CN1120095C - 制做用于金属印刷板的铝支座的方法 - Google Patents
制做用于金属印刷板的铝支座的方法 Download PDFInfo
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- CN1120095C CN1120095C CN00106249A CN00106249A CN1120095C CN 1120095 C CN1120095 C CN 1120095C CN 00106249 A CN00106249 A CN 00106249A CN 00106249 A CN00106249 A CN 00106249A CN 1120095 C CN1120095 C CN 1120095C
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- aluminium sheet
- aluminium
- handled
- surface roughening
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- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 731
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 294
- 238000007639 printing Methods 0.000 title claims abstract description 92
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 80
- 239000002184 metal Substances 0.000 title claims abstract description 80
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 55
- 239000004411 aluminium Substances 0.000 title claims description 688
- 238000007788 roughening Methods 0.000 claims abstract description 268
- 239000007864 aqueous solution Substances 0.000 claims abstract description 223
- 238000000034 method Methods 0.000 claims abstract description 172
- 238000002048 anodisation reaction Methods 0.000 claims abstract description 127
- 230000002378 acidificating effect Effects 0.000 claims abstract description 116
- 238000011282 treatment Methods 0.000 claims abstract description 75
- 238000005530 etching Methods 0.000 claims abstract description 26
- 150000001398 aluminium Chemical class 0.000 claims description 378
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 189
- 239000000243 solution Substances 0.000 claims description 175
- 238000012545 processing Methods 0.000 claims description 140
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 133
- 238000005202 decontamination Methods 0.000 claims description 109
- 230000003588 decontaminative effect Effects 0.000 claims description 109
- 239000012530 fluid Substances 0.000 claims description 58
- 238000005498 polishing Methods 0.000 claims description 53
- 238000003486 chemical etching Methods 0.000 claims description 50
- 239000012670 alkaline solution Substances 0.000 claims description 38
- -1 aluminum ions Chemical class 0.000 claims description 37
- 230000007935 neutral effect Effects 0.000 claims description 35
- 239000012266 salt solution Substances 0.000 claims description 35
- 229910017604 nitric acid Inorganic materials 0.000 claims description 29
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 27
- 239000011259 mixed solution Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 134
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 100
- 239000010410 layer Substances 0.000 description 58
- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 56
- 239000011229 interlayer Substances 0.000 description 48
- 239000008151 electrolyte solution Substances 0.000 description 42
- 239000007921 spray Substances 0.000 description 30
- 238000005507 spraying Methods 0.000 description 30
- 239000004677 Nylon Substances 0.000 description 29
- 229920001778 nylon Polymers 0.000 description 29
- 229910000859 α-Fe Inorganic materials 0.000 description 29
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 26
- 238000000576 coating method Methods 0.000 description 26
- 239000013078 crystal Substances 0.000 description 26
- 238000002360 preparation method Methods 0.000 description 26
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 24
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 24
- 239000002253 acid Substances 0.000 description 23
- 238000005406 washing Methods 0.000 description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 238000001035 drying Methods 0.000 description 22
- 239000010439 graphite Substances 0.000 description 22
- 229910002804 graphite Inorganic materials 0.000 description 22
- 238000005868 electrolysis reaction Methods 0.000 description 20
- 239000000758 substrate Substances 0.000 description 20
- 239000004115 Sodium Silicate Substances 0.000 description 19
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 19
- 229910052911 sodium silicate Inorganic materials 0.000 description 19
- 239000000203 mixture Substances 0.000 description 17
- 235000019795 sodium metasilicate Nutrition 0.000 description 17
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 16
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 14
- 239000003082 abrasive agent Substances 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 14
- 229910002651 NO3 Inorganic materials 0.000 description 13
- 238000000137 annealing Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 10
- 238000005266 casting Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229910000838 Al alloy Inorganic materials 0.000 description 9
- 238000002347 injection Methods 0.000 description 9
- 239000007924 injection Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 239000006004 Quartz sand Substances 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 238000002791 soaking Methods 0.000 description 7
- 239000011780 sodium chloride Substances 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000006467 substitution reaction Methods 0.000 description 5
- 239000002562 thickening agent Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- 238000005275 alloying Methods 0.000 description 4
- 239000000701 coagulant Substances 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000012634 fragment Substances 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 239000004317 sodium nitrate Substances 0.000 description 4
- 235000010344 sodium nitrate Nutrition 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000011260 aqueous acid Substances 0.000 description 3
- 230000001413 cellular effect Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000011573 trace mineral Substances 0.000 description 3
- 235000013619 trace mineral Nutrition 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000010985 leather Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 101100004286 Caenorhabditis elegans best-5 gene Proteins 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000005270 abrasive blasting Methods 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 159000000013 aluminium salts Chemical class 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000009390 chemical decontamination Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000892 gravimetry Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229940085991 phosphate ion Drugs 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/04—Etching of light metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
| 电解溶液的类别 | 电解溶液的浓度(g/l) | 电解溶液的温度(℃) | 电解溶液中的铝离子浓度(g/l) | |
| 例41- | 硫酸 | 100 | 50 | 1 |
| - | ↓ | 350 | 60 | 1 |
| - | 盐酸 | 7.5 | 35 | 5 |
| - | ↓ | 7.5 | 50 | 5 |
| - | ↓ | 25 | 35 | 1 |
| - | ↓ | 25 | 50 | 1 |
| - | ↓ | 50 | 45 | 1 |
| - | ↓ | 50 | 45 | 1 |
| - | 硝酸 | 10 | 50 | 0.2 |
| -1 | ↓ | 300 | 60 | 0.2 |
| 硫酸的浓度(g/l) | 铝离子浓度(g/l) | 液体温度(℃) | 阳极氧化涂层的量(g/m2) | |
| 例49-1 | 100 | 7 | 55 | 2.4 |
| -2 | 115 | 5 | 55 | 2.4 |
| -3 | 90 | 3 | 55 | 2.4 |
| -4 | 100 | 5 | 50 | 2.4 |
| -5 | 150 | 5 | 35 | 1.8 |
| -6 | 150 | 5 | 30 | 1.8 |
| -7 | 150 | 5 | 37 | 1.8 |
| -8 | 170 | 5 | 35 | 1.8 |
| -9 | 130 | 5 | 35 | 1.8 |
Claims (44)
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11115112A JP2000301850A (ja) | 1999-04-22 | 1999-04-22 | 平版印刷版用アルミニウム支持体の製造方法 |
| JP115112/1999 | 1999-04-22 | ||
| JP11120452A JP2000313995A (ja) | 1999-04-27 | 1999-04-27 | 平版印刷版用アルミニウム支持体の製造方法 |
| JP120452/1999 | 1999-04-27 | ||
| JP178624/1999 | 1999-06-24 | ||
| JP178625/1999 | 1999-06-24 | ||
| JP11178624A JP2001011698A (ja) | 1999-06-24 | 1999-06-24 | 平版印刷板用アルミニウム支持体の粗面化方法及び製造方法 |
| JP11178625A JP2001011699A (ja) | 1999-06-24 | 1999-06-24 | 平版印刷版用アルミニウム支持体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1271652A CN1271652A (zh) | 2000-11-01 |
| CN1120095C true CN1120095C (zh) | 2003-09-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN00106249A Expired - Fee Related CN1120095C (zh) | 1999-04-22 | 2000-04-24 | 制做用于金属印刷板的铝支座的方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6533917B1 (zh) |
| EP (1) | EP1046514B1 (zh) |
| CN (1) | CN1120095C (zh) |
| AT (1) | ATE299099T1 (zh) |
| DE (1) | DE60021140T2 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110168128A (zh) * | 2017-01-11 | 2019-08-23 | 奥科宁克公司 | 预加工铝合金产品以便粘结的方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6780305B2 (en) * | 2001-02-20 | 2004-08-24 | Fuji Photo Film Co., Ltd. | Method for producing support for planographic printing plate, support for planographic printing plate, and planographic printing plate precursor |
| JPWO2003057934A1 (ja) * | 2001-12-28 | 2005-05-19 | 三菱アルミニウム株式会社 | 平版印刷版用アルミニウム合金板及びその製造方法と平版印刷版 |
| CN100446993C (zh) * | 2003-05-16 | 2008-12-31 | 富士胶片株式会社 | 平版印刷版用支持体的制造方法以及平版印刷版原版 |
| JP4603402B2 (ja) * | 2005-03-31 | 2010-12-22 | 富士フイルム株式会社 | 微細構造体およびその製造方法 |
| WO2007072638A1 (ja) * | 2005-12-22 | 2007-06-28 | Konica Minolta Medical & Graphic, Inc. | 平版印刷版材料用支持体、その製造方法及びそれを用いた平版印刷版材料 |
| US8512872B2 (en) | 2010-05-19 | 2013-08-20 | Dupalectpa-CHN, LLC | Sealed anodic coatings |
| US8609254B2 (en) | 2010-05-19 | 2013-12-17 | Sanford Process Corporation | Microcrystalline anodic coatings and related methods therefor |
| CN102381072B (zh) * | 2010-08-27 | 2016-02-24 | 富士胶片株式会社 | 平版印刷版用铝支撑体的制造方法及制造装置 |
| KR101351670B1 (ko) * | 2011-07-19 | 2014-01-14 | 미쯔비시 레이온 가부시끼가이샤 | 나노임프린트용 몰드의 제조 방법 |
| US20130233702A1 (en) * | 2012-03-09 | 2013-09-12 | Chung-Shan Institute of Science and Technology, Armaments, Bureau, Ministry of National Defense | Multi-Stationed Continuous Electro-Polishing System |
| CN103422135B (zh) * | 2012-05-15 | 2016-05-11 | 可成科技股份有限公司 | 具有止滑皮革质感表面的金属工件的制造方法 |
| US9187841B2 (en) | 2012-08-16 | 2015-11-17 | Catcher Technology Co., Ltd. | Method of forming skid-proof leather-texture surface on metallic substrate |
| CN103060807A (zh) * | 2012-12-28 | 2013-04-24 | 苏州米达思精密电子有限公司 | 一种规则阵列的无连接点蚀刻补强铝片结构 |
| JP6078851B2 (ja) * | 2013-12-19 | 2017-02-15 | 日本軽金属株式会社 | アルミニウム材の電解研磨処理方法 |
| WO2016106524A1 (zh) * | 2014-12-29 | 2016-07-07 | 深圳市恒兆智科技有限公司 | 铝材表面处理用的出光剂 |
| US10557212B2 (en) | 2016-03-08 | 2020-02-11 | Chemeon Surface Technology, Llc | Electropolishing method and product |
| CN105925982B (zh) * | 2016-05-30 | 2018-07-06 | 苏州安洁科技股份有限公司 | 一种用于制备铝材双面异形电路板的蚀刻液 |
| US20180298512A1 (en) * | 2017-04-13 | 2018-10-18 | General Electric Company | Electropolishing and anodizing method for brush holder apparatus |
| CN107164800A (zh) * | 2017-05-11 | 2017-09-15 | 沈阳航空航天大学 | 一种铝板毛化表面的制备方法及其应用 |
| JP7531517B2 (ja) | 2019-04-09 | 2024-08-09 | スリーディーエム・バイオメディカル・ピーティーワイ・リミテッド | 電解研磨方法 |
| CN110468444A (zh) * | 2019-09-17 | 2019-11-19 | 成都飞机工业(集团)有限责任公司 | 一种铝合金电解蚀刻工艺 |
| TWI859814B (zh) * | 2023-04-14 | 2024-10-21 | 可成科技股份有限公司 | 具有多角度視覺變色特性之鋁材物件的製作方法 |
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| US3935080A (en) * | 1974-10-02 | 1976-01-27 | Polychrome Corporation | Method of producing an aluminum base sheet for a printing plate |
| JPS5615396A (en) * | 1979-07-19 | 1981-02-14 | Fuji Photo Film Co Ltd | Manufacture of alminum support substance for lithographic plate |
| DE3222967A1 (de) * | 1982-06-19 | 1983-12-22 | Hoechst Ag, 6230 Frankfurt | Verfahren zur abtragenden modifizierung von elektrochemisch aufgerauhten traegermaterialien aus aluminium nd deren verwendung bei der herstellung von offsetdruckplatten |
| DE3025814C2 (de) * | 1980-07-08 | 1985-06-13 | Siemens AG, 1000 Berlin und 8000 München | Elektromagnetisches Relais |
| US4676879A (en) * | 1985-04-12 | 1987-06-30 | Becromal S.P.A. | Method for the production of an aluminum foil for electrolytic _capacitors, and electrolytic capacitors thus produced |
| DE3635303A1 (de) * | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
| US4872946A (en) * | 1987-02-23 | 1989-10-10 | Fuji Photo Film Co., Ltd. | Method of manufacturing supports for lithographic printing plate |
| US5152877A (en) * | 1989-10-13 | 1992-10-06 | Fuji Photo Film Co., Ltd. | Method for producing support for printing plate |
| DE3934683A1 (de) * | 1989-10-18 | 1991-04-25 | Kurt Hausmann | Verfahren und vorrichtung zur elektrochemischen aufrauhung einer metalloberflaeche |
| JP3217194B2 (ja) * | 1993-08-31 | 2001-10-09 | 富士写真フイルム株式会社 | 平版印刷版用支持体の製造方法 |
| DE4435221A1 (de) * | 1994-09-30 | 1996-04-04 | Hoechst Ag | Verfahren zum mechanischen Aufrauhen der Oberfläche eines Druckplattenträgers und Bürstenwalze zur Durchführung des Verfahrens |
| JPH08258440A (ja) * | 1995-03-22 | 1996-10-08 | Konica Corp | 平版印刷版用支持体及びその製造方法並びに感光性平版印刷版 |
| JP3494328B2 (ja) | 1995-10-20 | 2004-02-09 | 富士写真フイルム株式会社 | 平版印刷版用支持体の製造方法 |
| JP3580462B2 (ja) * | 1996-07-05 | 2004-10-20 | 富士写真フイルム株式会社 | 平版印刷版用アルミニウム支持体の製造方法 |
| EP0874068B1 (en) * | 1997-04-25 | 2004-01-14 | Fuji Photo Film Co., Ltd. | Method for producing an aluminum support for a lithographic printing plate |
| US6596150B2 (en) * | 1998-05-28 | 2003-07-22 | Fuji Photo Film Co., Ltd. | Production method for an aluminum support for a lithographic printing plate |
-
2000
- 2000-04-20 AT AT00108644T patent/ATE299099T1/de not_active IP Right Cessation
- 2000-04-20 DE DE60021140T patent/DE60021140T2/de not_active Expired - Fee Related
- 2000-04-20 EP EP00108644A patent/EP1046514B1/en not_active Expired - Lifetime
- 2000-04-21 US US09/556,823 patent/US6533917B1/en not_active Expired - Fee Related
- 2000-04-24 CN CN00106249A patent/CN1120095C/zh not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110168128A (zh) * | 2017-01-11 | 2019-08-23 | 奥科宁克公司 | 预加工铝合金产品以便粘结的方法 |
| CN110168128B (zh) * | 2017-01-11 | 2021-11-16 | 奥科宁克技术有限责任公司 | 预加工铝合金产品以便粘结的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60021140T2 (de) | 2006-05-04 |
| EP1046514B1 (en) | 2005-07-06 |
| ATE299099T1 (de) | 2005-07-15 |
| DE60021140D1 (de) | 2005-08-11 |
| US6533917B1 (en) | 2003-03-18 |
| CN1271652A (zh) | 2000-11-01 |
| EP1046514A2 (en) | 2000-10-25 |
| EP1046514A3 (en) | 2001-09-12 |
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