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CN111308816A - Organic film, array substrate, display panel and display device - Google Patents

Organic film, array substrate, display panel and display device Download PDF

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CN111308816A
CN111308816A CN202010130631.0A CN202010130631A CN111308816A CN 111308816 A CN111308816 A CN 111308816A CN 202010130631 A CN202010130631 A CN 202010130631A CN 111308816 A CN111308816 A CN 111308816A
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array substrate
organic film
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display
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王武
朴正淏
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BOE Technology Group Co Ltd
Chongqing BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chongqing BOE Optoelectronics Technology Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133388Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region

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  • Physics & Mathematics (AREA)
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  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
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  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本申请公开了一种有机膜、阵列基板、显示面板及显示装置,其中,有机膜,包括第一区域和围绕第一区域的第二区域,所述第二区域设置有镂空图案。上述方案,通过在第二区域设置有镂空图案,使得阵列基板上与框胶结合的部位形成凹凸的表面,提高了与框胶的结合面积,增大了附着力,因此克服了因设置有机膜而导致框胶与阵列基板剥离的问题。

Figure 202010130631

The present application discloses an organic film, an array substrate, a display panel and a display device, wherein the organic film includes a first area and a second area surrounding the first area, and the second area is provided with a hollow pattern. In the above scheme, the hollow pattern is arranged in the second area, so that the part on the array substrate that is combined with the sealant forms a concave-convex surface, which improves the bonding area with the sealant and increases the adhesion, thus overcoming the need for the organic film. This leads to the problem of peeling off the sealant and the array substrate.

Figure 202010130631

Description

有机膜、阵列基板、显示面板及显示装置Organic film, array substrate, display panel and display device

技术领域technical field

本发明一般涉及显示技术领域,具体涉及一种有机膜、阵列基板、显示面板及显示装置。The present invention generally relates to the field of display technology, and specifically relates to an organic film, an array substrate, a display panel and a display device.

背景技术Background technique

液晶显示技术是目前主流的显示技术,其中,薄膜晶体管液晶显示(Thin FilmTransistor Liquid Crystal Display,TFT-LCD)产品具有体积小、功耗低、无辐射、显示分辨率高等特点,被广泛应用于多种终端产品中。Liquid crystal display technology is the current mainstream display technology. Among them, Thin Film Transistor Liquid Crystal Display (TFT-LCD) products have the characteristics of small size, low power consumption, no radiation, and high display resolution, and are widely used in many in end products.

目前,用户对产品待机时间要求越来越高,而在产品中显示部件的耗电量占据着较高比例,因此,如何降低显示部件的耗电量是本领域技术人员所追求的长期目标,其中,在阵列基板中设置有机膜就是一个可行的方案。但使用有机膜降低功耗的同时,会造成阵列基板与框胶附着力不足,导致框胶与阵列基板剥离的问题。At present, users have higher and higher requirements for product standby time, and the power consumption of display components in products occupies a relatively high proportion. Therefore, how to reduce the power consumption of display components is a long-term goal pursued by those skilled in the art. Among them, arranging an organic film in the array substrate is a feasible solution. However, while using the organic film to reduce power consumption, the adhesion between the array substrate and the sealant is insufficient, resulting in the problem of peeling of the sealant and the array substrate.

发明内容SUMMARY OF THE INVENTION

本申请期望提供一种有机膜、阵列基板、显示面板及显示装置,用以解决现有技术中因设置有机膜而导致框胶与阵列基板剥离的问题。The present application desires to provide an organic film, an array substrate, a display panel and a display device to solve the problem that the sealant and the array substrate are peeled off due to the arrangement of the organic film in the prior art.

本发明提供一种有机膜,包括第一区域和围绕第一区域的第二区域,所述第二区域设置有镂空图案。The present invention provides an organic film comprising a first region and a second region surrounding the first region, wherein the second region is provided with a hollow pattern.

作为其中一种可实现方式,所述镂空图案的面积占所述第二区域的10%~30%。As one of the possible implementations, the area of the hollow pattern accounts for 10% to 30% of the second area.

作为其中一种可实现方式,所述镂空图案将所述第二区域分割为多个马赛克图案。As one implementation manner, the hollow pattern divides the second area into a plurality of mosaic patterns.

作为其中一种可实现方式,相邻所述马赛克图案间的距离为 10um-16um。As one of the possible implementations, the distance between adjacent mosaic patterns is 10um-16um.

作为其中一种可实现方式,相邻所述马赛克图案间的距离为13um。As one of the possible implementations, the distance between adjacent mosaic patterns is 13um.

第二方面,本发明提供一种阵列基板,包括显示区域和围绕所述显示区域的非显示区域,还包括上述的有机膜,所述第一区域至少位于所述显示区域,所述第二区域位于所述非显示区域。In a second aspect, the present invention provides an array substrate, comprising a display area, a non-display area surrounding the display area, and the above-mentioned organic film, the first area is at least located in the display area, and the second area is located at least in the display area. in the non-display area.

作为其中一种可实现方式所述有机膜上形成有第一钝化层;As one of the possible implementations, a first passivation layer is formed on the organic film;

所述第一钝化层暴露所述第二区域;或者,the first passivation layer exposes the second region; or,

所述第一钝化层覆盖所述第二区域,且跟随所述镂空图案形成有凹凸图案。The first passivation layer covers the second region and forms a concave-convex pattern following the hollow pattern.

作为其中一种可实现方式所述有机膜位于所述阵列基板的边界范围之内,且所述有机膜的边界距所述阵列基板的边界在0.1mm-0.3mm 之间。As one of the possible implementations, the organic film is located within the boundary range of the array substrate, and the boundary of the organic film is between 0.1 mm and 0.3 mm from the boundary of the array substrate.

第三方面,本发明提供一种显示面板,包括相对设置的彩膜基板和上述的阵列基板,以及所述彩膜基板和阵列基板对盒用的封框胶,所述封框胶位于所述第二区域范围内。In a third aspect, the present invention provides a display panel, comprising a color filter substrate and the above-mentioned array substrate disposed opposite to each other, and a frame sealing glue for assembling the color filter substrate and the array substrate, the frame sealing glue is located in the within the second area.

第四方面,本发明提供一种显示装置,包括上述的显示面板。In a fourth aspect, the present invention provides a display device including the above-mentioned display panel.

上述方案,通过在第二区域设置有镂空图案,使得阵列基板上与框胶结合的部位形成凹凸的表面,提高了与框胶的结合面积,增大了附着力,因此克服了因设置有机膜而导致框胶与阵列基板剥离的问题。In the above solution, the hollow pattern is arranged in the second area, so that the part on the array substrate that is combined with the sealant forms a concave-convex surface, which improves the bonding area with the sealant and increases the adhesion, so it overcomes the problem of setting the organic film. This leads to the problem of peeling off the sealant and the array substrate.

附图说明Description of drawings

通过阅读参照以下附图所作的对非限制性实施例所作的详细描述,本申请的其它特征、目的和优点将会变得更明显:Other features, objects and advantages of the present application will become more apparent by reading the detailed description of non-limiting embodiments made with reference to the following drawings:

图1为本发明实施例提供的有机膜的结构示意图;1 is a schematic structural diagram of an organic film provided in an embodiment of the present invention;

图2-10为本发明实施例提供的阵列基板的形成过程示意图;2-10 are schematic diagrams of a formation process of an array substrate according to an embodiment of the present invention;

图11为本发明实施例提供的显示面板的俯视图;11 is a top view of a display panel according to an embodiment of the present invention;

图12为本发明实施例提供的显示面板边界处的结构示意图。FIG. 12 is a schematic structural diagram of a display panel boundary according to an embodiment of the present invention.

具体实施方式Detailed ways

下面结合附图和实施例对本申请作进一步的详细说明。可以理解的是,此处所描述的具体实施例仅仅用于解释相关发明,而非对该发明的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与发明相关的部分。The present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the related invention, but not to limit the invention. In addition, it should be noted that, for the convenience of description, only the parts related to the invention are shown in the drawings.

需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。下面将参考附图并结合实施例来详细说明本申请。It should be noted that the embodiments in the present application and the features of the embodiments may be combined with each other in the case of no conflict. The present application will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.

图1为本发明实施例示出的一种有机膜,包括第一区域1和围绕第一区域1的第二区域2,第二区域2设置有镂空图案27。FIG. 1 shows an organic film according to an embodiment of the present invention, which includes a first area 1 and a second area 2 surrounding the first area 1 , and the second area 2 is provided with a hollow pattern 27 .

该有机膜可以在制作阵列基板的工序中形成,例如但不限于,The organic film can be formed in the process of fabricating the array substrate, such as but not limited to,

在衬底基板上形成TFT器件,在TFT器件上形成第一钝化层,在第一钝化层上形成有机溶液层,对有机溶液层进行固化,并在固化后的第二区域2进行刻蚀形成上述镂空图案27。A TFT device is formed on the base substrate, a first passivation layer is formed on the TFT device, an organic solution layer is formed on the first passivation layer, the organic solution layer is cured, and the cured second region 2 is etched The above-mentioned hollow pattern 27 is formed by etching.

上述方案,通过在第二区域2设置有镂空图案27,使得阵列基板上与框胶结合的部位形成凹凸的表面,提高了与框胶的结合面积,增大了附着力,因此克服了因设置有机膜而导致框胶与阵列基板剥离的问题。In the above solution, by arranging the hollow pattern 27 in the second area 2, the part on the array substrate that is combined with the sealant forms a concave-convex surface, which improves the bonding area with the sealant and increases the adhesion, thus overcoming the problem of setting The organic film leads to the problem of peeling off the sealant and the array substrate.

作为其中一种可实现方式,镂空图案的面积占第二区域的 10%~30%。例如为10%、15%、20%、25%、30%等。采用该比例,一方面可以提高框胶与阵列基板间的接触面积,保证其之间具有足够的附着力,另一方面,有机膜的第二区域还可以具有足够的面积与其下的结构层具有足够的附着力。As one of the possible implementations, the area of the hollow pattern accounts for 10% to 30% of the second area. For example, 10%, 15%, 20%, 25%, 30%, etc. With this ratio, on the one hand, the contact area between the sealant and the array substrate can be increased to ensure sufficient adhesion between them; sufficient adhesion.

作为其中一种可实现方式,镂空图案27将第二区域2分割为多个马赛克图案4。这里不对各马赛克图案4的具体尺寸做限定,相邻的马赛克图案4可以相同,也可以不同。As one of the possible implementations, the hollow pattern 27 divides the second area 2 into a plurality of mosaic patterns 4 . The specific size of each mosaic pattern 4 is not limited here, and adjacent mosaic patterns 4 may be the same or different.

作为其中一种可实现方式,相邻马赛克图案4间的距离为 10um-16um。As one of the possible implementations, the distance between adjacent mosaic patterns 4 is 10um-16um.

作为其中一种可实现方式,相邻马赛克图案4间的距离为13um。As one of the possible implementations, the distance between adjacent mosaic patterns 4 is 13um.

第二方面,如图2-10所示,本发明提供一种阵列基板,包括显示区域和围绕所述显示区域的非显示区域,还包括上述的有机膜23,第一区域至少位于显示区域,第二区域位于非显示区域。In the second aspect, as shown in FIGS. 2-10 , the present invention provides an array substrate, which includes a display area and a non-display area surrounding the display area, and also includes the above-mentioned organic film 23 , the first area is at least located in the display area, The second area is located in the non-display area.

作为其中一种可实现方式所述有机膜上形成有第一钝化层24;As one of the possible implementations, a first passivation layer 24 is formed on the organic film;

第一钝化层24暴露所述第二区域,使框胶与有机膜直接粘接在一起;或者,The first passivation layer 24 exposes the second region, so that the sealant and the organic film are directly bonded together; or,

第一钝化层24覆盖第二区域,且跟随镂空图案形成有凹凸图案,使框胶与第一钝化层粘接在一起。这里所说的跟随镂空图案形成有凹凸图案,是指,镂空图案中是凹陷的部分,第一钝化层24也相应地是凹陷。具体地,第一钝化层相对于有机膜来说是较薄的,例如,有机膜的厚度可以是4um左右,第一钝化层24的厚度可以是0.4um左右,由于第一钝化层24较薄,则其不会将镂空图案填平,因此第一钝化层 24在第二区域也形成了凹凸图案。The first passivation layer 24 covers the second area, and follows the hollow pattern to form a concave-convex pattern, so that the sealant and the first passivation layer are bonded together. The concave-convex pattern formed following the hollow pattern here refers to the concave part in the hollow pattern, and the first passivation layer 24 is correspondingly concave. Specifically, the first passivation layer is thinner than the organic film. For example, the thickness of the organic film may be about 4um, and the thickness of the first passivation layer 24 may be about 0.4um. If 24 is thinner, it will not fill in the hollow pattern, so the first passivation layer 24 also forms a concave-convex pattern in the second area.

作为其中一种可实现方式所述有机膜23位于所述阵列基板的边界范围之内,且有机膜的边界距阵列基板的边界C的距离D在 0.1mm-0.3mm之间,另参见图11、图12,例如为0.2mm,也即有机膜小于阵列基板,可以防止在进行阵列基板切割时损坏有机膜,造成有机膜产生裂纹。As one of the possible implementations, the organic film 23 is located within the boundary range of the array substrate, and the distance D between the boundary of the organic film and the boundary C of the array substrate is between 0.1 mm and 0.3 mm, see also FIG. 11 12, for example, it is 0.2 mm, that is, the organic film is smaller than the array substrate, which can prevent damage to the organic film when the array substrate is cut, resulting in cracks in the organic film.

下面以其中一个示例,来对上述阵列基板的制备方法进行说明。本发明实施例中所说的“构图工艺”包括沉积膜层、涂覆光刻胶、掩模曝光、显影、刻蚀、剥离光刻胶等处理,是相关技术中成熟的制备工艺。本实施例中所说的“光刻工艺”包括涂覆膜层、掩模曝光和显影,是相关技术中成熟的制备工艺。沉积可采用溅射、蒸镀、化学气相沉积等已知工艺,涂覆可采用已知的涂覆工艺,刻蚀可采用已知的方法,在此不做具体的限定。在本实施例的描述中,需要理解的是,“薄膜”是指将某一种材料在基底上利用沉积或涂覆工艺制作出的一层薄膜。若在整个制作过程当中该“薄膜”无需构图工艺或光刻工艺,则该“薄膜”还可以称为“层”。若在整个制作过程当中该“薄膜”还需构图工艺或光刻工艺,则在构图工艺前称为“薄膜”,构图工艺后称为“层”。经过构图工艺或光刻工艺后的“层”中包含至少一个“图案”。Hereinafter, the method for preparing the above-mentioned array substrate will be described by taking one of the examples. The "patterning process" mentioned in the embodiments of the present invention includes processes such as depositing a film layer, coating photoresist, mask exposure, developing, etching, and stripping photoresist, and is a mature preparation process in the related art. The "photolithography process" mentioned in this embodiment includes film coating, mask exposure and development, and is a mature preparation process in the related art. The deposition can use known processes such as sputtering, evaporation, and chemical vapor deposition, the coating can use a known coating process, and the etching can use a known method, which is not specifically limited here. In the description of this embodiment, it should be understood that "thin film" refers to a layer of thin film produced by depositing or coating a certain material on a substrate. If the "thin film" does not require a patterning process or a photolithography process in the entire manufacturing process, the "thin film" may also be referred to as a "layer". If the "thin film" needs a patterning process or a photolithography process in the whole manufacturing process, it is called a "thin film" before the patterning process, and a "layer" after the patterning process. A "layer" after a patterning process or a photolithography process contains at least one "pattern".

S101:在基底20形成栅极29及公共电极8,如图2所示;S101: forming a gate electrode 29 and a common electrode 8 on the substrate 20, as shown in FIG. 2;

该基底20可以是柔性基底,如聚对苯二甲酸乙二醇酯 (Polyethyleneterephthalate;PET)薄膜;也可以是刚性基底,如玻璃基底。The substrate 20 can be a flexible substrate, such as a polyethylene terephthalate (Polyethyleneterephthalate; PET) film; it can also be a rigid substrate, such as a glass substrate.

在基底20上沉积栅金属薄膜,对栅金属薄膜进行图案化,形成栅极29及公共电极8。A gate metal film is deposited on the substrate 20 , and the gate metal film is patterned to form a gate electrode 29 and a common electrode 8 .

S102:在形成前述图案的基底20上,沉积第一栅绝缘薄膜作为第一栅绝缘层21,图如3所示;S102: on the substrate 20 on which the aforementioned pattern is formed, deposit a first gate insulating film as the first gate insulating layer 21, as shown in FIG. 3;

其中,第一栅绝缘薄膜可以采用硅氧化物SiOx、硅氮化物SiNx、氮氧化硅SiON等,可以为单层、双层或者多层结构。Wherein, the first gate insulating film can be silicon oxide SiOx, silicon nitride SiNx, silicon oxynitride SiON, etc., and can be a single-layer, double-layer or multi-layer structure.

S103:在第一栅绝缘层21上形成有源层30,图如4所示;S103: forming an active layer 30 on the first gate insulating layer 21, as shown in FIG. 4;

S104:在有源层30上形成源极28、漏极31,图如5所示;S104: forming the source electrode 28 and the drain electrode 31 on the active layer 30, as shown in FIG. 5;

在有源层上沉积金属层,对该金属层进行图案化,形成源极28、漏极31。A metal layer is deposited on the active layer, and the metal layer is patterned to form the source electrode 28 and the drain electrode 31 .

S105:在源极28、漏极31上沉积第二钝化层22,图如6所示;S105: depositing a second passivation layer 22 on the source electrode 28 and the drain electrode 31, as shown in FIG. 6;

第二钝化层22的材料可以采用硅氧化物SiOx、硅氮化物SiNx、氮氧化硅SiON等,可以为单层、双层或者多层结构。The material of the second passivation layer 22 can be silicon oxide SiOx, silicon nitride SiNx, silicon oxynitride SiON, etc., and can be a single-layer, double-layer or multi-layer structure.

S106:在第二钝化层22上形成有机膜23,图如7所示;S106: forming an organic film 23 on the second passivation layer 22, as shown in FIG. 7;

在第二钝化层22上涂覆有机溶液,对有机溶液进行热固化,形成一张膜层结构,在该膜层结构上位于第二区域的位置,通过刻蚀形成镂空图案27。An organic solution is coated on the second passivation layer 22, and the organic solution is thermally cured to form a film layer structure, and a hollow pattern 27 is formed by etching at the position of the second region on the film layer structure.

S107:在第二钝化层22上形成第一透明电极层26,图如8所示;S107: forming a first transparent electrode layer 26 on the second passivation layer 22, as shown in FIG. 8;

S108:在第一透明电极层26上形成第一钝化层24,图如9所示;S108: forming a first passivation layer 24 on the first transparent electrode layer 26, as shown in FIG. 9;

S109:在第一钝化层24上形成与公共电极8连接的第二透明电极层25,图如10所示。S109 : forming a second transparent electrode layer 25 connected to the common electrode 8 on the first passivation layer 24 , as shown in FIG. 10 .

第三方面,如图11、图12所示,本发明提供一种显示面板,包括相对设置的彩膜基板9和上述实施例的阵列基板8,以及所述彩膜基板9和阵列基板8对盒用的封框胶10,所述封框胶10位于所述第二区域范围L内。In the third aspect, as shown in FIG. 11 and FIG. 12 , the present invention provides a display panel, which includes a color filter substrate 9 and an array substrate 8 in the above-mentioned embodiment arranged oppositely, and a pair of the color filter substrate 9 and the array substrate 8 . The frame sealing glue 10 for the box, the frame sealing glue 10 is located within the range L of the second area.

一般地,如图11所示,显示面板中,阵列基板8的尺寸最大,然后是有机膜23,彩膜基板9小于有机膜23,作为一种可实现方式,彩膜基板9的其中一个边界7在阵列基板范围内,另外三个边界与整列基板对应的边界平齐,有机膜覆盖显示区域AA。Generally, as shown in FIG. 11 , in the display panel, the size of the array substrate 8 is the largest, followed by the organic film 23 , and the color filter substrate 9 is smaller than the organic film 23 . 7 Within the range of the array substrate, the other three boundaries are flush with the boundaries corresponding to the entire array of substrates, and the organic film covers the display area AA.

如图12所示,阵列基板8的边缘区域,即显示区域边界S之外,一般顺次包括阵列基板行驱动的时钟走线区域GOACLK、阵列基板行驱动的薄膜晶体管走线区域GOATFT、即公共电极走线区域Vcom。As shown in FIG. 12 , the edge area of the array substrate 8, that is, outside the display area boundary S, generally includes the clock wiring area GOACLK for row driving of the array substrate, and the thin film transistor wiring area GOATFT for row driving of the array substrate in sequence, that is, the common Electrode trace area Vcom.

第四方面,本发明提供一种显示装置,包括上述的显示面板。In a fourth aspect, the present invention provides a display device including the above-mentioned display panel.

显示装置例如但不限于为智能手机、平板电脑、电视机、显示器、笔记本电脑、数码相框等。The display device is, for example, but not limited to, a smart phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, and the like.

需要理解的是,上文如有涉及术语“中心”、“纵向”、“横向”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本发明的描述中,除非另有说明,“多个”的含义是两个或两个以上。It should be understood that the terms "center", "portrait", "horizontal", "top", "bottom", "front", "rear", "left", "right", "vertical" "," "horizontal", "top", "bottom", "inside", "outside", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, which are only for the convenience of describing the present invention and simplifying the description , rather than indicating or implying that the indicated device or element must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as limiting the invention. In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, a feature defined as "first" or "second" may expressly or implicitly include one or more of that feature. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

以上描述仅为本申请的较佳实施例以及对所运用技术原理的说明。本领域技术人员应当理解,本申请中所涉及的发明范围,并不限于上述技术特征的特定组合而成的技术方案,同时也应涵盖在不脱离发明构思的情况下,由上述技术特征或其等同特征进行任意组合而形成的其它技术方案。例如上述特征与本申请中公开的(但不限于)具有类似功能的技术特征进行互相替换而形成的技术方案。The above description is only a preferred embodiment of the present application and an illustration of the applied technical principles. Those skilled in the art should understand that the scope of the invention involved in this application is not limited to the technical solution formed by the specific combination of the above-mentioned technical features, and should also cover, without departing from the inventive concept, the above-mentioned technical features or their Other technical solutions formed by any combination of equivalent features. For example, a technical solution is formed by replacing the above-mentioned features with the technical features disclosed in this application (but not limited to) with similar functions.

Claims (10)

1. The organic film is characterized by comprising a first area and a second area surrounding the first area, wherein the second area is provided with a hollow pattern.
2. The organic film according to claim 1, wherein the area of the hollow pattern accounts for 10% to 30% of the second region.
3. The organic film of claim 1 or 2, wherein the hollowed-out pattern divides the second region into a plurality of mosaic patterns.
4. The organic film according to claim 3, wherein a distance between adjacent mosaic patterns is 10um to 16 um.
5. The organic film according to claim 4, wherein a distance between adjacent mosaic patterns is 13 um.
6. An array substrate comprising a display region and a non-display region surrounding the display region, wherein the array substrate further comprises the organic film of any one of 1 to 5, the first region is at least located in the display region, and the second region is located in the non-display region.
7. The array substrate of claim 6, wherein a first passivation layer is formed on the organic film;
the first passivation layer exposes the second region; or,
the first passivation layer covers the second area and is formed with a concave-convex pattern along with the hollow pattern.
8. The array substrate of claim 6 or 7, wherein the organic film is located within the boundary of the array substrate, and the boundary of the organic film is between 0.1mm and 0.3mm from the boundary of the array substrate.
9. A display panel, comprising a color film substrate and the array substrate of any one of claims 6 to 8, which are arranged oppositely, and a frame sealing adhesive for sealing the color film substrate and the array substrate, wherein the frame sealing adhesive is located in the second area.
10. A display device characterized by comprising the display panel according to claim 9.
CN202010130631.0A 2020-02-28 2020-02-28 Organic film, array substrate, display panel and display device Pending CN111308816A (en)

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Application publication date: 20200619