CN1575870A - Substrate cleaning device and substrate cleaning method - Google Patents

Abstract

Provided is a substrate cleaning device (method) capable of efficiently cleaning substrate surfaces without transmitting useless ultrasonic waves to cleaning water. The cleaning liquid supplied from the cleaning liquid supply nozzle (10) to the surface of the glass substrate (W) in a direction opposite to the transport direction of the glass substrate (W) flows over the surface of the glass substrate (W) to cover the entire surface of the substrate. On the other hand, when the ultrasonic oscillation nozzle (14) arranged under the conveyed glass substrate (W) oscillates the ultrasonic wave on the glass plate (W), the ultrasonic wave is transmitted to the cleaning liquid supplied to the surface of the glass substrate, so that the cleaning liquid Vibrates to clean the surface of the glass substrate (W) evenly and efficiently.

Description

Substrate cleaning device and substrate cleaning method

technical field

The present invention relates to an apparatus and method for cleaning substrate surfaces such as glass substrates and semiconductor wafers.

Background technique

A TFT array and the like are formed on a glass substrate incorporated in a liquid crystal display device. Such a TFT array is formed in the same manner as the process of forming a semiconductor integrated circuit on a glass substrate. Next, a resist film is formed in the process of forming a semiconductor integrated circuit. This resist film is formed by applying a resist solution on the surface of a glass substrate using a spin coater or the like and then drying it. Then, dust and foreign matter must be removed from the surface of the glass substrate before applying the resist.

As a cleaning method, a method of incorporating an ultrasonic element into a cleaning liquid supply nozzle, supplying ultrasonic waves to the cleaning water and spraying it onto the surface of the substrate (Patent Document 1), and a method of jetting ionized water in a high-pressure direction to the surface of the substrate (Patent Document 1) are known. 2) A method of removing dirt by pressing a rotating disk brush against the substrate surface (Patent Document 3).

patent documents

Patent Document 1: JP-A-2001-179196

Patent Document 2: JP-A-11-333387

Patent Document 3: JP-A-2002-233829

In the method of installing the ultrasonic element in the cleaning liquid supply nozzle, it is necessary to transmit the vibration from the ultrasonic element to all the cleaning water used for cleaning, and the effectiveness of the ultrasonic wave cannot be exerted with 100% efficiency, and the ultrasonic element is too high. As a result of getting rid of the output and cleaning fluid, the ultrasonic components are damaged.

In the method of spraying ionized water on the surface of the substrate with a high-pressure jet, the rate of cleaning liquid scattering is high, and efficient cleaning cannot be performed.

In addition, the cleaning method of pressing a disk brush against the surface of the substrate can damage the surface of the substrate.

Contents of the invention

In order to solve the above-mentioned problems, the substrate cleaning apparatus of the present invention arranges a cleaning liquid supply member for supplying cleaning water flowing in a certain direction to the surface of the substrate being conveyed above the conveying path constituted by rollers, etc. The cleaning water vibrates to arrange an ultrasonic vibration member under the substrate.

The cleaning liquid supply nozzle of the ultrasonic oscillating member oscillates ultrasonic waves from between the transport rollers to the underside of the substrate, supplies ultrasonic waves to the cleaning water supplied to the surface of the substrate, and vibrates the cleaning water to clean the surface of the substrate.

According to the cleaning apparatus (method) described above, it is possible to perform cleaning efficiently without uselessly transmitting ultrasonic waves to the cleaning water on the surface of the substrate.

Description of drawings

FIG. 1 is a side view of a substrate cleaning apparatus of the present invention.

Fig. 2 is a plan view of the substrate cleaning device.

Fig. 3 is an enlarged sectional view taken along line A-A of Fig. 1 .

Fig. 4 is a sectional view taken along line B-B of Fig. 3 .

Fig. 5 is an enlarged view of main parts of Fig. 1 .

Fig. 6 is a view taken along line C-C of Fig. 5 .

Detailed ways

Embodiments of the present invention will be described below with reference to the drawings. Fig. 1 is a side view of the substrate cleaning device of the present invention, Fig. 2 is a plan view of the substrate cleaning device, Fig. 3 is an enlarged sectional view of the A-A line of Fig. 1 , Fig. 4 is a sectional view of the B-B line of Fig. 3 , and Fig. 5 is a diagram 1 is an enlarged view of the main part, and Fig. 6 is a view taken along the line C-C in Fig. 5 .

The substrate cleaning apparatus includes a transport path 1 formed in a tunnel shape. This transport path 1 is made up of left and right wall bodies 2, 2, left and right top plates 3, 3, and a bottom plate 4 installed obliquely upward from the upper ends of the wall bodies 2, 2, and the left and right top plates 3, 3 are opened, Drain holes 5 are provided.

Between the said wall body 2, 2, conveyance rollers 6... are erected at equal intervals, these conveyance rollers 6... are rotated by the motor 7, and the glass substrate W is conveyed.

In addition, a cleaning liquid supply member 8 is disposed on the upper part of the conveyance path 1 . In the cleaning liquid supply unit 8 , three tanks 9 opening downward are arranged in succession in a direction perpendicular to the transport direction, and four cleaning liquid supply nozzles 10 are arranged in each tank 9 . The number of cleaning liquid supply nozzles 10 is arbitrary and can be increased or decreased depending on the size of the glass substrate. If necessary, as shown in FIG. 4 , auxiliary cleaning nozzles 11 may be arranged before and after cleaning liquid supply nozzles 10 .

On the other hand, an ultrasonic oscillation member 12 is arranged at a lower portion in the transport path 1 . The ultrasonic oscillating member 12 is composed of a box-shaped body 13 and an ultrasonic oscillating nozzle 14 installed in the body 13 so that the ultrasonic oscillating nozzle 14 faces between the conveying rollers 6 . . .

The ultrasonic vibrating members 12 are arranged three times in a direction perpendicular to the transport direction, similarly to the cleaning liquid supply member 8 . The reasons for arranging a plurality of cleaning liquid supply members 8 and ultrasonic oscillation members 12 in the width direction in this way are to facilitate maintenance and troubleshooting, increase or decrease according to the size of the substrate, and ease of fabrication.

The cleaning solution is preferably ozone water, alkaline ionized water, etc., and if the temperature reaches 40-50°C, the molecular activities will be accelerated and the cleaning efficiency will be improved. Ultrasonic output ranges from 28kHz to 1MHz (preferably 45kHz to 100kHz).

In addition, the upper end of the cleaning liquid supply nozzle 14 is set slightly lower than the upper end of the transport roller 6 . Accordingly, the upper end portion of the cleaning liquid supply nozzle 14 is close to the lower surface of the glass substrate W being conveyed, and ultrasonic waves can be efficiently transmitted to the glass substrate.

As described above, the cleaning liquid is supplied from the cleaning liquid supply nozzle 10 to the surface of the glass substrate in a certain direction, that is, in a direction opposite to the direction in which the glass substrate W is transported. Then, the cleaning liquid flows over the surface of the glass substrate W, covering the entire surface of the substrate. On the other hand, when the ultrasonic wave is oscillated on the glass plate W from the cleaning liquid supply nozzle 14 arranged below the conveyed glass substrate W, the ultrasonic wave is transmitted to the cleaning liquid supplied to the surface of the glass substrate, and the cleaning liquid is vibrated and uniformly cleaned. Efficient cleaning of glass substrates.

As explained above, according to the present invention, an ultrasonic vibrating member is arranged under a substrate such as a glass substrate to be transported, and the vibration generated by the ultrasonic wave is transmitted to the cleaning water supplied to the surface of the substrate, so only the cleaning water related to cleaning is vibrated by the ultrasonic wave, Ultrasonic waves are not transmitted to the cleaning water that is not on the surface of the substrate, so the cleaning efficiency is greatly improved.

Claims (3)

1. a base plate cleaning device is characterized in that, comprising: substrate transport the path; Go up the rinse water that flows in a certain direction and be configured in cleaning solution supplying parts above the substrate for the substrate surface that transports is supplied with; And be configured in supersonic oscillations member below the substrate in order to make the rinse water that supplies to substrate surface produce vibration.

2. add right and require 1 described base plate cleaning device, it is characterized in that, the described path of transporting is made of a plurality of rollers that transport, and the ultrasonic nozzle of described supersonic oscillations member transports between the roller facing to described.

3. substrate-cleaning method, it is characterized in that: the substrate surface that transports is supplied with the rinse water that flows to the carriage direction upstream side, and use the supersonic oscillations member below the substrate that transports, to provide ultrasonic wave to the rinse water that supplies to substrate surface, make rinse water vibration and cleaning base plate surface.

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