CN113005400A

CN113005400A - Adsorption device and evaporation equipment

Info

Publication number: CN113005400A
Application number: CN202110203944.9A
Authority: CN
Inventors: 刘佳宁; 白珊珊; 刘华猛; 王伟伟
Original assignee: BOE Technology Group Co Ltd
Current assignee: BOE Technology Group Co Ltd
Priority date: 2021-02-23
Filing date: 2021-02-23
Publication date: 2021-06-22

Abstract

The present disclosure relates to an adsorption equipment and coating by vaporization equipment, adsorption equipment is used for coating by vaporization equipment, and wherein, adsorption equipment includes: a base; the driving mechanism is connected with the base and can drive the base to move along a specified direction; the adsorption device is arranged on the base; the adsorption device is provided with a central magnet and a plurality of annular peripheral magnets, and each peripheral magnet is arranged around the central magnet and is sequentially distributed at intervals in the direction far away from the central magnet. The adsorption device can solve the problem that a mask plate is not easy to adsorb flatly, thereby reducing the color mixing risk in the evaporation process and further improving the evaporation yield.

Description

Adsorption device and evaporation equipment

Technical Field

The disclosure relates to the technical field of manufacturing of evaporation equipment, in particular to an adsorption device and the evaporation equipment.

Background

Currently, in the field of manufacturing technology of vapor deposition equipment, as shown in fig. 1 and 2, a conventional adsorption device is generally composed of a plurality of cylindrical magnets 1 arranged in sequence at intervals. However, as shown in fig. 3 and 4, since the mask plate 2 has different sagging degrees under the influence of gravity, when a plurality of columnar magnets 1 arranged at intervals in sequence are used, the mask plate 2 cannot be uniformly adsorbed everywhere, and thus the problem of color mixing occurs, which further affects the evaporation yield.

It is to be noted that the information disclosed in the above background section is only for enhancement of understanding of the background of the present disclosure, and thus may include information that does not constitute prior art known to those of ordinary skill in the art.

Disclosure of Invention

The utility model aims to overcome the not enough of above-mentioned prior art, provide an adsorption equipment and evaporation equipment, can solve the difficult smooth problem of being adsorbed of mask slice to colour mixture risk when reducing the coating by vaporization, and then improve the coating by vaporization yield.

The first aspect of the present disclosure provides an adsorption device for an evaporation apparatus, including:

a base;

the driving mechanism is connected with the base and can drive the base to move along a specified direction;

the adsorption device is arranged on the base; the adsorption device is provided with a central magnet and a plurality of annular peripheral magnets, and each peripheral magnet is arranged around the central magnet and is sequentially distributed at intervals in the direction far away from the central magnet.

In an exemplary embodiment of the present disclosure, in any adjacent two of the peripheral magnets, a width of the peripheral magnet close to the central magnet in a first direction is larger than a width of the peripheral magnet far from the central magnet in the first direction;

a width of the central magnet in the first direction is greater than a width of any of the peripheral magnets in the first direction;

wherein the first direction is a direction from a center point of the central magnet to the peripheral magnet.

In an exemplary embodiment of the present disclosure, the widths of two adjacent peripheral magnets in the first direction have a first difference, and the first difference of any two adjacent peripheral magnets is equal;

the central magnet has a second difference in width in the first direction from the peripheral magnet adjacent to the central magnet, the second difference being equal to the first difference.

In an exemplary embodiment of the present disclosure, a value of the first difference ranges from 0.5mm to 2 mm.

In an exemplary embodiment of the present disclosure, in the first direction, a first distance is provided between the outer peripheral surfaces of two adjacent peripheral magnets, and the first distances of any two adjacent peripheral magnets are equal;

in the first direction, a second distance is provided between the outer peripheral surface of the central magnet and the outer peripheral surface of the peripheral magnet adjacent to the central magnet, and the second distance is equal to the first distance.

In an exemplary embodiment of the present disclosure, the polarities of the magnetic poles of any adjacent two of the peripheral magnets are opposite;

and the polarity of the magnetic pole of the central magnet is opposite to the magnetic pole of the peripheral magnet adjacent to the central magnet.

In an exemplary embodiment of the present disclosure, the peripheral magnet has a plurality of magnet units distributed along a circular track, and the polarities of the magnetic poles of the magnet units of the same peripheral magnet are the same.

In an exemplary embodiment of the present disclosure, a central groove and a plurality of annular peripheral grooves are provided on the base, the number of the peripheral grooves is the same as the number of the peripheral magnets, and the plurality of peripheral grooves correspond to the plurality of peripheral magnets one to one;

the central magnets are positioned in the central grooves and fixed through the central grooves, and each peripheral magnet is positioned in the peripheral groove corresponding to the central magnet and fixed through the peripheral groove.

In an exemplary embodiment of the present disclosure, a width of each of the peripheral magnets in the first direction and a width of the central magnet in the first direction are the same;

in the first direction, a third distance is reserved between the outer peripheral surfaces of two adjacent peripheral magnets, the third distances of any two adjacent peripheral magnets are different, and the third distances are gradually increased in the first direction;

in the first direction, a fourth distance is arranged between the outer peripheral surface of the central magnet and the outer peripheral surface of the peripheral magnet adjacent to the central magnet, and the fourth distance is smaller than the third distance;

wherein the first direction is a direction from the central magnet to the peripheral magnet.

A second aspect of the present disclosure provides an evaporation apparatus, comprising:

the support table is used for placing a mask plate;

the adsorption device is any one of the adsorption devices, and is used for adsorbing the mask plate;

wherein the driving mechanism can drive the base to move along the direction close to the supporting platform or far away from the supporting platform.

The technical scheme provided by the disclosure can achieve the following beneficial effects:

the adsorption device provided by the disclosure has a base and a driving mechanism connected with the base, so that the driving mechanism can drive the base to move along a specified direction. And because the adsorption device is arranged on the base, the adsorption device can also move along the designated direction under the driving of the driving mechanism. Therefore, the mask plate can be attracted and released by the movement of the attraction device.

In addition, the adsorption device is provided with a central magnet and a plurality of annular peripheral magnets, wherein the peripheral magnets are arranged around the central magnet and are sequentially distributed at intervals in the direction away from the central magnet. Therefore, the adsorption device can generate a ring-shaped magnetic field, and the magnetic force at the center of the adsorption device can be larger, so that the center of the mask plate can be prevented from sagging, and the mask plate can be leveled under the adsorption of the adsorption device. Therefore, the adsorption device provided by the application can reduce the color mixing risk in the evaporation process, and can reduce the damage of the mask plate and the substrate, thereby improving the yield of evaporation.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and together with the description, serve to explain the principles of the disclosure. It is to be understood that the drawings in the following description are merely exemplary of the disclosure, and that other drawings may be derived from those drawings by one of ordinary skill in the art without the exercise of inventive faculty.

FIG. 1 shows a schematic diagram of a prior art sorption device;

FIG. 2 shows a schematic structural view of section A-A of FIG. 1;

FIG. 3 is a schematic diagram showing the effect of using a prior art adsorption device to adsorb a mask plate;

FIG. 4 is a schematic structural view of section B-B of FIG. 3;

FIG. 5 shows a schematic structural diagram of a sorption device according to an embodiment of the present disclosure;

FIG. 6 shows a schematic structural view of section C-C of FIG. 5;

FIG. 7 shows a data comparison graph of the magnetic field of a sorption device according to the present disclosure and the magnetic field of a prior art sorption device;

fig. 8 is a schematic diagram illustrating an effect of the adsorption device adsorbing the mask plate according to an embodiment of the disclosure;

FIG. 9 shows a schematic structural view of section D-D of FIG. 8;

FIG. 10 shows a schematic structural diagram of a sorption device according to another embodiment of the present disclosure;

FIG. 11 shows a schematic structural diagram of a sorption device according to yet another embodiment of the present disclosure;

fig. 12 shows a schematic structural diagram of a suction device according to yet another embodiment of the present disclosure.

Description of reference numerals:

1. a cylindrical magnet; 2. a mask plate; 3. an adsorption device; 4. a frame structure; 31. a central magnet; 32. a peripheral magnet; 321. a magnet unit.

Detailed Description

Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus their detailed description will be omitted.

Furthermore, in the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the disclosure. It may be evident, however, that one or more embodiments may be practiced without these specific details.

The terms "comprising" and "having" are intended to be inclusive and mean that there may be additional elements/components/etc. other than the listed elements/components/etc.

It should be noted that, although the terms "first", "second", etc. may be used herein to describe various elements, components, elements, regions, layers and/or sections, these elements, components, elements, regions, layers and/or sections should not be limited by these terms. Rather, these terms are used to distinguish one element, component, element, region, layer or section from another.

The first aspect of the present disclosure provides an adsorption apparatus, as shown in fig. 5 to 6 and 8 to 12, which can reduce the color mixing probability during the evaporation process, and can reduce the damage to the mask plate 2 and the substrate, thereby improving the yield of the evaporation.

The adsorption device may include: base, actuating mechanism and adsorption equipment 3. The base may be made of a metal material, but is not limited thereto, and may also be made of a plastic material, and the disclosure does not limit the material. In addition, the shape of the base is not limited in the disclosure, and the base can be arranged according to the specific shape of the evaporation equipment. For example, the base can be a metal mask, but is not limited thereto, and can also be a structure in other evaporation equipment.

The above-described adsorption device 3 may be provided on a base, as shown in fig. 5 and 6, and the adsorption device 3 may have a central magnet 31 and a plurality of annular peripheral magnets 32, each peripheral magnet 32 may be provided around the central magnet 31, and each peripheral magnet 32 is sequentially spaced apart in a direction away from the central magnet 31. The central magnet 31 and the peripheral magnet 32 may be permanent magnets, but are not limited thereto. The adsorption device 3 can adsorb the mask plate by magnetic force, so that the mask plate can be attached to the substrate covered on the mask plate.

Meanwhile, the adsorption device 3 is provided with the central magnet 31 and the plurality of annular peripheral magnets 32 arranged around the central magnet 31, so that the adsorption device 3 is provided with an annular magnetic field, and compared with the magnetic field generated by the sequentially arranged cylindrical magnets 1, the influence range of the annular magnetic field is larger, the magnetic force range of the mask plate is larger, and the mask plate is easier to flatten.

Further, as shown in fig. 8 and 9, since the adsorption device 3 provided by the present disclosure has a ring-shaped magnetic field, the magnetic field at the center of the adsorption device 3 is larger than that at other places, so that the center of the mask does not sag, thereby further leveling the mask.

As shown in fig. 5, in any adjacent two of the peripheral magnets 32, the width d in the first direction X of the peripheral magnet 32 close to the central magnet 31 is larger than the width d in the first direction X of the peripheral magnet 32 far from the central magnet 31. While the width d of the central magnet 31 in the first direction X is larger than the width d of any of the peripheral magnets 32 in the first direction X.

The first direction X may be a direction pointing from the central point of the central magnet 31 to the peripheral magnet 32, and it is understood that the first direction X may pass through the central point of the central magnet 31 and point to a direction away from the central magnet 31, but is not limited thereto, and the first direction X may not pass through the central point of the central magnet 31 and may be set according to actual needs.

Note that, the width d of the peripheral magnet 32 here is the distance between the inner wall and the outer wall of the peripheral magnet 32 in the first direction X; the width d of the central magnet 31 is a distance between the center point of the central magnet 31 and the outer wall of the central magnet 31 along the first direction X.

Since the central magnet 31 and the peripheral magnets 32 used in the present disclosure are permanent magnets, generally speaking, the magnetic force of a permanent magnet having a wider width d is larger when the permanent magnets have the same thickness. Therefore, the present disclosure further ensures that the center of the reticle does not sag by making the width d of the peripheral magnet 32 close to the central magnet 31 in the first direction X of any two adjacent peripheral magnets 32 larger than the width d of the peripheral magnet 32 far from the central magnet 31 in the first direction X, and making the width d of the central magnet 31 in the first direction X larger than the width d of any peripheral magnet 32 in the first direction X, so that the magnetic force of the adsorption device 3 is further gradually increased toward the center point by the periphery of the adsorption device 3.

Meanwhile, the magnetic force of the adsorption device 3 is gradually reduced in the first direction X, so that the problem of damage to the mask plate and the substrate caused by the overlarge magnetic force of the adsorption device 3 on the peripheral area of the mask plate is solved.

In one embodiment of the present disclosure, among all the peripheral magnets 32, the width d of the peripheral magnet 32 farthest from the central magnet 31 may be 5 to 10mm, for example: 5mm, 6mm, 7mm, 8mm, 9mm, 10mm, but not limited thereto, the width d of the peripheral magnet 32 farthest from the central magnet 31 may be other values. It is understood that when a larger magnetic force is required for the adsorption device 3, the widths d of the peripheral magnet 32 and the central magnet 31 may be set larger; when a smaller magnetic force is required for the adsorption device 3, the widths d of the peripheral magnet 32 and the central magnet 31 may be set smaller. Therefore, the width d value of the magnet can be adjusted and arranged arbitrarily according to actual needs.

In one embodiment of the present disclosure, the widths d of two adjacent peripheral magnets 32 in the first direction X may have a first difference, and the first difference of any two adjacent peripheral magnets 32 may be equal. Also, the width d of the central magnet 31 and the peripheral magnets 32 adjacent to the central magnet 31 in the first direction X may have a second difference. Wherein the second difference may be equal to the first difference. According to the present disclosure, by making the difference of the widths d between two adjacent magnets equal, the magnetic fields of the central magnet 31 and each peripheral magnet 32 in the adsorption device 3 are uniformly decreased in the first direction X, so that the magnetic force at each position in the adsorption device 3 is uniform, and the damage of the mask plate 2 and the substrate can be further prevented.

Specifically, fig. 7 is a data comparison diagram of the magnetic fields generated by the adsorption device 3 provided by the present disclosure and the adsorption device 3 of the related art, in which a solid line represents the magnetic field generated by the adsorption device 3 provided by the present disclosure, and a dotted line represents the magnetic field generated by the adsorption device 3 of the related art. Thus, as is apparent from fig. 7, the magnetic field generated everywhere by the suction device 3 in the related art is the same, and the problem of the center sag of the mask plate 2 cannot be overcome. The adsorption device 3 provided by the present disclosure has a high magnetic field at the center position, so that the problem of sagging of the center of the mask plate 2 can be prevented.

In an embodiment of the disclosure, a value range of the first difference may be between 0.5mm and 2mm, that is, a value range of the second difference may also be between 0.5mm and 2 mm. For example, the first difference may be 0.5mm, 0.8mm, 1.1mm, 1.4mm, 1.7mm, 2mm, etc., and the second difference may also be 0.5mm, 0.8mm, 1.1mm, 1.4mm, 1.7mm, 2mm, etc.

Further, in the first direction X, a first distance L is provided between the outer peripheral surfaces of two adjacent peripheral magnets 32, and the first distances L of any two adjacent peripheral magnets 32 are equal. Also, in the first direction X, the outer peripheral surface of the central magnet 31 and the outer peripheral surface of the peripheral magnet 32 adjacent to the central magnet 31 have a second distance L therebetween, which may be equal to the first distance L described above, and it is understood that the distances between the respective magnets in the adsorption device 3 are all equal.

Through all setting up the distance between each magnet in the adsorption component 3 to equal distance, can further make the magnetic force of adsorption component 3 can be by the very even reduction of first direction X in the center of adsorption component 3, just also can further make mask plate adsorbed more level and smooth, and further make the atress of mask plate more even, also consequently more be favorable to protecting mask plate and base plate.

In an embodiment of the present disclosure, a value range of the first distance L may be 15mm to 25mm, and a value range of the second distance L may also be 15mm to 25mm, but is not limited thereto, and values of the first distance L and the second distance L may not be within the value ranges, and may be set according to actual needs. Namely: when the adsorption device 3 requires a small gradient of magnetic force variation, the first distance L and the second distance L may be set short; it is within the scope of the present disclosure that the first distance L and the second distance L may also be suitably extended when a larger gradient of magnetic force variation is required for the adsorption device 3.

In another embodiment of the present disclosure, the width d of each peripheral magnet 32 in the first direction X may be the same as the width d of the central magnet 31 in the first direction X. In the first direction X, the outer circumferential surfaces of two adjacent peripheral magnets 32 may each have a third distance, and the third distance of any two adjacent peripheral magnets 32 is different, while the third distance may gradually increase in the first direction X. In addition, in the first direction X, the outer peripheral surface of the center magnet 31 has a fourth distance, which is smaller than the third distance, from the outer peripheral surface of the peripheral magnet 32 adjacent to the center magnet 31. It is understood that, in the first direction X, the distance between the outer peripheral surface of the center magnet 31 and the outer peripheral surface of the peripheral magnet 32 adjacent to the center magnet 31 is smaller than the distance between the outer peripheral surfaces of any two adjacent peripheral magnets 32.

Since the widths d of the magnets in the first direction X are the same, the distance between the magnets is gradually increased in the first direction X, so that the magnetic force at the center of the adsorption device 3 is ensured to be large, and the center of the mask plate 2 is prevented from sagging. In addition, the magnetic force of other areas of the adsorption device 3 can be small through the arrangement mode, so that the mask plate 2 and the substrate are prevented from being damaged due to the fact that the magnetic force of the adsorption device 3 is too large.

In one embodiment of the present disclosure, the third distance increases uniformly in the first direction X, and the difference between the minimum third distance and the fourth distance is the same as the value by which the third distance increases uniformly in the first direction X. Therefore, the magnetic force of the adsorption device 3 can be uniformly changed in the first direction X, so that the stress of the mask plate is further uniform, and the mask plate is enabled to be adsorbed more smoothly. At the same time, it is possible to further prevent the mask plate 2 and the substrate from being damaged due to uneven variation in the magnetic force of the adsorption device 3

In one embodiment of the present disclosure, as shown in fig. 5 to 6 and fig. 10 to 11, the cross section of the annular peripheral magnet 32 may be a circular ring, an elliptical ring, a rectangular ring, etc., and may be set according to actual needs. The cross section of the central magnet 31 may be circular, oval, rectangular, etc., and may also be configured according to actual needs, which is not limited in this disclosure.

Further, in order to ensure a better adsorption effect of the adsorption device 3, when the cross section of the annular peripheral magnet 32 is a circular ring, the cross section of the central magnet 31 may be circular; when the cross section of the ring-shaped peripheral magnet 32 is an elliptical ring, the shape of the cross section of the central magnet 31 may be elliptical; when the cross section of the ring-shaped peripheral magnet 32 is a rectangular ring, the cross section of the central magnet 31 may be rectangular in shape.

In addition, the thickness of each of the annular peripheral magnet 32 and the central magnet 31 may be the same, and the cross-section shapes of the annular peripheral magnet 32 and the central magnet 31 in the thickness direction may be rectangular, but the invention is not limited thereto, and may also be other shapes, which is not limited by the disclosure.

In one embodiment of the present disclosure, the polarities of the poles of any adjacent two peripheral magnets 32 may be opposite, and the polarity of the pole of the central magnet 31 may be opposite to the polarity of the pole of the peripheral magnet 32 adjacent to the central magnet 31. It should be noted that, the central magnet 31 and each peripheral magnet 32 may have an N pole and an S pole, and therefore, the polarities of the magnetic poles of two adjacent peripheral magnets 32 are opposite to each other, it is understood that, in two adjacent peripheral magnets 32, the polarity of the magnetic pole of one peripheral magnet 32 may be an N pole and an S pole in the second direction, and the polarity of the magnetic pole of the other peripheral magnet 32 may be an S pole and an N pole in the second direction, so as to ensure that the polarities of the magnetic poles of the plurality of peripheral magnets 32 may be alternately arranged.

In addition, the polarity of the magnetic poles of the central magnet 31 is opposite to the polarity of the magnetic poles of the peripheral magnets 32 adjacent to the central magnet 31, which can be understood as: the polarities of the magnetic poles of the central magnet 31 may be N and S poles in the second direction in order, and the polarities of the magnetic poles of the peripheral magnets 32 adjacent to the central magnet 31 may be S and N poles in the second direction in order. However, the present disclosure is not limited thereto, and the arrangement of the polarities of the magnetic poles of the central magnet 31 and each peripheral magnet 32 is not limited thereto, for example, the polarity of the magnetic pole of the central magnet 31 may be S and N in the second direction, so long as the polarities of the magnetic poles of the adjacent two magnets are opposite. The second direction may be a direction from the central magnet 31 to the base.

By making the polarities of the magnetic poles of any two adjacent peripheral magnets 32 opposite, and making the polarity of the magnetic pole of the central magnet 31 opposite to the polarity of the magnetic pole of the peripheral magnet 32 adjacent to the central magnet 31, it is possible to prevent the magnetic field repulsion and cancellation phenomenon from occurring between the adjacent two peripheral magnets 32 and between the central magnet 31 and the peripheral magnet 32 adjacent thereto, thereby ensuring that the adsorption device 3 has good adsorption performance.

In one embodiment of the present disclosure, as shown in fig. 12, the peripheral magnet 32 may have a plurality of magnet units 321 distributed along a circular track, and the polarities of the poles of the magnet units 321 of the same peripheral magnet 32 are the same. It is understood that the polarities of the magnetic poles of the respective magnet units 321 in the same peripheral magnet 32 may each be N-pole and S-pole or S-pole and N-pole in sequence in the second direction. In the same peripheral magnet 32, a gap may be provided between the magnet units 321.

In one embodiment of the present disclosure, a central groove and a plurality of annular peripheral grooves may be provided on the base. Wherein, a plurality of annular peripheral grooves can encircle central recess setting to in proper order to keeping away from the direction interval setting of central recess.

In addition, the number of peripheral grooves may be the same as the number of peripheral magnets 32, and a plurality of peripheral grooves correspond one-to-one to the plurality of peripheral magnets 32. It should be noted that the one-to-one correspondence mentioned here means that each size of the peripheral magnet 32 has a peripheral groove corresponding to the size thereof, and the peripheral groove is located at the same position as the peripheral magnet 32 in the adsorption device 3.

Further, the central magnet 31 may be located within and secured by the central recess. Each peripheral magnet 32 may be located within and secured by a peripheral groove corresponding thereto. This disclosure can restrict the positions of the central magnet 31 and the peripheral magnet 32 by providing the central groove and the peripheral groove, and prevent the central magnet 31 and the peripheral magnet 32 from being displaced, thereby significantly improving the yield of the evaporation.

The driving mechanism may be connected to the base and may drive the base to move in a designated direction. The designated direction may be a direction approaching to the mask plate or a direction away from the mask plate, but is not limited thereto, and the designated direction may be set according to actual needs.

Further, the driving mechanism can be connected with one side of the base far away from the magnet, and can also be connected with the side surface of the base. Meanwhile, the form of the driving mechanism is not limited in the disclosure, and the driving mechanism can be arranged according to actual needs as long as the driving mechanism can drive the base to move towards the designated direction.

The second aspect of the present disclosure provides an evaporation apparatus that can reduce the color mixing probability during evaporation and can reduce damage to the mask plate 2 and the substrate, thereby improving the yield of evaporation.

Specifically, the evaporation apparatus may include: a support table and an adsorption device. The support table can be used for placing the mask plate 2, and the center of the support table can be provided with a through hole; the adsorption device may be the adsorption device described above, and is configured to adsorb the mask plate 2 placed on the support table. Wherein, the driving mechanism in the absorption device can drive the base to move along the direction close to the supporting platform or away from the supporting platform.

Further, a bearing frame structure 4 may be further disposed between the support platform and the mask plate, and the center of the frame structure 4 may also have a through hole. In addition, a vapor deposition source is arranged on one side of the support platform far away from the adsorption device and is used for vapor deposition of the substrate.

Therefore, when the substrate needs to be subjected to vapor deposition, the mask plate may be placed on the support table first, and the substrate may be covered on the mask plate. Then, the driving device is used for driving the base to move towards the direction close to the supporting table, so that the mask plate is close to the magnetic field of the adsorption device 3 and is flatly adsorbed on the substrate under the action of the magnetic force of the adsorption device 3. And opening the evaporation source to perform evaporation on the substrate. After the evaporation is finished, the driving device can be utilized to drive the base to move in the direction away from the supporting table, so that the mask plate is separated from the magnetic field of the adsorption device 3, and the mask plate cannot be under the magnetic action of the adsorption device 3 and is further separated from the substrate. At the moment, the evaporated substrate and the mask plate can be taken out respectively, so that the whole evaporation process is completed.

Other embodiments of the disclosure will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This disclosure is intended to cover any variations, uses, or adaptations of the disclosure following, in general, the principles of the disclosure and including such departures from the present disclosure as come within known or customary practice within the art to which the disclosure pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the disclosure being indicated by the following claims.

Claims

1. an adsorption device, for evaporation equipment, is characterized in that, comprises:

base;

a driving mechanism, connected with the base and capable of driving the base to move in a specified direction;

The adsorption device is arranged on the base; the adsorption device has a central magnet and a plurality of annular peripheral magnets, and each peripheral magnet is arranged around the central magnet and is sequentially spaced away from the central magnet.

2. The adsorption device according to claim 1, characterized in that,

In any two adjacent peripheral magnets, the width of the peripheral magnet close to the central magnet in the first direction is greater than the width of the peripheral magnet farther from the central magnet in the first direction;

The width of the central magnet in the first direction is greater than the width of any of the peripheral magnets in the first direction;

Wherein, the first direction is a direction from the center point of the central magnet to the peripheral magnets.

3. The adsorption device according to claim 2, characterized in that,

The widths of the two adjacent peripheral magnets in the first direction have a first difference, and the first difference of any two adjacent peripheral magnets is equal;

The widths of the central magnet and the peripheral magnets adjacent to the central magnet in the first direction have a second difference, and the second difference is equal to the first difference.

4 . The adsorption device according to claim 3 , wherein the value of the first difference ranges from 0.5 mm to 2 mm. 5 .

5. The adsorption device according to claim 2, characterized in that,

In the first direction, there is a first distance between the outer peripheral surfaces of two adjacent peripheral magnets, and the first distances of any two adjacent peripheral magnets are equal;

In the first direction, there is a second distance between the outer peripheral surface of the central magnet and the outer peripheral surfaces of the peripheral magnets adjacent to the central magnet, and the second distance is equal to the first distance.

6. The adsorption device according to claim 1, wherein the polarities of the magnetic poles of any two adjacent peripheral magnets are opposite;

And the polarity of the magnetic pole of the central magnet is opposite to that of the magnetic poles of the peripheral magnets adjacent to the central magnet.

7 . The adsorption device according to claim 1 , wherein the peripheral magnet has a plurality of magnet units distributed along an annular track, and the magnetic poles of the magnet units of the same peripheral magnet have the same polarity. 8 . .

8. The adsorption device according to claim 1, characterized in that,

The base is provided with a central groove and a plurality of annular peripheral grooves, the number of the peripheral grooves is the same as the number of the peripheral magnets, and the plurality of the peripheral grooves and the plurality of the peripheral magnets are one by one correspond;

The central magnet is located in and fixed by the central groove, and each of the peripheral magnets is located in and fixed by the peripheral groove corresponding thereto.

9. The adsorption device according to claim 1, characterized in that,

The width of each of the peripheral magnets in the first direction is the same as the width of the central magnet in the first direction;

In the first direction, there is a third distance between the outer peripheral surfaces of two adjacent peripheral magnets, and the third distance of any two adjacent peripheral magnets is different, and the third distance is gradually increase in the first direction;

In the first direction, there is a fourth distance between the outer peripheral surface of the central magnet and the outer peripheral surfaces of the peripheral magnets adjacent to the central magnet, and the fourth distance is smaller than the third distance;

Wherein, the first direction is a direction from the central magnet to the peripheral magnets.

10. A vapor deposition device, characterized in that, comprising:

a support table, the support table is used for placing the mask;

an adsorption device, wherein the adsorption device is the adsorption device according to any one of the above claims 1 to 9, which is used for adsorbing the mask plate;

Wherein, the driving mechanism can drive the base to move in a direction close to the support table or away from the support table.