CN1300722A - Glass substrate of plasma display screen - Google Patents
Glass substrate of plasma display screen Download PDFInfo
- Publication number
- CN1300722A CN1300722A CN 99126878 CN99126878A CN1300722A CN 1300722 A CN1300722 A CN 1300722A CN 99126878 CN99126878 CN 99126878 CN 99126878 A CN99126878 A CN 99126878A CN 1300722 A CN1300722 A CN 1300722A
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- CN
- China
- Prior art keywords
- glass
- plasma display
- display screen
- glass substrate
- temp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
A glass substrate of plasma display screen coutains such chemical components as SiO2 (50-61), Na2O (3-5), Al2O3 (4-10), K2O (4-8), CaO (3-6), MgO (1-4), ZrO2 (1-4), BaO (4-15), SrO (3-10), TiO2 (0.01-1) and P2O3 (0-0.8). The space temp of kiln pool is 1600-1650 deg.C. The temp of molten glass before tin trough is 1150-1250 deg.C. The temp at entrance of annealing kiln is 570-650 deg.C.
Description
The invention belongs to field of glass production technology, mainly propose a kind of glass substrate of plasma display screen.
Plasma Display Technology (Plasma Display Panel is called for short PDP) is a kind of light emitting-type flat panel display that utilizes the ultraviolet ray excited light-emitting phosphor of geseous discharge generation.In its process that realization is maximized and superelevation becomes more meticulous, as soda lime sheet glass, because the size thermostability requires to exist big gap apart from the complete processing of plasma display, in preparation PDP sinter process process, sheet glass serious thermal contraction phenomenon also occurs except that thermal distortion takes place, promptly heating back sheet glass geometrical dimension is less than before heating, have a strong impact on the photoelectric properties of display panel, increased manufacture difficulty, limited development and the use of PDP.
The objective of the invention is to propose a kind of new sheet glass composition and the improvement of corresponding technology, be specially adapted to substrate of plasma display screen, it has improved thermal property, mechanical property, the electric property of sheet glass, and fully reaches the processing request of PDP display screen.
Base plate glass of the present invention basic composition is (weight percent): SiO
250～61 Na
2O 3～5 Al
2O
34～10 K
2O 4～8 CaO 3～6 MgO1～4 ZrO
21～4 BaO, 4～15 SrO, 3～10 TiO
20.01～1P
2O
30.0～0.8.
In above-mentioned glass is formed, other microcomponent can appear, comprises adding SO
3Fluorochemical, O
2Such ignition dope and finings.Because the coloring impurity of introducing in the glass batch presents water white transparency in order to make glass, can increase discoloring agents such as cobalt, manganese.In above-mentioned glass is formed owing to added BaO, ZrO
2And the Al of high level
2O
3, can significantly change the thermal property of glass, make its characteristic that presents high-density, high softening-point, low bulk, simultaneously, owing to quote the X ray that BaO can absorb in the procedure for displaying to be excited significantly, to alleviate radiation injury to human body.
The invention still further relates to the processing method that adopts float glass process to produce PDP dedicated substrate glass improves.
The accompanying drawing that the present invention provides is:
Accompanying drawing 1 is produced the process flow sheet of PDP dedicated substrate glass for adopting float glass process.
Accompanying drawing 2 is for being dedicated substrate glass melting of the present invention, moulding section synoptic diagram.
Its typical process flow as shown in Figure 1, the method for float glass production is at glass Melt frit in the glass stove is removed the also glass of the thorough homogenizing of process of bubble, field trash Liquid flows into molten tin bath in a steady stream, fills density in the groove and does not soak mutually greater than glass, with melten glass The tin liquor of profit, the glass metal of inflow is expanded thereon, and opens at self gravitation and surface Under the power effect, form ganoid glass plate, it is flat to make large tracts of land through supercooling again Glass sheet is sent. Production technology of the present invention and above-mentioned common float glass worker It is identical to plant, and therefore no longer describes in detail.
As shown in Figure 2, the batch that accurate feed proportioning is all mixed is thrown with automatic feeder Enter in the filling pocket 1, slowly flow in the melting tank 2, with batch melting. The glass of melting Glass liquid flows into clarification, homogenizing section 3 under the effect that refluxes, make glass get rid of bubble, Reach evenly, through flowing in the moulding molten tin bath 6 through runner 5 after the cooling end 4, make glass It is tabular that the glass beach becomes, and imports annealing kiln 7 into through automatic transfer roller, after strict annealing Become finished glass. Above-mentioned technology is identical with original float glass process.
The present invention produces special-purpose PDP base plate glass, and the space temperature of melting tank is 1600～1650 ℃, delay glass metal in the time of clarification, homogenizing section, the time is original many About 10%, specific practice is to strengthen the area of clarification, homogenizing section, and it is produced Big by about 10% during simple glass. When moulding, glass metal flows into the temperature before the molten tin bath Should be than common Na2O-O-Ca-SiO
2The glass temperature height is controlled at 1150～1250 ℃, The annealing kiln inlet temperature is 570～650 ℃.
Embodiment:
The one-tenth of PDP dedicated substrate glass of the present invention is grouped into and proportioning (weight percent)
SiO
2 58
Na
2O 4.5
Al
2O
3 8
K
2O 7
CaO 4
MgO 1
ZrO
2 3.5
BaO 11
SrO 2.5
TiO
2 0.5
In the above-described embodiments, be easy to fusing, clarification, add an amount of finings SB especially for making glass
2O
3, fusing assistant additives such as (fluorochemicals), temperature of fusion is 1550 ℃. the melting pool room temps is 1620 ℃, and mold temperature is 1200 ℃, and annealing temperature is 630 ℃, and furnace operation atmosphere is oxidizing atmosphere.
Its results of property is:
The coefficient of expansion 83 * 10
-7/ ℃ (50～350 ℃)
573 ℃ of strain points
840 ℃ of softening temperatures
Density 2.78g/cm
3
Body resistivity 2.02 * 10
13Ω cm.
In the present invention, above-mentioned glass oxide compound is formed and production belongs to key technical feature, as everyone knows, the various mineral substance that use in when batching, Chemicals enter after melting furnaces carry out high-temperature fusion at admixtion, form oxide compound with being converted into above-mentioned glass, oxide form promptly disclosed in this invention is also within the scope of the invention.
Claims (1)
1, glass substrate of plasma display screen is characterized in that becoming to be grouped into proportioning being (weight percent): SiO
250～61 Na
2O 3～5 Al
2O
34～10K
2O 4～8 CaO 3～6 MgO 1～4 ZrO
21～4 BaO, 4～15SrO, 3～10 TiO
20.01～1 P
2O
30.0～0.8;
The room temps of melting pool was 1600～1650 ℃ during the present invention produced, and glass metal flows into the preceding temperature of molten tin bath and is controlled at 1150～1250 ℃ during moulding, and the annealing furnace temperature in is 570～650 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN99126878A CN1100734C (en) | 1999-12-23 | 1999-12-23 | Glass substrate of plasma display screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN99126878A CN1100734C (en) | 1999-12-23 | 1999-12-23 | Glass substrate of plasma display screen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1300722A true CN1300722A (en) | 2001-06-27 |
| CN1100734C CN1100734C (en) | 2003-02-05 |
Family
ID=5284598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN99126878A Expired - Fee Related CN1100734C (en) | 1999-12-23 | 1999-12-23 | Glass substrate of plasma display screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1100734C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1564778A1 (en) * | 2004-02-16 | 2005-08-17 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
| CN101959819A (en) * | 2008-02-27 | 2011-01-26 | 旭硝子株式会社 | Glass composition for substrate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3007653B2 (en) * | 1990-05-24 | 2000-02-07 | 日本電気硝子株式会社 | CRT panel glass |
| US5292690A (en) * | 1991-03-29 | 1994-03-08 | Nippon Electric Glass Company, Ltd. | Glass composition for glass bubbles with increased compressive strength |
| HUP9602086A2 (en) * | 1996-07-30 | 1999-06-28 | General Electric Company | Glass composition |
-
1999
- 1999-12-23 CN CN99126878A patent/CN1100734C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1564778A1 (en) * | 2004-02-16 | 2005-08-17 | Matsushita Electric Industrial Co., Ltd. | Plasma display panel |
| CN101959819A (en) * | 2008-02-27 | 2011-01-26 | 旭硝子株式会社 | Glass composition for substrate |
| US8349751B2 (en) | 2008-02-27 | 2013-01-08 | Asahi Glass Company, Limited | Glass composition for substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1100734C (en) | 2003-02-05 |
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|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20030205 Termination date: 20101223 |