JP2008242081A - Radiation sensitive resin composition for forming colored layer, color filter and color liquid crystal display element - Google Patents

Abstract

[PROBLEMS] To form a color filter that can form a color filter that does not cause "burn-in" with a high product yield, and that provides a pixel and a black matrix that are excellent in solvent resistance and adhesion to a substrate. A radiation-sensitive resin composition and the like are provided.
A radiation-sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a radiation-sensitive radical generator, B) Mw / Mn of the alkali-soluble resin is 1.0 to 2.0, (b1) at least one selected from the group of unsaturated carboxylic acids or acid anhydrides and unsaturated phenol compounds, and (b2) A radiation-sensitive resin composition for forming a colored layer, comprising a copolymer containing an unsaturated compound having an oxetane skeleton as an essential component.
[Selection figure] None

Description

  The present invention relates to a radiation-sensitive composition for forming a colored layer, a color filter, and a color liquid crystal display element. More specifically, the present invention relates to a color filter used for a transmissive or reflective color liquid crystal display device, a color imaging tube element, and the like. The present invention relates to a radiation-sensitive composition used for forming a useful colored layer, a color filter having a colored layer formed from the radiation-sensitive composition, and a color liquid crystal display device including the color filter.

As a method of forming a color filter using a colored radiation-sensitive resin composition, a coating film of a colored radiation-sensitive resin composition is formed on a substrate or a substrate on which a light-shielding layer having a desired pattern is formed in advance. Radiation is irradiated through a photomask having a desired pattern shape (hereinafter referred to as “exposure”), developed with an alkali developer to dissolve and remove unexposed portions, and then post-exposed using a clean oven or hot plate. A method of obtaining pixels of each color by baking (see, for example, Patent Document 1 and Patent Document 2) is known.
In recent years, since the size of the substrate used for forming the color filter has been increased, the application method of the radiation sensitive resin composition is a method for applying the radiation sensitive resin composition from the method using a central dropping type spin coater. It is being replaced by a method using a slit nozzle in which the liquid protrusion has a smaller diameter. In the latter slit nozzle method, since the diameter of the liquid protrusion is small (narrow), the radiation-sensitive resin composition often remains around the nozzle tip after the application is completed. Since it drops onto the color filter as a dry foreign substance and the quality of the color filter is significantly reduced, jet cleaning is usually performed by spraying a cleaning solvent on the nozzle tip before coating. Quality degradation cannot be effectively prevented, and this is a major factor in reducing product yield.
Therefore, in order to cope with such problems, in recent years, there has been a demand for a radiation sensitive resin composition for a color filter that has high cleaning properties with a cleaning solvent, that is, high solubility in the cleaning solvent even after drying.

In recent years, a liquid crystal display device having a color filter is required to have a long lifetime, and accordingly, there is an increasing demand for the anti-burning ability of the color filter.
By the way, “burn-in” is a kind of display defect of a liquid crystal display device, and an image that should not be displayed is displayed on the screen, or a black or white “haze” -shaped image is displayed on the image that is originally displayed. It is a phenomenon that overlaps and is displayed. Such a phenomenon is thought to result from the fact that the charged impurities in the liquid crystal diffuse in the liquid crystal and the potential difference applied to align the liquid crystal molecules is not maintained for a certain period of time. It has recently been clarified that elution occurs not only in the molecular production but also in the formed color filter.
For such a phenomenon, as disclosed in, for example, Patent Document 3, it is known that it is effective to increase the purity of the pigment, but the impurity is a pigment in the radiation-sensitive resin composition. It may be derived from other components, and it is not always sufficient to increase the pigment purity.
Therefore, development of a radiation-sensitive resin composition for a color filter that satisfies the demand for high product yield at the time of manufacturing color filters in recent years and does not cause “burn-in” is strongly demanded.

  In recent years, in the technical field of color filters, the required performance for the formed pixels, black matrix and colored radiation-sensitive composition has become more stringent. Sensitivity, resolution, pattern shape, etc. as colored radiation-sensitive composition In addition, the pixels and black matrix are strongly required to have excellent solvent resistance to a wide range of solvents and adhesion to the substrate, and from the viewpoint of production control of color filters, coloring used in the formation of color filters The radiation-sensitive composition is also strongly required to have excellent storage stability as a liquid composition containing a solvent, but the conventional colored radiation-sensitive composition cannot sufficiently satisfy these requirements. It was.

JP-A-2-144502 JP-A-3-53201 JP 2000-329929 A

  The subject of this invention is providing the radiation sensitive resin composition for colored layer formation etc. which can form the color filter which does not produce "burn-in" with a high product yield. Also, a novel color layer forming feeling that provides a pixel and a black matrix that has good storage stability as a liquid composition containing a solvent, and has excellent solvent resistance to a wide range of solvents and adhesion to a substrate. It is to provide a radiation composition.

The present invention, first,
A radiation-sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a radiation-sensitive radical generator, and (B) an alkali-soluble Copolymer whose resin is at least one selected from the group of (b1) unsaturated carboxylic acid or its anhydride and unsaturated phenol compound, and (b2) an unsaturated compound having an oxetane skeleton (Mw / Mn) of polystyrene-equivalent weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) and polystyrene-equivalent number average molecular weight (Mn) measured by gel permeation chromatography (GPC) Is a radiation-sensitive resin composition for forming a colored layer, which is 1.0 to 2.0.

  Secondly, the present invention comprises a color filter formed from the radiation-sensitive resin composition for forming a colored layer.

  Thirdly, the present invention comprises a color liquid crystal display device comprising the color filter.

Hereinafter, the present invention will be described in detail.
Radiation-sensitive resin composition- (A) Colorant-
The colorant in the present invention is not particularly limited in color tone, and may be any of a pigment, a dye, or a natural pigment, but since a color filter is required to have a high purity and high light transmittance color development and heat resistance, A pigment is preferable, and an organic pigment or carbon black is particularly preferable.
Examples of the organic pigment include compounds classified as pigments in the color index, and specifically those having the following color index (CI) numbers.

C. I. Pigment yellow 12, C.I. I. Pigment yellow 13, C.I. I. Pigment yellow 14, C.I. I. Pigment yellow 17, C.I. I. Pigment yellow 20, C.I. I. Pigment yellow 24, C.I. I. Pigment yellow 31, C.I. I. Pigment yellow 55, C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 93, C.I. I. Pigment yellow 109, C.I. I. Pigment yellow 110, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 153, C.I. I. Pigment yellow 154, C.I. I. Pigment yellow 155, C.I. I. Pigment yellow 166, C.I. I. Pigment yellow 168, C.I. I. Pigment yellow 211;

C. I. Pigment orange 5, C.I. I. Pigment orange 13, C.I. I. Pigment orange 14, C.I. I. Pigment orange 24, C.I. I. Pigment orange 34, C.I. I. Pigment orange 36, C.I. I. Pigment orange 38, C.I. I. Pigment orange 40, C.I. I. Pigment orange 43, C.I. I. Pigment orange 46, C.I. I. Pigment orange 49, C.I. I. Pigment orange 61, C.I. I. Pigment orange 64, C.I. I. Pigment orange 68, C.I. I. Pigment orange 70, C.I. I. Pigment orange 71, C.I. I. Pigment orange 72, C.I. I. Pigment orange 73, C.I. I. Pigment orange 74;

C. I. Pigment red 1, C.I. I. Pigment red 2, C.I. I. Pigment red 5, C.I. I. Pigment red 17, C.I. I. Pigment red 31, C.I. I. Pigment red 32, C.I. I. Pigment red 41, C.I. I. Pigment red 122, C.I. I. Pigment red 123, C.I. I. Pigment red 144, C.I. I. Pigment red 149, C.I. I. Pigment red 166, C.I. I. Pigment red 168, C.I. I. Pigment red 170, C.I. I. Pigment red 171, C.I. I. Pigment red 175, C.I. I. Pigment red 176, C.I. I. Pigment red 177, C.I. I. Pigment red 178, C.I. I. Pigment red 179, C.I. I. Pigment red 180, C.I. I. Pigment red 185, C.I. I. Pigment red 187, C.I. I. Pigment red 202, C.I. I. Pigment red 206, C.I. I. Pigment red 207, C.I. I. Pigment red 209, C.I. I. Pigment red 214, C.I. I. Pigment red 220, C.I. I. Pigment red 221, C.I. I. Pigment red 224, C.I. I. Pigment red 242, C.I. I. Pigment red 243, C.I. I. Pigment red 254, C.I. I. Pigment red 255, C.I. I. Pigment red 262, C.I. I. Pigment red 264, C.I. I. Pigment red 272;

CI Pigment Violet 1, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29, CI Pigment Violet 32, CI Pigment Violet 36, CI Pigment Violet 38;
CI Pigment Blue 15, CI Pigment Blue 15: 3, CI Pigment Blue 15: 4, CI Pigment Blue 15: 6, CI Pigment Blue 60, CI Pigment Blue 80;
CI Pigment Green 7, CI Pigment Green 36;
CI Pigment Brown 23, CI Pigment Brown 25;
CI Pigment Black 1, CI Pigment Black 7.

Among these organic pigments, C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180, C.I. I. Pigment red 177, C.I. I. CI Pigment Red 254, CI Pigment Blue 15: 3, CI Pigment Blue 15: 4, CI Pigment Blue 15: 6, CI Pigment Green 7, CI Pigment Green 36; CI Pigment Violet 23, CI Pigment Blue 60 and CI Pigment Blue 80 At least one selected from the group is preferred.
The organic pigments can be used alone or in admixture of two or more, and organic pigments and carbon black can also be mixed and used.

  In the present invention, each of the pigments can be used by modifying the particle surface with a polymer, if desired. Examples of the polymer that modifies the pigment particle surface include the polymers described in Patent Document 3 and the like, and various commercially available polymers or oligomers for dispersing pigments.

JP-A-8-259876

Moreover, in this invention, a coloring agent can be used with a dispersing agent depending on necessity. Examples of the dispersant include cationic, anionic, nonionic, amphoteric, silicone, and fluorine surfactants.
Examples of the surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, and polyoxyethylene oleyl ether; polyoxyethylene n-octylphenyl ether, polyoxyethylene n-nonyl Polyoxyethylene alkyl phenyl ethers such as phenyl ether; Polyethylene glycol diesters such as polyethylene glycol dilaurate and polyethylene glycol distearate; Sorbitan fatty acid esters; Fatty acid-modified polyesters; Tertiary amine-modified polyurethanes; Polyethyleneimines In addition, the following trade names are KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and F-Top (manufactured by Tochem Products). MegaFuck (Dainippon Ink & Chemicals), Florard (Sumitomo 3M), Asahi Guard, Surflon (Asahi Glass), BYK, Disperbyk (Bicchemy Japan) Product), Solsperse (manufactured by Seneca Corporation), and the like.
These surfactants can be used alone or in admixture of two or more.
The usage-amount of surfactant is 50 parts weight or less normally with respect to 100 weight part of coloring agents, Preferably it is 0-30 weight part.

  In the present invention, the radiation-sensitive resin composition can be prepared by an appropriate method. When a pigment is used as a colorant, the pigment is used in a solvent in the presence of a dispersant, such as a bead mill or a roll mill. And mixing and dispersing while pulverizing to obtain a pigment dispersion, which may be (B) component, (C) component and (D) component described later, and additional solvent or other components described later if necessary. It is preferable to prepare by adding an additive and mixing.

As a dispersant used for the preparation of the pigment dispersion, for example, an appropriate dispersant such as a cationic, anionic, nonionic or amphoteric can be used, but a compound having a urethane bond (hereinafter, “ Dispersants containing "urethane-based dispersants") are preferred.
The urethane bond generally has the formula R—NH—COO—R ′ (where R and R ′ are aliphatic, alicyclic or aromatic monovalent or polyvalent organic groups, The group is further bonded to a group having another urethane bond or another group, and can be present in a lipophilic group and / or a hydrophilic group in the urethane-based dispersant. It can be present in the main chain and / or side chain of the dispersant, and more than one can be present in the urethane-based dispersant. When two or more urethane bonds are present in the urethane-based dispersant, each urethane bond may be the same or different.

Examples of such urethane dispersants include reaction products of diisocyanates and / or triisocyanates with polyesters having a hydroxyl group at one end and / or polyesters having a hydroxyl group at both ends. be able to.
Examples of the diisocyanates include benzene diisocyanates such as benzene-1,3-diisocyanate and benzene-1,4-diisocyanate; toluene-2,4-diisocyanate, toluene-2 , 5-diisocyanate, toluene-2,6-diisocyanate, toluene diisocyanates such as toluene-3,5-diisocyanate; 1,2-xylene-3,5-diisocyanate, 1, 2-xylene-3,6-diisocyanate, 1,3-xylene-2,4-diisocyanate, 1,3-xylene-2,5-diisocyanate, 1,3-xylene-4,6- Other aromatics such as xylene diisocyanates such as diisocyanate, 1,4-xylene-2,5-diisocyanate, 1,4-xylene-2,6-diisocyanate Mention may be made of an isocyanate, and the like.

Examples of the triisocyanates include benzenes such as benzene-1,2,4-triisocyanate, benzene-1,2,5-triisocyanate, and benzene-1,3,5-triisocyanate. Triisocyanates; toluene-2,3,5-triisocyanate, toluene-2,3,6-triisocyanate, toluene-2,4,5-triisocyanate, toluene-2,4,6-tri Toluene isocyanates such as isocyanate; 1,2-xylene-3,4,5-triisocyanate, 1,2-xylene-3,4,6-triisocyanate, 1,3-xylene-2, 4,5-triisocyanate, 1,3-xylene-2,4,6-triisocyanate, 1,3-xylene-4,5,6-triisocyanate, 1,4-chi And other aromatic triisocyanates such as xylene triisocyanates such as len-2,3,5-triisocyanate and 1,4-xylene-2,3,6-triisocyanate. .
These diisocyanates and triisocyanates can be used alone or in admixture of two or more.

Examples of the polyester having a hydroxyl group at one end and the polyester having a hydroxyl group at both ends include polycaprolactone having a hydroxyl group at one end or both ends, polyvalerolactone having a hydroxyl group at one end or both ends, and one end Or a polylactone having a hydroxyl group at one or both ends, such as polypropiolactone having a hydroxyl group at both ends; polyethylene terephthalate having a hydroxyl group at one or both ends, polybutylene terephthalate having a hydroxyl group at one or both ends, etc. Examples thereof include polycondensed polyesters having a hydroxyl group at one or both ends.
These polyesters having a hydroxyl group at one end and polyesters having a hydroxyl group at both ends can be used alone or in admixture of two or more.

The urethane-based dispersant in the present invention is preferably a reaction product of an aromatic diisocyanate and a polylactone having a hydroxyl group at one end and / or a polylactone having a hydroxyl group at both ends, particularly toluene diisocyanate. A reaction product of a polycaprolactone having a hydroxyl group at one end and / or a polycaprolactone having a hydroxyl group at both ends is preferred.
Specific examples of such urethane-based dispersants are trade names such as Disperbyk161 and Disperbyk170 (manufactured by Big Chemy (BYK)), EFKA (manufactured by EFKA Chemicals Beebuy (EFKA)), and Disparon (Enomoto). Series products such as Kasei Co., Ltd.) can be mentioned.
The Mw of the urethane-based dispersant in the present invention is usually 5,000 to 50,000, preferably 7,000 to 20,000.
The said urethane type dispersing agent can be used individually or in mixture of 2 or more types.

A (meth) acrylic dispersant composed of a (co) polymer of (meth) acrylic monomers is also preferred as the dispersant.
Specific examples of such (meth) acrylic dispersants include Disperbyk2000 and Disperbyk2001 (above, manufactured by BYK Chemy (BYK)) as trade names.
The said (meth) acrylic-type dispersing agent can be used individually or in mixture of 2 or more types.

The amount of the dispersant used in preparing the pigment dispersion is usually 100 parts by weight or less, preferably 0.5 to 100 parts by weight, more preferably 1 to 70 parts by weight, particularly 100 parts by weight of the pigment. The amount is preferably 10 to 50 parts by weight. In this case, if the amount of the dispersant used exceeds 100 parts by weight, developability and the like may be impaired.
Moreover, as a solvent used when preparing a pigment dispersion liquid, the thing similar to the solvent illustrated about the liquid composition of the radiation sensitive resin composition mentioned later can be mentioned, for example.
The amount of the solvent used in preparing the pigment dispersion is usually 200 to 1,200 parts by weight, preferably 300 to 1,000 parts by weight with respect to 100 parts by weight of the pigment.

When preparing a pigment dispersion using a bead mill, for example, glass beads or titania beads having a diameter of about 0.5 to 10 mm are used, and a pigment mixture composed of a pigment, a solvent and a dispersant is used. Preferably, it can be carried out by mixing and dispersing while cooling with cooling water or the like.
In this case, the filling rate of the beads is usually 50 to 80% of the mill capacity, and the injection amount of the pigment mixture is usually about 20 to 50% of the mill capacity. The treatment time is usually 2 to 50 hours, preferably 2 to 25 hours.
Moreover, when preparing using a roll mill, it can carry out by processing, for example, using a 3 roll mill, a 2 roll mill, etc., preferably cooling a pigment liquid mixture with cooling water etc.
In this case, the roll interval is preferably 10 μm or less, and the shearing force is usually about 10 8 dyn / sec. The treatment time is usually 2 to 50 hours, preferably 2 to 25 hours.

-(B) Alkali-soluble resin-
The alkali-soluble resin in the present invention has an Mw / Mn (where Mw and Mn are polystyrene-converted weight average molecular weight and polystyrene-converted number average molecular weight measured by gel permeation chromatography (GPC)) of 1.0 to 2. (B1) at least one selected from the group of unsaturated carboxylic acids or acid anhydrides and unsaturated phenol compounds (hereinafter collectively referred to as “unsaturated compounds (b1)”); b2) unsaturated compounds having an oxetane skeleton (hereinafter collectively referred to as “oxetane unsaturated compounds (b2)”) and (b3) other unsaturated compounds copolymerizable with these (hereinafter referred to as “unsaturated compounds”). Copolymer (hereinafter referred to as “resin (B)”) with (A) the coloring agent. Act as loaders, and a component having a solubility in an alkali developing solution used in the developing process for forming the colored layer.

Examples of the unsaturated carboxylic acid or acid anhydride thereof include:
Unsaturated monocarboxylic acids such as (meth) acrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid;
Unsaturated dicarboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid or the like;
A trivalent or higher unsaturated polycarboxylic acid or anhydride thereof;
Mono [(meth) acryloyloxyalkyl] of divalent or higher polyvalent carboxylic acids such as succinic acid mono [2- (meth) acryloyloxyethyl] and phthalic acid mono [2- (meth) acryloyloxyethyl] Esters;
Examples thereof include mono (meth) acrylates of polymers having a carboxyl group and a hydroxyl group at both ends, such as ω-carboxypolycaprolactone mono (meth) acrylate.
Examples of the unsaturated phenol compound include:
o-vinylphenol, m-vinylphenol, p-vinylphenol, 2-methyl-4-vinylphenol, 3-methyl-4-vinylphenol, o-isopropenylphenol, m-isopropenylphenol, p-isopropenylphenol Unsaturated phenols such as
2-vinyl-1-naphthol, 3-vinyl-1-naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthol, 2-isopropenyl-1-naphthol, 3-isopropenyl-1-naphthol, etc. Of unsaturated naphthols.

Of these unsaturated compounds (b1), (meth) acrylic acid, succinic acid mono [2- (meth) acryloyloxyethyl], ω-carboxypolycaprolactone mono (meth) acrylate, and the like are preferable. ) Acrylic acid is preferred.
The unsaturated compound (b1) can be used alone or in admixture of two or more.

Next, in the copolymer, the oxetane unsaturated compound (b2) is preferably a compound represented by the following general formula (1) (hereinafter referred to as “oxetane unsaturated compound (1)”). ), A compound represented by the following general formula (2) (hereinafter referred to as “oxetane unsaturated compound (2)”), and the like.

[In the general formula (1), R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms independently of one another, R ¹ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms independently of one another, R ² , R ³ , R ⁴ and R ⁵ each independently represent a hydrogen atom, a fluorine atom, an alkyl group having 1 to 4 carbon atoms, a fluoroalkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 20 carbon atoms. , N is an integer of 0-6. ]

In [Formula ^{(2), R, R 1} , R 2, R 3, R 4, R 5 and n are each in the general formula ^{(1) R, R 1,} R 2, R 3, R 4, R Synonymous with ⁵ and n. ]

In General Formula (1) and General Formula (2), examples of the alkyl group having 1 to 4 carbon atoms of R, R ¹ , R ² , R ³ , R ⁴ and R ⁵ include, for example, a methyl group, an ethyl group, n- A propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group and the like can be mentioned.
Examples of the fluoroalkyl group having 1 to 4 carbon atoms of R ² , R ³ , R ⁴ and R ⁵ include a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a 1-fluoroethyl group, and 2-fluoro Ethyl group, 1,1-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoro-n-propyl group, heptafluoro-i-propyl group, nonafluoro-n-butyl group, Nonafluoro-i-butyl group, nonafluoro-sec-butyl group, nonafluoro-t-butyl group and the like can be mentioned.
As the R ^2, R ^3, aryl group having 6 to 20 carbon atoms of R ⁴ and R ^5, for example, a phenyl group, o- tolyl group, m- tolyl group, a p- tolyl .

As the oxetane unsaturated compound (1), for example,
3-[(meth) acryloyloxymethyl] oxetane, 3-[(meth) acryloyloxymethyl] -2-methyloxetane, 3-[(meth) acryloyloxymethyl] -3-methyloxetane, 3-[(meth) Acryloyloxymethyl] -2-ethyloxetane, 3-[(meth) acryloyloxymethyl] -3-ethyloxetane, 3-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) [Acryloyloxymethyl] -2-pentafluoroethyloxetane, 3-[(meth) acryloyloxymethyl] -2-phenyloxetane, 3-[(meth) acryloyloxymethyl] -2,2-difluorooxetane, 3-[( (Meth) acryloyloxymethyl] -2,2,4-trifluoro Kisetan, 3 - [(meth) acryloyloxy methyl] -2,2,4,4-tetrafluorooxetane,

3- [2- (meth) acryloyloxyethyl] oxetane, 3- [2- (meth) acryloyloxyethyl] -2-methyloxetane, 3- [2- (meth) acryloyloxyethyl] -3-methyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-ethyloxetane, 3- [2- (meth) acryloyloxyethyl] -3-ethyloxetane, 3- [2- (meth) acryloyloxyethyl] -2 -Trifluoromethyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-pentafluoroethyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-phenyloxetane, 3- [2- ( (Meth) acryloyloxyethyl] -2,2-difluorooxetane, 3- [2- (meth) acryloyl (Meth) acrylic acid esters such as xylethyl] -2,2,4-trifluorooxetane and 3- [2- (meth) acryloyloxyethyl] -2,2,4,4-tetrafluorooxetane Can do.

Moreover, as an oxetane type unsaturated compound (2), for example,
2-[(meth) acryloyloxymethyl] oxetane, 2-[(meth) acryloyloxymethyl] -2-methyloxetane, 2-[(meth) acryloyloxymethyl] -3-methyloxetane, 2-[(meth) Acryloyloxymethyl] -4-methyloxetane, 2-[(meth) acryloyloxymethyl] -2-ethyloxetane, 2-[(meth) acryloyloxymethyl] -3-ethyloxetane, 2-[(meth) acryloyloxy Methyl] -4-ethyloxetane, 2-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 2-[(meth) acryloyloxymethyl] -3-trifluoromethyloxetane, 2-[(meth) [Acryloyloxymethyl] -4-trifluoromethyloxetane, 2 [(Meth) acryloyloxymethyl] -2-pentafluoroethyloxetane, 2-[(meth) acryloyloxymethyl] -3-pentafluoroethyloxetane, 2-[(meth) acryloyloxymethyl] -4-pentafluoroethyl Oxetane,

2-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[(meth) acryloyloxymethyl] -3-phenyloxetane, 2-[(meth) acryloyloxymethyl] -4-phenyloxetane, 2- [(Meth) acryloyloxymethyl] -2,3-difluorooxetane, 2-[(meth) acryloyloxymethyl] -2,4-difluorooxetane, 2-[(meth) acryloyloxymethyl] -3,3-difluoro Oxetane, 2-[(meth) acryloyloxymethyl] -3,4-difluorooxetane, 2-[(meth) acryloyloxymethyl] -4,4-difluorooxetane, 2-[(meth) acryloyloxymethyl] -3 , 3,4-trifluorooxetane, 2-[(meth) acryloyloxy Methyl] 3,4,4-trifluoro oxetane, 2 - [(meth) acryloyloxy methyl] 3,3,4,4 tetrafluorooxetane

2- [2- (meth) acryloyloxyethyl] oxetane, 2- [2- (meth) acryloyloxyethyl] -2-methyloxetane, 2- [2- (meth) acryloyloxyethyl] -3-methyloxetane, 2- [2- (meth) acryloyloxyethyl] -4-methyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-ethyloxetane, 2- [2- (meth) acryloyloxyethyl] -3 -Ethyloxetane, 2- [2- (meth) acryloyloxyethyl] -4-ethyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-trifluoromethyloxetane, 2- [2- (meth) [Acryloyloxyethyl] -3-trifluoromethyloxetane, 2- [2- (meth) acryloyloxyethyl] -4-trifluoromethyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-pentafluoroethyloxetane, 2- [2- (meth) acryloyloxyethyl] -3-pentafluoroethyloxetane, 2 -[2- (meth) acryloyloxyethyl] -4-pentafluoroethyloxetane,

2- [2- (meth) acryloyloxyethyl] -2-phenyloxetane, 2- [2- (meth) acryloyloxyethyl] -3-phenyloxetane, 2- [2- (meth) acryloyloxyethyl] -4 -Phenyloxetane, 2- [2- (meth) acryloyloxyethyl] -2,3-difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -2,4-difluorooxetane, 2- [2- ( (Meth) acryloyloxyethyl] -3,3-difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,4-difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -4,4 -Difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,3,4-trifluorooxe 2- [2- (meth) acryloyloxyethyl] -3,4,4-trifluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,3,4,4-tetrafluorooxetane, etc. (Meth) acrylic acid esters and the like.

  Of these oxetane unsaturated compounds (1) and oxetane unsaturated compounds (2), 3-[(meth) acryloyloxymethyl] oxetane, 3-[(meth) acryloyloxymethyl] -3-ethyl Oxetane, 3-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[(meth) acryloyloxymethyl] oxetane , 2-[(meth) acryloyloxymethyl] -4-trifluoromethyloxetane and the like are preferable, and in particular, 3- (methacryloyloxymethyl) oxetane, 3- (methacryloyloxymethyl) -3-ethyloxetane, 3- ( Methacryloyloxymethyl) -2-trifluoromethyloxetane, 3- (methacryloyl) Oxymethyl) -2-phenyloxetane, 2- (methacryloyloxymethyl) oxetane, 2- (methacryloyloxymethyl) -4-trifluoromethyloxetane, etc. have a wide development margin of the resulting radiation-sensitive composition and are obtained. It is preferable from the viewpoint of improving the chemical resistance of the colored layer.

In the present invention, as the oxetane unsaturated compound, in addition to the oxetane unsaturated compound (1) and the oxetane unsaturated compound (2), for example,
(3-oxetanylmethoxy) -p-vinylbenzene, [2- (3-oxetanyl) ethoxy] -p-vinylbenzene, (2-oxetanylmethoxy) -p-vinylbenzene, [2- (2-oxetanyl) ethoxy] -(Oxetanylalkyl) ethers of vinylphenols such as p-vinylbenzene;
(Oxetanylalkyl) vinyl ethers such as (3-oxetanylmethyl) vinyl ether, [2- (3-oxetanyl) ethyl] vinyl ether, (2-oxetanylmethyl) vinyl ether, and [2- (2-oxetanyl) ethyl] vinyl ether are used. You can also
The oxetane-based unsaturated compounds can be used alone or in admixture of two or more.

Next, as the unsaturated compound (b3), for example,
Styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl ether, m -Aromatic vinyl compounds such as vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether;
Indenes such as indene and 1-methylindene;

N-phenylmaleimide, N-o-methylphenylmaleimide, Nm-methylphenylmaleimide, Np-methylphenylmaleimide, N-o-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, Np-methoxy N- (substituted) arylmaleimide such as phenylmaleimide and N-substituted maleimides such as N-cyclohexylmaleimide;
A macromonomer having a (meth) acryloyl group at one end of a polymer molecular chain such as polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, polysiloxane or the like (hereinafter simply referred to as “macromonomer”). Class:

Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, sec-butyl (meth) Acrylate, t-butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (Meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, 2-methoxyethyl (meth) acrylate Rate, 2-phenoxyethyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxypropylene glycol (meth) acrylate, methoxydipropylene glycol (meth) acrylate, isobornyl (Meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decan-8-yl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, glycerol (meth) acrylate, tetrahydrofurfuryl Unsaturated carboxylic esters such as (meth) acrylates;

2-aminoethyl (meth) acrylate, 2-dimethylaminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate, 2-dimethylaminopropyl acrylate, 3-aminopropyl (meth) acrylate, 3-dimethylaminopropyl ( Unsaturated carboxylic acid aminoalkyl esters such as (meth) acrylate;
Unsaturated carboxylic acid glycidyl esters such as glycidyl (meth) acrylate;
Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate;
Other unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether;
Vinyl cyanide compounds such as (meth) acrylonitrile, α-chloroacrylonitrile, vinylidene cyanide;
Unsaturated amides such as (meth) acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth) acrylamide;
Aliphatic conjugated dienes such as 1,3-butadiene, isoprene, chloroprene, isoprenesulfonic acid and the like can be mentioned.

Among these unsaturated compounds (b3), styrene, macromonomers, N-substituted maleimides, methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate Cyclohexyl (meth) acrylate, phenyl (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decan-8-yl (meth) acrylate, glycerol mono (meth) acrylate, etc. Among the macromonomers, polystyrene macromonomers and polymethyl (meth) acrylate macromonomers are particularly preferable. Among the N-substituted maleimides, N-phenylmaleimide and N-cyclohexylmaleimide are particularly preferable.
The unsaturated compound (b3) can be used alone or in admixture of two or more.

In the present invention, preferable resin (B) includes at least one unsaturated compound (b1) having (meth) acrylic acid as an essential component, 3-[(meth) acryloyloxymethyl] oxetane, 3-[( (Meth) acryloyloxymethyl] -3-ethyloxetane, 3-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[( And at least one oxetane unsaturated compound (b2) selected from the group of (meth) acryloyloxymethyl] oxetane and 2-[(meth) acryloyloxymethyl] -4-trifluoromethyloxetane, In some cases, styrene, N-cyclohexylmaleimide, N-phenylmaleimide Methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5.2 1.0 ^2,6 ] at least one unsaturated compound (b3) selected from the group consisting of decan-8-yl (meth) acrylate, glycerol mono (meth) acrylate, polystyrene macromonomer and polymethylmethacrylate macromonomer. The copolymer to contain can be mentioned.

In the present invention, as a particularly preferred resin (B),
At least one unsaturated compound (b1) containing (meth) acrylic acid as an essential component, 3-[(meth) acryloyloxymethyl] oxetane, 3-[(meth) acryloyloxymethyl] -3-ethyloxetane, 3-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[(meth) acryloyloxymethyl] oxetane and 2-[( At least one oxetane unsaturated compound (b2) selected from the group of (meth) acryloyloxymethyl] -4-trifluoromethyloxetane, and tricyclo [5.2.1.0 ^2,6 ] decan-8-yl. Copolymer containing at least one unsaturated compound (b3) having (meth) acrylate as an essential component It can be mentioned.

In the copolymer (B), the copolymerization ratio of the unsaturated compound (b1) is preferably 1 to 40% by weight, particularly preferably 5 to 30% by weight, and the copolymerization of the oxetane-based unsaturated compound (b2). The proportion is preferably 1 to 60% by weight, particularly preferably 10 to 45% by weight, and the copolymerization proportion of the unsaturated compound (b3) is preferably 0 to 80% by weight, particularly preferably 25 to 70% by weight. It is.
In the present invention, by setting the copolymerization ratio of each unsaturated compound in the copolymer (B) to the above range, the storage stability as the alkali-soluble resin itself is excellent, and the sensitivity and solvent resistance are high even at a high pigment concentration. In addition to the property, the substrate adhesion, etc., a radiation-sensitive composition having excellent storage stability as a pigment dispersion and a liquid composition can be obtained.

  In the present invention, the resin (B) can be preferably produced by living radical polymerization of an unsaturated compound (b1) or the like in a solvent in the presence of a radical polymerization initiator system that generates a living radical.

  In living radical polymerization, when a compound having a functional group that may deactivate an active radical such as a carboxyl group is used as a polymerizable unsaturated compound, polymerization is performed as necessary to prevent the growth terminal from being deactivated. Resin (B) can also be obtained by deprotecting the functional group in the unsaturated compound after protecting and polymerizing the functional group by, for example, esterification.

  Various radical polymerization initiator systems for living radical polymerization of polymerizable unsaturated compounds have been proposed. For example, a TEMPO system proposed by Georges et al. (See, for example, Non-Patent Document 1), and proposed by Matyjazewski et al. A system composed of a combination of copper bromide and a bromine-containing ester compound (for example, see Non-Patent Document 2), a system composed of a combination of carbon tetrachloride and a ruthenium (II) complex proposed by Hamasaki et al. Non-Patent Document 3), or a system comprising a combination of a thiocarbonyl compound having a chain transfer constant greater than 0.1 and a radical initiator, as disclosed in Patent Document 5, Patent Document 6 and Patent Document 7. Etc.

M.K.Georges, R.P.N.Veregin, P.M.Kazmaier, G.K.Hamer, Macromolecules, 1993, Vol.26, p.2987 Matyjaszewski, K. Coca, S. Gaynor, G. wei, M. Woodworth, B.E. Macromolecules, 1997, Vol. 30, p. 7348 Hamasaki, S.Kamigaito, M.Sawamoto, M. Macromolecules, 2002, Vol.35, p.2934 Japanese Patent No. 3639859 (Japanese Patent Publication No. 2000-515181) Special Table 2002-2002 JP-T-2004-518773

As a suitable radical polymerization initiator system used for living radical polymerization, a system in which the active radical at the growth end is not deactivated is appropriately selected depending on the type of the polymerizable unsaturated compound used. In consideration of efficiency, metal-free system, and the like, a combination of a thiocarbonylthio compound that is a molecular weight control agent and a radical initiator is preferable.
The combination of the thiocarbonylthio compound and the radical initiator is described in detail in Patent Literature 5, Patent Literature 6, and Patent Literature 7 as well as the following patent literature.

Special table 2002-508409 gazette Japanese translation of PCT publication No. 2002-512653 Special table 2003-527458 gazette Patent 3634843 (Japanese Patent Publication No. 2003-536105) JP-T-2005-503452

  As described in Patent Documents 5 to 8, a random copolymer or block having a narrow molecular weight distribution is obtained by living radical polymerization of a polymerizable unsaturated compound in the presence of a thiocarbonylthio compound and a radical initiator. A copolymer can be obtained. Moreover, since a functional group can be introduced into the obtained random copolymer and block copolymer, the copolymer is converted into an aqueous gel (see Patent Document 9), a photoresist (see Patent Document 10), a surface activity. It has been clarified that it can also be used for applications such as an agent (see Patent Document 11).

  In the present invention, preferred resin (B) is a group represented by the following formula (i) (hereinafter referred to as “terminal group (i)”) or at least one terminal of each polymer chain constituting the resin (B). A resin having a group represented by the formula (ii) (hereinafter referred to as “terminal group (ii)”) (hereinafter referred to as “resin (B1)”) can be given.

[In Formula (i), Z ¹ is different from a hydrogen atom, a chlorine atom, a carboxyl group, a cyano group, an alkyl group having 1 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, or a carbon atom. A monovalent heterocyclic group having 3 to 20 atoms in total with the term atom, -OR, -SR, -N (R) ₂ ,
-OC (= O) R, -C (= O) OR, -C (= O) N (R) ₂ , -P (= O) (OR) ₂ , -P (= O) (R) _2, or 1 represents a monovalent group having a polymer chain, and each R independently represents an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, or a monovalent aromatic hydrocarbon having 6 to 18 carbon atoms. A monovalent heterocyclic group having 3 to 18 total atoms of a group or a carbon atom and a hetero atom, the above-mentioned alkyl group having 1 to 20 carbon atoms, and a monovalent aromatic hydrocarbon having 6 to 20 carbon atoms The group, the monovalent heterocyclic group having 3 to 20 atoms in total, and R may each be substituted. ]

[In the formula (ii), Z ² represents an m-valent group derived from an alkane having 1 to 20 carbon atoms, an m-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a carbon atom and a hetero atom. A m-valent group derived from a heterocyclic compound having a total of 3 to 20 atoms or an m-valent group having a polymer chain, an m-valent group derived from the alkane having 1 to 20 carbon atoms, the number of carbon atoms The m-valent group derived from 6 to 20 aromatic hydrocarbons and the m-valent group derived from the heterocyclic compound having 3 to 20 atoms in total may be substituted, and m is an integer of 2 or more. is there. ]

When the resin (B) has only one polymer chain, the terminal group (i) is usually bonded to one terminal of the polymer chain, but the terminal group is bonded to the other terminal. (I) A terminal group (ii) or a chain terminating group may be attached. This “chain terminating group” is a group determined by the reaction conditions during living radical polymerization. When the terminal group (ii) is bonded to the polymer chain, it is bonded to the polymer chain in the terminal group (ii). (M-1) bonds (S-) which are not bonded to the chain terminating group. The chain terminating group can also be R ¹ to R ² .
In addition, when there are two or more polymer chains constituting it, each polymer chain is usually bonded to the terminal group (ii) at one end thereof, and the resin (B) has a branched structure. The terminal group (i), the terminal group (ii) or the chain terminating group may be bonded to the other terminal of each polymer chain. And when the said terminal group (ii) couple | bonds with the other terminal of a polymer chain, (m-1) bond (S-) which is not couple | bonded with the polymer chain in this terminal group (ii). ) May be further bonded to a terminal group (i), a terminal group (ii) or a chain terminating group. The chain terminating group can also be R ¹ to R ² .

In the formula (i), an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, and a substituted ^one of Z ¹ may be substituted. Preferred examples of the monovalent heterocyclic group having 3 to 20 total atoms of carbon atoms and hetero atoms, R which may be substituted, and a monovalent group having a polymer chain are also preferred. In addition, for example, the same groups as those corresponding to Z ¹ in formula (1) described later can be exemplified.

In the formula (ii), m 2 derived from an alkane having 1 to 20 carbon atoms which may be substituted in Z ² , m derived from an aromatic hydrocarbon having 6 to 20 carbon atoms which may be substituted. As a valent group, an m-valent group derived from a heterocyclic compound having 3 to 20 total atoms of carbon atoms and hetero atoms, which may be substituted, and an m-valent group having a polymer chain, Including those preferred ones, for example, the same groups as those corresponding to each of Z ² in formula (2) described later can be exemplified.

  The resin (B) can be produced, for example, through a step of living radical polymerization of a polymerizable unsaturated compound using a thiocarbonylthio compound represented by the following formula (3) or formula (4) as a molecular weight control agent. In this living radical polymerization, a radical initiator is also usually used.

[In Formula (3), Z ¹ is different from a hydrogen atom, a chlorine atom, a carboxyl group, a cyano group, an alkyl group having 1 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, or a carbon atom. A monovalent heterocyclic group having 3 to 20 atoms in total with the term atom, -OR, -SR, -N (R) ₂ ,
-OC (= O) R, -C (= O) OR, -C (= O) N (R) ₂ , -P (= O) (OR) ₂ , -P (= O) (R) _2, or 1 represents a monovalent group having a polymer chain, and each R is independently an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, or a monovalent aromatic hydrocarbon having 6 to 18 carbon atoms. A monovalent heterocyclic group having 3 to 18 total atoms of a group or a carbon atom and a hetero atom, and the aforementioned alkyl group having 1 to 20 carbon atoms and a monovalent aromatic hydrocarbon having 6 to 20 carbon atoms Group, a monovalent heterocyclic group having 3 to 20 atoms in total and R may each be substituted, p is an integer of 1 or more, and R ⁶ is 1 to 1 carbon atoms when p = 1. 20 alkyl groups, monovalent alicyclic hydrocarbon groups having 3 to 20 carbon atoms, monovalent aromatic hydrocarbon groups having 6 to 20 carbon atoms, and 3 to 20 total atoms of carbon atoms and hetero atoms 1 of Heterocyclic group, -OR, -SR, represent a monovalent group having a -N (R) ₂ or a polymer chain, each R is an alkyl group having 1 to 18 carbon atoms independently of one another, carbon atoms 2 -18 alkenyl group, monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, or monovalent heterocyclic group having 3 to 18 total atoms of carbon atoms and hetero atoms, p = 2 A single bond, a divalent group derived from an alkane having 1 to 20 carbon atoms, a divalent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a total number of atoms of carbon atoms and hetero atoms of 3 A divalent group derived from a heterocyclic compound having ˜20 or a divalent group having a polymer chain, and when p ≧ 3, a p-valent group derived from an alkane having 1 to 20 carbon atoms, the number of carbons P-valent group derived from 6-20 aromatic hydrocarbons, derived from a heterocyclic compound having a total of 3-20 carbon atoms and hetero atoms 1 represents a p-valent group or a p-valent group having a polymer chain, the alkyl group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and 1 having 6 to 20 carbon atoms. Valent aromatic hydrocarbon group, monovalent heterocyclic group having 3 to 20 atoms in total, R, divalent group derived from alkane having 1 to 20 carbon atoms, aromatic hydrocarbon having 6 to 20 carbon atoms A divalent group derived from a divalent group derived from a heterocyclic compound having 3 to 20 atoms in total, a p-valent group derived from an alkane having 1 to 20 carbon atoms, an aromatic having 6 to 20 carbon atoms A p-valent group derived from a hydrocarbon and a p-valent group derived from a heterocyclic compound having 3 to 20 atoms in total may be substituted. ]

[In the formula (4), Z ² represents an m-valent group derived from an alkane having 1 to 20 carbon atoms, an m-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a carbon atom and a hetero atom. A m-valent group derived from a heterocyclic compound having a total of 3 to 20 atoms or an m-valent group having a polymer chain, an m-valent group derived from the alkane having 1 to 20 carbon atoms, the number of carbon atoms The m-valent group derived from 6 to 20 aromatic hydrocarbons and the m-valent group derived from the heterocyclic compound having 3 to 20 atoms in total may be substituted, and R ⁷ may have 1 to 1 carbon atoms. 20 alkyl groups, monovalent alicyclic hydrocarbon groups having 3 to 20 carbon atoms, monovalent aromatic hydrocarbon groups having 6 to 20 carbon atoms, and 3 to 20 total atoms of carbon atoms and hetero atoms A monovalent heterocyclic group, —OR, —SR, —N (R) ₂ or a monovalent group having a polymer chain, wherein each R is Independently an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, or a total of 3 to 18 atoms of carbon atoms and hetero atoms 1 represents a monovalent heterocyclic group, the alkyl group having 1 to 20 carbon atoms, the monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms. , A monovalent heterocyclic group having 3 to 20 atoms in total and R may each be substituted, and m is an integer of 2 or more. ]

In formula (3), examples of the alkyl group having 1 to 20 carbon atoms of Z ¹ include a methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, sec- Butyl group, t-butyl group, n-pentyl group, 1,1-dimethylpropyl group, neopentyl group, n-hexyl group, n-heptyl group, n-octyl group, 1,1-dimethyl-3,3-dimethyl A butyl group, n-nonyl group, n-decyl group, n-dodecyl group, n-tetradecyl group, n-hexadecyl group, n-octadecyl group, n-eicosyl group, etc. can be mentioned.
Examples of the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms of Z ¹ include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthracenyl group, a 9-anthracenyl group, a benzyl group, An α-methylbenzyl group, an α, α-dimethylbenzyl group, a phenethyl group, and the like can be given.

Examples of the monovalent heterocyclic group having 3 to 20 total atoms of carbon atoms and hetero atoms of Z ¹ include oxiranyl group, aziridinyl group, 2-furanyl group, 3-furanyl group, 2- Tetrahydrofuranyl group, 3-tetrahydrofuranyl group, 1-pyrrole group, 2-pyrrole group, 3-pyrrole group, 1-pyrrolidinyl group, 2-pyrrolidinyl group, 3-pyrrolidinyl group, 1-pyrazole group, 2-pyrazole group, 3-pyrazole group, 2-tetrahydropyranyl group, 3-tetrahydropyranyl group, 4-tetrahydropyranyl group, 2-thianyl group, 3-thianyl group, 4-thianyl group, 2-pyridinyl group, 3-pyridinyl group 4-pyridinyl group, 2-piperidinyl group, 3-piperidinyl group, 4-piperidinyl group, 2-morpholinyl group, 3-morpholinyl group, etc. Can.

Z ¹ —OR, —SR, —N (R) ₂ , —OC (═O) R, —C (═O) OR,
An alkyl group having 1 to 18 carbon atoms of R in —C (═O) N (R) ₂ , —P (═O) (OR) ₂ and —P (═O) (R) ₂ ; As the monovalent aromatic hydrocarbon group or the monovalent heterocyclic group having 3 to 18 total atoms of carbon atoms and hetero atoms, for example, an alkyl group having 1 to 20 carbon atoms exemplified for Z ¹ Among monovalent aromatic hydrocarbon groups having 6 to 20 carbon atoms or monovalent heterocyclic groups having 3 to 20 total atoms of carbon atoms and hetero atoms, the number of carbon atoms or the total number of atoms is 18 or less. Can be mentioned.

  Examples of the alkenyl group having 2 to 18 carbon atoms of the same R include, for example, a vinyl group, 1-propenyl group, 2-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, and 1-pentenyl group. 2-pentenyl group, 3-pentenyl group, 4-pentenyl group, 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group and the like.

For the alkyl group having 1 to 20 carbon atoms, the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, the monovalent heterocyclic group having 3 to 20 total atoms of carbon atoms and hetero atoms, and R Examples of the substituent include, for example, hydroxyl group, carboxyl group, carboxylate group, sulfonate group, sulfonate group, isocyanate group, cyano group, vinyl group, epoxy group, silyl group, halogen atom, and Z ¹ . -OR, -SR, -N (R) ₂ , -OC (= O) R,
-C (= O) OR, -C (= O) N (R) ₂ , -P (= O) (OR) ₂ or -P (= O) (R) _2, or carbon number exemplified for R 1 -18 alkyl group, alkenyl group having 2 to 18 carbon atoms, monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, or monovalent heterocyclic ring having 3 to 18 total atoms of carbon atoms and hetero atoms A group similar to the formula group can be selected as appropriate, and one or more of these substituents can be present in the substituted derivative. However, it is preferable that the total number of carbon atoms or the total number of atoms in the substituted derivative does not exceed 20.

Examples of the monovalent group having a polymer chain of Z ¹ include α-olefins such as ethylene and propylene; aromatic vinyl compounds such as styrene and α-methylstyrene; vinyl fluoride, vinyl chloride, and chloride. Vinyl halides such as vinylidene; unsaturated alcohols such as vinyl alcohol and allyl alcohol; esters of unsaturated alcohols such as vinyl acetate and allyl acetate; unsaturated carboxylic acids such as (meth) acrylic acid and p-vinylbenzoic acid Acids; methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate, n-butyl (meth) acrylate, t- (meth) acrylic acid (Meth) acrylic acid esters such as butyl, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate; (Meth) acrylamides such as Acrylamide and N, N-dimethyl (meth) acramide; Unsaturated nitriles such as (meth) acrylonitrile and vinylidene cyanide; One kind of unsaturated compounds such as conjugated dienes such as butadiene and isoprene In addition to the monovalent group having an addition polymerization polymer chain formed as described above, a polyoxyethylene whose terminal may be etherified, a polyether such as polyoxypropylene whose terminal may be etherified, And monovalent groups having a polyaddition polymer chain such as polyester, polyamide, or polyimide, or a polycondensation polymer chain. In the monovalent group having these polymer chains, even when the polymer chain is directly bonded to the carbon atom of the thiocarbonyl group in the formula (3), for example, —CH ₂ —COO—, —C (CH ₃₎ (CN) may be through a linking hand CH ₂ CH ₂ -COO-, etc. attached to the carbon atom of the thiocarbonyl group in the formula (3).
In the formula (3), a plurality of Z ¹ may be the same or different from each other.

In Formula (3), when p = 1, R ⁶ is an alkyl group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a monovalent group having 6 to 20 carbon atoms. A monovalent heterocyclic group, a monovalent heterocyclic group having 3 to 20 total atoms of carbon atoms and hetero atoms, -OR, -SR, -N (R) ₂ or a monovalent polymer chain A group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, and a carbon atom different from the above. The monovalent heterocyclic group having 3 to 20 atoms in total and R may each be substituted.

The alkyl group having 1 to 20 carbon atoms, the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, the monovalent heterocyclic group having 3 to 20 atoms in total, -OR, -SR, -N (R As the monovalent group having ₂ or a substituted derivative or polymer chain thereof, for example, the same groups as those exemplified for the respective groups corresponding to Z ¹ can be mentioned. In the case of a monovalent group having a polymer chain of R ⁶ (p = 1), even when the polymer chain is directly bonded to the sulfur atom in the formula (6), for example, —CH ₂ —COO— , —C (CH ₃ ) (CN) CH ₂ CH ₂ —COO—, etc.

Moreover, as said C3-C20 monovalent alicyclic hydrocarbon group, a cyclopentyl group, a cyclohexyl group, a cyclopentenyl group, a cyclohexenyl group etc. can be mentioned, for example.
Examples of the substituent for the monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms include, for example, an alkyl group having 1 to 20 carbon atoms in Z ^{1 and} a monovalent aromatic hydrocarbon having 6 to 20 carbon atoms. Group, a monovalent heterocyclic group having 3 to 20 total atoms of carbon atom and hetero atom, and a group similar to those exemplified for the substituent for R can be appropriately selected from these substituents. May be present in the substituted derivative in one or more or one or more. However, it is preferable that the total number of carbon atoms or the total number of atoms in the substituted derivative does not exceed 20.

When p = 2, R ⁶ is a single bond, a divalent group derived from an alkane having 1 to 20 carbon atoms, a divalent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, or a carbon atom. A divalent group derived from a heterocyclic compound having a total number of atoms of 3 to 20 and a divalent group having a polymer chain, and a divalent group derived from the alkane having 1 to 20 carbon atoms , A divalent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms and a divalent group derived from a heterocyclic compound having 3 to 20 atoms in total may be substituted.

In addition, when p ≧ 3, R ⁶ is a p-valent group derived from an alkane having 1 to 20 carbon atoms, a p-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, or a carbon atom that is different from that of carbon atoms. A p-valent group derived from a heterocyclic compound having 3 to 20 atoms in total or a p-valent group having a polymer chain, and derived from a p-valent group derived from the alkane or an aromatic hydrocarbon The p-valent group and the p-valent group derived from the heterocyclic compound having 3 to 20 atoms in total may be substituted.

  Examples of the alkane having 1 to 20 carbon atoms include methane, ethane, propane, n-butane, i-butane, n-pentane, i-pentane, neopentane, n-hexane, n-heptane, n-octane, and n. -Nonane, n-decane, n-dodecane, n-tetradecane, n-hexadecane, n-octadecane, n-eicosane and the like can be mentioned.

  Examples of the aromatic hydrocarbon having 6 to 20 carbon atoms include benzene and 1,4-dimethylbenzene (for example, a carbon atom of each methyl group at the 1,4-position is a sulfur atom in the formula (3)). ), 1,2,4,5-tetramethylbenzene (for example, the carbon atom of each methyl group at the 1,2,4,5-position binds to the sulfur atom in formula (3).) 1,2,3,4,5,6-hexamethylbenzene (for example, the carbon atom of each methyl group at the 1,2,3,4,5,6-position binds to the sulfur atom in formula (3)) ), 1,4-di-i-propylbenzene (for example, the carbon atom at the 2-position of each i-propyl group at the 1,4-position is bonded to the sulfur atom in the formula (3)), Examples include naphthalene and anthracene groups.

  Examples of the heterocyclic compound having 3 to 20 atoms in total include oxirane, aziridine, furan, tetrahydrofuran, pyrrole, pyrrolidine, pyrazole, tetrahydropyran, thiane, pyridine, piperidine, and morpholine.

A divalent group derived from the alkane having 1 to 20 carbon atoms, a divalent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, and a divalent group derived from a heterocyclic compound having 3 to 20 atoms in total. A p-valent group derived from an alkane having 1 to 20 carbon atoms, a p-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, and a heterocyclic compound having 3 to 20 atoms in total. Examples of the substituent for the p valent group, for example, an alkyl group having 1 to 20 carbon atoms of the Z ^1, 1 monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, the total atoms of carbon atoms and hetero atoms The monovalent heterocyclic group of 3 to 20 and the same groups as those exemplified for the substituent for R can be selected as appropriate, and these substituents are one or more or one or more in the substituted derivatives. Can exist. However, it is preferable that the total number of carbon atoms or the total number of atoms in the substituted derivative does not exceed 20.

Examples of the polymer chain that gives the divalent group of R ^{6 and} the polymer chain that gives the p-valent group include addition polymerization polymers exemplified for the monovalent group having the Z ¹ polymer chain. Examples thereof include the same chain, polyaddition polymer chain and polycondensation polymer chain. In a divalent group having a polymer chain of R ⁶ and a p-valent group, even when the polymer chain is directly bonded to the sulfur atom in the formula (6), for example, —CH ₂ —COO—, — C (CH ₃₎ (CN) may be through a linking hand CH ₂ CH ₂ -COO-, etc. attached to the sulfur atom in the formula (6).

Next, in the formula (4), examples of the alkane having 1 to 20 carbon atoms that give an m-valent group of Z ² include, for example, 1 to 20 carbon atoms that give a divalent group and a p-valent group of R ⁶ The same compounds as those exemplified for the alkane can be mentioned.
Further, examples of the aromatic hydrocarbon having 6 to 20 carbon atoms that give an m-valent group of Z ² include, for example, an aromatic carbon atom having 6 to 20 carbon atoms that gives a divalent group of R ⁶ and a p-valent group. The thing similar to the compound illustrated about hydrogen can be mentioned.
Further, examples of the heterocyclic compound having 3 to 20 total atoms of carbon atoms and hetero atoms that give the m-valent group of Z ² include the above-mentioned divalent group and p-valent group of R ^6. The thing similar to the compound illustrated about the heterocyclic compound of 3-20 total atoms of a carbon atom and a hetero atom can be mentioned.

Derived from an m-valent group derived from an alkane having 1 to 20 carbon atoms of Z ² , an m-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, and a heterocyclic compound having 3 to 20 atoms in total. Examples of the substituent for the m-valent group include, for example, an alkyl group having 1 to 20 carbon atoms of Z ^1, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, and a total atom of carbon atoms and hetero atoms. The monovalent heterocyclic group of 3 to 20 and the same groups as those exemplified for the substituent for R can be selected as appropriate, and these substituents are one or more or one or more in the substituted derivatives. Can exist. However, it is preferable that the total number of carbon atoms or the total number of atoms in the substituted derivative does not exceed 20.

Examples of the polymer chain that gives an m-valent group of Z ² include, for example, the addition polymerization-type polymer chain, polyaddition-type polymer chain, and heavy chain exemplified for the monovalent group having the Z ¹ polymer chain. The thing similar to a condensation type polymer chain can be mentioned. In the m-valent group having a polymer chain of Z ² , even when the polymer chain is directly bonded to the carbon atom of the thiocarbonyl group in the formula (4), for example,
_{-CH 2 -COO -, - C (} CH 3) (CN) may be through a linking hand CH ₂ CH ₂ -COO-, etc. attached to the carbon atom of the thiocarbonyl group in the formula (7).

In the formula (4), R ⁷ is an alkyl group having 1 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, a monovalent atom having 3 to 20 total atoms of carbon atoms and hetero atoms. As the monovalent group having a heterocyclic group, —OR, —SR, —N (R) ₂ and a polymer chain, or a substituted derivative thereof, for example, groups exemplified for the corresponding groups of Z ¹ The same thing can be mentioned. In the monovalent group having a polymer chain of R ⁷ , even when the polymer chain is directly bonded to the sulfur atom in the formula (4), for example, —CH ₂ —COO—,
-C (CH ₃₎ (CN) may be through a linking hand CH ₂ CH ₂ -COO-, etc. attached to the sulfur atom in the formula (4).

Examples of the monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms of R ⁷ and substituted derivatives thereof include, for example, monovalent fats having 3 to 20 carbon atoms of the above R ⁶ (p = 1). The thing similar to the group illustrated about the cyclic hydrocarbon group and its substituted derivative can be mentioned.
In the formula (4), a plurality of R ⁷ may be the same or different from each other.

In Formula (4), when the connecting part between Z ² and —C (═S) —S—R ⁷ is an aliphatic carbon atom, the aliphatic carbon atom in Z ² is —C (═S ) When bonded to —S—R ⁷ and the linking moiety is an aromatic carbon atom, the aromatic carbon atom in Z ² is bonded to —C (═S) —S—R ^7, and When the moiety is a sulfur atom, the sulfur atom in —SR representing Z ² is bonded to —C (═S) —S—R ⁷ .

  Specific examples of particularly preferred thiocarbonylthio compounds in the present invention include compounds represented by the following formulas (5) to (30).

These thiocarbonylthio compounds can be used alone or in admixture of two or more.
In the present invention, at the time of living radical polymerization, one or more kinds of other molecular weight control agents such as α-methylstyrene dimer and t-dodecyl mercaptan can be used in combination with the thiocarbonylthio compound.

The radical initiator used in the living radical polymerization is not particularly limited, and those generally known as radical polymerization initiators can be used, for example, 2,2′-azobisisobutyrate. Azo compounds such as nitrile, 2,2′-azobis (2,4-dimethylvaleronitrile), 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile); benzoyl peroxide, lauroyl peroxide, 1 , 1'-bis (t-butylperoxy) cyclohexane, organic peroxides such as t-butylperoxypivalate; hydrogen peroxide; redox initiators composed of these peroxides and reducing agents. it can.
These radical initiators can be used alone or in admixture of two or more.

The solvent used in the living radical polymerization is not particularly limited as long as the active radical is not deactivated.
Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and propylene glycol monoethyl ether;
Ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, diethylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, dipropylene glycol ethyl ether acetate, etc. Poly) alkylene glycol alkyl ether acetates;
(Poly) alkylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol methyl ethyl ether, dipropylene glycol diethyl ether;
Other ethers such as tetrahydrofuran;
Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;
Ketoalcohols such as diacetone alcohol (ie 4-hydroxy-4-methylpentan-2-one), 4-hydroxy-4-methylhexan-2-one;

Lactic acid alkyl esters such as methyl lactate and ethyl lactate;
Ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropion Ethyl acetate, ethyl ethoxy acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-acetate Butyl, n-pentyl formate, i-pentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate , Methyl acetoacetate, ethyl acetoacetate, 2-oxobutanoic acid Other esters such as Le;
Aromatic hydrocarbons such as toluene and xylene;
Examples thereof include amides such as N-methylpyrrolidone, N, N-dimethylformamide, and N, N-dimethylacetamide.

Among these solvents, from the viewpoints of solubility of each component when used as a radiation sensitive resin composition, pigment dispersibility, coatability, and the like, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, Propylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, dipropylene glycol dimethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate , Ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, n-butyl acetate, vinegar i- butyl, formic acid n- pentyl acetate, i- pentyl, n- butyl propionate, ethyl butyrate, i- propyl butyrate n- butyl, ethyl pyruvate and the like are preferable.
The said solvent can be used individually or in mixture of 2 or more types.

In the living radical polymerization, the amount of the thiocarbonylthio compound used is usually 0.1 to 50 parts by weight, preferably 0.2 to 16 parts by weight, based on 100 parts by weight of the total polymerizable unsaturated compound. The usage-amount of a polymerization initiator is 0.1-50 weight part normally with respect to 100 weight part of all the polymerizable unsaturated compounds, Preferably it is 0.1-20 weight part.
The polymerization temperature is usually 0 to 150 ° C., preferably 50 to 120 ° C., and the polymerization time is usually 10 minutes to 20 hours, preferably 30 minutes to 6 hours.

In the present invention, the resin (B) is an unsaturated compound (b1), etc., in a suitable solvent, 2,2′-azobisisobutyronitrile, 2,2′-azobis (2,4-dimethylvaleronitrile). , 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile) after polymerization in the presence of a radical polymerization initiator, produced through a reprecipitation method using two or more organic solvents having different polarities You can also That is, after removing insoluble impurities from the solution in a good solvent after polymerization by filtration or centrifugation as necessary, a large amount (usually 5 to 10 times the volume of the polymer solution) of a precipitant (poor) Purification by pouring into the solvent) and reprecipitation of the copolymer. At that time, among the impurities remaining in the polymer solution, impurities soluble in the precipitant remain in the liquid phase and are separated from the purified resin (B) and the like.
Examples of the good solvent / precipitant combination used in this reprecipitation method include diethylene glycol monomethyl ether acetate / n-hexane, methyl ethyl ketone / n-hexane, diethylene glycol monomethyl ether acetate / n-heptane, and methyl ethyl ketone / n-heptane. Can be mentioned.

  Mw of the resin (B) (where Mw is a polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography (GPC)) is 1,000 to 45,000, preferably 3,000 to 20,000, Particularly preferred is 4,000 to 10,000.

The Mw / Mn of the resin (B) (where Mn is the number average molecular weight in terms of polystyrene measured by gel permeation chromatography (GPC)) is usually 1.0 to 2.0, preferably 1.0. To 1.7, particularly preferably 1.0 to 1.4.
By using such an alkali-soluble resin having a predetermined Mw and preferably having the specific Mn and / or Mw / Mn, a radiation-sensitive resin composition having excellent developability can be obtained. This makes it possible to form pixels with sharp pattern edges, and hardly develop residues, background stains, film residues, etc. on the unexposed substrate and the light-shielding layer during development, and has high cleaning performance with organic solvents. Therefore, it is possible to achieve a high product yield without generating dry foreign matters during the production of the color filter, and to effectively prevent “burn-in” of the color filter.
In this invention, resin (B) can be used individually or in mixture of 2 or more types.

  The amount of the resin (B) used in the present invention is usually 10 to 1,000 parts by weight, preferably 20 to 500 parts by weight with respect to 100 parts by weight of the (A) pigment. In this case, if the amount of the resin (B) used is less than 10 parts by weight, for example, alkali developability may be lowered, or background stains or film residues may occur on the unexposed substrate or the light shielding layer. On the other hand, when the amount exceeds 1,000 parts by weight, the pigment concentration is relatively lowered, and it may be difficult to achieve the target color density as a thin film.

-(C) polyfunctional monomer-
The polyfunctional monomer in the present invention is a monomer having two or more polymerizable unsaturated bonds.
As such a polyfunctional monomer, for example,
Di (meth) acrylates of alkylene glycols such as ethylene glycol and propylene glycol;
Di (meth) acrylates of polyalkylene glycols such as polyethylene glycol of diethylene glycol or higher, polypropylene glycol of dipropylene glycol or higher;
Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol, etc. and their dicarboxylic acid-modified products;
Oligo (meth) acrylates such as polyester, epoxy resin, urethane resin, alkyd resin, silicone resin, spirane resin;
Polymer di (meth) acrylates having hydroxyl groups at both ends, such as poly-1,3-butadiene having hydroxyl groups at both ends, polyisoprene having hydroxyl groups at both ends, polycaprolactone having hydroxyl groups at both ends,
And tris [2- (meth) acryloyloxyethyl] phosphate.

  Of these polyfunctional monomers, poly (meth) acrylates of trihydric or higher polyhydric alcohols and their modified dicarboxylic acids are preferable. Specifically, trimethylolpropane tri (meth) acrylate, penta Erythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate and the like are preferable, and in particular, trimethylolpropane triacrylate, pentaerythritol triacrylate and di Pentaerythritol hexaacrylate is preferred because it has high pixel strength, excellent pixel surface smoothness, and is less likely to cause scumming or film residue on the unexposed substrate and the light shielding layer. The said polyfunctional monomer can be used individually or in mixture of 2 or more types.

  The usage-amount of the polyfunctional monomer in this invention is 5-500 weight part normally with respect to 100 weight part of resin (B), Preferably it is 20-300 weight part. In this case, when the amount of the polyfunctional monomer used is less than 5 parts by weight, the strength and surface smoothness of the pixel tend to be reduced. On the other hand, when the amount exceeds 500 parts by weight, for example, alkali developability is reduced. In addition, background stains, film residue, etc. tend to occur on the unexposed portion of the substrate or on the light shielding layer.

In the present invention, a part of the polyfunctional monomer can be replaced with a monofunctional monomer having one polymerizable unsaturated bond.
Examples of the monofunctional monomer include the unsaturated compound (b1) exemplified for the resin (B), N-vinylsuccinimide, N-vinylpyrrolidone, N-vinylphthalimide, N-vinyl- 2-piperidone, N-vinyl-ε-caprolactam, N-vinylpyrrole, N-vinylpyrrolidine, N-vinylimidazole, N-vinylimidazolidine, N-vinylindole, N-vinylindoline, N-vinylbenzimidazole N-vinyl nitrogen-containing heterocyclic compounds such as N-vinyl carbazole, N-vinyl piperidine, N-vinyl piperazine, N-vinyl morpholine, N-vinyl phenoxazine; N- (meth) acryloyl morpholine, commercially available M-5300, M-5400, M-5600 (above, manufactured by Toagosei Co., Ltd.) It can be mentioned.
These monofunctional monomers can be used alone or in admixture of two or more.

  The proportion of the monofunctional monomer used is usually 90% by weight or less, preferably 50% by weight or less, based on the total of the polyfunctional monomer and the monofunctional monomer. In this case, when the use ratio of the monofunctional monomer exceeds 90% by weight, the strength and surface smoothness of the pixel tend to be lowered.

-(D) Radiation sensitive radical generator-
The radiation-sensitive radical generator in the present invention (hereinafter simply referred to as “radical generator”) is the above-mentioned (C) polyfunctional compound by exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam, and X-ray. It is a compound that generates radicals that can initiate the polymerization of the monomer and optionally the monofunctional monomer.
Examples of such radical generators include, for example, acetophenone compounds, biimidazole compounds, triazine compounds, O-acyloxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, α-diketone compounds. Examples thereof include a compound, a polynuclear quinone compound, a xanthone compound, a diazo compound, and an imide sulfonate compound. These compounds are components that generate active radicals or active acids or both active radicals and active acids upon exposure.
In the present invention, the photopolymerization initiator can be used alone or in admixture of two or more. As the photopolymerization initiator in the present invention, an acetophenone compound, a biimidazole compound, a triazine compound, At least one selected from the group of O-acyloxime compounds is preferred.

  In the present invention, the general use amount of the radical generator is usually 0.01 to 120 parts by weight with respect to 100 parts by weight of the total of (C) the polyfunctional monomer and the monofunctional monomer. , Preferably 1 to 100 parts by weight. In this case, when the amount of the photopolymerization initiator used is less than 0.01 part by weight, curing by exposure becomes insufficient, and it may be difficult to obtain a color filter in which the colored layer pattern is arranged according to a predetermined arrangement. On the other hand, if it exceeds 120 parts by weight, the formed colored layer tends to be detached from the substrate during development.

Among preferred radical generators in the present invention, specific examples of acetophenone compounds include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 2-methyl-1- [4- (methylthio) phenyl]. 2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1 , 2-diphenylethane-1-one, 1,2-octanedione, and the like.
Among these acetophenone compounds, in particular, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpho Linophenyl) butan-1-one, 1,2-octanedione and the like are preferred.
The acetophenone compounds can be used alone or in admixture of two or more.

  In the present invention, when the acetophenone-based compound is used as the radical generator, the amount used is generally 0. 0 parts per 100 parts by weight in total of the (C) polyfunctional monomer and the monofunctional monomer. 01 to 80 parts by weight, preferably 1 to 70 parts by weight, and more preferably 1 to 60 parts by weight. In this case, if the amount of the acetophenone compound used is less than 0.01 parts by weight, curing by exposure may be insufficient, and it may be difficult to obtain a color filter in which pixel patterns are arranged according to a predetermined arrangement, If it exceeds 80 parts by weight, the formed pixels tend to fall off the substrate during development.

  Specific examples of the biimidazole compound include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) -1,2′-bi Imidazole, 2,2′-bis (2-bromophenyl) -4,4 ′, 5,5′-tetrakis (4-ethoxycarbonylphenyl) -1,2′-biimidazole, 2,2′-bis (2 -Chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4', 5,5'-tetra Phenyl-1,2′-biimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2, 2'-bis (2-bromophenyl)- , 4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4-dibromophenyl) -4,4 ′, 5,5′-tetraphenyl-1, 2'-biimidazole, 2,2'-bis (2,4,6-tribromophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole and the like can be mentioned. .

  Among these biimidazole compounds, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2 , 4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′-biimidazole, 2,2′-bis (2,4,6-trichlorophenyl) -4,4 ′, 5 , 5′-tetraphenyl-1,2′-biimidazole and the like are preferable, and in particular, 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2 ′. -Biimidazole is preferred.

These biimidazole compounds are excellent in solubility in solvents, do not generate foreign matters such as undissolved substances and precipitates, have high sensitivity, and sufficiently advance the curing reaction by exposure with a small amount of energy. Since no curing reaction occurs in the exposed area, the coated film after exposure is clearly divided into a cured area that is insoluble in the developer and an uncured area that has high solubility in the developer, Thereby, a high-definition color filter in which pixel patterns without undercuts are arranged according to a predetermined arrangement can be formed.
The biimidazole compounds can be used alone or in admixture of two or more.

  In the present invention, the amount used when the biimidazole compound is used as the radical generator is usually 0 with respect to 100 parts by weight of the total of the (C) polyfunctional monomer and the monofunctional monomer. 0.01 to 40 parts by weight, preferably 1 to 30 parts by weight, more preferably 1 to 20 parts by weight. In this case, if the amount of biimidazole compound used is less than 0.01 parts by weight, curing by exposure becomes insufficient, and it may be difficult to obtain a color filter in which a pixel pattern is arranged according to a predetermined arrangement. On the other hand, when the amount exceeds 40 parts by weight, there is a tendency that the formed pixel is easily detached from the substrate and the film surface of the pixel surface is easily removed during development.

In the present invention, when a biimidazole compound is used as the radical generator, it is preferable to use a hydrogen donor described below in combination because the sensitivity can be further improved.
The “hydrogen donor” as used herein means a compound that can donate a hydrogen atom to a radical generated from a biimidazole compound by exposure.
The hydrogen donor in the present invention is preferably a mercaptan compound or an amine compound defined below.

The mercaptan-based compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having one or more, preferably 1 to 3, more preferably 1 to 2, mercapto groups directly bonded to the mother nucleus (hereinafter referred to as “ Mercaptan-based hydrogen donor ").
The amine compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having 1 or more, preferably 1 to 3, more preferably 1 to 2 amino groups directly bonded to the mother nucleus (hereinafter referred to as “ Amine-based hydrogen donor ").
These hydrogen donors can also have a mercapto group and an amino group at the same time.

Hereinafter, the hydrogen donor will be described more specifically.
The mercaptan-based hydrogen donor can have one or more benzene rings or heterocyclic rings, and can have both a benzene ring and a heterocyclic ring. When two or more of these rings are present, It may or may not be formed.
Further, when the mercaptan-based hydrogen donor has two or more mercapto groups, one or more of the remaining mercapto groups are substituted with an alkyl, aralkyl or aryl group as long as at least one free mercapto group remains. Further, as long as at least one free mercapto group remains, a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group, or two sulfur atoms are present. It can have structural units linked in the form of disulfides.
Further, the mercaptan-based hydrogen donor may be substituted with a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group, or the like at a place other than the mercapto group.

Specific examples of such mercaptan hydrogen donors include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2,5-dimercapto-1,3,4-thiadiazole, 2-mercapto- 2,5-dimethylaminopyridine and the like can be mentioned.
Of these mercaptan-based hydrogen donors, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferable, and 2-mercaptobenzothiazole is particularly preferable.

In addition, the amine hydrogen donor can have one or more benzene rings or heterocyclic rings, and can have both a benzene ring and a heterocyclic ring. A ring may or may not be formed.
In addition, in the amine-based hydrogen donor, one or more of the amino groups may be substituted with an alkyl group or a substituted alkyl group. It may be substituted with a carbonyl group, a substituted phenoxycarbonyl group, a nitrile group or the like.

Specific examples of such amine-based hydrogen donors include 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4-diethylaminoacetophenone, 4-dimethylaminopropiophenone, Examples thereof include ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile and the like.
Among these amine hydrogen donors, 4,4′-bis (dimethylamino) benzophenone and 4,4′-bis (diethylamino) benzophenone are preferable, and 4,4′-bis (diethylamino) benzophenone is particularly preferable.
The amine-based hydrogen donor has a function as a sensitizer even in the case of radical generators other than biimidazole compounds.

In the present invention, the hydrogen donor can be used alone or in admixture of two or more. However, one or more mercaptan hydrogen donors and one or more amine hydrogen donors are used in combination. It is preferable that the formed pixels are difficult to drop off from the substrate during development, and that the pixel intensity and sensitivity are high.
Specific examples of the combination of a mercaptan hydrogen donor and an amine hydrogen donor include 2-mercaptobenzothiazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzothiazole / 4,4′-bis. (Diethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (dimethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone and the like, and more preferred combinations 2-mercaptobenzothiazole / 4,4′-bis (diethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4′-bis (diethylamino) benzophenone, and a particularly preferred combination is 2-mercaptobenzothiazole / , 4'-bis (diethylamino) benzophenone.
The weight ratio of mercaptan hydrogen donor to amine hydrogen donor in the combination of mercaptan hydrogen donor and amine hydrogen donor is usually from 1: 1 to 1: 4, preferably from 1: 1 to 1: 3.

  In the present invention, when the hydrogen donor is used in combination with the biimidazole compound, the amount used is preferably 0 with respect to 100 parts by weight of the total of (C) the polyfunctional monomer and the monofunctional monomer. 0.01 to 40 parts by weight, more preferably 1 to 30 parts by weight, and particularly preferably 1 to 20 parts by weight. In this case, if the amount of the hydrogen donor used is less than 0.01 parts by weight, the effect of improving the sensitivity tends to be lowered. On the other hand, if it exceeds 40 parts by weight, the formed pixels are detached from the substrate during development. It tends to be easier.

  Specific examples of the triazine compound include 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2 -(5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6-bis (trichloro Methyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4-dimethoxy) Phenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4- Triazine-based compounds having a halomethyl group such as xystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine Can be mentioned.

Of these triazine compounds, 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine is particularly preferable.
The triazine compounds can be used alone or in admixture of two or more.

  In the present invention, when the triazine-based compound is used as the radical generator, the amount used is preferably 0.1 with respect to 100 parts by weight of the total of (C) the polyfunctional monomer and the monofunctional monomer. It is 01-40 weight part, More preferably, it is 1-30 weight part, Especially preferably, it is 1-20 weight part. In this case, if the amount of the triazine compound used is less than 0.01 part by weight, curing due to exposure becomes insufficient, and it may be difficult to obtain a color filter in which pixel patterns are arranged according to a predetermined arrangement. On the other hand, if it exceeds 40 parts by weight, the formed pixels tend to drop off from the substrate during development.

  Specific examples of the O-acyloxime compound include 1- [4- (phenylthio) phenyl] -heptane-1,2-dione 2- (O-benzoyloxime), 1- [4- (phenylthio). Phenyl] -octane-1,2-dione 2- (O-benzoyloxime), 1- [4- (benzoyl) phenyl] -octane-1,2-dione 2- (O-benzoyloxime), 1- [9 -Ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -ethanone 1- (O-acetyloxime), 1- [9-ethyl-6- (3-methylbenzoyl) -9H-carbazole -3-yl] -ethanone 1- (O-acetyloxime), 1- (9-ethyl-6-benzoyl-9H-carbazol-3-yl) -ethanone 1- (O-acetate) Ruokishimu) ethanone 1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranyl Ruben benzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydropyranylbenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofuranylbenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylbenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- {2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) benzoyl} -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranylmethoxybenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydropyranylmethoxybenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofuranylmethoxybenzoyl) -9. H. -Carbazol-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylmethoxybenzoyl) -9. H. -Carbazole-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- {2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) methoxybenzoyl } -9. H. -Carbazol-3-yl] -1- (O-acetyloxime) and the like.

Among these O-acyloxime compounds, in particular, 1- [4- (phenylthio) phenyl] -octane-1,2-dione 2- (O-benzoyloxime), 1- [9-ethyl-6- ( 2-Methylbenzoyl) -9H-carbazol-3-yl] -ethanone 1- (O-acetyloxime), ethanone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranylmethoxybenzoyl) -9 . H. -Carbazole-3-yl] -1- (O-acetyloxime), ethanone-1- [9-ethyl-6- {2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) methoxybenzoyl } -9. H. -Carbazol-3-yl] -1- (O-acetyloxime) and the like are preferable.
The O-acyloxime compounds can be used alone or in admixture of two or more.

  In the present invention, when the O-acyloxime compound is used as the radical generator, the amount used is preferably based on 100 parts by weight of the total of (C) the polyfunctional monomer and the monofunctional monomer. Is 0.01 to 80 parts by weight, more preferably 1 to 70 parts by weight, and particularly preferably 1 to 60 parts by weight. In this case, if the amount of the O-acyloxime compound used is less than 0.01 parts by weight, curing by exposure becomes insufficient, and it is difficult to obtain a color filter in which the colored layer pattern is arranged according to a predetermined arrangement. On the other hand, if the amount exceeds 80 parts by weight, the formed colored layer tends to fall off from the substrate during development.

-Other additives-
The radiation-sensitive resin composition of the present invention contains the components (A) to (D) as essential components, but may further contain other additives as necessary.
Examples of the other additives include fillers such as glass and alumina; polymer compounds such as polyvinyl alcohol and poly (fluoroalkyl acrylates); nonionic surfactants, cationic surfactants, anionic interfaces Surfactants such as activators; vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-amino Ethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl Trimethoxysilane, 3-chloropropylmethyldi Adhesion promoters such as toxisilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane; 2,2-thiobis (4-methyl-6-tert-butylphenol), Antioxidants such as 2,6-di-t-butylphenol; UV absorbers such as 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenones; poly Examples thereof include an aggregation inhibitor such as sodium acrylate.

Preparation of liquid composition The radiation-sensitive resin composition of the present invention is usually prepared as a liquid composition by blending a solvent.
As the solvent, the components (A) to (D) constituting the radiation-sensitive composition and other additive components are dispersed or dissolved, and do not react with these components and have appropriate volatility. As long as it is, it can be appropriately selected and used.

As such a solvent, for example,
Propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and propylene glycol monoethyl ether;
Ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, diethylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, dipropylene glycol ethyl ether acetate, etc. Poly) alkylene glycol alkyl ether acetates;
(Poly) alkylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol methyl ethyl ether, dipropylene glycol diethyl ether;
Other ethers such as tetrahydrofuran;
Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone;
Ketoalcohols such as diacetone alcohol (ie 4-hydroxy-4-methylpentan-2-one), 4-hydroxy-4-methylhexan-2-one;

Lactic acid alkyl esters such as methyl lactate and ethyl lactate;
Ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropion Ethyl acetate, ethyl ethoxyacetate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, i-propyl acetate, n -Butyl, i-butyl acetate, n-pentyl formate, i-pentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate , N-propyl pyruvate, methyl acetoacetate, acetovine Ethyl, other esters such as ethyl 2-oxobutanoate;
Aromatic hydrocarbons such as toluene and xylene;
Examples thereof include amides such as N-methylpyrrolidone, N, N-dimethylformamide, and N, N-dimethylacetamide.

Among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate from the viewpoint of solubility, pigment dispersibility, coatability, etc. , Diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, dipropylene glycol dimethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methoxybutyl acetate , 3-methyl-3-methoxybutyl propionate, n-butyl acetate, i-butyl acetate , Formic acid n- pentyl acetate, i- pentyl, n- butyl propionate, ethyl butyrate, i- propyl butyrate n- butyl, ethyl pyruvate and the like are preferable.
The said solvent can be used individually or in mixture of 2 or more types.

Further, together with the solvent, benzyl ethyl ether, di-n-hexyl ether, acetonyl acetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate Further, a high boiling point solvent such as diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate can be used in combination.
The high boiling point solvents can be used alone or in admixture of two or more.

  The amount of the solvent used is not particularly limited, but the total concentration of each component excluding the solvent of the composition is preferably 5 from the viewpoint of applicability, stability and the like of the obtained liquid composition. An amount of -50% by weight, particularly preferably 10-40% by weight is desirable.

Method of forming a color filter Then, using the radiation-sensitive resin composition of the present invention, a method for forming a color filter of the present invention.
The method for forming a color filter usually includes at least the following steps (1) to (4).
(1) The process of forming the coating film of the radiation sensitive resin composition for color filters of this invention on a board | substrate. (2) A step of exposing at least a part of the coating film.
(3) A step of developing the coated film after exposure.
(4) A step of heat-treating (hereinafter referred to as “post-bake”) the coated film after development.
Hereinafter, these steps will be sequentially described.

-(1) Process-
First, on the surface of the substrate, if necessary, a light shielding layer is formed so as to partition a portion for forming a pixel, and the radiation sensitive resin composition for a color filter containing a red pigment, for example, is formed on the substrate. After applying the liquid composition of the product, pre-baking is performed to evaporate the solvent and form a coating film.
Examples of the substrate used in this step include glass, silicon, polycarbonate, polyester, aromatic polyamide, polyamideimide, polyimide, polyethersulfone, cyclic olefin ring-opening polymer, and hydrogenated products thereof. be able to.
In addition, these substrates may be subjected to appropriate pretreatment such as chemical treatment with a silane coupling agent or the like, plasma treatment, ion plating, sputtering, gas phase reaction method, vacuum deposition, etc., if desired.
When applying the liquid composition to the substrate, an appropriate coating method such as spin coating (coating with a spin coater), casting coating, roll coating, or coating with a slit nozzle can be employed. The radiation resin composition has high solubility in a cleaning solvent even after drying, and is suitable for application by a slit nozzle.
The prebaking condition is usually about 2 to 4 minutes at 70 to 110 ° C.
The coating thickness is usually 0.1 to 10 μm, preferably 0.2 to 8.0 μm, more preferably 0.2 to 6.0 μm as the film thickness after removal of the solvent.

-(2) Process-
Thereafter, at least a part of the formed coating film is exposed, for example, through a photomask having an appropriate pattern.
As the radiation used in this step, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like can be used, but radiation having a wavelength in the range of 190 to 450 nm is preferable. Exposure of radiation is usually, 10~10,000J / m ² approximately.

-(3) Process-
Thereafter, the exposed coating film is preferably developed using an alkali developer, and an unexposed portion of the coating film is dissolved and removed to form a pattern.
Examples of the alkali developer include sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-undecene, 1,5- An aqueous solution of diazabicyclo- [4.3.0] -5-nonene is preferred.
An appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like can be added to the alkaline developer. In addition, it is usually washed with water after alkali development.
As a development processing method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.
The development conditions are preferably about 5 to 300 seconds at room temperature.

-(4) Process-
Then, the post-baked coating film after development can provide a substrate on which pixel patterns made of a cured product of the radiation-sensitive resin composition are arranged in a predetermined arrangement.
The post-baking conditions are preferably 180 to 230 ° C. and about 20 to 40 minutes.
The film thickness of the pixel thus formed is usually 0.5 to 5.0 μm, preferably 1.5 to 3.0 μm.

  Furthermore, by repeating the steps (1) to (4) using each liquid composition of the radiation sensitive resin composition for color filters containing a green or blue pigment, a green pixel pattern and a blue By forming the pixel pattern on the same substrate, a colored layer in which pixel patterns of the three primary colors of red, green, and blue are arranged in a predetermined arrangement can be formed on the substrate. However, the order of forming the pixel patterns of the respective colors in the present invention is not limited to the order described above.

Color filter The color filter of the present invention is formed from the radiation-sensitive resin composition for a color filter of the present invention.
The color filter of the present invention is extremely useful for, for example, a transmissive or reflective color liquid crystal display device, a color imaging tube element, a color sensor, and the like.

Color liquid crystal display device The color liquid crystal display device of the present invention comprises the color filter of the present invention.
The color liquid crystal display device of the present invention can have an appropriate structure. For example, the color filter is formed on a substrate different from the driving substrate on which the thin film transistor (TFT) is arranged, and the driving substrate and the substrate on which the color filter is formed are opposed to each other through the liquid crystal layer. In addition, a substrate in which a color filter is formed on the surface of a driving substrate on which a thin film transistor (TFT) is disposed, and a substrate in which an ITO (indium oxide doped with tin) electrode is formed include a liquid crystal layer. It is also possible to adopt a structure facing each other. The latter structure has the advantage that the aperture ratio can be remarkably improved, and a bright and high-definition liquid crystal display element can be obtained.

  The radiation-sensitive resin composition for forming a colored layer of the present invention can form a color filter that does not cause “burn-in” with a high product yield, and is also suitable for application by a slit nozzle. Furthermore, it is possible to provide a pixel and a black matrix which have good storage stability as a liquid composition containing a solvent, and are excellent in solvent resistance to a wide range of solvents, adhesion to a substrate, and the like.

Hereinafter, the embodiment of the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples.
Mw and Mn of the resin obtained in each of the following synthesis examples were measured by gel permeation chromatography (GPC) according to the following specifications.
Apparatus: GPC-101 (manufactured by Showa Denko KK).
Column: GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804 were used in combination.
Mobile phase: Tetrahydrofuran containing 0.5% by weight of phosphoric acid.

Synthesis of alkali-soluble resin Synthesis Example 1
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents Subsequently, 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -3-ethyloxetane, and 60 parts of benzyl methacrylate were charged, and the atmosphere was replaced with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 8,000 and Mw / Mn = 1.6. This resin is referred to as “alkali-soluble resin (B-1)”.

Synthesis example 2
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents Subsequently, 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -3-ethyloxetane, 20 parts of N-phenylmaleimide, 10 parts of styrene, and 30 parts of benzyl methacrylate were substituted with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 8,500 and Mw / Mn = 1.5. This resin is referred to as “alkali-soluble resin (B-2)”.

Synthesis example 3
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -3-ethyloxetane, 20 parts of N-phenylmaleimide, 10 parts of styrene, tricyclo [5.2.1.0 ^2,6 ] decane- 30 parts of 8-yl methacrylate were charged and the atmosphere was replaced with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 7,500 and Mw / Mn = 1.5. This resin is referred to as “alkali-soluble resin (B-3)”.

Synthesis example 4
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents Subsequently, 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -2-phenyloxetane, 30 parts of benzyl methacrylate and 30 parts of 2-hydroxyethyl methacrylate were charged with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 8,000 and Mw / Mn = 1.6. This resin is referred to as “alkali-soluble resin (B-4)”.

Synthesis example 5
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents Next, 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -2-phenyloxetane, 20 parts of N-phenylmaleimide, 10 parts of styrene, 15 parts of benzyl methacrylate and 15 parts of 2-hydroxyethyl methacrylate And replaced with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and this temperature was maintained for polymerization for 3 hours. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 8,000 and Mw / Mn = 1.7. This resin is referred to as “alkali-soluble resin (B-5)”.

Synthesis Example 6
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 4 parts of pyrazole-1-dithiocarboxylic acid cyanodimethyl-methyl ester and 200 parts of propylene glycol monomethyl ether acetate as molecular weight control agents Followed by 15 parts of methacrylic acid, 25 parts of 3- (methacryloyloxymethyl) -2-phenyloxetane, 20 parts of N-phenylmaleimide, 10 parts of styrene, tricyclo [5.2.1.0 ^2,6 ] decane- 15 parts of 8-yl methacrylate and 15 parts of 2-hydroxyethyl methacrylate were charged and substituted with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and this temperature was maintained for polymerization for 3 hours. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 8,500 and Mw / Mn = 1.6. This resin is referred to as “alkali-soluble resin (B-6)”.

Comparative Synthesis Example 1
A flask equipped with a condenser and a stirrer was charged with 10 parts by weight of 2,2′-azobisisobutyronitrile and 400 parts by weight of diethylene glycol monomethyl ether acetate, followed by 30 parts by weight of methacrylic acid and 31.2 parts by weight of N-phenylmaleimide. Parts, 20 parts by weight of benzyl methacrylate, 18.8 parts by weight of styrene and 10 parts by weight of α-methylstyrene dimer as a molecular weight control agent, and after replacing with nitrogen, the reaction solution was heated to 80 ° C. while gently stirring. The polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 2 parts by weight of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for 1 hour to obtain a resin solution. The obtained resin was Mw = 5,000 and Mw / Mn = 3.6. This resin is referred to as “resin (b-1)”.

Comparative Synthesis Example 2
A flask equipped with a condenser and a stirrer was charged with 3 parts of 2,2′-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate, followed by 15 parts of methacrylic acid, 3- (methacryloyloxymethyl) -3- After charging 25 parts of ethyl oxetane, 60 parts of benzyl methacrylate and 3 parts of α-methylstyrene dimer as a molecular weight control agent and replacing with nitrogen, the reaction solution was heated to 80 ° C. while gently stirring and maintained at this temperature. Then, a resin solution was obtained by polymerization for 5 hours. The obtained resin was Mw = 18,000 and Mw / Mn = 2.6. This resin is referred to as “resin (b-2)”.

Comparative Synthesis Example 3
In a flask equipped with a condenser and a stirrer, 2 parts of 2,2′-azobisisobutyronitrile, 2 parts of cyanodimethyl-methyl ester of pyrazole-1-dithiocarboxylic acid and 200 parts of diethylene glycol monomethyl ether acetate as molecular weight control agents Then, 30 parts of methacrylic acid, 31.2 parts of N-phenylmaleimide, 20 parts of benzyl methacrylate and 18.8 parts of styrene were charged, and the atmosphere was replaced with nitrogen. Thereafter, the mixture was gently stirred to raise the temperature of the reaction solution to 80 ° C., and polymerization was carried out for 3 hours while maintaining this temperature. Thereafter, the temperature of the reaction solution was raised to 100 ° C., 1 part of 2,2′-azobisisobutyronitrile was added, and polymerization was continued for another hour to obtain a resin solution. The obtained resin was Mw = 12,000 and Mw / Mn = 1.7. This resin is referred to as “alkali-soluble resin (b-3)”.

Example 1
Preparation of liquid composition (A) C.I. I. Pigment red 254 and C.I. I. A mixture of 20 parts by weight of an 80/20 (weight ratio) mixture with Pigment Yellow 139, 5 parts by weight of Disperbyk 2001 (in terms of solid content) as a dispersant, and 75 parts by weight of ethyl 3-ethoxypropionate as a solvent, A pigment dispersion was prepared by mixing and dispersing for 12 hours using a fine mill (trade name, manufactured by Mitsubishi Materials Corporation, beads mill (bead diameter: 1.0 mm)).
Next, 400 parts by weight of this pigment dispersion, 70 parts by weight of alkali-soluble resin (B-1) as an alkali-soluble resin (in terms of solid content), (C) 80 parts by weight of dipentaerythritol hexaacrylate as a polyfunctional monomer, (D) 50 parts by weight of 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1 as a radical generator and 1,000 parts by weight of propylene glycol monomethyl ether acetate as a solvent were mixed. A liquid composition (R-1) was prepared.

The liquid composition (R-1) was evaluated according to the following procedure. The evaluation results are shown in Tables 1 and 2.
Evaluation of voltage holding ratio A SiO2 film for preventing elution of sodium ions was formed on the surface of the liquid composition (R-1), and an ITO (indium-tin oxide alloy) electrode was deposited in a predetermined shape. After coating on a soda glass substrate using a spin coater, prebaking was performed in a clean oven at 90 ° C. for 10 minutes to form a coating film having a thickness of 2.0 μm.
Next, using a high-pressure mercury lamp, the coating film was exposed to radiation containing wavelengths of 365 nm, 405 nm, and 436 nm at an exposure amount of 5,000 J / m ² without using a photomask. Thereafter, the substrate is immersed in a developer comprising a 0.04 wt% potassium hydroxide aqueous solution at 23 ° C. for 1 minute, developed, washed with ultrapure water, air-dried, and further post-baked at 250 ° C. for 30 minutes. And the coating film was cured to form red pixels on the substrate. The film thickness of this pixel was 1.6 μm.

Next, the substrate on which this pixel is formed and the substrate on which ITO electrodes are simply deposited in a predetermined shape are bonded together with a sealant mixed with 0.8 mm glass beads, and then Merck liquid crystal MLC6608 (trade name) is injected. Thus, a liquid crystal cell was produced.
Next, the liquid crystal cell was placed in a constant temperature layer at 60 ° C., and the voltage holding ratio of the liquid crystal cell was measured with a liquid crystal voltage holding ratio measuring system VHR-1A (trade name) manufactured by Toyo Technica. The applied voltage at this time is a square wave of 5.5 V, and the measurement frequency is 60 Hz. Here, the voltage holding ratio is a value of (liquid crystal cell potential difference after 16.7 milliseconds / voltage applied at 0 milliseconds). If the voltage holding ratio is 90% or more, it can be said that a liquid crystal display device including a color filter formed using the liquid composition is less likely to cause “burn-in”. Further, when the voltage holding ratio is 95% or more, it can be said that a liquid crystal display device including a color filter formed using the liquid composition has almost no possibility of causing “burn-in”.

After applying the immersion test liquid composition (R-1) on a soda glass substrate having a diameter of 4 inches on which a SiO2 film for preventing elution of sodium ions is formed using a spin coater, a clean room at 23 ° C. The coating film was formed by allowing it to stand for 12 hours and drying.
Next, this substrate was immersed in 100 cc of propylene glycol monomethyl ether acetate for 2 minutes. As a result, the case where the coating film was completely dissolved was evaluated as ◯, and the case where the coating film was not dissolved and a large amount of foreign matter was observed in the liquid was evaluated as x.

Adhesion evaluation The liquid composition (R-1) was applied on a soda glass substrate having a diameter of 4 inches on the surface of which a SiO2 film for preventing elution of sodium ions was formed using a spin coater, and then at 90 ° C. Pre-baking was performed for 4 minutes to form a coating film having a thickness of 1.3 μm. Then, after cooling this board | substrate to room temperature, the coating film was exposed by the exposure amount of 2,000 J / m < ² > using the high pressure mercury lamp. Thereafter, a 0.04% aqueous potassium hydroxide solution at 23 ° C. was discharged onto the coating film at a development pressure of 1 kgf / cm ² (nozzle diameter 1 mm) to perform shower development, followed by post-baking at 220 ° C. for 30 minutes. It was. Then, according to JIS K5400 standard, the coating film is cross-cut into 100 grids, and an adhesion test is performed. If the grids are not peeled off, 1 or 10 of the grids are peeled off. The case was evaluated as Δ, and the case where more than 10 grids were peeled off was evaluated as ×.

Evaluation of solvent resistance The liquid composition (R-1) was applied on a soda glass substrate having a diameter of 4 inches on which a SiO2 film for preventing elution of sodium ions was formed using a spin coater. Thereafter, prebaking was performed at 90 ° C. for 4 minutes to form a coating film having a thickness of 1.3 μm. Then, after cooling this board | substrate to room temperature, the coating film was exposed by the exposure amount of 500 J / m < ² > through the photomask using the high pressure mercury lamp. Thereafter, a 0.04 wt% potassium hydroxide aqueous solution at 23 ° C. was discharged at a developing pressure of 1 kgf / cm ² (nozzle diameter 1 mm) to perform shower development, and then post-baked at 220 ° C. for 30 minutes. To form a 200 × 200 μm dot pattern.
Next, the obtained substrate was immersed in N-methylpyrrolidone at 25 ° C. for 30 minutes, and the dot pattern before and after immersion was observed with a scanning electron microscope. When (film thickness after immersion × 100 / film thickness before immersion) is 95% or more, the film thickness ratio before and after immersion is less than 95%, or a part of the pattern is chipped. The case was evaluated as Δ, and the case where the entire pattern was peeled off from the substrate after immersion was evaluated as x.

Evaluation of Storage Stability of Liquid Composition When the liquid composition (R-1) is placed in a glass bottle and stored in a constant temperature and humidity chamber at 40 ° C. for 1 week, the viscosity before and after storage is measured and the rate of change in viscosity is measured. (Viscosity after storage × 100 / viscosity before storage) was calculated. If the viscosity change rate is 110 or less, it can be said that the storage stability of the liquid composition is good.

Examples 2-6 and Comparative Examples 1-3
Instead of 70 parts by weight of alkali-soluble resin (B-1) (in terms of solid content), 70 parts by weight of alkali-soluble resins (B-2) to (B-6) or (b-1) to (b-3) ( Liquid compositions (R-2) to (R-6) and (r-1) to (r-3) were prepared in the same manner as in Example 1 except that the solid content conversion was used, and each evaluation was performed. went. The evaluation results are shown in Tables 1 and 2.

Claims (6)

A radiation-sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a radiation-sensitive radical generator, and (B) an alkali-soluble Copolymer whose resin is an essential constituent component of (b1) at least one selected from the group of unsaturated carboxylic acid or its anhydride and unsaturated phenol compound, and (b2) an unsaturated compound having an oxetane skeleton (Mw / Mn) of polystyrene-equivalent weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) and polystyrene-equivalent number average molecular weight (Mn) measured by gel permeation chromatography (GPC) Is a radiation-sensitive resin composition for forming a colored layer, wherein the composition is 1.0 to 2.0. (B) The alkali-soluble resin is a resin having a group represented by the following formula (i) or a group represented by the formula (ii) at at least one terminal of each polymer chain constituting the alkali-soluble resin. The radiation-sensitive resin composition for forming a colored layer according to claim 1.

[In Formula (i), Z ¹ is different from a hydrogen atom, a chlorine atom, a carboxyl group, a cyano group, an alkyl group having 1 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, or a carbon atom. A monovalent heterocyclic group having 3 to 20 atoms in total with the term atom, -OR, -SR, -N (R) ₂ ,
-OC (= O) R, -C (= O) OR, -C (= O) N (R) ₂ , -P (= O) (OR) ₂ , -P (= O) (R) _2, or 1 represents a monovalent group having a polymer chain, and each R independently represents an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, or a monovalent aromatic hydrocarbon having 6 to 18 carbon atoms. A monovalent heterocyclic group having 3 to 18 total atoms of a group or a carbon atom and a hetero atom, the above-mentioned alkyl group having 1 to 20 carbon atoms, and a monovalent aromatic hydrocarbon having 6 to 20 carbon atoms The group, the monovalent heterocyclic group having 3 to 20 atoms in total, and R may each be substituted. ]
[In the formula (ii), Z ² represents an m-valent group derived from an alkane having 1 to 20 carbon atoms, an m-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a carbon atom and a hetero atom. A m-valent group derived from a heterocyclic compound having a total of 3 to 20 atoms or an m-valent group having a polymer chain, an m-valent group derived from the alkane having 1 to 20 carbon atoms, the number of carbon atoms The m-valent group derived from 6 to 20 aromatic hydrocarbons and the m-valent group derived from the heterocyclic compound having 3 to 20 atoms in total may be substituted, and m is an integer of 2 or more. is there. ]   (B) The radiation-sensitive resin composition for forming a colored layer according to claim 1, wherein the alkali-soluble resin is produced through living radical polymerization. (B) Resin produced by subjecting an alkali-soluble resin to a living radical polymerization using a polymerizable unsaturated compound as a molecular weight controller using a thiocarbonylthio compound represented by the following formula (1) or formula (2) The radiation-sensitive resin composition for forming a colored layer according to claim 1, wherein the composition is a radiation-sensitive resin composition.

[In the formula (1), Z ¹ is different from a hydrogen atom, a chlorine atom, a carboxyl group, a cyano group, an alkyl group having 1 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, or a carbon atom. A monovalent heterocyclic group having 3 to 20 atoms in total with the term atom, -OR, -SR, -N (R) ₂ ,
-OC (= O) R, -C (= O) OR, -C (= O) N (R) ₂ , -P (= O) (OR) ₂ , -P (= O) (R) _2, or 1 represents a monovalent group having a polymer chain, and each R is independently an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, or a monovalent aromatic hydrocarbon having 6 to 18 carbon atoms. A monovalent heterocyclic group having 3 to 18 total atoms of a group or a carbon atom and a hetero atom, and the aforementioned alkyl group having 1 to 20 carbon atoms and a monovalent aromatic hydrocarbon having 6 to 20 carbon atoms Group, a monovalent heterocyclic group having 3 to 20 atoms in total and R may each be substituted, p is an integer of 1 or more, and R ⁶ is 1 to 1 carbon atoms when p = 1. 20 alkyl groups, monovalent alicyclic hydrocarbon groups having 3 to 20 carbon atoms, monovalent aromatic hydrocarbon groups having 6 to 20 carbon atoms, and 3 to 20 total atoms of carbon atoms and hetero atoms 1 of Heterocyclic group, -OR, -SR, represent a monovalent group having a -N (R) ₂ or a polymer chain, each R is an alkyl group having 1 to 18 carbon atoms independently of one another, carbon atoms 2 -18 alkenyl group, monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, or monovalent heterocyclic group having 3 to 18 total atoms of carbon atoms and hetero atoms, p = 2 A single bond, a divalent group derived from an alkane having 1 to 20 carbon atoms, a divalent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a total number of atoms of carbon atoms and hetero atoms of 3 A divalent group derived from a heterocyclic compound having ˜20 or a divalent group having a polymer chain, and when p ≧ 3, a p-valent group derived from an alkane having 1 to 20 carbon atoms, the number of carbons P-valent group derived from 6-20 aromatic hydrocarbons, derived from a heterocyclic compound having a total of 3-20 carbon atoms and hetero atoms 1 represents a p-valent group or a p-valent group having a polymer chain, the alkyl group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and 1 having 6 to 20 carbon atoms. Valent aromatic hydrocarbon group, monovalent heterocyclic group having 3 to 20 atoms in total, R, divalent group derived from alkane having 1 to 20 carbon atoms, aromatic hydrocarbon having 6 to 20 carbon atoms A divalent group derived from a divalent group derived from a heterocyclic compound having 3 to 20 atoms in total, a p-valent group derived from an alkane having 1 to 20 carbon atoms, an aromatic having 6 to 20 carbon atoms A p-valent group derived from a hydrocarbon and a p-valent group derived from a heterocyclic compound having 3 to 20 atoms in total may be substituted. ]

[In the formula (2), Z ² represents an m-valent group derived from an alkane having 1 to 20 carbon atoms, an m-valent group derived from an aromatic hydrocarbon having 6 to 20 carbon atoms, a carbon atom and a hetero atom. M-valent group derived from a heterocyclic compound having a total of 3 to 20 atoms or m-valent group having a polymer chain, m-valent group derived from the alkane having 1 to 20 carbon atoms, carbon number The m-valent group derived from an aromatic hydrocarbon having 6 to 20 and the m-valent group derived from a heterocyclic compound having 3 to 20 atoms in total may be substituted, and R ⁷ may have 1 to 1 carbon atoms. 20 alkyl groups, monovalent alicyclic hydrocarbon groups having 3 to 20 carbon atoms, monovalent aromatic hydrocarbon groups having 6 to 20 carbon atoms, and 3 to 20 total atoms of carbon atoms and hetero atoms A monovalent heterocyclic group, —OR, —SR, —N (R) ₂ or a monovalent group having a polymer chain, wherein each R is mutually Independently an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms, or a total of 3 to 18 atoms of carbon atoms and hetero atoms 1 represents a monovalent heterocyclic group, the alkyl group having 1 to 20 carbon atoms, the monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, and the monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms. , A monovalent heterocyclic group having 3 to 20 atoms in total and R may each be substituted, and m is an integer of 2 or more. ] The color filter formed from the radiation sensitive resin composition for colored layer formation in any one of Claims 1-4. A color liquid crystal display device comprising the color filter according to claim 5.