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CN111684011A - Resist composition and resist film - Google Patents

Resist composition and resist film Download PDF

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CN111684011A
CN111684011A CN201980009865.5A CN201980009865A CN111684011A CN 111684011 A CN111684011 A CN 111684011A CN 201980009865 A CN201980009865 A CN 201980009865A CN 111684011 A CN111684011 A CN 111684011A
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resist composition
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acid anhydride
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epoxy resin
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CN111684011B (en
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户塚凉
大西贤午
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Kansai Paint Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
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    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/04Epoxynovolacs
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

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Abstract

The invention aims to provide a resist composition which has excellent storage stability and is excellent in screen printing performance, definition, low warpage, flexibility, chemical resistance and flame retardance. The present invention relates to a resist composition comprising: a biphenyl aralkyl type epoxy resin (A), an acid anhydride curing agent (B) containing a carboxylic anhydride (B1) and a carboxylic anhydride modified product (B2), and an extender pigment (C); the resist composition contains 20 to 100 parts by mass of the acid anhydride curing agent (B) and 10 to 200 parts by mass of the extender pigment (C) based on 100 parts by mass of the solid content of the biphenyl aralkyl epoxy resin (A).

Description

抗蚀剂组合物和抗蚀膜Resist composition and resist film

技术领域technical field

本发明涉及一种贮存稳定性良好、且丝网印刷性、清晰度、低翘曲性、挠性、耐化学品性和阻燃性均优异的抗蚀剂组合物及抗蚀膜。The present invention relates to a resist composition and resist film having good storage stability and excellent screen printability, clarity, low warpage, flexibility, chemical resistance and flame retardancy.

背景技术Background technique

阻焊剂的目的在于,在将部件焊接到印刷线路板上时防止焊料附着在不必要的部分上和保护电路。用于该用途的抗蚀剂组合物所形成的固化膜需要满足与基材的密合性、阻燃性、电绝缘性、焊锡耐热性、耐化学品性(耐溶剂性、耐碱性及耐酸性)及耐电镀性等各种特性。此外,近年来,对在高精细且柔性电路基板的需求日益扩大,涂布固化后的挠性及低翘曲性也是必不可少的。The purpose of solder resist is to prevent solder from adhering to unnecessary parts and to protect circuits when soldering components to a printed wiring board. The cured film formed from the resist composition used for this application needs to satisfy the adhesion to the substrate, flame retardancy, electrical insulation, solder heat resistance, chemical resistance (solvent resistance, alkali resistance) and acid resistance) and plating resistance and other characteristics. In addition, in recent years, the demand for high-definition and flexible circuit boards has been increasing, and flexibility and low warpage properties after coating and curing are also essential.

以往,通过抗蚀剂组合物的图案形成一般是将感光性组合物曝光并蚀刻来形成图案,但需要光致抗蚀剂组合物、显影液、蚀刻液、剥离液等多种大量的化学液,而且需要繁杂的工序。因此,要求没有曝光工序,且可通过丝网印刷而形成高精细的图案膜。Conventionally, pattern formation by resist composition generally involves exposure and etching of a photosensitive composition to form a pattern, but a large amount of chemical solutions such as photoresist composition, developer, etching solution, and stripping solution are required. , and requires complicated processes. Therefore, it is required that a high-definition pattern film can be formed by screen printing without an exposure step.

对此,例如,专利文献1提出了一种印刷用抗蚀剂组合物,其含有(A)联苯芳烷基型环氧树脂、(B)胺值在100~500mgKOH/g范围内的至少1种胺系固化剂、(C)平均一次粒径在1~100nm范围内的微粒二氧化硅、(D)薄片状体质颜料及(E)有机溶剂,其中,以该环氧树脂(A)的树脂固体成分100质量份为基准,成分(D)的含量为0.1~100质量份。In this regard, for example, Patent Document 1 proposes a resist composition for printing containing (A) a biphenyl aralkyl type epoxy resin, and (B) at least an amine value in the range of 100 to 500 mgKOH/g. An amine-based curing agent, (C) particulate silica having an average primary particle diameter in the range of 1 to 100 nm, (D) a flaky extender pigment, and (E) an organic solvent, wherein the epoxy resin (A) The content of the component (D) is 0.1 to 100 parts by mass based on 100 parts by mass of the resin solid content.

然而,在追求性能提高的过程中,上述印刷用抗蚀剂组合物的贮存稳定性不足,此外,需要在丝网印刷性、清晰度、低翘曲性、挠性及阻燃性的任意性能上进行改良。However, in pursuit of performance improvement, the above-mentioned resist composition for printing has insufficient storage stability, and in addition, any performance in screen printability, clarity, low warpage, flexibility, and flame retardancy is required. improvement on.

现有技术文献prior art literature

专利文献Patent Literature

专利文献1:日本特开2017-82089号公报Patent Document 1: Japanese Patent Laid-Open No. 2017-82089

发明内容SUMMARY OF THE INVENTION

发明要解决的课题The problem to be solved by the invention

本发明的目的在于提供一种贮存稳定性良好、且丝网印刷性、清晰度、低翘曲性、挠性、耐化学品性和阻燃性均优异的抗蚀剂组合物。An object of the present invention is to provide a resist composition having good storage stability and excellent screen printability, clarity, low warpage, flexibility, chemical resistance, and flame retardancy.

解决课题的手段means of solving problems

本发明人等为了解决上述课题,进行了深入研究,结果发现,通过以特定比例含有联苯芳烷基型环氧树脂(A)、包含脂环族羧酸酐(b1)和脂环族羧酸酐改性物(b2)的酸酐系固化剂(B)和体质颜料(C)的抗蚀剂组合物能够解决上述课题,至此完成了本发明。The inventors of the present invention have conducted intensive studies in order to solve the above-mentioned problems, and as a result, they have found that the biphenyl aralkyl type epoxy resin (A), the alicyclic carboxylic acid anhydride (b1) and the alicyclic carboxylic acid anhydride are contained in a specific ratio. The resist composition of the acid anhydride-based curing agent (B) of the modified product (b2) and the extender pigment (C) can solve the above-mentioned problems, and the present invention has been completed.

即,本发明涉及一种抗蚀剂组合物以及含有该抗蚀剂组合物的抗蚀膜,所述抗蚀剂组合物含有:That is, the present invention relates to a resist composition containing:

下述通式(I)表示的联苯芳烷基型环氧树脂(A);A biphenyl aralkyl type epoxy resin (A) represented by the following general formula (I);

酸酐系固化剂(B),其包含羧酸酐(b1)和羧酸酐改性物(b2);和An acid anhydride-based curing agent (B) comprising a carboxylic acid anhydride (b1) and a carboxylic acid anhydride modified product (b2); and

体质颜料(C),Extender Pigments (C),

所述抗蚀剂组合物以所述联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,含有20~100质量份的所述酸酐系固化剂(B)和10~200质量份的所述体质颜料(C);The resist composition contains 20 to 100 parts by mass of the acid anhydride-based curing agent (B) and 10 to 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A) 200 parts by mass of the extender pigment (C);

[化1][hua 1]

Figure BDA0002598591940000021
Figure BDA0002598591940000021

(式中,n表示1~10的重复数)。(in the formula, n represents the number of repetitions of 1 to 10).

发明效果Invention effect

本发明的抗蚀剂组合物的贮存稳定性优异、且能够形成丝网印刷性、清晰度、低翘曲性、挠性、耐化学品性和阻燃性均优异的抗蚀膜。The resist composition of the present invention is excellent in storage stability, and can form a resist film excellent in all of screen printability, clarity, low warpage, flexibility, chemical resistance, and flame retardancy.

具体实施方式Detailed ways

本发明的抗蚀剂组合物含有:联苯芳烷基型环氧树脂(A);包含羧酸酐(b1)和羧酸酐改性物(b2)的酸酐系固化剂(B);和体质颜料(C)。The resist composition of the present invention contains: a biphenyl aralkyl type epoxy resin (A); an acid anhydride-based curing agent (B) containing a carboxylic acid anhydride (b1) and a carboxylic acid anhydride modified product (b2); and an extender pigment (C).

联苯芳烷基型环氧树脂(A)Biphenyl aralkyl type epoxy resin (A)

本发明中使用的联苯芳烷基型环氧树脂(A)通常是衍生自联苯衍生物与酚化合物和萘酚化合物等具有酚骨架的化合物、且分子内含有2个以上环氧基的多官能环氧树脂,其由通式(I)表示。The biphenyl aralkyl type epoxy resin (A) used in the present invention is usually derived from a compound having a phenol skeleton such as a biphenyl derivative, a phenol compound and a naphthol compound, and contains two or more epoxy groups in the molecule. A polyfunctional epoxy resin represented by the general formula (I).

[化2][hua 2]

Figure BDA0002598591940000031
Figure BDA0002598591940000031

(式中,n表示1~10的重复数)。(in the formula, n represents the number of repetitions of 1 to 10).

作为上述联苯芳烷基型环氧树脂(A)的原料的酚芳烷基型树脂例如可以通过使4,4′-双甲氧基甲基联苯或4,4′-双卤代甲基联苯等取代的亚甲基联苯化合物与酚化合物在酸性条件下进行缩合的缩合反应而制得。接着,通过使上述酚芳烷基型树脂与表氯醇、β-甲基表氯醇等卤代环氧化物反应而环氧丙基化,由此可以得到上述通式(I)的化合物。The phenol aralkyl type resin which is a raw material of the above-mentioned biphenyl aralkyl type epoxy resin (A) can be obtained, for example, by using 4,4'-bismethoxymethylbiphenyl or 4,4'-bishalomethyl. It is obtained by the condensation reaction of substituted methylene biphenyl compounds such as base biphenyl and phenolic compounds under acidic conditions. Next, the compound of the above-mentioned general formula (I) can be obtained by reacting the above-mentioned phenol aralkyl-type resin with a halogenated epoxide such as epichlorohydrin and β-methyl epichlorohydrin to glycidyl.

作为联苯芳烷基型环氧树脂(A),例如可以使用日本化药(株)制的“NC-3000”、“NC-3000-L”、“NC3000-H”、“NC3000-FH”及“NC3100”等市售品。As the biphenyl aralkyl type epoxy resin (A), "NC-3000", "NC-3000-L", "NC3000-H", and "NC3000-FH" manufactured by Nippon Kayaku Co., Ltd. can be used, for example. and "NC3100" and other commercial products.

予以说明,在通式(1)表示的联苯芳烷基型环氧树脂中,n=1的联苯芳烷基型环氧树脂的含有比率如下所示:“NC3000-FH”为约15~20质量%,“NC3000-H”为约20~25质量%,“NC3000”为约30~40质量%,“NC3000L”为约40~50质量%,“NC3100”为约55~65质量%。In addition, in the biphenyl aralkyl type epoxy resin represented by general formula (1), the content ratio of the biphenyl aralkyl type epoxy resin of n=1 is as follows: "NC3000-FH" is about 15 ~20 mass%, "NC3000-H" is about 20-25 mass%, "NC3000" is about 30-40 mass%, "NC3000L" is about 40-50 mass%, "NC3100" is about 55-65 mass% .

酸酐系固化剂(B)Acid anhydride curing agent (B)

本发明中使用的酸酐系固化剂(B)包含羧酸酐(b1)和羧酸酐的改性物(b2)。The acid anhydride-based curing agent (B) used in the present invention includes a carboxylic acid anhydride (b1) and a modified product (b2) of a carboxylic acid anhydride.

羧酸酐(b1) Carboxylic anhydride (b1) :

作为羧酸酐(b1),例如可举出:四氢邻苯二甲酸酐、甲基四氢邻苯二甲酸酐、三烷基四氢邻苯二甲酸酐、六氢邻苯二甲酸酐、甲基六氢邻苯二甲酸酐、纳迪克酸酐、甲基纳迪克酸酐、氯桥酸酐、纳迪克酸酐(himic anhydride)、5-(2,5-二氧代四氢呋喃基)-3-甲基-3-环己烯-1,2-二羧酸酐、甲基-5-降冰片烯-2,3-二羧酸酐、三烷基四氢邻苯二甲酸酐-马来酸酐加成物、氯桥酸(Chlorendic acid)、甲基内亚甲基四氢邻苯二甲酸等脂环族羧酸的酸酐;十二烯基琥珀酸酐、聚壬二酸酐、聚癸二酸酐、聚十二烷二酸酐等脂族羧酸的酸酐;邻苯二甲酸酐、偏苯三酸酐、均苯四酸酐、二苯甲酮四羧酸酐、乙二醇偏苯三酸酐、联苯四羧酸酐等芳族羧酸的酸酐等。作为羧酸酐(b1)的市售品,可以使用日本化药(株)制的“KayahardMCD”(甲基-5-降冰片烯-2,3-二羧酸酐)、新日本理化(株)制的“Rikacid HH”(六氢邻苯二甲酸酐)、“Rikacid MH-T”(甲基六氢邻苯二甲酸酐)、“Rikacid MH-700”(甲基六氢邻苯二甲酸酐)等。As carboxylic acid anhydride (b1), for example, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, methyl base hexahydrophthalic anhydride, nadic anhydride, methyl nadic anhydride, chloro bridge anhydride, himic anhydride, 5-(2,5-dioxotetrahydrofuranyl)-3-methyl- 3-cyclohexene-1,2-dicarboxylic acid anhydride, methyl-5-norbornene-2,3-dicarboxylic acid anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, chlorine Anhydrides of alicyclic carboxylic acids such as Chlorendic acid and methylendomethylenetetrahydrophthalic acid; dodecenyl succinic anhydride, polyazelaic anhydride, polysebacic anhydride, polydodecanedioic acid Acid anhydrides of aliphatic carboxylic acids such as acid anhydrides; acid anhydrides of aromatic carboxylic acids such as phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic anhydride, ethylene glycol trimellitic anhydride, biphenyl tetracarboxylic anhydride, etc. As a commercial product of the carboxylic acid anhydride (b1), "KayahardMCD" (methyl-5-norbornene-2,3-dicarboxylic acid anhydride) manufactured by Nippon Kayaku Co., Ltd., manufactured by Nippon Chemical Co., Ltd. "Rikacid HH" (hexahydrophthalic anhydride), "Rikacid MH-T" (methylhexahydrophthalic anhydride), "Rikacid MH-700" (methylhexahydrophthalic anhydride) Wait.

羧酸酐的改性物(b2) Modified product (b2) of carboxylic anhydride :

作为羧酸酐的改性物(b2),例如可举出:脂环族羧酸酐的改性物、脂族羧酸酐的改性物、及芳族羧酸酐的改性物。具体地,可举出:脂环族羧酸酐与(聚)亚烷基二醇的酯、脂族羧酸酐与(聚)亚烷基二醇的酯、芳族羧酸酐改性物与(聚)亚烷基二醇的酯等。作为(聚)亚烷基二醇,例如可举出:乙二醇、丙二醇、聚乙二醇、聚丙二醇、聚乙二醇和聚丙二醇的嵌段物等。作为羧酸酐的改性物(b2)的市售品,可以使用新日本理化(株)制的“Rikacid HF-08”(脂环族羧酸酐与(聚)亚烷基二醇的酯)、“Rikacid TMEG-100”(芳族羧酸酐与乙二醇的酯)等。As the modified product (b2) of the carboxylic acid anhydride, for example, a modified product of an alicyclic carboxylic anhydride, a modified product of an aliphatic carboxylic anhydride, and a modified product of an aromatic carboxylic acid anhydride can be mentioned. Specifically, esters of alicyclic carboxylic anhydrides and (poly)alkylene glycols, esters of aliphatic carboxylic anhydrides and (poly)alkylene glycols, modified aromatic carboxylic anhydrides and (poly)alkylene glycols can be mentioned. ) esters of alkylene glycols, etc. As (poly)alkylene glycol, ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, a block product of polyethylene glycol, and polypropylene glycol, etc. are mentioned, for example. As a commercial product of the modified product (b2) of carboxylic acid anhydride, "Rikacid HF-08" (ester of alicyclic carboxylic acid anhydride and (poly)alkylene glycol) manufactured by Nippon Chemical Co., Ltd., "Rikacid TMEG-100" (ester of aromatic carboxylic acid anhydride and ethylene glycol) and the like.

在酸酐系固化剂(B)中,上述羧酸酐(b1)与羧酸酐改性物(b2)的使用比(质量比)从固化性、挠性及耐化学品性的观点考虑,以两成分的固体成分合计为基准,期望(b1)/(b2)=5/5~1/9,优选为4/6~2/8。In the acid anhydride-based curing agent (B), the use ratio (mass ratio) of the carboxylic acid anhydride (b1) and the carboxylic acid anhydride modified product (b2) is two components from the viewpoints of curability, flexibility, and chemical resistance. Based on the total solid content of , it is desirable that (b1)/(b2)=5/5 to 1/9, preferably 4/6 to 2/8.

另外,酸酐系固化剂(B)的使用量从固化性、挠性、耐化学品性和阻燃性的观点考虑,以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,为20~100质量份,优选为40~90质量份。In addition, the usage-amount of the acid anhydride type curing agent (B) is based on 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A) from the viewpoint of curability, flexibility, chemical resistance, and flame retardancy It is 20-100 mass parts as a basis, Preferably it is 40-90 mass parts.

体质颜料(C)Extender Pigment (C)

作为本发明所使用的体质颜料(C),可举出:粘土、二氧化硅、气相法二氧化硅、硫酸钡、滑石、碳酸钙、白碳、硅藻土、碳酸铝镁片、云母片等。Examples of the extender pigment (C) used in the present invention include clay, silica, fumed silica, barium sulfate, talc, calcium carbonate, white carbon, diatomaceous earth, aluminum magnesium carbonate flakes, and mica flakes Wait.

体质颜料(C)的使用量从贮存稳定性、低翘曲性、挠性、耐化学品性和阻燃性的观点考虑,以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,为10~200质量份,优选为30~180质量份。The use amount of the extender pigment (C) is based on the solid content of the biphenyl aralkyl type epoxy resin (A) 100 from the viewpoint of storage stability, low warpage, flexibility, chemical resistance and flame retardancy. It is 10-200 mass parts based on a mass part, Preferably it is 30-180 mass parts.

本发明中,从提高贮存稳定性、低翘曲性、挠性、耐化学品性和阻燃性的观点考虑,特别期望含有下述的气相法二氧化硅(c1)、硫酸钡(c2)和滑石(c3)来作为体质颜料(C)。In the present invention, it is particularly desirable to contain the following fumed silica (c1) and barium sulfate (c2) from the viewpoint of improving storage stability, low warpage, flexibility, chemical resistance, and flame retardancy and talc (c3) as extender pigment (C).

平均一次粒径为1~20nm的气相法二氧化硅(c1)Fumed silica with an average primary particle size of 1 to 20 nm (c1)

气相法二氧化硅(c1)是将氯化硅气化并在高温氢焰中通过气相反应合成的无定形的玻璃状且球状的无细孔的二氧化硅,平均一次粒径为1~20nm,优选为2~15nm。气相法二氧化硅(c1)的平均一次粒径可通过观察电子显微镜来测定。Fumed silica (c1) is an amorphous glassy spherical non-porous silica synthesized by vaporizing silicon chloride in a high temperature hydrogen flame by gas phase reaction, and having an average primary particle size of 1 to 20 nm , preferably 2 to 15 nm. The average primary particle size of the fumed silica (c1) can be measured by observation with an electron microscope.

此外,气相法二氧化硅(c1)的比表面积期望为100~1000m2/g,优选为200~500m2/g的范围。Further, the specific surface area of the fumed silica (c1) is desirably in the range of 100 to 1000 m 2 /g, and preferably in the range of 200 to 500 m 2 /g.

作为这样的气相法二氧化硅(c1)的市售品,例如可举出:“Aerosil RX300”(商品名,平均一次粒径7nm)、“Aerosil RX-200”(商品名,平均一次粒径12nm)、“Aerosil RX-380S”(商品名,平均一次粒径5nm)、“Aerosil R-976S”(商品名,平均一次粒径7nm)、“Aerosil300”(商品名,平均一次粒径7nm)、“Aerosil 200”(商品名,平均一次粒径12nm)(以上均为日本Aerosil公司制)、“HDK H 20”(商品名,平均一次粒径10nm,瓦克旭化成有机硅公司制)等。As a commercial item of such a fumed silica (c1), "Aerosil RX300" (trade name, average primary particle size 7 nm), "Aerosil RX-200" (trade name, average primary particle size, 7 nm) are mentioned, for example 12nm), "Aerosil RX-380S" (trade name, average primary particle size 5nm), "Aerosil R-976S" (trade name, average primary particle size 7nm), "Aerosil300" (trade name, average primary particle size 7nm) , "Aerosil 200" (trade name, average primary particle size 12 nm) (all of the above are manufactured by Aerosil Corporation of Japan), "HDK H 20" (trade name, average primary particle size 10 nm, manufactured by Wacker Asahi Kasei Silicones Co., Ltd.).

在使用气相法二氧化硅(c1)的情况下,从抗蚀剂组合物的贮存稳定性优异、以及丝网印刷性、抗蚀膜的清晰度的观点考虑,其使用量以联苯芳烷基型环氧树脂(A)的固体成分100质量部为基准,期望为1~50质量份,优选为5~20质量份。In the case of using fumed silica (c1), from the viewpoints of excellent storage stability of the resist composition, screen printability, and clarity of the resist film, the amount of the used amount is biphenylarane. The solid content of the base epoxy resin (A) is preferably 1 to 50 parts by mass, preferably 5 to 20 parts by mass, based on 100 parts by mass of the solid content.

平均粒径0.1~1.0μm的硫酸钡(c2)Barium sulfate (c2) with an average particle size of 0.1 to 1.0 μm

从抗蚀剂组合物的稳定性、清晰度的观点考虑,硫酸钡(c2)的平均粒径适宜为0.01~1.0μm,优选为0.1~1.0μm,更优选为0.2~0.5μm。From the viewpoint of stability and clarity of the resist composition, the average particle diameter of barium sulfate (c2) is preferably 0.01 to 1.0 μm, preferably 0.1 to 1.0 μm, and more preferably 0.2 to 0.5 μm.

作为这样的硫酸钡(c2)的市售品,例如可举出:“Bariace B-20”(堺化学工业社制,商品名,平均粒径0.03μm)、“Bariace B-30”(堺化学工业社制,商品名,平均粒径0.3μm)、“硫酸钡PS-07”(Guangxi Xiangzh社制,商品名,平均粒径0.74μm)、“硫酸钡HF”(深州嘉信化工公司制,商品名,平均粒径0.9μm)。予以说明,硫酸钡(c2)的平均粒径可以使用“UPA-EX250”(商品名,日机装株式会社制,利用动态光散射法的粒度分布测定装置)来测定。As such a commercial item of barium sulfate (c2), for example, "Bariace B-20" (manufactured by Sakai Chemical Industry Co., Ltd., trade name, average particle size: 0.03 μm), "Bariace B-30" (Sakai Chemical Co., Ltd.) Industrial Co., Ltd., trade name, average particle size 0.3 μm), “Barium Sulfate PS-07” (Guangxi Xiangzh Co., Ltd., trade name, average particle size 0.74 μm), “Barium Sulfate HF” (Shenzhou Jiaxin Chemical Co., Ltd., trade name, average particle size 0.9 μm). In addition, the average particle diameter of barium sulfate (c2) can be measured using "UPA-EX250" (trade name, the Nikkiso Co., Ltd. make, particle size distribution analyzer by dynamic light scattering method).

在使用硫酸钡(c2)的情况下,从丝网印刷性的观点考虑,其使用量以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,期望为1~70质量份,优选为10~40质量份。In the case of using barium sulfate (c2), the usage amount thereof is desirably 1 to 70 parts by mass based on 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A) from the viewpoint of screen printability. The mass part is preferably 10 to 40 mass parts.

平均粒径1.0~10μm的滑石(c3)Talc (c3) with an average particle size of 1.0 to 10 μm

滑石(c3)为具有层状结构的鳞片状粒子,平均粒径为1~10μm,优选平均粒径为2~5μm。The talc (c3) is a scaly particle having a layered structure, and has an average particle diameter of 1 to 10 μm, preferably an average particle diameter of 2 to 5 μm.

作为滑石(c3)的市售品,例如可举出:“Micro Ace SG-95”(商品名,平均粒径2.5μm)、“Micro Ace P-8”(商品名,平均粒径3.3μm)、“Micro Ace P-3”(商品名,平均粒径5μm)、“Micro Ace K-1”(商品名,平均粒径8μm)(以上为日本滑石社制)、“微粉滑石AHM80”(Liaoning公司制,平均粒径5μm)、“滑石AT-1”(东洋化成社制,平均粒径6μm)、“Simgon”(日本滑石社制,平均粒径8μm)、“MISTRON VAPOR”(Nihon Mistron公司制,平均粒径8μm)、“滑石GTA”(协和矿业社制,平均粒径10μm)等。予以说明,滑石(c3)的平均粒径是通过激光衍射法的(C250)测定的粒径。As a commercial item of talc (c3), "Micro Ace SG-95" (trade name, average particle diameter 2.5 micrometers), "Micro Ace P-8" (trade name, average particle diameter 3.3 micrometers) are mentioned, for example. , "Micro Ace P-3" (trade name, average particle size 5μm), "Micro Ace K-1" (trade name, average particle size 8μm) (the above are manufactured by Nippon Talc Corporation), "micro powder talc AHM80" (Liaoning Company made, average particle size 5μm), "Talc AT-1" (Toyo Kasei Co., Ltd., average particle size 6μm), "Simgon" (Japan Talc Co., Ltd., average particle size 8μm), "MISTRON VAPOR" (Nihon Mistron Co., Ltd. manufactured by Kyowa Mining, with an average particle size of 8 μm), “Talc GTA” (manufactured by Kyowa Mining Co., Ltd., with an average particle size of 10 μm). In addition, the average particle diameter of talc (c3) is the particle diameter measured by the laser diffraction method (C250).

在使用滑石(c3)的情况下,从低翘曲性、挠性的观点考虑,其配合量以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,期望为1~70质量份,优选为15~30质量份。In the case of using talc (c3), from the viewpoint of low warpage and flexibility, the compounding amount is desirably 1 based on 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A). to 70 parts by mass, preferably 15 to 30 parts by mass.

有机烷氧基化合物(D)Organic alkoxy compound (D)

本发明的抗蚀剂组合物根据需要可含有有机烷氧基化合物(D)。作为上述有机烷氧基化合物(D),例如可举出:原乙酸三甲酯(MOA)、原甲酸三甲酯(MOF)、原甲酸三乙酯、原乙酸三乙酯、原乙酸三异丙酯、二甲氧基丙烷等。The resist composition of this invention can contain an organic alkoxy compound (D) as needed. Examples of the organic alkoxy compound (D) include trimethyl orthoacetate (MOA), trimethyl orthoformate (MOF), triethyl orthoformate, triethyl orthoacetate, and triiso orthoacetate. Propyl ester, dimethoxypropane, etc.

在使用有机烷氧基化合物(D)的情况下,从抗蚀剂组合物的贮存稳定性优异、且可提供丝网印刷性优异的抗蚀膜的观点考虑,其使用量以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,适宜为0.1~30质量份,优选为1~20质量份。In the case of using the organic alkoxy compound (D), from the viewpoint of being excellent in the storage stability of the resist composition and providing a resist film excellent in screen printability, the amount of its use is the biphenylarane. The solid content of the base epoxy resin (A) is preferably 0.1 to 30 parts by mass, preferably 1 to 20 parts by mass, based on 100 parts by mass of the solid content.

本发明的抗蚀剂组合物根据需要还可以含有咪唑系固化促进剂、阻燃剂、有机溶剂。The resist composition of the present invention may further contain an imidazole-based curing accelerator, a flame retardant, and an organic solvent as necessary.

咪唑系固化促进剂是催化剂型的固化剂,对环氧树脂添加少量即可促进固化。The imidazole-based curing accelerator is a catalyst-type curing agent, which can accelerate curing by adding a small amount of epoxy resin.

作为咪唑系固化促进剂,具体地,可举出:咪唑(分子量68.08)、2-甲基咪唑(分子量82.11)、2-乙基咪唑(分子量96.13)、2-乙基-4-甲基咪唑(分子量110.16)、2-苯基咪唑(分子量144.18)、2-苯基咪唑啉(分子量146.19)、2,3-二氢-1H-吡咯并[1,2-a]苯并咪唑(分子量158.19)、4-甲基苯基咪唑(分子量158.19)、1-(2-氰基乙基)-2-乙基-4-甲基-咪唑(分子量163.22)、1-(2-氰基乙基)-2-苯基咪唑(分子量197.24)、2,4-二氨基-6-[2′-甲基咪唑基-(1′)]乙基-s-三嗪(分子量219.25)、2,4-二氨基-6-[2′-乙基-4′-甲基咪唑基-(1’)]-乙基-s-三嗪(分子量248.31)、2,4-二氨基-6-[2′-十一烷基咪唑基-(1′)]-乙基-s-三嗪(分子量359.51)等。其中,从抗蚀膜的清晰度的观点考虑,优选分子量200以上的咪唑系固化促进剂,具体地,特别优选为2,4-二氨基-6-[2′-甲基咪唑基-(1)]乙基-s-三嗪、2,4-二氨基-6-[2′-乙基-4′-甲基咪唑基-(1′)]-乙基-s-三嗪、2,4-二氨基-6-[2′-十一烷基咪唑基-(1′)]-乙基-s-三嗪。Specific examples of imidazole-based curing accelerators include imidazole (molecular weight: 68.08), 2-methylimidazole (molecular weight: 82.11), 2-ethylimidazole (molecular weight: 96.13), 2-ethyl-4-methylimidazole (molecular weight 110.16), 2-phenylimidazole (molecular weight 144.18), 2-phenylimidazoline (molecular weight 146.19), 2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole (molecular weight 158.19) ), 4-methylphenylimidazole (molecular weight 158.19), 1-(2-cyanoethyl)-2-ethyl-4-methyl-imidazole (molecular weight 163.22), 1-(2-cyanoethyl) )-2-phenylimidazole (molecular weight 197.24), 2,4-diamino-6-[2'-methylimidazolyl-(1')]ethyl-s-triazine (molecular weight 219.25), 2,4 -Diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine (molecular weight 248.31), 2,4-diamino-6-[2 '-Undecylimidazolyl-(1')]-ethyl-s-triazine (molecular weight 359.51) and the like. Among them, an imidazole-based curing accelerator having a molecular weight of 200 or more is preferable from the viewpoint of the clarity of the resist film, and specifically, 2,4-diamino-6-[2′-methylimidazolyl-(1 )] ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine, 2, 4-Diamino-6-[2'-undecylimidazolyl-(1')]-ethyl-s-triazine.

在使用咪唑系固化促进剂的情况下,其使用量以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,期望为1~20质量份,优选为5~15质量份的范围。In the case of using an imidazole-based curing accelerator, the amount used is desirably 1 to 20 parts by mass, preferably 5 to 15 parts by mass, based on 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A). range of copies.

作为上述阻燃剂,从环境、阻燃性、以及与环氧树脂的相容性的观点考虑,可适宜使用非卤素的含磷化合物、金属氢氧化物和含氮化合物。As the above-mentioned flame retardant, non-halogen phosphorus-containing compounds, metal hydroxides, and nitrogen-containing compounds can be suitably used from the viewpoints of environment, flame retardancy, and compatibility with epoxy resins.

作为上述非卤素的含磷化合物,可举出:非卤素的磷酸酯、缩合磷酸酯、红磷等。作为上述磷酸酯,可举出各种磷酸酯化合物,具体地,可举出:磷酸三苯酯、磷酸三-二甲苯酯、磷酸三乙酯、磷酸甲苯基苯酯、磷酸二甲苯酯、磷酸2-乙基己基二苯酯、磷酸二甲基甲酯、磷酸三烯丙酯、三聚氰胺多聚磷酸酯等。As the said non-halogen phosphorus-containing compound, non-halogen phosphoric acid ester, condensed phosphoric acid ester, red phosphorus, etc. are mentioned. As said phosphoric acid ester, various phosphoric acid ester compounds are mentioned, Specifically, triphenyl phosphate, tris-xylyl phosphate, triethyl phosphate, tolyl phenyl phosphate, dimethyl phosphate, phosphoric acid are mentioned. 2-ethylhexyl diphenyl ester, dimethyl methyl phosphate, triallyl phosphate, melamine polyphosphate, etc.

作为上述缩合磷酸酯,可举出:间苯二酚双(二苯基)磷酸酯、1,3-亚苯基双(二苯基磷酸酯)、1,3-亚苯基双(二甲苯基)磷酸酯、双酚A双(二苯基磷酸酯)、磷腈酸苯酯(phosphonitrilic acid phenyl ester)等磷腈化合物等。作为市售品,例如可举出:磷酸三甲酯(商品名TMP)、磷酸三乙酯(商品名TEP)、磷酸三丁酯(商品名TBP)、磷酸三辛酯(商品名TOP)、磷酸三丁氧基乙酯(商品名TBXP)、磷酸辛基二苯酯(商品名41)、磷酸三甲苯酯(商品名TCP)、磷酸甲苯基二苯酯(商品名CC2P);磷酸三苯酯(商品名TPP)、CR-733S、CR-741、CR-747、PX-200(以上,大八化学工业社制);Reofos 35、50、65、90、110、Reofos BAPP、Kronitex TCP、Kronitex TXP、Kronitex CC2P(以上,味之素社制);Z-900(互应化学工业(株)制的プラコート)等。As said condensed phosphoric acid ester, resorcinol bis (diphenyl) phosphoric acid ester, 1, 3- phenylene bis (diphenyl phosphoric acid ester), 1, 3- phenylene bis (xylene) are mentioned phosphazene compounds such as phosphonitrile, bisphenol A bis(diphenyl phosphate), phosphonitrilic acid phenyl ester, etc. Examples of commercially available products include trimethyl phosphate (trade name TMP), triethyl phosphate (trade name TEP), tributyl phosphate (trade name TBP), trioctyl phosphate (trade name TOP), Tributoxyethyl phosphate (trade name TBXP), octyl diphenyl phosphate (trade name 41), tricresyl phosphate (trade name TCP), tolyl diphenyl phosphate (trade name CC2P); triphenyl phosphate Ester (trade name TPP), CR-733S, CR-741, CR-747, PX-200 (above, manufactured by Daihachi Chemical Industry Co., Ltd.); Reofos 35, 50, 65, 90, 110, Reofos BAPP, Kronitex TCP, Kronitex TXP, Kronitex CC2P (above, manufactured by Ajinomoto Co., Ltd.); Z-900 (Purakuto, manufactured by Hoyo Chemical Industry Co., Ltd.), etc.

作为上述金属氢氧化物,可举出:氢氧化铝、氢氧化镁、水滑石类、和勃姆石等。上述氢氧化铝可以为表面未处理物,或者,也可以使用通过末端具有乙烯基或环氧基的硅烷偶联剂、硬脂酸、油酸、磷酸酯等进行了表面处理的氢氧化铝等。As said metal hydroxide, aluminum hydroxide, magnesium hydroxide, hydrotalcites, boehmite, etc. are mentioned. The above-mentioned aluminum hydroxide may be an untreated product, or may be surface-treated with a silane coupling agent having a vinyl or epoxy group at the terminal, stearic acid, oleic acid, phosphoric acid ester, or the like. .

作为氢氧化铝的市售品,可举出:昭和电工社制的Higilite H42M、HigiliteH42S、Higilite H42T、Higilite H42ST-V;日本轻金属社制的B1403、B1403ST、B1403T;巴工业社制的B-30、B-325、B-316、B-315、B-312、B-309及B-303等。Commercially available products of aluminum hydroxide include: Higilite H42M, Higilite H42S, Hgilite H42T, and Higilite H42ST-V manufactured by Showa Denko Corporation; B1403, B1403ST, B1403T manufactured by Nippon Light Metal Corporation; B-30 manufactured by Pakistan Industrial Corporation , B-325, B-316, B-315, B-312, B-309 and B-303, etc.

作为氢氧化镁,既可以是天然物也可以是合成物,此外,也可以为表面未处理物,也可以使用通过末端具有乙烯基或环氧基的硅烷偶联剂、硬脂酸、油酸、磷酸酯等进行了表面处理的氢氧化镁等。作为氢氧化镁的市售品,可举出:协和化学社制的KISUMA 5A、KISUMA5B、KISUMA 5E、KISUMA 5J、KISUMA 5P、KISUMA 5L;Albemarle公司制的Magnifin H5、Magnifin H7、Magnifin H10等。As magnesium hydroxide, a natural product or a synthetic product may be used, and a surface untreated product may be used, and a silane coupling agent having a vinyl group or epoxy group at the terminal, stearic acid, oleic acid may be used. , phosphate and other surface-treated magnesium hydroxide, etc. Commercially available products of magnesium hydroxide include KISUMA 5A, KISUMA 5B, KISUMA 5E, KISUMA 5J, KISUMA 5P, and KISUMA 5L manufactured by Kyowa Chemical Co., Ltd.; Magnifin H5, Magnifin H7, and Magnifin H10 manufactured by Albemarle Corporation.

作为上述含氮化合物,可举出三聚氰酸氰尿酸酯、聚磷酸铵等。As said nitrogen-containing compound, cyanuric acid cyanurate, ammonium polyphosphate, etc. are mentioned.

其中,从阻燃性的观点考虑,优选为热分解温度在约400℃以上的阻燃剂,适宜为工业上可容易获得的磷酸酯化合物、缩合磷酸酯、氢氧化镁、氢氧化铝。Among them, from the viewpoint of flame retardancy, a flame retardant having a thermal decomposition temperature of about 400° C. or higher is preferable, and industrially readily available phosphoric acid ester compounds, condensed phosphoric acid esters, magnesium hydroxide, and aluminum hydroxide are suitable.

在使用上述阻燃剂的情况下,从提高阻燃性的观点考虑,其使用量以联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,期望为1~50质量份,优选为10~45质量份的范围。In the case of using the above-mentioned flame retardant, from the viewpoint of improving flame retardancy, the usage amount thereof is desirably 1 to 50 parts by mass based on 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A). parts, preferably in the range of 10 to 45 parts by mass.

作为上述有机溶剂,例如,可适宜使用选自醇系有机溶剂、醚系有机溶剂、酮系有机溶剂和酯系有机溶剂、且溶解度参数(SP值)在9.0~15.0范围内的有机溶剂。As the organic solvent, for example, an organic solvent selected from alcohol-based organic solvents, ether-based organic solvents, ketone-based organic solvents, and ester-based organic solvents and having a solubility parameter (SP value) within the range of 9.0 to 15.0 can be suitably used.

作为醇系有机溶剂,可举出:甲醇(SP值14.5)、乙醇(SP值12.7)、正丁醇(SP值11.4)、2-乙氧乙醇(别名:溶纤剂(SP值10.71))、乙二醇单甲基醚(别名:甲基溶纤剂(SP值11.68))、乙二醇单乙基醚(别名:乙基溶纤剂(SP值10.5))、乙二醇单正丁基醚(别名:丁基溶纤剂(SP值9.5))、二甘醇单乙基醚(别名:卡必醇(SP值10.2))、二甘醇单丁基醚(别名:丁基卡必醇(SP值9.5))等。Examples of alcohol-based organic solvents include methanol (SP value 14.5), ethanol (SP value 12.7), n-butanol (SP value 11.4), 2-ethoxyethanol (alias: cellosolve (SP value 10.71)) , ethylene glycol monomethyl ether (alias: methyl cellosolve (SP value 11.68)), ethylene glycol monoethyl ether (alias: ethyl cellosolve (SP value 10.5)), ethylene glycol mono-positive Butyl ether (alias: butyl cellosolve (SP value 9.5)), diethylene glycol monoethyl ether (alias: carbitol (SP value 10.2)), diethylene glycol monobutyl ether (alias: butyl carbitol alcohol (SP value 9.5)) and so on.

作为醚系有机溶剂,可举出:(聚)乙二醇、(聚)乙二醇单甲基醚、(聚)乙二醇单乙基醚、(聚)乙二醇单丙基醚、(聚)丙二醇、(聚)丙二醇单甲基醚、(聚)丙二醇单乙基醚、(聚)丙二醇单丙基醚、聚醚改性的二甲基硅氧烷(例如“BYK-345”、“BYK-348”、“BYK-377”,商品名,BYK Japan KK制)等。As the ether-based organic solvent, (poly)ethylene glycol, (poly)ethylene glycol monomethyl ether, (poly)ethylene glycol monoethyl ether, (poly)ethylene glycol monopropyl ether, (Poly)propylene glycol, (poly)propylene glycol monomethyl ether, (poly)propylene glycol monoethyl ether, (poly)propylene glycol monopropyl ether, polyether modified dimethylsiloxane (eg "BYK-345" , "BYK-348", "BYK-377", trade name, made by BYK Japan KK), etc.

作为酮系有机溶剂,可举出:丙酮(SP值9.9)、甲乙酮(SP值9.3)、甲基异丁基酮(SP值8.4)、二异丁基酮(SP值7.8)、环己酮(SP值9.9)、异佛尔酮(SP值9.4)等。Examples of the ketone-based organic solvent include acetone (SP value 9.9), methyl ethyl ketone (SP value 9.3), methyl isobutyl ketone (SP value 8.4), diisobutyl ketone (SP value 7.8), and cyclohexanone (SP value 9.9), isophorone (SP value 9.4), etc.

作为酯系有机溶剂,可举出:乙酸乙酯(SP值9.1)、乙酸正丁酯(SP值8.5)、乙酸异丁酯(SP值8.3)、乙酸异戊酯(SP值7.8)、乙酸甲氧基丙酯(SP值9.2)、乙二醇单甲醚乙酸酯[别名:甲基溶纤剂乙酸酯(SP值9.9)]、二甘醇单丁醚乙酸酯(别名:卡必醇乙酸酯]等。Examples of the ester-based organic solvent include ethyl acetate (SP value 9.1), n-butyl acetate (SP value 8.5), isobutyl acetate (SP value 8.3), isoamyl acetate (SP value 7.8), acetic acid Methoxypropyl (SP value 9.2), ethylene glycol monomethyl ether acetate [alias: methyl cellosolve acetate (SP value 9.9)], diethylene glycol monobutyl ether acetate (alias: Carbitol acetate] and so on.

其他成分other ingredients

本发明的抗蚀剂组合物根据需要可适当含有着色成分、上述以外的体质颜料、其他固化促进剂、抗氧化剂、表面调整剂、流变控制剂、消泡剂、表面活性剂、防污剂、润湿剂等其他成分。The resist composition of the present invention may appropriately contain coloring components, extenders other than the above, other curing accelerators, antioxidants, surface modifiers, rheology control agents, antifoaming agents, surfactants, and antifouling agents as needed , wetting agents and other ingredients.

作为上述着色成分,例如可以使用着色颜料,具体地可举出:氧化钛、锌白、碳黑、钼红、普鲁士蓝、钴蓝、偶氮系颜料、酞菁系颜料、喹吖啶酮系颜料、异吲哚啉系颜料、蒽系颜料、

Figure BDA0002598591940000101
系颜料、二
Figure BDA0002598591940000102
嗪系颜料、二酮吡咯并吡咯系颜料等、铝膏、珍珠粉、石墨、MIO等光亮性颜料等。As the coloring component, for example, coloring pigments can be used, and specific examples thereof include titanium oxide, zinc white, carbon black, molybdenum red, Prussian blue, cobalt blue, azo-based pigments, phthalocyanine-based pigments, and quinacridone-based pigments. Pigments, isoindoline-based pigments, anthracene-based pigments,
Figure BDA0002598591940000101
pigment, two
Figure BDA0002598591940000102
Zine pigments, diketopyrrolopyrrole pigments, etc., aluminum paste, pearl powder, graphite, MIO and other bright pigments, etc.

上述着色成分从能够以较少的量着色及检测时的可视性的观点考虑,优选使用碳黑和/或酞菁系颜料。作为配合这些着色成分的方法,可举出:直接添加到抗蚀剂组合物中的方法;以及,与分散剂混合而进行分散糊化后再配合到抗蚀剂组合物中的方法。此外,在使用碳黑等比表面积较大的颜料时,期望使用大量的分散剂。作为上述分散方法,例如有:使用球磨机、卵磨机、砂磨机、震动器等或强力粉碎机器来获得分散糊的方法。It is preferable to use carbon black and/or a phthalocyanine-based pigment from the viewpoints of being able to be colored in a small amount and the visibility at the time of detection as the coloring component. As a method of mixing these coloring components, a method of directly adding to a resist composition, and a method of mixing with a dispersing agent, dispersing and gelatinizing, and then mixing into the resist composition are exemplified. In addition, when a pigment with a large specific surface area such as carbon black is used, it is desirable to use a large amount of dispersant. As the above-mentioned dispersion method, for example, there is a method of obtaining a dispersion paste using a ball mill, an egg mill, a sand mill, a shaker, or the like, or a powerful pulverizer.

作为其他固化促进剂,例如可举出:甲基-5-降冰片烯-2,3-二羧酸酐等酸酐;三苯膦等有机膦类;辛酸锡等金属化合物;以及四苯基硼酸四苯基

Figure BDA0002598591940000103
等四苯基硼盐等。Examples of other curing accelerators include: acid anhydrides such as methyl-5-norbornene-2,3-dicarboxylic acid anhydride; organic phosphines such as triphenylphosphine; metal compounds such as tin octoate; phenyl
Figure BDA0002598591940000103
such as tetraphenyl boron salt, etc.

本发明的抗蚀剂组合物可以通过配合联苯芳烷基型环氧树脂(A)、酸酐系固化剂(B)和体质颜料(C)以及根据需要的有机烷氧基化合物(D)、咪唑系固化促进剂、阻燃剂、有机溶剂以及其他成分并使用分散机、砂磨机、辊磨机、球磨机等来制造。此外,也可以事先制造颜料成分的分散糊,再来制造抗蚀剂组合物。The resist composition of the present invention can be prepared by compounding a biphenyl aralkyl type epoxy resin (A), an acid anhydride type curing agent (B), an extender pigment (C) and, if necessary, an organic alkoxy compound (D), An imidazole-based curing accelerator, a flame retardant, an organic solvent, and other components are produced using a disperser, a sand mill, a roll mill, a ball mill, or the like. In addition, a dispersion paste of pigment components may be produced in advance, and then the resist composition may be produced.

本发明的抗蚀剂组合物的粘度通常为1Pa·s~100Pa·s,优选在5Pa·s以上且小于30Pa·s的范围内。予以说明,抗蚀剂组合物的粘度例如可以通过用旋转粘度计(例如,E型粘度计,东机产业社制,RE80型,转数:5rpm,测定温度25℃)测定而获得。The viscosity of the resist composition of this invention is 1 Pa.s - 100 Pa.s normally, Preferably it exists in the range of 5 Pa.s or more and less than 30 Pa.s. In addition, the viscosity of a resist composition can be obtained by measuring with a rotational viscometer (for example, E-type viscometer, manufactured by Toki Sangyo Co., Ltd., RE80 type, number of revolutions: 5 rpm, measurement temperature 25°C).

此外,抗蚀剂组合物的粘性(结构粘度指数R)从可将抗蚀剂液体充分涂布在基板上及抑制抗蚀剂图案流动并兼顾图案精度的观点考虑,为2.0以上,优选为2.1~10.0。予以说明,上述结构粘度指数R按下述式(1)定义。In addition, the viscosity (structural viscosity index R) of the resist composition is 2.0 or more, preferably 2.1, from the viewpoints of sufficiently coating the resist liquid on the substrate and suppressing the flow of the resist pattern while taking into account the pattern accuracy ~10.0. In addition, the said structural viscosity index R is defined by following formula (1).

R=Va/Vb·····(1)R=Va/Vb・・・(1)

(其中,式(1)中,Va表示在25℃的温度下通过E型粘度计(商品名,东机产业(株)社制,RE80型)以5次/分钟的转数测定的表观粘度(Pa·s),Vb表示除了转数为50次/分钟以外同样操作测定的粘度(Pa·s))。(wherein, in the formula (1), Va represents the apparent appearance measured at 5 revolutions per minute with an E-type viscometer (trade name, manufactured by Toki Sangyo Co., Ltd., RE80 type) at a temperature of 25° C. The viscosity (Pa·s) and Vb represent the viscosity (Pa·s) measured in the same manner except that the number of revolutions was 50 times/min.

可将上述本发明的抗蚀剂组合物涂布在基材上来形成抗蚀膜。具体地,可以使用本发明的抗蚀剂组合物进行丝网印刷来形成期望的图案的抗蚀膜。The resist composition of the present invention described above can be applied to a substrate to form a resist film. Specifically, a resist film of a desired pattern can be formed by screen printing using the resist composition of the present invention.

作为上述基材,没有特别限定,作为优选的基材,可举出:在酚醛树脂、环氧树脂、聚酰胺树脂、聚酰亚胺树脂、或将这些树脂通过玻璃纤维强化而得到的强化树脂等树脂表面基材或玻璃基材上通过层压、蒸镀等手段覆盖例如铜、金、银、铝、铬等导电性金属而成的层压基材。这些基材的基板和金属膜可以由单层构成,也可以由多层构成。此外,可以在基材上设置贯通或非贯通的孔。这些基材的厚度和形状也没有特别限定。The above-mentioned base material is not particularly limited, and preferable base materials include phenol resin, epoxy resin, polyamide resin, polyimide resin, or a reinforced resin obtained by reinforcing these resins with glass fibers. A laminated base material in which conductive metals such as copper, gold, silver, aluminum, and chromium are covered on a resin surface base material or a glass base material by means of lamination, vapor deposition, or the like. The substrate and the metal film of these base materials may be constituted by a single layer or may be constituted by a plurality of layers. In addition, through or non-through holes may be provided in the substrate. The thickness and shape of these substrates are also not particularly limited.

作为用于上述丝网印刷的网版的种类,可举出:聚酯丝网、组合丝网、金属丝网、尼龙丝网等。此外,在印刷高粘度的膏状物的情况下,可以使用高张力的不锈钢丝网。丝网印刷的刮板可以为圆形、长方形、正方形中的任一种形状,此外,为了缩小攻角(印刷时的网版与刮板的夹角),也可以使用研磨刮板。对于其他的印刷条件等,可适当调整以往公知的条件。对于丝网印刷法而言,为了应对电路图案的高精细化,优选使用细目的丝网,特别优选使用约100~400目的细目的丝网。此时的丝网的开放面积优选为约20~50%。As a kind of the screen used for the said screen printing, a polyester screen, a composite screen, a metal screen, a nylon screen, etc. are mentioned. In addition, in the case of printing a high-viscosity paste, a high-tension stainless steel mesh can be used. The squeegee for screen printing can be any shape of circle, rectangle, and square. In addition, in order to reduce the angle of attack (the angle between the screen and the squeegee during printing), a grinding squeegee can also be used. For other printing conditions and the like, conventionally known conditions can be appropriately adjusted. In the screen printing method, in order to cope with the high definition of the circuit pattern, it is preferable to use a fine screen, and it is particularly preferable to use a fine screen of about 100 to 400 meshes. The open area of the wire mesh at this time is preferably about 20 to 50%.

被印刷的抗蚀剂组合物可通过加热干燥而形成抗蚀膜。干燥条件例如可根据所使用的有机溶剂的种类适当确定,通常,例如,干燥温度为50℃~200℃,优选为130~190℃的范围,干燥时间为1分钟~100分钟,优选为20分钟~80分钟。加热装置没有特别限定,例如可以使用热风炉或电炉等。The printed resist composition can be dried by heating to form a resist film. The drying conditions can be appropriately determined, for example, depending on the type of the organic solvent used. Usually, for example, the drying temperature is in the range of 50°C to 200°C, preferably 130°C to 190°C, and the drying time is 1 minute to 100 minutes, preferably 20 minutes. ~80 minutes. The heating device is not particularly limited, and for example, a hot-air furnace, an electric furnace, or the like can be used.

从防止作业工序中的伴随外部冲击的剥落、焊锡耐热性、和涂膜中的溶剂逸出、以及防止涂布时卷入气泡等的观点考虑,所得抗蚀膜的厚度以干燥膜厚计,期望为5~100μm,优选为10~30μm。此外,也可以将抗蚀剂组合物分多次涂布。作为此时的涂布方式,可采用以往公知的二涂一烤等的湿碰湿(wet-on-wet)涂装、或二涂二烤等的干碰湿(dry-on-wet)涂装。The thickness of the obtained resist film is based on the dry film thickness from the viewpoints of preventing peeling due to external impact during the work process, solder heat resistance, and solvent escape from the coating film, and preventing air bubbles from being entrapped during coating. , desirably 5 to 100 μm, preferably 10 to 30 μm. In addition, the resist composition may be divided and applied in a plurality of times. As a coating method at this time, conventionally known wet-on-wet coating such as two coats and one bake, or dry-on-wet coating such as two coats and two bakes can be used. Pack.

实施例Example

以下,通过制造例、实施例和比较例,更详细地说明本发明,但本发明不限定于此。各例中的“份”表示“质量份”,“%”表示“质量%”。Hereinafter, the present invention will be described in more detail by way of production examples, examples, and comparative examples, but the present invention is not limited thereto. "Part" in each example means "mass part", and "%" means "mass %".

抗蚀剂组合物的制作Preparation of resist composition

实施例1Example 1

在金属制容器中,用搅拌机充分混合以下成分:“NC3000-H”(注1)100份、“RikacidHF-08”(注3)50份、“Kayahard MCD”(注5)25份、“Aerosil RX-380S”(注7)10份、“BariaceB-30”(注12)30份、“KISUMA 5J”(注20)20份、和“C11Z-A”(注21)5份,使用三辊研磨机研磨,接着添加异佛尔酮,调整固体成分含量,制得固体成分为70%的抗蚀剂组合物No.1。In a metal container, thoroughly mix the following components with a mixer: 100 parts of "NC3000-H" (Note 1), 50 parts of "RikacidHF-08" (Note 3), 25 parts of "Kayahard MCD" (Note 5), "Aerosil" 10 copies of "RX-380S" (Note 7), 30 copies of "BariaceB-30" (Note 12), 20 copies of "KISUMA 5J" (Note 20), and 5 copies of "C11Z-A" (Note 21), using three rolls After grinding with a grinder, isophorone was added, and the solid content was adjusted to obtain a resist composition No. 1 having a solid content of 70%.

实施例2~21和比较例1~7Examples 2 to 21 and Comparative Examples 1 to 7

采用表1-表3所示的配比组成,除此以外,与实施例1同样操作,得到抗蚀剂组合物No.2~No.28。Except having adopted the mixing|blending composition shown in Table 1 - Table 3, it carried out similarly to Example 1, and obtained resist composition No.2-No.28.

[表1][Table 1]

Figure BDA0002598591940000131
Figure BDA0002598591940000131

[表2][Table 2]

Figure BDA0002598591940000141
Figure BDA0002598591940000141

[表3][table 3]

Figure BDA0002598591940000151
Figure BDA0002598591940000151

表1-表3中的(注)的含义如下所示。The meanings of (note) in Tables 1 to 3 are as follows.

(注1)NC3000-H:商品名,日本化药(株)社制,联苯芳烷基型环氧树脂,环氧值280~300g/eq.。(Note 1) NC3000-H: trade name, manufactured by Nippon Kayaku Co., Ltd., biphenyl aralkyl type epoxy resin, epoxy value 280 to 300 g/eq.

(注2)jER828EL:商品名,三菱化学(株)社制,双酚A型环氧树脂,环氧当量184~194g/eq.。(Note 2) jER828EL: trade name, manufactured by Mitsubishi Chemical Co., Ltd., bisphenol A epoxy resin, epoxy equivalent of 184 to 194 g/eq.

(注3)Rikacid HF-08:新日本理化株式会社,商品名,脂环族羧酸酐与聚亚烷基二醇的酯。(Note 3) Rikacid HF-08: Nippon Rika Co., Ltd., trade name, ester of alicyclic carboxylic acid anhydride and polyalkylene glycol.

(注4)Rikacid TMEG-100:新日本理化株式会社,商品名,芳族羧酸酐与乙二醇的酯。(Note 4) Rikacid TMEG-100: Nippon Rika Co., Ltd., trade name, ester of aromatic carboxylic acid anhydride and ethylene glycol.

(注5)Kayahard MCD:日本化药社制,商品名,甲基-5-降冰片烯-2,3-二羧酸酐。(Note 5) Kayahard MCD: manufactured by Nippon Kayakuyo Co., Ltd., trade name, methyl-5-norbornene-2,3-dicarboxylic acid anhydride.

(注6)FL11:三菱化学社制,商品名,改性脂族多胺,胺值255~285mgKOH/g,粘度50~100mPa·s/25℃,固体成分100%。(Note 6) FL11: manufactured by Mitsubishi Chemical Corporation, trade name, modified aliphatic polyamine, amine value 255-285 mgKOH/g, viscosity 50-100 mPa·s/25°C, solid content 100%.

(注7)Aerosil RX-380S:日本Aerosil株式会社,商品名,气相法二氧化硅,平均一次粒径5nm。(Note 7) Aerosil RX-380S: Japan Aerosil Co., Ltd., trade name, fumed silica, average primary particle size 5 nm.

(注8)Aerosil R812:日本Aerosil株式会社,商品名,气相法二氧化硅,平均一次粒径7nm。(Note 8) Aerosil R812: Japan Aerosil Co., Ltd., trade name, fumed silica, average primary particle size of 7 nm.

(注9)Aerosil R974:日本Aerosil株式会社,商品名,气相法二氧化硅,平均一次粒径12nm。(Note 9) Aerosil R974: Japan Aerosil Co., Ltd., trade name, fumed silica, average primary particle size 12 nm.

(注10)Aerosil R972:日本Aerosil株式会社,商品名,气相法二氧化硅,平均一次粒径16nm。(Note 10) Aerosil R972: Japan Aerosil Co., Ltd., trade name, fumed silica, average primary particle size 16 nm.

(注11)Aerosil 130:日本Aerosil株式会社,商品名,气相法二氧化硅,平均一次粒径16nm。(Note 11) Aerosil 130: Japan Aerosil Co., Ltd., trade name, fumed silica, average primary particle size 16 nm.

(注12)Bariace B-30:堺化学工业株式会社,商品名,硫酸钡,平均粒径0.3μm。(Note 12) Bariace B-30: Sakai Chemical Industry Co., Ltd., trade name, barium sulfate, average particle size 0.3 μm.

(注13)硫酸钡PS-07:Guangxi Xiangzh公司制,商品名,硫酸钡,平均粒径0.74μm。(Note 13) Barium sulfate PS-07: manufactured by Guangxi Xiangzh Co., Ltd., trade name, barium sulfate, average particle size 0.74 μm.

(注14)Barifine BF-20:堺化学工业株式会社,商品名,硫酸钡,平均粒径0.03μm。(Note 14) Barifine BF-20: Sakai Chemical Industry Co., Ltd., trade name, barium sulfate, average particle size 0.03 μm.

(注15)Micro Ace SG-95:日本滑石社制,商品名,滑石,平均粒径2.5μm。(Note 15) Micro Ace SG-95: manufactured by Nippon Talc Corporation, trade name, talc, average particle size 2.5 μm.

(注16)Micro Ace P-3:日本滑石社制,商品名,滑石,平均粒径5μm。(Note 16) Micro Ace P-3: manufactured by Nippon Talc Corporation, trade name, talc, average particle size 5 μm.

(注17)NANO ACE D-600:日本滑石社制,商品名,滑石,平均粒径0.6μm。(Note 17) NANO ACE D-600: manufactured by Nippon Talc Corporation, trade name, talc, average particle size 0.6 μm.

(注18)滑石SSS:日本滑石社制,商品名,滑石,平均粒径12μm。(Note 18) Talc SSS: manufactured by Nippon Talc Corporation, trade name, talc, average particle size 12 μm.

(注19)MOA:日宝化学株式会社制,商品名,原乙酸三甲酯。(Note 19) MOA: manufactured by Nippon Chemical Co., Ltd., trade name, trimethyl orthoacetate.

(注20)KISUMA 5J:协和化学工业社制,制品名,阻燃剂。(Note 20) KISUMA 5J: manufactured by Kyowa Chemical Industry Co., Ltd., product name, flame retardant.

(注21)C11Z-A:四国化成工业株式会社制,制品名,固化促进剂。(Note 21) C11Z-A: Shikoku Chemical Industry Co., Ltd. product name, curing accelerator.

评价试验Evaluation test

将如上所述制得的抗蚀剂组合物No.1~No.28供给于下述评价试验。结果一并示于表1-表3。The resist compositions No. 1 to No. 28 obtained as described above were subjected to the following evaluation tests. The results are shown in Table 1 to Table 3 together.

贮存稳定性:Storage stability:

将各抗蚀剂组合物密闭贮存在50℃的恒温室中,按以下基准评价贮存30天后的状态。Each resist composition was hermetically stored in a constant temperature chamber at 50°C, and the state after storage for 30 days was evaluated according to the following criteria.

◎:搅拌涂料组合物时立刻返回到贮存前的状态,无问题。⊚: The state before storage was immediately returned when the coating composition was stirred, and there was no problem.

○:涂料组合物沉降,可观察到滤饼层,但是在少于10分钟的搅拌(使用直径3cm的搅拌叶片以500rpm的转速)下,没有凝集物而返回到贮存前的状态。○: The coating composition settled and a cake layer was observed, but with less than 10 minutes of stirring (using a stirring blade with a diameter of 3 cm at 500 rpm), there was no aggregate and returned to the state before storage.

△:涂料组合物沉降,可观察到滤饼层,但是在10~60分钟的搅拌(使用直径3cm的搅拌叶片以500rpm的转速)下,凝集物返回到贮存前的状态。Δ: The coating composition settled and a cake layer was observed, but the aggregates returned to the state before storage under stirring for 10 to 60 minutes (using a stirring blade with a diameter of 3 cm at 500 rpm).

×:涂料组合物沉降,可观察到滤饼层,即使搅拌(使用直径3cm的搅拌叶片以500rpm的转速)超过60分钟,仍有凝集物残留。×: The coating composition settled, a cake layer was observed, and even after stirring (using a stirring blade with a diameter of 3 cm at a rotation speed of 500 rpm) for more than 60 minutes, aggregates remained.

清晰度:Clarity:

使用200目的丝网印刷版,使各抗蚀剂组合物在覆铜层压板“UPISEL-N”(制品名,宇部兴产社制,挠性覆铜层压板,铜箔厚/聚酰亚胺膜厚=9μm/25μm)上形成200μm见方的篓空图案的形状,以细线状连续实施5次丝网印刷至干燥膜厚为20μm,将第5次的图案涂布基板在180℃下干燥30分钟,作为试验板。Using a 200-mesh screen printing plate, each resist composition was coated on a copper clad laminate "UPISEL-N" (product name, manufactured by Ube Industries, Ltd., flexible copper clad laminate, copper foil thickness/polyimide) Film thickness = 9 μm/25 μm) in the shape of a 200 μm square basket pattern, screen printing was performed 5 times in a thin line until the dry film thickness was 20 μm, and the 5th pattern coated substrate was dried at 180°C 30 minutes as a test board.

予以说明,刮板速度为200mm/秒,攻角角度为70°,刮刀速度(用刮板回墨的速度)为70mm/秒。In addition, the blade speed was 200 mm/sec, the angle of attack was 70°, and the blade speed (speed of returning ink by the blade) was 70 mm/sec.

对所得的试验板进行以下的“清晰度A”、“清晰度B”、“清晰度C”的评价。The following "sharpness A", "sharpness B", and "sharpness C" were evaluated for the obtained test plate.

清晰度A:Clarity A:

用显微镜观察所得的各试验板的图案形状的精度,按以下基准进行评价。The accuracy of the pattern shape of each obtained test plate was observed with a microscope, and evaluated according to the following criteria.

◎:可以以一边的长度小于100μm±5μm来形成图案。⊚: A pattern can be formed so that the length of one side is less than 100 μm±5 μm.

○:可以以一边的长度为100μm±(5μm以上且小于10μm)来形成图案。○: A pattern can be formed so that the length of one side is 100 μm±(5 μm or more and less than 10 μm).

△:可以以一边的长度为100μm±(10μm以上且小于15μm)来形成图案。Δ: A pattern can be formed so that the length of one side is 100 μm±(10 μm or more and less than 15 μm).

×:图案的一边的长度为100μm±15μm以上。×: The length of one side of the pattern is 100 μm±15 μm or more.

清晰度B:Sharpness B:

在上述清晰度A的显微镜观察中,按以下基准评价有无渗出。In the microscopic observation of the above-mentioned clarity A, the presence or absence of bleeding was evaluated according to the following criteria.

◎:完全未观察到从图案形状的渗出。⊚: No bleeding from the pattern shape was observed at all.

○:可观察到极少量的从图案形状的渗出,但作为制品时是没有问题的水平。○: Bleeding out from the pattern shape was observed in a very small amount, but it was a level with no problem as a product.

△:可观察到从图案形状的渗出,随后有可能发生焊料未附着等的不良情况。△: Bleeding out from the pattern shape was observed, and there was a possibility that a problem such as solder not adhering subsequently occurred.

×:可明显观察到从图案形状的渗出。×: Bleeding from the pattern shape was clearly observed.

清晰度C:Clarity C:

在试验板的制作中,将连续印刷次数从5次改为100次,用显微镜观察图案形状的精度,按以下基准进行评价。In the preparation of the test plate, the number of times of continuous printing was changed from 5 to 100, and the precision of the pattern shape was observed with a microscope, and evaluated according to the following criteria.

◎:可以以一边的长度小于100μm±5μm来形成图案。⊚: A pattern can be formed so that the length of one side is less than 100 μm±5 μm.

○:可以以一边的长度为100μm±(5μm以上且小于10μm)来形成图案。○: A pattern can be formed so that the length of one side is 100 μm±(5 μm or more and less than 10 μm).

△:可以以一边的长度为100μm±(10μm以上且小于15μm)来形成图案。Δ: A pattern can be formed so that the length of one side is 100 μm±(10 μm or more and less than 15 μm).

×:图案的一边的长度为100μm±15μm以上。×: The length of one side of the pattern is 100 μm±15 μm or more.

挠性(耐折性):Flexibility (folding resistance):

在UPILEX 25S(宇部兴产(株)制,聚酰亚胺膜基材,厚度25μm)上使用涂布机将各抗蚀剂组合物No.1~No.20涂布至干燥膜厚为20μm,在基材表面温度180℃、60分钟的条件下进行加热干燥,制作试验片。Each resist composition No. 1 to No. 20 was coated on UPILEX 25S (manufactured by Ube Kosan Co., Ltd., polyimide film substrate, thickness 25 μm) using a coater to a dry film thickness of 20 μm , and heat-drying was carried out under the conditions of a substrate surface temperature of 180° C. for 60 minutes to prepare a test piece.

将上述试验片对折,施加1kg的荷重,用显微镜观察弯折部。进行10次相同的试验,按以下基准进行评价。The above-mentioned test piece was folded in half, a load of 1 kg was applied, and the folded portion was observed with a microscope. The same test was performed 10 times, and the evaluation was performed according to the following criteria.

◎:一次也未观察到弯折部的涂膜有裂纹、剥离。⊚: Cracks and peeling of the coating film at the bent portion were not observed at all.

○:观察到1次弯折部的涂膜有裂纹、剥离。○: Cracks and peeling were observed in the coating film of the primary bending portion.

△:观察到2~4次弯折部的涂膜有裂纹、剥离。Δ: Cracks and peeling were observed in the coating film of the folded portion 2 to 4 times.

×:在全部试验中弯折部的涂膜均发生裂纹、剥离。×: Cracks and peeling occurred in the coating film of the bent portion in all the tests.

低翘曲:Low warpage:

以与上述挠性试验同样的方式制作试验片。然后,在具有基材的状态下将试验片切出50mm×50mm见方,测定4个角的翘曲,求算平均值,按以下基准进行评价。Test pieces were prepared in the same manner as in the above-mentioned flexibility test. Then, the test piece was cut out into a 50 mm×50 mm square in the state with the base material, the warpage of the four corners was measured, the average value was calculated, and the evaluation was performed according to the following criteria.

◎:翘曲小于3mm。⊚: Warpage is less than 3 mm.

○:翘曲为3mm以上且小于7mm。○: Warpage is 3 mm or more and less than 7 mm.

△:翘曲为7mm以上且小于12mm。△: Warpage is 7 mm or more and less than 12 mm.

×:翘曲为12mm以上。×: Warpage is 12 mm or more.

燃烧性:Flammability:

以与上述挠性试验同样的方式制作试验片。对各试验片,进行基于UL94标准的垂直燃烧试验。基于UL94标准进行评价。UL94标准(Underwriters Laboratories Inc.的标准编号94)是关于装置和器具部件用的塑料材料燃烧性试验的标准。Test pieces were prepared in the same manner as in the above-mentioned flexibility test. For each test piece, a vertical burning test based on the UL94 standard was performed. Evaluation is based on UL94 standard. The UL94 standard (Standard No. 94 of Underwriters Laboratories Inc.) is a standard for flammability testing of plastic materials for parts of devices and appliances.

◎:在燃烧试验中为VTM-0。⊚: VTM-0 in the combustion test.

○:在燃烧试验中为VTM-1。○: VTM-1 in the combustion test.

×:表示已燃烧。×: Indicates burnt.

耐化学品性:Chemical resistance:

将与用于清晰度试验的同样的试验板浸渍在10%盐酸溶液中,在20℃下放置15分钟后,水洗、风干,然后按照JIS K 5600中记载的棋盘格形状(100个尺寸为1mm×1mm的棋盘格)进行切割。然后,通过玻璃纸胶带剥离试验进行试验,按以下基准进行评价。The same test panel used for the sharpness test was immersed in a 10% hydrochloric acid solution, left at 20°C for 15 minutes, washed with water, air-dried, and then conformed to the checkerboard shape (100 pieces of 1 mm in size) described in JIS K 5600. ×1mm checkerboard) for cutting. Then, it tested by the cellophane tape peeling test, and evaluated based on the following criteria.

◎:100个棋盘格残存,每个棋盘格未观察到边缘受损。◎: 100 checkerboards remained, and no edge damage was observed for each checkerboard.

○:100个棋盘格残存,但在棋盘格上观察到边缘受损。○: 100 checkerboards remained, but edge damage was observed on the checkerboards.

△:棋盘格的残存数为96以上且99个以下。△: The remaining number of checkerboards is 96 or more and 99 or less.

×:棋盘格的残存数为95个以下。×: The number of remaining checkerboards is 95 or less.

产业实用性Industrial Applicability

本发明的抗蚀剂组合物的贮存稳定性优异,可提供丝网印刷性、清晰度、低翘曲性、挠性、耐化学品性和阻燃性均优异的抗蚀膜。The resist composition of the present invention is excellent in storage stability, and can provide a resist film excellent in screen printability, clarity, low warpage, flexibility, chemical resistance and flame retardancy.

Claims (8)

1.抗蚀剂组合物,其含有:1. A resist composition comprising: 下述通式(I)表示的联苯芳烷基型环氧树脂(A);A biphenyl aralkyl type epoxy resin (A) represented by the following general formula (I); 酸酐系固化剂(B),包含羧酸酐(b1)和羧酸酐改性物(b2);和An acid anhydride-based curing agent (B), comprising a carboxylic acid anhydride (b1) and a carboxylic acid anhydride modified product (b2); and 体质颜料(C),Extender Pigments (C), 所述抗蚀剂组合物以所述联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,含有20~100质量份的所述酸酐系固化剂(B)和10~200质量份的所述体质颜料(C);The resist composition contains 20 to 100 parts by mass of the acid anhydride-based curing agent (B) and 10 to 100 parts by mass of the solid content of the biphenyl aralkyl type epoxy resin (A) 200 parts by mass of the extender pigment (C);
Figure FDA0002598591930000011
Figure FDA0002598591930000011
式中,n表示1~10的重复数。In the formula, n represents the repetition number of 1-10.
2.权利要求1所述的抗蚀剂组合物,其中,所述羧酸酐改性物(b2)为羧酸酐与(聚)亚烷基二醇的反应产物。2 . The resist composition according to claim 1 , wherein the modified carboxylic acid anhydride (b2) is a reaction product of a carboxylic acid anhydride and (poly)alkylene glycol. 3 . 3.权利要求1或2所述的抗蚀剂组合物,其中,所述羧酸酐(b1)与羧酸酐改性物(b2)的使用比(质量比)以两成分的固体成分合计为基准,为(b1)/(b2)=5/5~1/9。3 . The resist composition according to claim 1 , wherein the usage ratio (mass ratio) of the carboxylic acid anhydride (b1) and the carboxylic acid anhydride modified product (b2) is based on the total solid content of the two components. 4 . , it is (b1)/(b2)=5/5~1/9. 4.权利要求1~3任一项所述的抗蚀剂组合物,其中,所述体质颜料(C)包含平均一次粒径1~20nm的气相法二氧化硅(c1),所述气相法二氧化硅(c1)的使用量以所述联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,为1~50质量份。4 . The resist composition according to claim 1 , wherein the extender pigment (C) contains fumed silica (c1) having an average primary particle diameter of 1 to 20 nm, and the fumed silica The usage-amount of silica (c1) is 1-50 mass parts based on 100 mass parts of solid content of the said biphenyl aralkyl type epoxy resin (A). 5.权利要求1~4任一项所述的抗蚀剂组合物,其中,所述体质颜料(C)包含平均粒径0.01~1.0μm的硫酸钡(c2),所述硫酸钡(c2)的使用量以所述联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,为1~70质量份。5 . The resist composition according to claim 1 , wherein the extender pigment (C) contains barium sulfate (c2) having an average particle diameter of 0.01 to 1.0 μm, and the barium sulfate (c2) The usage-amount is 1-70 mass parts based on 100 mass parts of solid content of the said biphenyl aralkyl type epoxy resin (A). 6.权利要求1~5任一项所述的抗蚀剂组合物,其中,所述体质颜料(C)包含平均粒径1.0~10μm的滑石(c3),所述滑石(c3)的使用量以所述联苯芳烷基型环氧树脂(A)的固体成分100质量份为基准,为1~70质量份。The resist composition according to any one of claims 1 to 5, wherein the extender pigment (C) contains talc (c3) having an average particle diameter of 1.0 to 10 μm, and the amount of the talc (c3) used is It is 1-70 mass parts based on 100 mass parts of solid content of the said biphenyl aralkyl type epoxy resin (A). 7.权利要求1~6任一项所述的抗蚀剂组合物,其还含有有机烷氧基化合物(D)。7 . The resist composition according to claim 1 , further comprising an organic alkoxy compound (D). 8 . 8.抗蚀膜,其含有权利要求1~7任一项所述的抗蚀剂组合物。8 . A resist film comprising the resist composition according to claim 1 .
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