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CN1221027C - Semiconductor package with heat dissipation structure - Google Patents

Semiconductor package with heat dissipation structure Download PDF

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Publication number
CN1221027C
CN1221027C CN01116163.9A CN01116163A CN1221027C CN 1221027 C CN1221027 C CN 1221027C CN 01116163 A CN01116163 A CN 01116163A CN 1221027 C CN1221027 C CN 1221027C
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heat dissipation
semiconductor package
dissipation structure
chip
substrate
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CN1387252A (en
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何宗达
黄建屏
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Siliconware Precision Industries Co Ltd
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Siliconware Precision Industries Co Ltd
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    • H10W90/724
    • H10W90/736

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Abstract

A semiconductor package with a heat dissipation structure comprises a chip bearing element, wherein a plurality of welding pads are arranged on the surface of the chip bearing element for the chip to be connected, so that a heat dissipation element is connected by a plurality of soft metal supporting blocks, and the heat dissipation element is supported above the chip by the supporting blocks; the heat sink has several positioning parts corresponding to the bonding parts of the supporting blocks, so that the heat sink can be properly positioned without deviation after being attached to the chip carrier; then the heat dissipation structure formed by the heat dissipation member and the supporting block and the semiconductor chip are reflowed to the chip bearing member together, and the top surface of the heat dissipation member is exposed out of the packaging colloid to improve the heat dissipation efficiency.

Description

具有散热结构的半导体封装件Semiconductor package with heat dissipation structure

技术领域technical field

本发明是关于一种半导体封装件,尤指一种具有内嵌式散热件以提升散热效率的覆晶型球栅阵列(Flip Chip Ball Grid Array,FCBGA)半导体封装件。The invention relates to a semiconductor package, in particular to a flip-chip ball grid array (FCBGA) semiconductor package with an embedded heat sink to improve heat dissipation efficiency.

背景技术Background technique

球栅阵列(BGA)半导体封装件(Ball Grid Array SemiconductorPackage)具有较高数量的输入/出连接端(I/O Connection)得以因应高密度电子组件(Electronic Components)及电子电路(ElectronicCircuits)的半导体芯片所须,以符合电子产品对于电性功能与处理速度的需求而成为今日封装主流。然而,随着半导体芯片上电子电路与电子组件布设密度日增,芯片运作时产生的热量便愈多;如若不将半导体芯片产生的热能有效逸散,将会影响半导体芯片的性能及使用寿命。另者,传统上BGA半导体封装件的高性能芯片为封装胶体(Encapsulant)所包覆,惟构成该封装胶体的封装树脂是一导热系数仅约为0.8w/m°K的不良传热体,故使半导体芯片布设有电子电路及电子组件的作用表面(Active Surface)难以有效散热;如何有效排除半导体芯片产生的热量遂成业界所须解决的一大课题。Ball grid array (BGA) semiconductor package (Ball Grid Array Semiconductor Package) has a higher number of input/output connections (I/O Connection) to cope with semiconductor chips of high-density electronic components (Electronic Components) and electronic circuits (Electronic Circuits) It is necessary to meet the needs of electronic products for electrical functions and processing speed, and has become the mainstream of today's packaging. However, as the density of electronic circuits and electronic components on semiconductor chips increases, more heat will be generated during chip operation; if the heat energy generated by semiconductor chips is not effectively dissipated, the performance and service life of semiconductor chips will be affected. In addition, traditionally, the high-performance chip of the BGA semiconductor package is covered by encapsulant, but the encapsulant that constitutes the encapsulant is a poor heat transfer body with a thermal conductivity of only about 0.8w/m°K. Therefore, it is difficult to effectively dissipate heat on the active surface of the semiconductor chip on which the electronic circuit and electronic components are arranged; how to effectively remove the heat generated by the semiconductor chip has become a major issue to be solved in the industry.

美国专利第5,726,079号案即揭露一种覆晶型球栅阵列(Flip ChipBall Grid Array,FCBGA)封装结构(如第1图所示),其将一散热件11安置于半导体芯片12上方,藉由外露于封装件1的散热件11表面将芯片12产生的热量快速逸散到大气中。然而该项技术的缺失在于散热件11设置位置如果过高,将使模压作业实施时合模压力压迫到该散热件11,进而压迫至散热件11下方的芯片12致使芯片12受损;如若散热件11设置位置过于靠近芯片12,则易使得散热件11外露的上表面110于胶体封装制程中产生溢胶而减损其散热效益并且导致产品外观不良。因此进行该项技术须要求极高的作业精密度方使得该散热件11得正确地安置于预定高度,此举将提升制程困难度较不符合成本效益。U.S. Patent No. 5,726,079 discloses a flip-chip ball grid array (Flip ChipBall Grid Array, FCBGA) package structure (as shown in Figure 1), which arranges a heat sink 11 above the semiconductor chip 12, by The surface of the heat sink 11 exposed to the package 1 quickly dissipates the heat generated by the chip 12 into the atmosphere. However, the lack of this technology is that if the heat sink 11 is set too high, the mold clamping pressure will be pressed to the heat sink 11 when the molding operation is carried out, and then the chip 12 under the heat sink 11 will be pressed to cause damage to the chip 12; If the part 11 is placed too close to the chip 12, the exposed upper surface 110 of the heat sink 11 will be easily overflowed during the colloidal encapsulation process, which will reduce its heat dissipation effect and lead to poor appearance of the product. Therefore, this technique requires extremely high precision in order to ensure that the heat sink 11 is correctly placed at a predetermined height, which will increase the difficulty of the manufacturing process and is not cost-effective.

另外,美国专利第5,977,626号案亦揭示一种具有特殊形式散热件11的半导体封装结构1。如第2图所示,此种半导体封装结构1包括一散热件11黏接至一接设有半导体芯片12的基板14上;其中该散热件11具有一平坦部111及用以将该平坦部111支撑于芯片上方的支撑部112,俾使该平坦部111与支撑部112形成一收纳空间以供该芯片12及金线13置入,同时,该支撑部112形成有多个凸点113,使得该散热件11得藉这些凸点113稳定接置于该基板14上。In addition, US Patent No. 5,977,626 also discloses a semiconductor package structure 1 with a special heat sink 11 . As shown in Figure 2, this semiconductor package structure 1 includes a heat sink 11 bonded to a substrate 14 on which a semiconductor chip 12 is attached; wherein the heat sink 11 has a flat portion 111 and is used for the flat portion 111 is supported on the support part 112 above the chip, so that the flat part 111 and the support part 112 form a storage space for the chip 12 and the gold wire 13 to be inserted. At the same time, the support part 112 is formed with a plurality of bumps 113, The heat sink 11 is stably connected to the substrate 14 through the bumps 113 .

是种封装结构1虽可藉由特殊形状的散热件11设计提升芯片散热效率,但该封装体仍然具有前述专利(美国专利第5,726,079号)不易妥切安置散热件11位置的问题。此外,制作该特殊形式的散热件11时须使用冲压制程(Stamping)俾以形成向下弯曲的支撑部112,除增加封装成本以外,经冲压后该散热件11平坦部111的平面度(Planarity)往往受到影响而导致封装树脂溢胶于平坦部111的上表面110(即散热件11的外露表面110);尤其现今半导体封装件力朝薄化趋势开发,所用的散热件11厚度常薄至0.2mm甚或更薄,散热件11结构强度因薄化而降低将使该平坦部111的平面度更难维持,溢胶现象遂无法避免。Although this kind of package structure 1 can improve the heat dissipation efficiency of the chip through the design of the heat sink 11 with a special shape, the package still has the problem that it is difficult to properly place the heat sink 11 in the aforementioned patent (US Patent No. 5,726,079). In addition, the stamping process (Stamping) must be used to form the downwardly bent support portion 112 when making this special form of heat sink 11. In addition to increasing the packaging cost, the flatness of the flat portion 111 of the heat sink 11 after stamping (Planarity ) are often affected and cause the packaging resin to overflow on the upper surface 110 of the flat portion 111 (that is, the exposed surface 110 of the heat sink 11); especially nowadays, semiconductor packages are being developed towards a thinner trend, and the thickness of the heat sink 11 used is often as thin as 0.2 mm or even thinner, the reduced structural strength of the heat sink 11 due to the thinning will make it more difficult to maintain the flatness of the flat portion 111 , and the glue overflow phenomenon cannot be avoided.

发明内容Contents of the invention

本发明的目的即在提供一种具内嵌式散热结构的半导体封装件,该散热结构上设置有多个质软金属支撑块藉以释除均摊合模作业中模压模具对于散热件乃至于芯片产生的压迫力,俾以避免半导体芯片受损并使散热件得以精确定位而平稳贴置于芯片上方,除维持该散热件的优良平面性(Planarity)以外,并得令使散热结构的外露表面不致溢胶故而提升封装件的整体散热效率。The purpose of the present invention is to provide a semiconductor package with a built-in heat dissipation structure. The heat dissipation structure is provided with a plurality of soft metal support blocks so as to relieve the impact of the mold on the heat dissipation parts and even the chip during the mold clamping operation. In order to avoid damage to the semiconductor chip and allow the heat sink to be accurately positioned and placed on the chip smoothly, in addition to maintaining the excellent planarity of the heat sink, the exposed surface of the heat dissipation structure is not The excess glue thus improves the overall heat dissipation efficiency of the package.

本发明的另一目的即在提供一种藉由调整基板上植接焊垫开口的尺寸以便控制该散热结构与基板的间距,俾以降低封装成本以及制程复杂性的具内嵌式散热结构的半导体封装件。Another object of the present invention is to provide a built-in heat dissipation structure by adjusting the size of the opening of the implant pad on the substrate so as to control the distance between the heat dissipation structure and the substrate, so as to reduce the packaging cost and the complexity of the manufacturing process. semiconductor package.

鉴于上揭及其它目的,本发明具内嵌式散热结构的半导体封装件包括:一基板,其具有一正面及一相对的背面,于该基板正面上分别接设一组焊接焊垫及一组植球焊垫,并在该基板背面布设多个导电焊垫;一半导体芯片,具有一铺设有电子电路与电子组件的作用表面,其上植接有多个锡焊凸块俾供该芯片与基板导电连接;一散热结构,其藉一散热件及多个质软金属支撑块所构成者,其中该散热件下表面开设有多个定位部以供这些支撑块黏设;多个焊球,植置于该些导电焊垫上俾供该芯片与外部装置进行电性藕接;以及一用以包覆该半导体芯片、散热结构及部分基板,并令使该散热件上表面外露的封装胶体。In view of the foregoing disclosure and other purposes, the semiconductor package with an embedded heat dissipation structure of the present invention includes: a substrate having a front surface and an opposite back surface, and a set of welding pads and a set of welding pads are respectively connected on the front surface of the substrate. Ball planting pads, and a plurality of conductive pads are arranged on the back of the substrate; a semiconductor chip has an active surface on which electronic circuits and electronic components are laid, and a plurality of soldering bumps are implanted on it for the chip and The conductive connection of the substrate; a heat dissipation structure, which is formed by a heat dissipation element and a plurality of soft metal support blocks, wherein the lower surface of the heat dissipation element is provided with a plurality of positioning parts for these support blocks to be glued; a plurality of solder balls, Implanted on the conductive pads to provide electrical coupling between the chip and external devices; and an encapsulant for covering the semiconductor chip, heat dissipation structure and part of the substrate, and exposing the upper surface of the heat dissipation element.

该散热件上的定位部得为形成于该下表面上的凹穴或由该散热件上表面贯穿至下表面的贯穿孔,待这些质软金属支撑块(即由锡、铅、铅/锡合金及类似合金等软质金属材质制得)黏置俾以构成一散热结构而与该芯片的锡焊凸块同时回焊至基板实施模压作业时,该散热件距离基板正面的高度略大于形成封装胶体的封装模具的模穴顶面与基板的间距,遂使合模执行时模具提供的合模压迫力得经由这些质软金属支撑块溃缩(Collapse)释除而抵减,并且平均分摊于散热件上俾以降低半导体芯片承受的压力免于芯片受损,又能使得该散热件平整地附靠于该芯片上方藉以维持散热件的良好平面性。The positioning portion on the heat sink can be formed on the lower surface or a through hole that penetrates from the upper surface of the heat sink to the lower surface. Alloy and similar alloys and other soft metal materials) are glued to form a heat dissipation structure and are reflowed to the substrate at the same time as the solder bumps of the chip for molding operations. The height of the heat sink from the front of the substrate is slightly greater than that The distance between the top surface of the mold cavity and the substrate of the encapsulant encapsulation mold enables the mold clamping pressure provided by the mold to be released by the collapse of these soft metal support blocks during mold clamping, and is evenly distributed among the The heat dissipation element is used to reduce the pressure on the semiconductor chip to avoid damage to the chip, and also enables the heat dissipation element to be flatly attached to the top of the chip so as to maintain a good planarity of the heat dissipation element.

另一方面,这些定位部的开设除了提供一空隙俾利质软金属支撑块溃缩时具有一压力缓冲空间之外,藉由这些支撑块回焊至基板的焊接焊垫上亦使得该散热件精准无误地定位至基板上而无偏位的虞,则进行模压制程时该散热件顶面与模具上模的模穴顶面得以紧密接合遂可防止溢胶现象的发生。On the other hand, in addition to providing a space for the positioning portion to provide a pressure buffer space when the soft metal support block collapses, the heat sink is also made accurate by reflowing these support blocks to the welding pads of the substrate. If it is correctly positioned on the base plate without the risk of misalignment, the top surface of the heat sink and the top surface of the mold cavity of the upper mold of the mold can be tightly bonded during the molding process, thereby preventing the occurrence of glue overflow.

附图说明Description of drawings

以下以较佳具体例配合所附图式进一步详述本发明的特点及功效:Cooperate with the accompanying drawings below to further describe the characteristics and effects of the present invention in detail with preferred specific examples:

第1图是美国专利第5,726,079号案的半导体封装件的剖视图;Figure 1 is a cross-sectional view of a semiconductor package of US Patent No. 5,726,079;

第2图是美国专利第5,977,626号案的半导体封装件的剖视图;Figure 2 is a cross-sectional view of a semiconductor package of US Patent No. 5,977,626;

第3图是本发明第一实施例的半导体封装件的剖视图;Fig. 3 is a cross-sectional view of a semiconductor package according to a first embodiment of the present invention;

第4A至4D图是本发明半导体封装件第一实施例的详细制程图;Figures 4A to 4D are detailed process drawings of the first embodiment of the semiconductor package of the present invention;

第5图是本发明半导体封装件实施模压制程前后的比较剖视图;Fig. 5 is a comparative sectional view before and after the molding process of the semiconductor package of the present invention;

第6图是本发明第二实施例的半导体封装件的剖视图;以及,FIG. 6 is a cross-sectional view of a semiconductor package according to a second embodiment of the present invention; and,

第7图是本发明第三实施例的半导体封装件的剖视图。FIG. 7 is a cross-sectional view of a semiconductor package according to a third embodiment of the present invention.

符号标号说明Description of symbols

1,2,3     半导体封装件         20,30    锡球1, 2, 3 semiconductor package 20, 30 solder balls

11,21,31  内嵌式散热片         110,210  散热片上表面11, 21, 31 Embedded heat sink 110, 210 Upper surface of heat sink

211,311    散热片下表面         212       凹穴211, 311 Lower surface of heat sink 212 Dimple

312         贯穿孔               213,313  胶黏层312 Through hole 213, 313 Adhesive layer

111         平坦部          112         支撑部111 Flat part 112 Support part

113         凸点            12,22,32  半导体芯片113 Bumps 12, 22, 32 Semiconductor chips

220         作用表面        221         非作用表面220 Active surface 221 Non-active surface

13          金线            23,33      锡焊凸块13 Gold wire 23, 33 Solder bump

14,24,34  基板            240         基板正面14, 24, 34 Substrate 240 Substrate front

241         基板背面        242,342    焊接焊垫241 Substrate backside 242, 342 Solder pads

243         植球焊垫        243a        植球焊垫开口243 Ball Mounting Pad 243a Ball Mounting Pad Opening

244         导电焊垫        245         芯片接置区244 Conductive Pad 245 Chip Landing Area

15,25,35  焊球            16,26,36  封装胶体15, 25, 35 solder balls 16, 26, 36 encapsulant

17,37      底部填胶        28          模压模具17, 37 Underfill rubber 28 Molding mold

280         模穴顶面        29          散热结构280 Top surface of mold cavity 29 Heat dissipation structure

具体实施方式Detailed ways

以下即配合所附图式详细说明本发明的覆晶型球栅阵列(FCBGA)半导体封装件各实施例。Various embodiments of the flip-chip ball grid array (FCBGA) semiconductor package of the present invention will be described in detail below with reference to the accompanying drawings.

第一实施例:First embodiment:

第3图为本发明第一实施例的具内嵌式散热件FCBGA半导体封装件2,该封装结构是由一表面提供多个焊垫242,243,244接置的基板24,一具一作用表面220的半导体芯片22,一黏置有多个第一焊球20的内嵌式散热片21(Embedded Heat Sink,EDHS),多个植接于该芯片22作用表面220的锡焊凸块23,多个植设于该基板24上俾供半导体芯片12与外部装置(未图标)电性连结的第二焊球25,以及一用以包覆该芯片22及散热片21,并使该散热片21上表面210外露的封装胶体26所构成者。Figure 3 is a FCBGA semiconductor package 2 with an embedded heat sink according to the first embodiment of the present invention. The package structure is a substrate 24 with a plurality of solder pads 242, 243, 244 connected to one surface, each with a function. A semiconductor chip 22 on the surface 220, an embedded heat sink 21 (Embedded Heat Sink, EDHS) with a plurality of first solder balls 20 glued, a plurality of soldering bumps 23 implanted on the active surface 220 of the chip 22 , a plurality of second solder balls 25 planted on the substrate 24 for electrical connection between the semiconductor chip 12 and an external device (not shown), and one for covering the chip 22 and the heat sink 21, and making the heat dissipation The package compound 26 exposed on the upper surface 210 of the chip 21 is formed.

第4A至4D图为本发明第一实施例的具内嵌式散热件FCBGA半导体封装件2的详细制作流程,以下即就该封装件说明其各部制程。Figures 4A to 4D show the detailed manufacturing process of the FCBGA semiconductor package 2 with an embedded heat sink according to the first embodiment of the present invention. The manufacturing process of each part of the package will be described below.

先置一基板24,如第4A图所示,该基板24具有一正面240及一相对的背面241;其中,于该基板24正面240上形成有一组焊接焊垫242(Bonding Pads)与一组植球焊垫243(Ball Pads),而基板24背面241上则另设置有多个导电焊垫244。在基板24正面240上预设有一芯片接置区245提供这些焊接焊垫242形成俾与半导体芯片(未图标)的锡焊凸块(未图标)接置,这些焊接焊垫242分别藉由复数条导电迹线(未图标)穿越导电通孔(未图标)而电性连结至该基板24背面241的多个导电焊垫244上;另于基板24上该芯片接置区245外围的适当位置形成多个植球焊垫243以便与该散热件(未图标)上的第一焊球(未图标)焊接,同时,该植球焊垫243亦得具有接地功能(Grounding),除能提升半导体封装件2的整体散热效率外,复可提高其电性。该植球焊垫243的形成与已有BGA基板上用以供焊球(未图标)植接其上的导电焊垫244相同,遂不另为文赘述。First place a substrate 24, as shown in Fig. 4A, this substrate 24 has a front 240 and a relative back 241; The ball planting pads 243 (Ball Pads), and the back 241 of the substrate 24 are additionally provided with a plurality of conductive pads 244. A chip landing area 245 is preset on the front surface 240 of the substrate 24 to provide these welding pads 242 to be formed so as to be connected with solder bumps (not shown) of a semiconductor chip (not shown). These welding pads 242 are respectively connected by a plurality of A conductive trace (not shown) passes through a conductive via (not shown) and is electrically connected to a plurality of conductive pads 244 on the back surface 241 of the substrate 24 ; A plurality of ball planting pads 243 are formed so as to be soldered to the first solder balls (not shown) on the heat sink (not shown). In addition to the overall heat dissipation efficiency of the package 2, its electrical properties can be improved. The formation of the ball-planting pad 243 is the same as that of the conductive pad 244 on the existing BGA substrate for solder balls (not shown) to be planted thereon, so it will not be repeated here.

该半导体芯片22具有一作用表面220及一相对的非作用表面221,请参阅第4B图。该作用表面220上布设有多个电子电路及电子组件(未图标),以及多个输入/输出焊垫(未图标)俾使多个锡焊凸块23(SolderBump)接置而得与基板24(如第4A图所示)进行电性藕接,这些锡焊凸块23透过底部金属化制程(Under Bump Metallization)等方式植接,此等覆晶形成方法悉属已知故不另着墨。The semiconductor chip 22 has an active surface 220 and an opposite non-active surface 221, please refer to FIG. 4B. A plurality of electronic circuits and electronic components (not shown), and a plurality of input/output pads (not shown) are arranged on the active surface 220 so that a plurality of solder bumps 23 (SolderBump) are connected to the substrate 24 (As shown in FIG. 4A ) for electrical coupling, these solder bumps 23 are implanted through the bottom metallization process (Under Bump Metallization) and other methods. These flip-chip formation methods are known and will not be described separately. .

再者,另备一铜、铝等金属材质的内嵌式散热片21,如第4C图所示,该散热片21具有一上表面210及一相对的下表面211,藉由已有半蚀(Half Etching)或冲制(Stamping)技术(俱为已有故不予赘述)于该散热片21下表面211适当位置开设多个凹穴212俾供一如环氧树脂(Epoxy)等胶黏层213涂布其上;而后,将多个第一焊球20一一置入这些覆有胶黏层213的凹穴212内致使该第一焊球20得稳固接置于该散热片21上以构成一散热结构29,且该第一焊球20的垂直高度H须大于等于半导体芯片22厚度与锡焊凸块23高度的总和。该第一焊球20除以锡为材质制作外,铅、锡/铅合金及类似合金等其它软质金属亦适用之。Moreover, prepare an embedded heat sink 21 made of metal materials such as copper and aluminum. As shown in FIG. 4C, the heat sink 21 has an upper surface 210 and an opposite lower surface 211. (Half Etching) or stamping (Stamping) technology (both are existing and therefore will not be described in detail) to set up a plurality of recesses 212 at appropriate positions on the lower surface 211 of the heat sink 21 for glue such as epoxy resin (Epoxy) Layer 213 is coated thereon; Then, a plurality of first solder balls 20 are placed one by one into these cavities 212 covered with adhesive layer 213 so that the first solder balls 20 are firmly connected to the heat sink 21 In order to form a heat dissipation structure 29 , the vertical height H of the first solder ball 20 must be greater than or equal to the sum of the thickness of the semiconductor chip 22 and the height of the solder bump 23 . The first solder ball 20 is not only made of tin, but other soft metals such as lead, tin/lead alloys and similar alloys are also applicable.

将该半导体芯片22及内嵌式散热片21分别地藉以锡焊凸块23与这些第一焊球20同时回焊(Solder Reflow)至基板24对应的焊垫242,243上,如第4D图所示,以回焊作业进行植球时,会因其自动对位(Self-Alignment)而使第一焊球20得以精准植接于植球焊垫243上免除偏位之虞;并且,藉由基板24表面植球焊垫243开口243a开设的大小,得以较便利地调整内嵌式散热片21在封装件2内的高度(植球焊垫243开口243a较大,则第一焊球20受压而下陷较深,致使该散热片21于封装件2内的高度较小而较为贴近芯片22;反之亦然)。半导体芯片22、锡焊凸块23及散热片21上的第一焊球20同时回焊于基板后即可施以模压制程。The semiconductor chip 22 and the embedded heat sink 21 are reflowed (Solder Reflow) to the corresponding pads 242, 243 of the substrate 24 by means of soldering bumps 23 and these first solder balls 20 respectively, as shown in FIG. 4D As shown, when performing ball planting by reflow operation, the first solder ball 20 can be accurately implanted on the ball planting pad 243 due to its self-alignment (Self-Alignment) to avoid the risk of misalignment; and, by The size of the opening 243a of the ball planting pad 243 on the surface of the substrate 24 can facilitate the adjustment of the height of the embedded heat sink 21 in the package 2 (the opening 243a of the ball planting pad 243 is larger, the first solder ball 20 The pressure sinks deeper, so that the height of the heat sink 21 in the package 2 is smaller and closer to the chip 22; and vice versa). After the semiconductor chip 22 , the solder bump 23 and the first solder ball 20 on the heat sink 21 are simultaneously reflowed to the substrate, the molding process can be performed.

该封装胶体26是以已有的环氧树脂等材料形成,俾以包覆该半导体芯片22、锡焊凸块23以及散热结构29。如第5图所示,为使该半导体封装件2的散热效率得以有效提升,该散热片21的上表面210外露出该封装胶体26以直接与大气接触。由于该第一焊球20具一质软特性,且第一焊球20与散热片21之间相隔的胶黏层213亦为一吸收压力的缓冲介质,故得令该散热结构29距离基板24正面240的高度H1略大于用以形成封装胶体26的封装模具28的模穴顶面280与该基板24正面240的间距,则进行合模作业时,该封装模具28的模穴顶面280即会提供一向下压迫力俾使与该散热片21相接的第一焊球20受压而变形下陷,该散热片21的上表面210密接于模穴顶面280致使两者间不致形成间隙,故能避免溢胶现象的发生并得确保封装制品的外观及散热性;另者,因该第一焊球20与黏置其上的胶黏层213具有吸收变形量的特性,得以有效释除抵减封装模具28对于散热片21乃至于芯片22产生的压迫力,故可防止半导体芯片22在模压过程中发生裂损。The encapsulant 26 is formed of existing materials such as epoxy resin to cover the semiconductor chip 22 , the soldering bump 23 and the heat dissipation structure 29 . As shown in FIG. 5 , in order to effectively improve the heat dissipation efficiency of the semiconductor package 2 , the upper surface 210 of the heat sink 21 exposes the encapsulant 26 to directly contact with the atmosphere. Since the first solder ball 20 has a soft property, and the adhesive layer 213 between the first solder ball 20 and the heat sink 21 is also a buffer medium for absorbing pressure, the distance between the heat dissipation structure 29 and the substrate 24 The height H1 of the front side 240 is slightly greater than the distance between the cavity top surface 280 of the packaging mold 28 used to form the encapsulant 26 and the front surface 240 of the substrate 24, so when the mold clamping operation is performed, the cavity top surface 280 of the packaging mold 28 is A downward pressing force is provided so that the first solder ball 20 in contact with the heat sink 21 is deformed and sinks under pressure, and the upper surface 210 of the heat sink 21 is in close contact with the top surface 280 of the mold cavity so that no gap is formed between the two. Therefore, the occurrence of glue overflow can be avoided and the appearance and heat dissipation of the packaged product can be ensured; in addition, because the first solder ball 20 and the adhesive layer 213 stuck thereon have the characteristics of absorbing deformation, they can be effectively released. The compressive force produced by the packaging mold 28 on the heat sink 21 and even the chip 22 can be offset, so that the semiconductor chip 22 can be prevented from cracking during the molding process.

第二实施例:Second embodiment:

第6图所示者为本发明第二实施例的半导体封装件剖视图,该第二实施例的半导体封装件3与第一实施例中所揭示者大致相同,其不同处在于该散热片31上开设多个贯穿孔312俾以取代凹穴作为接置锡球30的定位孔。藉由已有打孔技术于该散热片31上适当位置预先钻制多个贯穿孔312,复于散热片31下表面311的贯穿孔312开口涂布胶黏剂313以黏接锡球30并进行后续封装作业,俟进行合模作业时,由于模压模具(未图标)施予散热片31的压迫力迫使第一焊球30受压变形,此时这些贯穿孔312得以形成一缓冲空间利于压迫力释除,使得传递至芯片的压力减小,遂更有助于维持半导体芯片32的结构完整性。Figure 6 is a cross-sectional view of the semiconductor package of the second embodiment of the present invention, the semiconductor package 3 of the second embodiment is substantially the same as that disclosed in the first embodiment, the difference lies in the heat sink 31 A plurality of through holes 312 are opened to replace the recesses as positioning holes for connecting the solder balls 30 . A plurality of through holes 312 are pre-drilled at appropriate positions on the heat sink 31 by existing drilling technology, and an adhesive 313 is applied to the openings of the through holes 312 on the lower surface 311 of the heat sink 31 to bond the solder balls 30 and After the subsequent packaging operation, when the mold clamping operation is performed, the first solder ball 30 is forced to be deformed due to the pressing force exerted by the molding die (not shown) on the heat sink 31. At this time, these through holes 312 can form a buffer space to facilitate compression. The force is relieved so that less stress is transmitted to the chip, which in turn helps to maintain the structural integrity of the semiconductor chip 32 .

第三实施例:Third embodiment:

第7图为本发明第三实施例的半导体封装件剖视图,该第三实施例的半导体封装件与前述两实施例大致相同,其不同处在于该实施例为维持芯片32的锡焊凸块33与基板34上焊接焊垫342的焊接品质,遂于回焊作业完成后复施以胶体底部充填(Underfill)(如第7图37所示),则进行模压制程时锡焊凸块33与焊接焊垫342间脆弱地焊接连结不致遭受模压模具(未图标)施予的压迫力而破坏,遂能确保覆晶焊接的品质信赖性。Fig. 7 is a cross-sectional view of a semiconductor package according to a third embodiment of the present invention. The semiconductor package according to this third embodiment is substantially the same as the previous two embodiments. The soldering quality of the soldering pad 342 on the substrate 34, then after the reflow operation is completed, the colloidal underfill (Underfill) (as shown in FIG. The fragile solder connection between the pads 342 will not be damaged by the pressing force exerted by the molding die (not shown), thus ensuring the quality reliability of the flip-chip soldering.

以上所述仅为本发明的较佳实施例而已,并非用以限定本发明的实质技术内容范围。本发明的实质技术内容广义地定义于本发明权利要求范围内,任何他人所完成的技术实体或方法,若与本发明权利要求范围所定义者为完全相同,亦或为一种等效变更,均视同涵盖于此专利范围内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the scope of the actual technical content of the present invention. The substantive technical content of the present invention is broadly defined within the scope of the claims of the present invention. If any technical entity or method completed by others is exactly the same as that defined in the scope of the claims of the present invention, or is an equivalent change, are deemed to be covered by this patent scope.

Claims (18)

1.一种具有散热结构的半导体封装件,其特征在于:所述半导体封装件包括:1. A semiconductor package with heat dissipation structure, characterized in that: the semiconductor package comprises: 一基板,其具有一正面及一相对的背面,于该基板正面各布设有一组第一焊垫及第二焊垫,并于该基板背面接置有多个的第三焊垫;A substrate, which has a front surface and an opposite back surface, a set of first welding pads and second welding pads are respectively arranged on the front surface of the substrate, and a plurality of third welding pads are connected to the back surface of the substrate; 一半导体芯片,具有一作用表面以供多个锡焊凸块接置其上以使该芯片与该基板第一焊垫电性导接;A semiconductor chip having an active surface for placing a plurality of solder bumps on it to electrically connect the chip with the first pad of the substrate; 一散热结构,其具有一散热件以及多个质软金属支撑块,其中该散热件具有一上表面与一相对的下表面,并于该下表面上开设有多个定位部以供这些支撑块黏置并藉之接设于该基板第二焊垫上;A heat dissipation structure, which has a heat dissipation element and a plurality of soft metal support blocks, wherein the heat dissipation element has an upper surface and an opposite lower surface, and a plurality of positioning parts are opened on the lower surface for these support blocks Adhesively placed and thereby connected to the second pad of the substrate; 多个导电组件,用以相接于基板第三焊垫上,以供该芯片与外界装置电性藕接;以及A plurality of conductive components are used to be connected to the third pad of the substrate for electrical coupling between the chip and external devices; and 一封装胶体,用以包覆该半导体芯片与散热结构且使该散热件的上表面外露。An encapsulation compound is used for covering the semiconductor chip and the heat dissipation structure and exposing the upper surface of the heat dissipation element. 2.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该半导体封装件为一覆晶型球栅阵列(FCBGA)半导体封装件。2. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the semiconductor package is a flip chip ball grid array (FCBGA) semiconductor package. 3.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该第一焊垫为焊接焊垫。3. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the first pad is a solder pad. 4.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该第二焊垫为植球焊垫。4. The semiconductor package with a heat dissipation structure as claimed in claim 1, wherein the second pad is a ball-mounted pad. 5.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该第二焊垫开口的开设尺寸取决于该散热结构距离该基板正面的高度而调整之。5 . The semiconductor package with heat dissipation structure as claimed in claim 1 , wherein the opening size of the second pad opening is adjusted according to the height of the heat dissipation structure from the front surface of the substrate. 6.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该第三焊垫为导电焊垫。6. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the third pad is a conductive pad. 7.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该作用表面为铺设有多个电子电路及电子组件的芯片表面。7. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the active surface is a chip surface on which a plurality of electronic circuits and electronic components are laid. 8.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该芯片与基板间的锡焊凸块得施以一胶体底部充填(Underfill)用以包覆芯片与基板间的锡焊凸块。8. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the solder bumps between the chip and the substrate are filled with a colloidal underfill to cover the gap between the chip and the substrate. Solder bumps. 9.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该散热件为一金属材质的内嵌式散热片。9 . The semiconductor package with heat dissipation structure as claimed in claim 1 , wherein the heat dissipation element is an embedded heat sink made of metal. 10 . 10.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该支撑块的材料选自锡、铅、锡/铅合金所组组群的其中之一。10. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the material of the supporting block is selected from one of the group consisting of tin, lead, and tin/lead alloy. 11.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该支撑块选自焊条(Solder Column),焊球(Solder Balls)所组组群的其中之一。11. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the supporting block is selected from one of the group consisting of solder column and solder ball. 12.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该支撑块的垂直高度大于等于该半导体芯片厚度与该锡焊凸块高度的总和。12 . The semiconductor package with heat dissipation structure as claimed in claim 1 , wherein the vertical height of the supporting block is greater than or equal to the sum of the thickness of the semiconductor chip and the height of the solder bump. 13 . 13.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该支撑块藉以一胶黏层黏接于该散热件的定位部上。13. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the support block is bonded to the positioning portion of the heat dissipation element by an adhesive layer. 14.如权利要求13所述的具有散热结构的半导体封装件,其特征在于:该胶黏层为一环氧树脂的弹性材质所构成。14. The semiconductor package with heat dissipation structure as claimed in claim 13, wherein the adhesive layer is made of an elastic material of epoxy resin. 15.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该定位部为形成于该散热件下表面上的凹穴。15. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the positioning portion is a cavity formed on the lower surface of the heat dissipation element. 16.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该定位部为开设于该散热件上的多个贯穿孔。16. The semiconductor package with a heat dissipation structure as claimed in claim 1, wherein the positioning portion is a plurality of through holes opened on the heat dissipation element. 17.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该锡焊凸块与这些支撑块同时藉以回焊方式植接于该基板所设的多组焊垫上。17 . The semiconductor package with heat dissipation structure according to claim 1 , wherein the soldering bump and the supporting blocks are implanted on the plurality of groups of soldering pads provided on the substrate by means of reflow at the same time. 18 . 18.如权利要求1所述的具有散热结构的半导体封装件,其特征在于:该导电组件为焊球。18. The semiconductor package with heat dissipation structure as claimed in claim 1, wherein the conductive component is a solder ball.
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CN101937885B (en) * 2010-08-12 2013-03-20 日月光半导体制造股份有限公司 Semiconductor package and method of manufacturing the same
CN102347290A (en) * 2011-09-30 2012-02-08 常熟市广大电器有限公司 Chip packaging structure with good heat dispersion property
TWI453881B (en) * 2012-01-04 2014-09-21 矽品精密工業股份有限公司 Package structure and its manufacturing method
US8674509B2 (en) * 2012-05-31 2014-03-18 Freescale Semiconductor, Inc. Integrated circuit die assembly with heat spreader
CN106935516B (en) * 2015-12-30 2019-05-03 欣兴电子股份有限公司 Manufacturing method of packaging structure of embedded electronic component
CN116134613A (en) * 2020-09-25 2023-05-16 华为技术有限公司 A kind of chip package structure, electronic equipment and preparation method of chip package structure
CN112437555B (en) * 2020-11-25 2021-11-09 江苏汇成光电有限公司 Mechanism capable of reducing jitter in Tape Bonding technological process

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