CN1300550C - Device and method for measuring surface profile of object to be measured - Google Patents
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Abstract
本发明是有关于一种量测待测物表面轮廓的装置及方法,是通过由检索宽频光的干涉强度以检测宽频光的干涉强度分布的变化,并对宽频光所包括的至少一特定波长的干涉强度分布进行转换,以取得至少一特定波长的相位分布图,再对至少一特定波长的相位分布图进行相位还原的处理以取得至少一特定波长的相位还原图,最后,对至少一特定波长的相位还原图进行相位-物理尺度的转换,即可取得待测物的表面轮廓。
The present invention relates to a device and method for measuring the surface profile of an object to be measured, which detects the change of the interference intensity distribution of the broadband light by searching the interference intensity of broadband light, and converts the interference intensity distribution of at least one specific wavelength included in the broadband light to obtain a phase distribution diagram of at least one specific wavelength, and then performs phase restoration processing on the phase distribution diagram of at least one specific wavelength to obtain a phase restoration diagram of at least one specific wavelength. Finally, the phase restoration diagram of at least one specific wavelength is converted from phase to physical scale to obtain the surface profile of the object to be measured.
Description
技术领域technical field
本发明是关于一种量测待测物表面轮廓的装置及方法,尤指一种分析白光干涉条纹以量测待测物表面轮廓的装置及方法。The invention relates to a device and method for measuring the surface profile of an object to be measured, especially a device and method for analyzing white light interference fringes to measure the surface profile of the object to be measured.
背景技术Background technique
量测待测物表面轮廓可让使用者了解待测物表面轮廓是否正常或符合使用者的预期,而目前量测待测物表面轮廓的技术是使用白光垂直扫描干涉(vertical scanning interferometry)分析的方法。白光是指波长400-700纳米(nm)的宽频光,由于白光的相互干涉所需的长度极短,约为8-10纳米,所以光程差需小于相互干涉所需的长度,方能产生明显的干涉现象。故此方法可用以观察极小范围的变化,并对待测物可提供精准的表面轮廓的量测。Measuring the surface profile of the object to be tested allows the user to know whether the surface profile of the object to be tested is normal or in line with the user's expectations. However, the current technology for measuring the surface profile of the object to be tested uses white light vertical scanning interferometry (vertical scanning interferometry) analysis method. White light refers to broadband light with a wavelength of 400-700 nanometers (nm). Since the length required for mutual interference of white light is extremely short, about 8-10 nanometers, the optical path difference must be smaller than the length required for mutual interference to produce obvious interference. Therefore, this method can be used to observe changes in a very small range, and can provide accurate measurement of the surface profile of the object to be tested.
白光垂直扫描分析可区分成二大技术:波峰感测分析(peak-sensinganalysis)以及频谱分析(spectrum analysis),此二种方法皆利用分光元件而将白光区分成量测光以及参考光,量测光是用以入射至待测物表面,参考光是用以入射至标准参考面,通过由调变量测光路中量测光与参考光的光程差并记录干涉强度的变化,纪录产生最大干涉对比时的位置,从而建立出三维表面轮廓。White light vertical scanning analysis can be divided into two major technologies: peak-sensing analysis and spectrum analysis. Both of these two methods use light-splitting elements to divide white light into measurement light and reference light. The light is used to be incident on the surface of the object to be measured, and the reference light is used to be incident on the standard reference surface. By adjusting the optical path difference between the measurement light and the reference light in the measurement light path and recording the change of the interference intensity, the record produces the maximum position during interference contrast, thereby establishing a three-dimensional surface profile.
美国专利第4340306号,发明名称,[Optical system for surfacetopography measurement],其使用波峰感测分析以检测最大干涉对比(强度)所发生位置,以重建出待测物的表面轮廓。然而,于量测大阶高表面轮廓时,为维持一定的量测精度,往往会耗费大量的量测时间。US Patent No. 4340306, title of the invention, [Optical system for surfacetopography measurement], which uses peak sensing analysis to detect where the maximum interference contrast (intensity) occurs to reconstruct the surface profile of the object to be measured. However, in order to maintain a certain measurement accuracy when measuring a large-order high-level surface profile, a large amount of measurement time is often consumed.
如图1所示,美国专利第5398113号,发明名称【Method and apparatusfor surface topography measurement by spatial-frequency analysisof interferograms】,其使用频谱分析并利用傅利叶转换(FourierTransform)及最小平方拟合法,得到对应白光中不同波长的初始相位差,以重建出待测物表面轮廓高度。然而,此技术是对复数个连续波长进行傅利叶转换,假设,单一像素若有N笔扫描资料,则完成傅利叶转换所需的运算次数至少为N*10g2*N次,要完成最小平方拟合的运算则需要N次的运算次数,则完成单一像素所需的运算次数至少为N2*10g2*N次。因此,于量测大阶高表面轮廓时,由于所需运算的资料量与运算次数仍无法有效减少,仍会耗费大量的运算时间与记忆空间。As shown in Figure 1, U.S. Patent No. 5398113, the name of the invention [Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms], which uses spectrum analysis and uses Fourier Transform (FourierTransform) and least square fitting method to obtain the corresponding white light The initial phase difference of different wavelengths is used to reconstruct the height of the surface profile of the object to be measured. However, this technology performs Fourier transformation on multiple continuous wavelengths. Assuming that if there are N scan data for a single pixel, the number of operations required to complete the Fourier transformation is at least N*10g 2 *N times, and the least square fitting must be completed The calculation of N times is required, and the number of operations required to complete a single pixel is at least N 2 *10g 2 *N times. Therefore, when measuring the profile of a large-order high surface, a large amount of computing time and memory space will still be consumed because the amount of required computing data and the number of computing operations cannot be effectively reduced.
由于上述两种量测待测物表面轮廓高度的技术,皆需要大量的运算时间与记忆空间,并无比较快速、有效率的改进方法,这将无法满足使用者的需求。Since the above two techniques for measuring the height of the surface profile of the object to be tested require a large amount of computing time and memory space, there is no relatively fast and efficient improvement method, which will not be able to meet the needs of users.
发明内容Contents of the invention
本发明的主要目的是在提供一种量测待测物表面轮廓的装置,以便能迅速取得待测物表面轮廓,并有效地简化系统架构与成本。The main purpose of the present invention is to provide a device for measuring the surface profile of the object to be measured, so as to quickly obtain the surface profile of the object to be measured, and effectively simplify the system structure and cost.
本发明的另一目的是在提供一种量测待测物表面轮廓的方法,以便能迅速取得待测物表面轮廓,有效降低记忆空间及所需的运算次数。Another object of the present invention is to provide a method for measuring the surface profile of the object to be measured, so as to quickly obtain the surface profile of the object to be measured, effectively reducing the memory space and the required number of calculations.
为达成上述目的,本发明揭露一种量测待测物表面轮廓的装置,包括:宽频光源,是用以提供宽频光,宽频光是包括至少一特定波长的光波;光束整形系统,是用以接收宽频光,并将宽频光输出;分光镜,是用以接收光束整形系统所输出的宽频光,并输出之,并用以接收干涉宽频光,并输出之;参考镜面,是用以入射参考光,并反射之;分合光元件,是用以将分光镜所输出的宽频光分成量测光以及参考光,量测光是用以入射至待测物表面,并反射之,分合光元件将反射的量测光以及参考光合光后,输出干涉宽频光;位移器,是以调整分合光元件与参考镜面及分合光元件与待测物之间距离;以及阵列式强度检测器,是用以接收分光镜所反射的干涉宽频光,并对至少一特定波长的光波进行分析以取得待测物表面轮廓。To achieve the above object, the present invention discloses a device for measuring the surface profile of an object to be measured, including: a broadband light source for providing broadband light, the broadband light includes light waves of at least one specific wavelength; a beam shaping system for Receive the broadband light and output the broadband light; the beam splitter is used to receive the broadband light output by the beam shaping system and output it, and is used to receive the interference broadband light and output it; the reference mirror is used to enter the reference light , and reflect it; the light splitting element is used to divide the broadband light output by the beam splitter into measurement light and reference light. The measurement light is used to enter the surface of the object to be measured and reflect it. The reflected measuring light and the reference photosynthetic light are outputted as interference broadband light; the shifter is used to adjust the distance between the split-combining element and the reference mirror and the distance between the split-combining element and the object to be measured; and the array intensity detector, It is used to receive the interference broadband light reflected by the spectroscope, and analyze the light wave of at least one specific wavelength to obtain the surface profile of the object to be measured.
为达成上述目的,本发明揭露一种量测待测物表面轮廓的方法,是包括下列步骤:(A)检索宽频光的干涉强度;(B)检测宽频光的干涉强度分布的变化;(C)对宽频光所包括的至少一特定波长的干涉强度分布进行转换,以取得至少一特定波长的相位分布图;(D)对至少一特定波长的相位分布图进行相位还原的处理以取得至少一特定波长的相位还原图;以及(E)对至少一特定波长的相位还原图进行相位-物理尺度的转换以取得待测物的表面轮廓。In order to achieve the above object, the present invention discloses a method for measuring the surface profile of an object to be measured, which includes the following steps: (A) retrieving the interference intensity of the broadband light; (B) detecting the change of the interference intensity distribution of the broadband light; (C ) converting the interference intensity distribution of at least one specific wavelength included in broadband light to obtain a phase distribution diagram of at least one specific wavelength; (D) performing phase reduction processing on the phase distribution diagram of at least one specific wavelength to obtain at least one a phase restoration map of a specific wavelength; and (E) performing phase-physical scale conversion on the phase restoration map of at least one specific wavelength to obtain a surface profile of the object to be tested.
附图说明Description of drawings
图1是现有量测待测物表面轮廓装置的示意图;1 is a schematic diagram of an existing device for measuring the surface profile of an object to be measured;
图2是本发明量测待测物表面轮廓装置的示意图;Fig. 2 is a schematic diagram of the device for measuring the surface profile of the object to be measured according to the present invention;
图3是本发明量测待测物表面轮廓方法的流程图;Fig. 3 is a flow chart of the method for measuring the surface profile of the object to be measured according to the present invention;
图4是白光垂直扫描干涉强度变化的波形图;Fig. 4 is a waveform diagram of white light vertical scanning interference intensity variation;
图5是特定波长的相位分布平面图;Figure 5 is a plan view of the phase distribution of a specific wavelength;
图6是特定波长的相位还原图;Figure 6 is a phase restoration diagram of a specific wavelength;
图7是待测物表面轮廓的示意图。Fig. 7 is a schematic diagram of the surface profile of the object to be measured.
具体实施方式Detailed ways
本发明量测待测物表面轮廓的装置及方法是针对复数个特定的单波长的干涉信号进行傅利叶转换,以取得复数特定的单波长的初始相位分布,再利用单波长或多波长相移干涉中的相位还原的方法,因而重建待测物表面轮廓。由于本发明量测待测物表面轮廓的方法所需的记忆空间、运算次数、及运算时间皆较现有技术为少,同时可直接应用在结合单波长相移干涉与白光垂直扫描干涉的表面轮廓干涉仪装置上,同时可用处理单波长相移干涉术中的相位还原演算法来处理白光垂直扫描干涉术的干涉信号。The device and method for measuring the surface profile of the object to be measured in the present invention is to perform Fourier transformation on a plurality of specific single-wavelength interference signals to obtain a complex number of specific single-wavelength initial phase distributions, and then use single-wavelength or multi-wavelength phase shift interference The method of phase restoration in , thus reconstructing the surface profile of the object under test. Since the method for measuring the surface profile of the object to be tested requires less memory space, number of operations, and operation time than the prior art, it can be directly applied to surfaces that combine single-wavelength phase-shift interference and white light vertical scanning interference On the profile interferometer device, at the same time, the phase restoration algorithm in the single-wavelength phase-shift interferometry can be used to process the interference signal of the white light vertical scanning interferometry.
如图2所示,本发明量测待测物表面轮廓的装置是包括下列元件:宽频光源12、光束整形系统14、分光镜16、阵列式强度检测器18、位移器20、分合光元件22、参考镜面24、及待测物26,上述元件的说明如下:As shown in Figure 2, the device for measuring the surface profile of the object to be measured in the present invention includes the following elements: a
宽频光源12是用以提供宽频光,即白光,至光束整形系统14。光束整形系统14是用以将宽频光源12所提供的宽频光,均匀地入射至分光镜16。The
分光镜16是用以将光束整形系统14所入射的宽频光反射至分合光元件22,并将来分合光元件22所入射的干涉宽频光透射至阵列式强度检测器18。The
分合光元件22将分光镜16所入射的宽频光分成量测光以及参考光,量测光是用以入射至待测物26表面,并反射之;参考光是用以入射至参考镜面24,并反射之。当反射的量测光以及参考光经由分合光元件22合光后,形成干涉宽频光,再将干涉宽频光入射至阵列式强度检测器18。此时,双光束(干涉宽频光)干涉强度分布表示如下:The splitting and combining
I=IDC.[1+V.cos(φ)]表示双光束间的干涉相位差。使用者通过由对位移器20进行光轴方向的垂直扫移,依序改变双光束间的干涉相位差,再经由阵列式强度检测器18纪录干涉强度的变化,即可得知待测物表面上任一点的白光垂直扫描干涉强度变化图(如图4所示)。其中整体干涉强度的变化会随着同调函式V的波包形式而变化。I=I DC .[1+V.cos(φ)] represents the interference phase difference between the two beams. The user changes the interference phase difference between the two beams sequentially by moving the
由于宽频光的双光束干涉可以视为同时间复数个单频光双光束干涉的集合,所以宽频光双光束干涉强度的分布可表示如下:Since the double-beam interference of broadband light can be regarded as a collection of multiple single-frequency light double-beam interferences at the same time, the distribution of broadband light double-beam interference intensity can be expressed as follows:
σ是表示波长的倒数(1/λ),亦称为波数:(σ,x,y,)=0(σ,x,y,)+Δ(σ,x,y,)是表示对应各单频光的干涉相位差;(x,y)是表示量测点(以pixel为单位)的位置,并以阵列式强度检测器18的平面空间位置来表示,其可对应至待测物表面上的一个点。由于宽频光的双光束干涉可以视为同时间复数个单频光双光束干涉的集合,使用者可选取特定波长λ1以作为上述量测的依据,图5是为特定波长λ1的相位分布平面图,将特定波长λ1的干涉强度变化资料做傅利叶转换,并对转换后的实部项与虚部项作反正切(tan-1)运算,即可取到特定波长λ1对量测点(x,y)干涉的相位分布平面图,待依序完成所有量测点(x,y)的上述计算,即可得出如图5所示的相位分布平面图。再通过由单波长相移干涉术中的相位还原演算法以对所有量测点(x,y)进行运算,即可得到特定波长的相位还原图,如图6所示。由于波长与相位的关系是为等效,此时,再对特定波长的相位还原图进行相位-物理尺度的转换,即能得到待测物的表面轮廓,如图7所示。由于单波长相移干涉术中的相位还原演算法以及相位-物理尺度的转换是为已知的技术,在此并不多作说明。σ is the reciprocal of the wavelength (1/λ), also known as the wave number: (σ, x, y,) = 0 (σ, x, y,) + Δ(σ, x, y,) means Corresponding to the interference phase difference of each single-frequency light; (x, y) represents the position of the measurement point (in pixel), and is represented by the plane space position of the array
本发明量测待测物表面轮廓的方法是包括下列步骤:The method for measuring the surface profile of the object to be measured in the present invention comprises the following steps:
步骤S30:检索宽频光的干涉强度。将宽频光源12所提供宽频光传送至光束整形系统14以、分光镜16、及分合光元件22后,分合光元件22将宽频光分成量测光以及参考光,量测光是用以入射至待测物26表面,并反射之;参考光是用以入射至参考镜面24,并反射之。当反射的量测光以及参考光经由分合光元件22合光后,形成干涉宽频光,再将干涉宽频光入射至阵列式强度检测器18,并通过由对位移器20进行光轴方向的垂直扫移,即可得知待测物表面上任一点的白光(宽频光)垂直扫描干涉强度分布(干涉资讯)。并通过由对位移器20进行光轴方向的垂直扫移,则可改变双光束间(量测光以及参考光)的光程差,即可得到宽频光双光束间的干涉相位差。Step S30: Retrieve the interference intensity of the broadband light. After the broadband light provided by the
步骤S32:检测宽频光的干涉强度分布的变化。阵列式强度检测器18检测宽频光双光束间的干涉强度的变化,即可得知待测物表面上任一点的白光垂直扫描干涉强度的分布。Step S32: Detect changes in the interference intensity distribution of the broadband light. The
步骤S34:对特定波长的干涉强度分布进行转换,以取得特定波长的相位分布。由于宽频光的双光束干涉可以视为同时间复数个单频光双光束干涉的集合,可选取特定波长λ1作为量测的依据,并将此特定波长λ1的干涉强度变化资料做傅利叶转换,并对转换后的实部项与虚部项作反正切运算,即可取到特定波长λ1对量测点(x,y)干涉的相位分布。待依序完成所有量测点(x,y)的上述计算,即可取得特定波长的相位分布图。Step S34: Convert the interference intensity distribution of the specific wavelength to obtain the phase distribution of the specific wavelength. Since the double-beam interference of broadband light can be regarded as a collection of multiple single-frequency light double-beam interference at the same time, a specific wavelength λ1 can be selected as the basis for measurement, and the interference intensity change data of this specific wavelength λ1 can be Fourier transformed, and The arctangent operation is performed on the converted real part and imaginary part, and the phase distribution of the interference of a specific wavelength λ1 with the measurement point (x, y) can be obtained. After the above calculations of all measurement points (x, y) are completed in sequence, the phase distribution diagram of a specific wavelength can be obtained.
步骤S36:对特定波长的相位分布图进行进行相位还原的处理以取得特定波长的相位还原图。再通过由单波长相移干涉术中的相位还原演算法以对所有量测点(x,y)进行相位还原的运算,即可得到特定波长的相位还原图。Step S36 : performing a phase restoration process on the phase distribution diagram of the specific wavelength to obtain the phase restoration diagram of the specific wavelength. Then, through the phase restoration algorithm in the single-wavelength phase-shift interferometry, the phase restoration operation is performed on all the measurement points (x, y) to obtain the phase restoration diagram of a specific wavelength.
步骤S38:对特定波长的相位还原图进行相位-物理尺度的转换以取得待测物的表面轮廓。由于波长与相位的关系是为等效,如果对特定波长的相位还原图进行相位-物理尺度的转换,即能得到待测物的表面轮廓。Step S38: performing phase-physical scale conversion on the phase restoration map of a specific wavelength to obtain the surface profile of the object to be measured. Since the relationship between wavelength and phase is equivalent, if the phase restoration diagram of a specific wavelength is converted from phase to physical scale, the surface profile of the object to be measured can be obtained.
本发明量测待测物表面轮廓的装置及方法,除了具有运算次数较少的优点外,因为使用宽频光源时不须外加滤光片便可执行传统单波长相移干涉法,更可有效地简化系统架构与成本。The device and method for measuring the surface profile of the object to be measured according to the present invention not only have the advantage of fewer operations, but also can perform the traditional single-wavelength phase-shifting interferometry without additional filters when using a broadband light source, which can be more effective Simplify system architecture and cost.
上述实施例仅是为了方便说明而举例而已,本发明所主张的权利范围而非仅限于上述实施例。The above-mentioned embodiments are only examples for convenience of description, and the scope of rights claimed by the present invention is not limited to the above-mentioned embodiments.
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100414251C (en) * | 2005-10-31 | 2008-08-27 | 致茂电子股份有限公司 | Method for repairing dark spot area of surface topography |
| CN102122054B (en) * | 2010-01-12 | 2012-10-10 | 财团法人工业技术研究院 | Focusing method and device |
| CN102297665A (en) * | 2010-06-25 | 2011-12-28 | 财团法人工业技术研究院 | Surface measuring device, measuring method and correcting method thereof |
| CN103884283A (en) * | 2012-12-19 | 2014-06-25 | 台濠科技股份有限公司 | Manual white light interference order measuring method |
| US9958267B2 (en) * | 2015-12-21 | 2018-05-01 | Industrial Technology Research Institute | Apparatus and method for dual mode depth measurement |
| CN108662992B (en) * | 2017-03-31 | 2020-10-16 | 均豪精密工业股份有限公司 | Surface measurement method and surface measurement system |
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| US4340306A (en) * | 1980-02-04 | 1982-07-20 | Balasubramanian N | Optical system for surface topography measurement |
| US4948253A (en) * | 1988-10-28 | 1990-08-14 | Zygo Corporation | Interferometric surface profiler for spherical surfaces |
| US5398113A (en) * | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
| US5706085A (en) * | 1995-08-03 | 1998-01-06 | Blossey; Stefan G. | Method for the non-contact rapid and accurate acquisition of the surface topology of objects |
| CN1384334A (en) * | 2002-06-07 | 2002-12-11 | 清华大学 | Double-frequency confocal step height microscope measuring device |
| WO2003036229A1 (en) * | 2001-10-25 | 2003-05-01 | Toray Engineering Co., Ltd. | Surface shape measuring method and device therefor |
| JP2003148921A (en) * | 2001-11-15 | 2003-05-21 | Seiko Epson Corp | Shape measuring method and device |
| CN2577238Y (en) * | 2002-10-24 | 2003-10-01 | 中国科学院上海光学精密机械研究所 | Measuring device for interference of flat-plate surface appearance |
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| US4340306A (en) * | 1980-02-04 | 1982-07-20 | Balasubramanian N | Optical system for surface topography measurement |
| US4948253A (en) * | 1988-10-28 | 1990-08-14 | Zygo Corporation | Interferometric surface profiler for spherical surfaces |
| US5398113A (en) * | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
| US5706085A (en) * | 1995-08-03 | 1998-01-06 | Blossey; Stefan G. | Method for the non-contact rapid and accurate acquisition of the surface topology of objects |
| WO2003036229A1 (en) * | 2001-10-25 | 2003-05-01 | Toray Engineering Co., Ltd. | Surface shape measuring method and device therefor |
| JP2003148921A (en) * | 2001-11-15 | 2003-05-21 | Seiko Epson Corp | Shape measuring method and device |
| CN1384334A (en) * | 2002-06-07 | 2002-12-11 | 清华大学 | Double-frequency confocal step height microscope measuring device |
| CN2577238Y (en) * | 2002-10-24 | 2003-10-01 | 中国科学院上海光学精密机械研究所 | Measuring device for interference of flat-plate surface appearance |
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| CN1673670A (en) | 2005-09-28 |
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