetone alcohol (4-hydroxy-4-methylpentan-2-one), 4-hydroxy-4-methylhexan-2 - ketones such as ketones;

Lactate alkyl esters such as methyl lactate and ethyl lactate;

Ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isoamyl acetate, 3-methyl-3-methoxybutyl acetate, n-butyl propionate, 3-methyl-3-methoxybutyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl glycolate, Ethoxyethyl acetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl pyruvate ester, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutyrate, 2 - Esters such as ethyl oxobutyrate;

Aromatic hydrocarbons such as toluene and xylene;

Amides such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, etc.

Among the above-mentioned solvents, benzyl alcohol, ethylene glycol mono-n-butyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol monomethyl ether, etc. Ether acetate, ethylene glycol mono-n-butyl ether acetate, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol Dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, n-butyl acetate, isobutyl acetate, n-pentyl formate, isoamyl acetate, 3- Methoxybutyl acetate, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate ester, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, ethyl pyruvate, etc.

The above solvents may be used alone or in combination of two or more.

In addition, the above-mentioned solvents can also be mixed with benzyl ethyl ether, dihexyl ether, acetonylacetone, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl acetate, ethyl benzoate, Diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate and other high boiling point solvents are used together.

The above-mentioned high boiling point solvents may be used alone or in combination of two or more kinds.

There is no special limitation on the amount of solvent used, but in view of the applicability and storage stability of the obtained radiation-sensitive composition, the total concentration of other components except the solvent in the composition is preferably 5 to 50% by weight , more preferably 10 to 40% by weight.

-Manufacturing method of radiation-sensitive composition for color filter-

The preparation method of the radiation-sensitive composition for color filters of the present invention is not particularly limited, but it is preferred to disperse (A) pigment in a medium containing (B) dispersant, (C) alkali-soluble resin and (F) solvent in advance. steps for preparation.

Hereinafter, the step of dispersing the (A) pigment in the above-mentioned medium in advance is referred to as a "preliminary dispersion step", and the dispersion obtained by dispersing the (A) pigment in the above-mentioned medium in advance is referred to as a "preliminary dispersion".

The amount of the (C) alkali-soluble resin used in the preliminary dispersion step is preferably 5 to 100% by weight, more preferably 10 to 50% by weight relative to the amount of the (C) alkali-soluble resin used in the radiation-sensitive composition for color filters. In this case, when the usage-amount of (C) alkali-soluble resin is less than 5 weight%, the storage stability of the obtained composition will fall, and there exists a tendency for a residue to generate|occur|produce easily on a board|substrate.

The preliminary dispersion step can be performed, for example, by mixing the above-mentioned components using a mixing device such as a dissolver, a bead mill, or a rod mill.

In the preliminary dispersion thus obtained, the (A) pigment has an average particle diameter of preferably 50 to 400 nm, more preferably 50 to 150 nm.

Following the preliminary dispersion step, the preliminary dispersion liquid is passed through conventional By mixing the methods, the radiation-sensitive composition for color filters of the present invention can be obtained.

Method for forming color filters

A method for forming the color filter of the present invention using the radiation-sensitive composition for color filters of the present invention (hereinafter simply referred to as "radiation-sensitive composition") will be described below.

The method for forming the color filter of the present invention at least includes the following steps (1) to (4).

(1) a step of forming a film of the radiation-sensitive composition of the present invention on a substrate;

(2) a step of exposing at least a part of the film to radiation;

(3) a step of developing the film after exposure;

(4) A step of post-baking the developed film.

The above steps will be described in sequence below.

-(1) Step-

First, if necessary, a light-shielding layer is formed on the surface of a substrate so as to divide portions where pixels are to be formed, and the radiation-sensitive composition of the present invention is coated on the substrate, followed by prebaking to evaporate the solvent to form a film.

Substrates used in this step include, for example, glass, silicon, polycarbonate, polyester, aramid, polyamideimide, polyimide, and polyestersulfone, in addition to ring-opening polymers of cyclic olefins or its hydrogenation products, etc.

In addition, these substrates can also undergo appropriate pretreatments such as chemical treatment with silane coupling agents, plasma treatment, ion plating, sputtering, gas phase reaction method, and vacuum evaporation as required.

When coating the radiation-sensitive composition on the substrate, appropriate coating methods such as spin coating, cast coating, and roll coating can be used, among which coating methods using a spin coater or a slot die coater are preferred.

Prebaking conditions are preferably a temperature of 70 to 110° C. and a time of about 2 to 4 minutes.

The coating thickness is preferably 0.1 to 8.0 μm, more preferably 0.2 to 6.0 μm, and still more preferably 0.2 to 4.0 μm in terms of the film thickness after drying.

-(2) Steps-

Then, at least a part of the formed film is exposed to radiation. In this step, when exposing a part of the film, it is preferable to expose through a photomask having a predetermined pattern.

The radiation used for exposure can be suitably selected from radiation such as visible light, ultraviolet rays, deep ultraviolet rays, electron beams, and X-rays, preferably radiation with a wavelength in the range of 190 to 450 nm.

The amount of radiation exposure is preferably about 10 to 10,000 J/m ² .

-(3) Steps-

Next, the exposed coating is developed with a developing solution, preferably an alkaline developing solution, and unexposed portions of the coating are dissolved and removed, whereby a predetermined pattern is formed.

The alkali developing solution is preferably such as sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5.4.0]-7-undecene and Aqueous solutions of 1,5-diazabicyclo-[4.3.0]-5-nonene and the like.

A suitable amount of water-soluble organic solvents such as methanol and ethanol, surfactants, and the like may be added to the above-mentioned alkaline developing solution. Moreover, it is preferable to wash with water after alkali image development.

As the developing treatment method, a shower developing method, a spray developing method, a dip developing method, a paddle developing method, and the like can be applied.

As image development conditions, temperature is preferably normal temperature, and time is about 5 to 300 seconds.

-(4) Steps-

Then, by post-baking the developed film, a substrate in which pixel patterns are arranged in a predetermined array can be obtained.

The post-baking treatment conditions are preferably, for example, a temperature of 180 to 240° C. and a time of about 15 to 90 minutes. The film thickness of the pixel thus formed is preferably 0.1 to 6.0 µm, more preferably 0.5 to 3.0 µm.

By repeating the steps (1) to (4) above with each radiation sensitive composition dispersed with red, green or blue pigments, red, green and blue pixel patterns are formed on the same substrate. A colored layer in which pixel patterns of the three primary colors of red, green and blue are arranged in a predetermined arrangement is formed on it.

In addition, in the present invention, the order of forming the pixel patterns of each color can be selected arbitrarily.

color filter

The color filter of the present invention is formed from the radiation-sensitive composition for color filters of the present invention.

In addition to transmissive or reflective color liquid crystal display devices, the color filter of the present invention is very useful in color imaging tube elements and color sensors.

Color liquid crystal display device

The color liquid crystal display device of the present invention has the color filter of the present invention.

The color liquid crystal display device of the present invention can adopt an appropriate structure. For example, a configuration may be adopted in which color filters are formed on a substrate other than a driving substrate on which thin film transistors (TFTs) are disposed, and the driving substrate and the substrate on which color filters are formed face each other through a liquid crystal layer. A structure may also be adopted in which a color filter is formed on the surface of a driving substrate on which thin film transistors (TFTs) are disposed, and the substrate is opposed to a substrate of ITO (tin-doped indium oxide) electrodes via a liquid crystal layer. The latter structure can greatly increase the aperture ratio, and has the advantage of being able to obtain a bright and high-definition liquid crystal display device.

Example

Embodiments of the present invention will be described more specifically by way of examples below, but the present invention is not limited to the following examples.

Example 1

15 parts by weight of a mixture of C.I. Pigment Red 254/C.I. Pigment Red 177=80/20 (weight ratio) as (A) pigment, and 5 parts by weight of Disperbyk-2001 (solid content concentration: 45.1% by weight) as (B) dispersant parts (in terms of solid content, about 2.26 parts by weight), methacrylic acid/N-phenylmaleimide/styrene/benzyl methacrylate copolymer as (C) alkali-soluble resin (copolymerization weight ratio =20/30/20/30, Mw=9,500, Mn=5,000) 6 parts by weight and 37 parts by weight of propylene glycol monomethyl ether acetate and 37 parts by weight of ethyl 3-ethoxy propionate as the (F) solvent Parts were treated with a bead mill to prepare a preliminary dispersion (R1).

Then, 100 parts by weight of the preliminary dispersion liquid (R1), methacrylic acid/succinic acid mono(2-methacryloyloxyethyl) ester/N-phenylmaleimide as (C) alkali-soluble resin were mixed. Amine/styrene/benzyl methacrylate copolymer (copolymerization weight ratio=25/10/30/20/15, Mw=12,000, Mn=6,500) 5 parts by weight, as (D) polyfunctional monomer 10 parts by weight of dipentaerythritol hexaacrylate, 2-methyl-(4-methylthiophenyl)-2-morpholino-1-acetone-15 parts by weight as (E) photopolymerization initiator, and 15 parts by weight as (F ) 70 parts by weight of 3-methoxybutyl acetate as a solvent to prepare a radiation-sensitive composition.

Example 2

Pigment Green 36/C.I. Pigment Yellow 138/C.I. Pigment Yellow 150=50/40/10 (weight ratio) mixture 15 parts by weight as (A) pigment, Disperbyk-2001 7.5 parts by weight as (B) dispersant (about 3.38 parts by weight in terms of solid content), as (C) alkali-soluble resin, methacrylic acid/ω-carboxydicaprolactone monoacrylate/N-phenylmaleimide/styrene/benzyl 4 parts by weight of methacrylate/glycerol monomethacrylate copolymer (copolymerization weight ratio=15/10/20/10/35/10, Mw=6,000, Mn=3,000) and propylene glycol mono 73.5 parts by weight of methyl ether acetate were treated in the same manner as in Example 1 to prepare a preliminary dispersion (G1).

Then, 100 parts by weight of the preliminary dispersion liquid (G1), methacrylic acid/N-phenylmaleimide/styrene/benzyl methacrylate/glycerin monomethacrylic acid as the (C) alkali-soluble resin were mixed 5 parts by weight of ester copolymer (copolymer weight ratio = 15/25/15/35/10, Mw = 13,500, Mn = 6,000), 10 parts by weight of dipentaerythritol hexaacrylate as (D) polyfunctional monomer, as (E) 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) butanone-15 parts by weight of photopolymerization initiator and 3-ethoxypropionic acid as (F) solvent 70 parts by weight of ethyl ester to prepare a radiation-sensitive composition.

Example 3

Pigment Blue 15/C.I. Pigment Violet 23=90/10 (weight ratio) mixture 15 parts by weight as (A) pigment, Disperbyk-2001 10 parts by weight as (B) dispersant (calculated by solid content, 4.51 parts by weight), acrylic acid/N-phenylmaleimide/styrene/phenyl methacrylate/2-hydroxyethyl methacrylate/polymethyl methacrylate as (C) alkali-soluble resin Macromonomer copolymer (copolymerization weight ratio=15/20/10/35/10/10, Mw=23,000, Mn=11,000) 2 parts by weight and 63 propylene glycol monomethyl ether acetate as (F) solvent Parts by weight and 10 parts by weight of propylene glycol monomethyl ether were treated in the same way as in Example 1 to prepare a preliminary dispersion (B1).

Then, 100 parts by weight of the preliminary dispersion liquid (B1) and methacrylic acid/N-phenylmaleimide/α-methylstyrene/benzyl methacrylate copolymer as (C) alkali-soluble resin were mixed (Copolymerization weight ratio=20/25/25/30, Mw=43,000, Mn=21,000) 10 parts by weight, dipentaerythritol hexaacrylate as (D) polyfunctional monomer 20 parts by weight, as (E) photopolymerization 2-methyl-(4-methylthiophenyl)-2-morpholino-1-acetone-15 parts by weight of initiator and 3-methyl-3-methoxybutyl as (F) solvent 30 parts by weight of acetate and 80 parts by weight of propylene glycol monoethyl ether acetate were used to prepare a radiation-sensitive composition.

Example 4

In the preliminary dispersion step, methacrylic acid/N-phenylmaleimide/styrene/n-butyl methacrylate copolymer (copolymerization weight ratio=20/30/20/30, Mw=8,000, Mn= 4,000) 6 parts by weight instead of (C) 6 parts by weight of alkali-soluble resin in embodiment 1; Ethylene/2-ethylhexyl methacrylate copolymer (copolymer weight ratio=20/30/20/30, Mw=14,000, Mn=6,500) 5 parts by weight instead of (C) alkali-soluble resin 5 in Example 1 parts by weight, and the others are the same as in Example 1 to prepare a radiation-sensitive composition.

Comparative example 1

Replace the (B) dispersant Disperbyk-2001 5 parts by weight of pre-dispersion liquid (R1) in embodiment 1 with 2.5 parts by weight of solsupa-su S24000 (amine value=50, acid value=25), and other are identical with embodiment 1, Preparation of radiation-sensitive compositions.

Comparative example 2

Use methacrylic acid/benzyl methacrylate copolymer (copolymerization weight ratio = 25/75, Mw = 13,000, Mn = 6,500) to replace the formazan of (C) alkali-soluble resin in the preliminary dispersion (R1) in Example 1. Acrylic/N-phenylmaleimide/styrene/benzyl methacrylate copolymer. In addition, methacrylic acid/2-hydroxyethyl methacrylate/benzyl methacrylate copolymer (copolymerization weight ratio = 15/15/70, Mw = 16,000, Mn = 7,500) was used instead of the (C) Alkali-soluble resin Methacrylic acid/mono(2-methacryloyloxyethyl)succinate/N-phenylmaleimide/styrene/benzyl methacrylate copolymer, others In the same manner as in Example 1, a radiation-sensitive composition was prepared.

Comparative example 3

7.5 parts by weight (approximately 3.35 parts by weight in terms of solid content) of Disperbyk-182 (amine value=14, acid value=0, solid content concentration 44.6% by weight) was used instead of (B) of the preliminary dispersion (G1) in Example 2 Dispersant Disperbyk-2001 7.5 parts by weight, others are the same as in Example 2 to prepare a radiation-sensitive composition.

Comparative example 4

With methacrylic acid/ω-carboxy polycaprolactone monoacrylate/styrene/benzyl methacrylate/glycerin monomethacrylate copolymer (copolymerization weight ratio=15/15/20/35/15, Mw =15,500, Mn=6,500) instead of (C) alkali-soluble resin methacrylic acid/ω-carboxydicaprolactone monoacrylate/N-phenylmaleimide/ Styrene/Benzyl Methacrylate/Glycerol Monomethacrylate Copolymer. In addition, (C) alkali-soluble resin methacrylic acid/N- Phenylmaleimide/styrene/benzyl methacrylate/glycerol monomethacrylate copolymer, and the other is the same as in Example 2 to prepare a radiation-sensitive composition.

Comparative Example 5

Replace 10 parts by weight of (B) dispersant Disperbyk-2001 of pre-dispersion liquid (B1) in Example 3 with 4.5 parts by weight of Assispa-PB-822 (amine value=13, acid value=16), and others are the same as in Example 3 , to prepare a radiation-sensitive composition.

The following evaluations were performed on the radiation-sensitive compositions obtained in the above-mentioned Examples and Comparative Examples, and the evaluation results are shown in Table 1.

Adhesion evaluation

Prepare 2 pieces of #1737 glass substrates of Corning Company, apply the above-mentioned radiation-sensitive compositions on the surface of each substrate with a spin coater, and then pre-bake them at 70° C. for 3 minutes to form a film with a thickness of 2.5 μm. film. Next, each substrate was cooled to room temperature, and exposed to ultraviolet rays with wavelengths of 365nm, 405nm, and 436nm through a photomask with a high-pressure mercury lamp (illuminance 250W/m ^{2 )} . The exposure dose of the film on the other substrate was 500 J/m ² . Then, the film on each substrate is used as a developing solution at 23° C. of developing solution CD150CR (containing potassium hydroxide 0.04% by weight) of JSR Co., Ltd., and is sprayed and developed with a developing solution spray pressure of 0.3 MPa (nozzle diameter: 1.0 mm) for 1 Minutes, washed with ultrapure water, and then post-baked at 200°C for 30 minutes to form a 90/210 μm line/space pattern (Rain·And·Spe-Spata-n) stripe-like pixel pattern on each substrate.

The resulting pixel pattern was observed with an optical microscope, and the evaluation was "O" when no chipping or peeling of the pixel pattern was found, and "X" was found when chipping or peeling was found.

Evaluation of surface smoothness

The surface roughness of the upper part of each pixel pattern obtained in the above adhesion evaluation was measured and evaluated with an atomic force microscope of Digital Instruments Co., Ltd. Generally, when the surface roughness is not higher than 60 Å, the surface smoothness is considered good.

Developability evaluation

Each of the above radiation-sensitive compositions was coated on the surface of Corning's #1737 glass substrate with a spin coater, and then prebaked at 90° C. for 3 minutes to form a film with a film thickness of 2.5 μm. Next, the substrate was cooled to room temperature, and the film was exposed to ultraviolet rays of wavelengths including 365nm, 405nm and 436nm at an exposure dose of 1,000J/ ^m2 through a photomask with a high-pressure mercury lamp (illuminance: 250W/ ^m2 ). Then use the developer solution CD150CR (containing potassium hydroxide 0.04% by weight) of JSR (strain) company as the developing solution for the film, spray the developing film for 1 minute with the spraying pressure of the developing solution at 0.1 MPa (0.3 mm in diameter of the nozzle), and use an ultra-pure Washing with water, and then post-baking at 200° C. for 30 minutes to form a 90/210 μm line/space pattern of striped pixel patterns on the substrate.

The resulting pixel pattern was observed with an optical microscope, and the evaluation was "O" when no residue or scum was found on the unexposed portion of the substrate, and the evaluation was "X" when residue or scum was found.

Storage Stability Evaluation

The initial viscosity of each radiation-sensitive composition was measured with a Tokyo Keiki E-type viscometer. 50 g of each radiation-sensitive composition was put into a light-shielding glass container, and was left to stand at 23° C. for 14 days in an airtight state, and then the viscosity after standing was measured with a Tokyo Keiki E-type viscometer. Calculate the change rate of the viscosity after standing with respect to the initial viscosity, evaluate as "○" when the rate of change is less than 5%, evaluate as "△" when the rate of change is 5% to <10%, and rate of change is 10% or 10% In the case of the above, the evaluation was "x".

Table 1 Adhesion Surface roughness () Developability storage stability Exposure Exposure 1000J/ ^m2 500J/ ^m2 1000J/ ^m2 500J/ ^m2 Example 1 ○ ○ 38 50 ○ ○ Example 2 ○ ○ 31 42 ○ ○ Example 3 ○ ○ twenty two 33 ○ ○ Example 4 ○ ○ 25 36 ○ ○ Comparative example 1 ○ x 65 88 x x Comparative example 2 x x 78 106 x x Comparative example 3 ○ x 67 92 x △ Comparative example 4 x x 70 97 x x Comparative Example 5 x x 45 64 x x

Claims (4)

1. A radiation-sensitive composition for color filters, characterized in that the composition comprises: (A) a pigment; (B) a dispersant; (C) an alkali-soluble resin comprising (c1) containing (meth)acrylic acid Carboxyl-containing unsaturated monomers, (c2) N-position substituted maleimides, and (c3) selected from styrene, α-methylstyrene, p-hydroxyl-α-methylstyrene, (form base) methyl acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl A copolymer of at least one of poly(meth)acrylate, glycerol mono(meth)acrylate, polystyrene macromer, and polymethylmethacrylate macromer; (D) multifunctionality Monomer; (E) photopolymerization initiator and (F) solvent, wherein said (B) dispersant contains acrylic acid copolymer, and this acrylic acid copolymer obtains through living anion polymerization, and its amine value (unit mg KOH/ g) and acid value (unit: mgKOH/g) are greater than 0. 2. A radiation-sensitive composition for color filters, characterized in that the composition comprises: (A) pigment; (B) dispersant; (C) alkali-soluble resin; (D) multifunctional monomer; (E ) a photopolymerization initiator and (F) a solvent, and the composition is prepared by predispersing the above-mentioned (A) pigment in a medium containing (B) a dispersant, (C) an alkali-soluble resin, and (F) a solvent, wherein The (B) dispersant contains an acrylic copolymer obtained by living anion polymerization, and its amine value (unit mg KOH/g) and acid value (unit mg KOH/g) are both greater than 0. 3. A color filter comprising the radiation-sensitive composition for color filters according to claim 1 or 2. 4. A liquid crystal display device comprising the color filter according to claim 3.