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CN111936421A - 一种球形二氧化硅粉体填料的制备方法和由此得到的球形二氧化硅粉体填料及其应用 - Google Patents

一种球形二氧化硅粉体填料的制备方法和由此得到的球形二氧化硅粉体填料及其应用 Download PDF

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Publication number
CN111936421A
CN111936421A CN201980016623.9A CN201980016623A CN111936421A CN 111936421 A CN111936421 A CN 111936421A CN 201980016623 A CN201980016623 A CN 201980016623A CN 111936421 A CN111936421 A CN 111936421A
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China
Prior art keywords
spherical silica
silica powder
powder filler
preparation
organosilicon compound
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CN201980016623.9A
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CN111936421B (zh
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陈树真
李锐
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Zhejiang Sanshi New Material Technology Co Ltd
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Zhejiang Sanshi New Material Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/30—Nuclear fission reactors

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Silicon Polymers (AREA)

Abstract

本发明涉及一种球形二氧化硅粉体填料的制备方法，包括如下步骤：有机硅化合物水解缩合得到聚硅氧烷沉淀，其中，该有机硅化合物包括化学式为(R1)a(R2)b(R3)cSi(X)d的硅烷，R1，R2，R3为可独立选择的碳原子1至18的烃基或氢原子；X为可水解缩合的官能基；a，b，c为0、1、2或3；d为1、2、3或4；a+b+c+d＝4；将聚硅氧烷沉淀粉碎后干燥得到硅氧烷角形粉体；将硅氧烷角形粉体熔融球化形成球形二氧化硅粉体填料。本发明还提供一种由此得到的球形二氧化硅粉体填料及其应用。本发明以有机硅化合物作为起始原料，由此形成的球形二氧化硅粉体填料中不含铀和钍等放射性元素，因此满足低放射性的要求。

Description

PCT国内申请，说明书已公开。

Claims (11)

  1. PCT国内申请，权利要求书已公开。
CN201980016623.9A 2019-03-12 2019-03-12 一种球形二氧化硅粉体填料的制备方法和由此得到的球形二氧化硅粉体填料及其应用 Active CN111936421B (zh)

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PCT/CN2019/077839 WO2020181490A1 (zh) 2019-03-12 2019-03-12 一种球形二氧化硅粉体填料的制备方法和由此得到的球形二氧化硅粉体填料及其应用

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CN111936421B CN111936421B (zh) 2022-11-11

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US (1) US12151942B2 (zh)
JP (1) JP7456642B2 (zh)
KR (1) KR102653644B1 (zh)
CN (1) CN111936421B (zh)
WO (1) WO2020181490A1 (zh)

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JP2024179264A (ja) * 2023-06-14 2024-12-26 株式会社アドマテックス 高純度溶融球状シリカ、及びこれを含む電子機器用樹脂組成物、並びにこれを含む化粧品
CN118269431B (zh) * 2024-05-08 2025-09-23 浙江鹏远新材料科技集团股份有限公司 一种阻燃隔热epe建材及其制备方法

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CN101172610A (zh) * 2007-11-22 2008-05-07 中国矿业大学(北京) 一种高温二氧化硅粉体的制备方法
CN101462727A (zh) * 2008-09-27 2009-06-24 浙江华飞电子封装基材有限公司 球形二氧化硅的制备方法
CN101519207A (zh) * 2009-03-31 2009-09-02 赵娟 一种粉料燃烧炉
CN105408252A (zh) * 2013-08-01 2016-03-16 日挥触媒化成株式会社 碎解二氧化硅粒子的制造方法及包含该微粒的树脂组合物
WO2017170534A1 (ja) * 2016-03-29 2017-10-05 日立化成株式会社 エアロゲル複合体パウダー

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JPS6438451A (en) * 1987-08-05 1989-02-08 Denki Kagaku Kogyo Kk Filler
JPH01183421A (ja) * 1988-01-19 1989-07-21 Shin Etsu Chem Co Ltd 石英ガラスの製造方法
JP2607118B2 (ja) * 1988-04-19 1997-05-07 日本化学工業株式会社 球状有機珪酸および球状シリカ粉末の製造法
US4979973A (en) * 1988-09-13 1990-12-25 Shin-Etsu Chemical Co., Ltd. Preparation of fused silica glass by hydrolysis of methyl silicate
JP4789080B2 (ja) * 2000-06-20 2011-10-05 日本アエロジル株式会社 非晶質微細シリカ粒子の製造方法
TW201119944A (en) * 2009-10-20 2011-06-16 Nippon Catalytic Chem Ind Amorphous silica and process for producing same
WO2011083683A1 (ja) 2010-01-07 2011-07-14 三菱マテリアル株式会社 合成非晶質シリカ粉末
JP5956113B2 (ja) 2011-03-29 2016-07-20 株式会社アドマテックス 球状シリカ粉体の製造方法及び半導体封止材の製造方法
JP2015086120A (ja) 2013-10-31 2015-05-07 株式会社トクヤマ 球状シリカ微粉末とその製造方法
CN105384177B (zh) 2015-11-27 2018-04-13 江苏联瑞新材料股份有限公司 亚微米级球形二氧化硅微粉的制备方法
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CN101172610A (zh) * 2007-11-22 2008-05-07 中国矿业大学(北京) 一种高温二氧化硅粉体的制备方法
CN101462727A (zh) * 2008-09-27 2009-06-24 浙江华飞电子封装基材有限公司 球形二氧化硅的制备方法
CN101519207A (zh) * 2009-03-31 2009-09-02 赵娟 一种粉料燃烧炉
CN105408252A (zh) * 2013-08-01 2016-03-16 日挥触媒化成株式会社 碎解二氧化硅粒子的制造方法及包含该微粒的树脂组合物
WO2017170534A1 (ja) * 2016-03-29 2017-10-05 日立化成株式会社 エアロゲル複合体パウダー

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Publication number Publication date
WO2020181490A1 (zh) 2020-09-17
CN111936421B (zh) 2022-11-11
US12151942B2 (en) 2024-11-26
JP2022523589A (ja) 2022-04-25
JP7456642B2 (ja) 2024-03-27
KR102653644B1 (ko) 2024-04-01
US20220153599A1 (en) 2022-05-19
KR20210126109A (ko) 2021-10-19

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Address after: No. 1919, Ganshan Road, Huzhou City, Zhejiang Province, 313000

Applicant after: Zhejiang Sanshi New Material Technology Co.,Ltd.

Address before: 1219-16, building 3, No. 1366, Hongfeng Road, Kangshan street, Huzhou Economic and Technological Development Zone, Huzhou City, Zhejiang Province, 313000

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