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CN1180222C - Dual-frequency confocal step height microscopic measuring device - Google Patents

Dual-frequency confocal step height microscopic measuring device Download PDF

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CN1180222C
CN1180222C CNB021208840A CN02120884A CN1180222C CN 1180222 C CN1180222 C CN 1180222C CN B021208840 A CNB021208840 A CN B021208840A CN 02120884 A CN02120884 A CN 02120884A CN 1180222 C CN1180222 C CN 1180222C
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CN1384334A (en
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殷纯永
林德教
柳忠尧
张蕊
徐毅
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Tsinghua University
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Abstract

The present invention belongs to the technical field of surface topography measurement and relates to a dual frequency confocal shoulder height micrometering device which comprises a horizontal Zeeman laser, a spectroscope, a Faraday cell, a 1/2 wave plate, a lens, a pinhole, a cemented lens, a polarization spectroscope, a quarter-wave plate which is placed on the reflection light path of the polarization spectroscope, a kaleidoscope prism, a quarter-wave plate which is placed on the transmitted light path of the polarization spectroscope, a microobjective, a second spectroscope, a Glan prism, a convergent lens on the reflection light path of the second spectroscope, a second pinhole and a photodetector on the reflection light path of the second spectroscope, a convergent lens on the transmitted light path of the second spectroscope, and a photodetector on the transmitted light path of the second spectroscope, wherein the spectroscope, the Faraday cell, the 1/2 wave plate, the lens, the pinhole, the cemented lens and the polarization spectroscope are orderly placed on the axial line of the transmitting terminal of the laser; the kaleidoscope prism is placed on the reflection light path of the polarization spectroscope; the microobjective is placed on the transmitted light path of the polarization spectroscope; the Glan prism and the second pinhole are respectively placed on the reflection light path of the second spectroscope. The present invention merges dual frequency laser interference and scanning confocal microtechnique to improve resolution and the measurement range, satisfies the requirements of high measurement precision and a large measuring range and has low cost. The present invention not only satisfies the requirement of the immediate development of microelectronic technology but also can be further popularized and applied.

Description

双频共焦台阶高度显微测量装置Dual-frequency confocal step height microscopic measuring device

技术领域technical field

本发明属于表面形貌测量技术领域,特别涉及双频共焦干涉显微系统用于台阶高度标准测量。The invention belongs to the technical field of surface topography measurement, in particular to a dual-frequency confocal interference microscope system used for step height standard measurement.

背景技术Background technique

共焦扫描成像早在上个世纪50年代就由Minsky提出,随后Davidovits、Sheppard和Wilson等对共焦显微系统作了进一步研究。研究结果表明:共焦扫描显微系统不仅可以抑制成像中弱杂散光,而且在相同成像条件下,其轴向分辨率为普通显微系统的1.4倍,并且具有三维层析成像功能。正是这种三维成像的能力,使共焦显微术已经广泛地应用于生物、生物医学、工业探测以及计量学领域。Confocal scanning imaging was proposed by Minsky as early as the 1950s, and then Davidovits, Sheppard and Wilson made further research on confocal microscopy systems. The research results show that: the confocal scanning microscope system can not only suppress the weak stray light in imaging, but also under the same imaging conditions, its axial resolution is 1.4 times that of the ordinary microscope system, and it has the function of three-dimensional tomography. It is this three-dimensional imaging capability that has made confocal microscopy widely used in the fields of biology, biomedicine, industrial detection, and metrology.

然而,普通的共焦显微镜其轴向分辨率仍然只停留在亚微米量级,且光源的噪声和漂移直接影响测量结果,为此哈尔滨工业大学的谭久彬等提出了差动共焦式纳米级光聚焦探测系统,如图1所示。其结构包括:光源31及在其出射光轴上设置的半透半反镜32和聚焦透镜33,在该半透半反镜32的反射光路上设置另一半透半反镜35,以及分别设在该半透半反镜35的反射、透射光路上的两针孔36、38及两探测器37、39,以及接收两探测器的输出信号的处理电路40。这种共焦显微镜的工作原理为:从光源31输出的光经待测样品表面34反射返回后由分光镜35分成透射和反射两束光,在反射光和透射光后分别放置针孔和探测器,针孔36、38的位置分别对称地位于像焦平面之前和之后,通过对两探测器信号37、39求差和求和,给出光聚焦信号。当待测样品表面位于焦平面上时,两针孔地位置相对与像焦平面对称,两探测器的差值为零;当样品表面偏离焦平面一个微小位移时,像点分别趋近于其中的一个针孔和远离另一个针孔,使探测到的光功率一个增大,一个减小,从而由差动信号反映除位移的大小和方向。这种方法虽然能使测量的轴向分辨率达到2nm,但是测量范围受到光强差动曲线线性区的限制,不能给出较大范围的测量。同时由于光强变化与样品表面位移的关系并不是完全的线性关系,所以测量的精度也不可能很高。However, the axial resolution of ordinary confocal microscopes is still only at the submicron level, and the noise and drift of the light source directly affect the measurement results. For this reason, Tan Jiubin from Harbin Institute of Technology proposed a differential confocal nanoscale optical Focus detection system, as shown in Figure 1. Its structure comprises: light source 31 and half-mirror 32 and focusing lens 33 that are arranged on its outgoing optical axis, another half-mirror 35 is set on the reflected light path of this half-mirror 32, and set respectively There are two pinholes 36, 38 and two detectors 37, 39 on the reflection and transmission light paths of the half mirror 35, and a processing circuit 40 for receiving the output signals of the two detectors. The working principle of this confocal microscope is: the light output from the light source 31 is reflected back by the surface 34 of the sample to be tested and then divided into two beams of transmitted and reflected light by the beam splitter 35, and pinholes and detectors are respectively placed after the reflected light and the transmitted light. The positions of the pinholes 36 and 38 are symmetrically located in front of and behind the image focal plane respectively, and the optical focus signal is given by taking the difference and sum of the signals 37 and 39 of the two detectors. When the surface of the sample to be measured is on the focal plane, the positions of the two pinholes are relatively symmetrical to the focal plane of the image, and the difference between the two detectors is zero; when the surface of the sample deviates from the focal plane by a small displacement, the image points approach respectively One of the pinholes is far away from the other pinhole, so that the detected optical power increases and decreases, so that the magnitude and direction of the displacement are reflected by the differential signal. Although this method can make the axial resolution of the measurement reach 2nm, the measurement range is limited by the linear region of the light intensity differential curve, and cannot provide a larger range of measurement. At the same time, since the relationship between the change of light intensity and the displacement of the sample surface is not completely linear, the measurement accuracy cannot be very high.

发明内容Contents of the invention

本发明的目的是为克服已有技术的不足之处,融合双频激光干涉和扫描共焦显微技术的特点,提供一种双频共焦显微台阶高度测量员装置,可对微电子掩膜板等台阶高度进行定量测量,具有高度高分辨和较大量程测量的特点。The purpose of the present invention is to overcome the deficiencies of the prior art, integrate the characteristics of dual-frequency laser interference and scanning confocal microscopy technology, and provide a dual-frequency confocal microscopic step height measurer device, which can measure the steps of microelectronic mask boards, etc. Quantitative measurement of height, with the characteristics of high resolution and large range measurement.

本发明的技术方案包括横向塞曼双频激光器,依次放置在该激光器发射端轴线上的第一块分光镜、法拉第盒、以快轴为22.5度放置的1/2波片、透镜、第一针孔、胶合透镜和偏振分光镜;放置在该偏振分光镜反射光路上的以快轴为45度放置的第一1/4波片和四面体棱镜,放置在该偏振分光镜透射光路上的以快轴为45度放置的第二1/4波片、显微物镜;还包括设置在该偏振分光镜的合光光路上的第二块分光镜,分别放置在该第二块分光镜的反射光路上的格兰棱镜、会聚透镜、第二针孔和光电探测器,在该第二块分光镜的透射光路上的会聚透镜和光电探测器。The technical scheme of the present invention includes a transverse Zeeman dual-frequency laser, a first beam splitter, a Faraday cell, a 1/2 wave plate placed at 22.5 degrees with the fast axis, a lens, a first Pinhole, cemented lens and polarization beam splitter; the first 1/4 wave plate and tetrahedral prism placed on the reflection light path of the polarization beam splitter with the fast axis as 45 degrees, placed on the transmission light path of the polarization beam splitter The second 1/4 wave plate and the microscope objective lens placed at 45 degrees with the fast axis; also include a second beam splitter arranged on the combined light path of the polarization beam splitter, respectively placed on the second beam splitter A Glan prism, a converging lens, a second pinhole and a photodetector on the reflected light path, and a converging lens and a photodetector on the transmitted light path of the second beam splitter.

本发明的测量原理如下:如图2所示。横向塞曼(He-Ne双频)激光器同时作为共焦显微镜和误差干涉系统的光源,分别获取样品表面的光强信息(粗定位)和相位信息(精确值),同时实现了较大量程和高分辨率的台阶高度测量要求。The measurement principle of the present invention is as follows: as shown in FIG. 2 . The transverse Zeeman (He-Ne dual-frequency) laser is used as the light source of the confocal microscope and the error interference system at the same time to obtain the light intensity information (coarse positioning) and phase information (precise value) of the sample surface respectively, and at the same time realize a large range and High resolution step height measurement requirements.

假设横向塞曼激光器输出激光的偏振矢量为:Assume that the polarization vector of the laser output from the transverse Zeeman laser is:

EE. 00 == ii →&Right Arrow; EE. 0101 sinsin (( 22 ππ ff 11 tt ++ φφ 0101 )) ++ jj →&Right Arrow; EE. 0202 sinsin (( 22 ππ ff 22 tt ++ φφ 0202 )) -- -- -- (( 11 ))

式中,各变量的含义为:

Figure C0212088400042
Figure C0212088400043
分别为出射平行分量p、垂直分量s的偏振方向矢量;E01、E02分别为p、s分量的振幅;f1、f2分别为p、s分量的频率,频差Δf=f1-f2;φ01、φ02分别为p、s分量的初始相位。In the formula, the meaning of each variable is:
Figure C0212088400042
Figure C0212088400043
are the polarization direction vectors of outgoing parallel component p and vertical component s respectively; E 01 and E 02 are the amplitudes of p and s components respectively; f 1 and f 2 are the frequencies of p and s components respectively, and the frequency difference Δf=f 1 - f 2 ; φ 01 and φ 02 are the initial phases of the p and s components respectively.

E0经过PBS分光后,反射光为s分量、形成参考光,透射光为p分量、形成测量光,分别经过参考和测量光路后再由PBS合光。由于参考光往返经过1/4波片两次,相当于经过一次1/2波片,又因为1/4波片的快轴与偏振方向成45°,所以参考光的偏振分量分别旋转了90°,即由s偏振变成p偏振;同理测量光则有p偏振变成为s偏振。所以,当参考光由四面体返回时透过PBS,测量光由待测样品表面反射返回时由PBS反射,二者重新合成为一束光。可将经过PBS合光之后参考光和测量光的偏振矢量E1和E2写作:After E 0 is split by the PBS, the reflected light is the s component to form the reference light, and the transmitted light is the p component to form the measurement light. After passing through the reference and measurement optical paths respectively, the light is combined by the PBS. Since the reference light passes through the 1/4 wave plate twice, which is equivalent to passing through the 1/2 wave plate once, and because the fast axis of the 1/4 wave plate is 45° to the polarization direction, the polarization components of the reference light are rotated by 90° respectively. °, that is, from s-polarization to p-polarization; similarly, the measurement light changes from p-polarization to s-polarization. Therefore, when the reference light passes through the PBS when it returns from the tetrahedron, the measurement light is reflected by the PBS when it is reflected from the surface of the sample to be tested, and the two are recombined into a beam of light. The polarization vectors E 1 and E 2 of the reference light and measurement light after PBS light combination can be written as:

EE. 11 == ii →&Right Arrow; KK 11 EE. 0202 sinsin (( 22 ππ ff 22 tt ++ φφ 0202 ++ φφ 1212 )) -- -- -- (( 22 ))

EE. 22 == jj →&Right Arrow; KK 22 EE. 0101 sinsin (( 22 ππ (( ff 11 ++ 22 ff 00 )) tt ++ φφ 0101 ++ φφ 22twenty two )) -- -- -- (( 33 ))

其中,K1=1-α1、K2=1-α2,α1、α2分别为s、p分量在干涉仪中的光强损耗因子;φ12为参考光路位相增量,φ22为测量光路在样品不同时的位相增量。F0为样品扫描过程中引起的多普勒频移。Among them, K 1 =1-α 1 , K 2 =1-α 2 , α 1 , α 2 are the light intensity loss factors of the s and p components in the interferometer respectively; φ 12 is the phase increment of the reference optical path, φ 22 To measure the phase increment of the optical path when the samples are different. F 0 is the Doppler frequency shift caused by the sample scanning process.

E1、E2检偏后由探测器接收形成测量信号Em、Im,可描述为:After E 1 and E 2 are depolarized, they are received by the detector to form measurement signals E m and I m , which can be described as:

Im=I0K1K2sin(2π(f1-f2+2f0)t+φ0122-(φ0212))    (4)式中:I0∝E01E02I m =I 0 K 1 K 2 sin(2π(f 1 -f 2 +2f 0 )t+φ 0122 -(φ 0212 )) (4) where: I 0 ∝ E 01 E 02 .

从横向塞曼激光器的输出直接取得的参考信号Ir为:The reference signal I r taken directly from the output of the transverse Zeeman laser is:

Ir=I0K0sin(2π(f1-f2)t+φ0)                            (5)I r =I 0 K 0 sin(2π(f 1 -f 2 )t+φ 0 ) (5)

由于φ01、φ22、φ02、φ12、φ0均为常数,所以Im与Ir比相后可得相位差Δφ为:Since φ 01 , φ 22 , φ 02 , φ 12 , and φ 0 are all constants, the phase difference Δφ obtained after comparing I m with I r is:

式中,λ=632.8nm,为He-Ne激光波长;s为被测位移量;Δφ的单位为度。由式(6)可得: s = Δφ 720 · λ , 所以当相位测量分辨率为0.1°时,位移测量分辨率达到0.1nm。In the formula, λ=632.8nm, which is the wavelength of He-Ne laser; s is the measured displacement; the unit of Δφ is degree. From formula (6) can get: the s = Δφ 720 · λ , So when the phase measurement resolution is 0.1°, the displacement measurement resolution reaches 0.1nm.

然而,相位测量方法只能在半个波长量程范围内有效。所以,为了提高测量量程,本发明利用共焦显微系统对光强进行了同步测量,这样就在满足较大测量范围的同时实现了台阶高度测量的高分辨。However, the phase measurement method is only valid within half a wavelength range. Therefore, in order to increase the measurement range, the present invention uses a confocal microscope system to measure the light intensity synchronously, thus achieving high resolution of step height measurement while meeting a larger measurement range.

本发明具有以下特点及良好效果:The present invention has following characteristics and good effect:

本发明双频共焦显微台阶高度测量装置在传统共焦显微镜测量光强的基础上,采取双频激光作为光源,增加了相位检测,从而突破了光强检测的瑞利判据的限制。相位测量方法实现对半波长的3600细分(相当于0.1°的相位测量单位)使测量分辨率达到纳米量级。改进后的双频共焦干涉显微系统光路是本发明区别于现有技术的创新点之一。The dual-frequency confocal microscopic step height measuring device of the present invention adopts a dual-frequency laser as a light source on the basis of light intensity measurement by a traditional confocal microscope, and adds phase detection, thereby breaking through the limitation of the Rayleigh criterion for light intensity detection. The phase measurement method realizes 3600 subdivisions of the half-wavelength (equivalent to a phase measurement unit of 0.1°) so that the measurement resolution reaches the nanometer level. The improved optical path of the dual-frequency confocal interference microscope system is one of the innovative points of the present invention which are different from the prior art.

本发明的共焦显微测量技术采用法拉第盒和1/2波片,使出射光和返回光偏振方向(即s偏振和p偏振)互换,从而有效地克服了光回授问题的影响,使激光稳频系统在测量过程中能够始终正常工作,避免出现多个谐振腔。The confocal microscopic measurement technology of the present invention adopts Faraday cell and 1/2 wave plate, makes outgoing light and returning light polarization direction (being s polarization and p polarization) exchange, thereby effectively overcomes the influence of light feedback problem, makes laser The frequency stabilization system can always work normally during the measurement process, avoiding multiple resonant cavities.

本发明在实现高分辨的同时由光强测量获得粗定位信息,其光强信号测量由双频干涉得到的正弦信号幅值给出。测量信号和同频的参考信号输入锁相放大器,可以得到测量信号的幅值大小。与普通共焦显微镜测量直流光强相比,这种方法可以有效地克服外来杂散光的干扰,提高测量的鲁棒性。这是区别现有技术的创新点之二。The present invention obtains rough positioning information by light intensity measurement while achieving high resolution, and the light intensity signal measurement is given by sinusoidal signal amplitude obtained by double-frequency interference. The measurement signal and the reference signal of the same frequency are input into the lock-in amplifier, and the amplitude of the measurement signal can be obtained. Compared with the measurement of DC light intensity by ordinary confocal microscope, this method can effectively overcome the interference of extraneous stray light and improve the robustness of measurement. This is the second innovative point that distinguishes the prior art.

附图说明Description of drawings

图1为已有的差动共焦式纳米级光聚焦探测系统光路结构图Figure 1 is the optical path structure diagram of the existing differential confocal nanoscale optical focusing detection system

图2为本发明的测量原理框图Fig. 2 is the measuring principle block diagram of the present invention

图3为本发明的双频共焦台阶高度显微测量装置实施例结构图Fig. 3 is the structural diagram of an embodiment of the dual-frequency confocal step height microscopic measurement device of the present invention

图4为本发明的实施实例与纳米干涉仪原理框图Fig. 4 is the implementation example of the present invention and nano-interferometer principle block diagram

图5为本发明的实施实例的一组初步实验结果Fig. 5 is a group of preliminary experimental results of the embodiment of the present invention

具体实施方式Detailed ways

本发明的双频共焦台阶高度显微测量装置的结构及工作原理结合实施例及附图详细说明如下:The structure and working principle of the dual-frequency confocal step height microscopic measurement device of the present invention are described in detail in conjunction with the embodiments and accompanying drawings as follows:

本实施例的结构如图3所示,包括:具有较高稳频精度的横向塞曼He-Ne双频激光器1,以及依次放置在激光器发射端轴线上的分光镜(BS)2、法拉第盒4、1/2波片5、透镜6、针孔7、胶合透镜8和偏振分光镜(PBS)9,放置在PBS反射光路上的1/4波片10和四面体棱镜11,放置在PBS透射光路上的1/4波片12、显微物镜13;测量光和参考光经PBS合光后分为两个部分分别用于光强测量和相位测量,故本装置还包括BS15,分别放置在BS反射光路上的格兰棱镜19、胶合透镜20、针孔21和光电探测器22,在BS15透射光路上的光阑16、会聚透镜17和光电探测器18。The structure of the present embodiment is shown in Figure 3, including: a transverse Zeeman He-Ne dual-frequency laser 1 with higher frequency stabilization accuracy, and a beam splitter (BS) 2 and a Faraday cell placed on the axis of the laser emitting end in sequence 4, 1/2 wave plate 5, lens 6, pinhole 7, cemented lens 8 and polarization beam splitter (PBS) 9, place 1/4 wave plate 10 and tetrahedral prism 11 on PBS reflection light path, place in PBS The 1/4 wave plate 12 and the microscope objective lens 13 on the transmitted light path; the measurement light and the reference light are combined by PBS and then divided into two parts for light intensity measurement and phase measurement respectively, so this device also includes BS15, which are placed separately Glan prism 19, cemented lens 20, pinhole 21 and photodetector 22 on the BS reflected light path, diaphragm 16, converging lens 17 and photodetector 18 on the BS15 transmitted light path.

本实施例的双频共焦台阶显微高度测量装置具体原理如下:The specific principles of the dual-frequency confocal step micro-height measuring device in this embodiment are as follows:

如图3所示。横向塞曼He-Ne激光器1输出正交的双频激光,由BS 2将输出光分为两束,反射光检偏后由探测器3形成参考信号,透射光通过法拉第盒4和快轴沿22.5°方向放置的1/2波片5使光的偏振方向旋转90°,可以避免光回授对激光器的影响。再经过小透镜6会聚于针孔7上,经过针孔7滤除杂散光后由胶合透镜8将光束扩成平行光束。平行光束通过PBS9进行偏振分光,其中反射光作为参考光,透射光作为测量光。参考光先经过快轴沿45°放置的1/4波片10后被四面体11反射,反射光再次经过45°放置的1/4波片10,参考光的偏振方向旋转90°,再次经过PBS9时变为透射光;测量光经过快轴沿45°放置的1/4波片12和无限筒长的显微物镜13投射在待测样品表面14,测量光经样品反射回后再次经过1/4波片12后偏振方向也旋转90°,再次经过PBS9后被反射,并与参考光合光。合成光通过BS15分成两部分,透射光经过光阑16和会聚透镜17后由探测器18检偏接收形成相位测量信号,与参考信号进行相位测量,从而使双频共焦显微镜的分辨率提高到1纳米以下;反射光经过格兰棱镜19滤去参考光,并由胶合透镜20(与胶合透镜8相同)会聚经针孔21后,入射到探测器22接收,形成光强测量信号,通过锁相放大器得到光强值,由光强变化得到轴向位移偏离焦点量的信息,从而克服纯相位测量单值性问题,使纵向测量量程达到5微米以上,同时还有效的减少杂散光干扰。As shown in Figure 3. Transverse Zeeman He-Ne laser 1 outputs orthogonal dual-frequency laser, and BS 2 divides the output light into two beams. After the reflected light is analyzed, the detector 3 forms a reference signal, and the transmitted light passes through the Faraday cell 4 and along the fast axis. The 1/2 wave plate 5 placed in the direction of 22.5° rotates the polarization direction of light by 90°, which can avoid the influence of light feedback on the laser. Then converge on the pinhole 7 through the small lens 6, filter the stray light through the pinhole 7, expand the light beam into a parallel light beam by the cemented lens 8. The parallel light beam is polarized and split through PBS9, in which the reflected light is used as the reference light, and the transmitted light is used as the measuring light. The reference light first passes through the 1/4 wave plate 10 placed along the fast axis at 45°, and then is reflected by the tetrahedron 11. The reflected light passes through the 1/4 wave plate 10 placed at 45° again, and the polarization direction of the reference light is rotated by 90°. When PBS9, it becomes transmitted light; the measurement light passes through the 1/4 wave plate 12 placed along the fast axis at 45° and the microscopic objective lens 13 with infinite tube length and projects on the surface 14 of the sample to be measured, and the measurement light passes through 1 again after being reflected by the sample. After the /4 wave plate 12, the polarization direction is also rotated by 90°, and after passing through the PBS9 again, it is reflected and combined with the reference light. The synthesized light is divided into two parts by BS15, and the transmitted light is analyzed and received by the detector 18 after passing through the diaphragm 16 and the converging lens 17 to form a phase measurement signal, and the phase measurement is carried out with the reference signal, so that the resolution of the dual-frequency confocal microscope is increased to Below 1 nanometer; the reflected light passes through the Glan prism 19 to filter out the reference light, and after being converged by the cemented lens 20 (the same as the cemented lens 8) through the pinhole 21, it is incident on the detector 22 to receive, forming a light intensity measurement signal, which passes through the lock The phase amplifier obtains the light intensity value, and the information of the axial displacement deviating from the focal point is obtained from the light intensity change, so as to overcome the single value problem of pure phase measurement, make the longitudinal measurement range reach more than 5 microns, and effectively reduce stray light interference at the same time.

本实施例对微电子台阶高度进行测量的方法,包括以下步骤:The method for measuring the height of the microelectronic step in this embodiment includes the following steps:

1)横向塞曼He-Ne激光器1输出正交的双频激光,由BS2将输出光分为两束,反射光检偏后由探测器3形成参考信号,透射光通过法拉第盒4和快轴沿22.5°方向放置的1/2波片5使偏振方向旋转90°,以避免光回授的影响。1) The transverse Zeeman He-Ne laser 1 outputs an orthogonal dual-frequency laser, and the output light is divided into two beams by BS2. After the reflected light is analyzed, the reference signal is formed by the detector 3, and the transmitted light passes through the Faraday cell 4 and the fast axis. The 1/2 wave plate 5 placed along the 22.5° direction rotates the polarization direction by 90° to avoid the influence of light feedback.

2)再经过小透镜6会聚于针孔7上,经过针孔7滤除杂散光后由胶合透镜8将光束扩成平行光束。2) Converge on the pinhole 7 through the small lens 6, filter the stray light through the pinhole 7, and expand the beam into a parallel beam by the cemented lens 8.

3)平行光束通过PBS9进行偏振分光,其中反射光作为参考光,透射光作为测量光。3) The parallel light beam is polarized and split through PBS9, wherein the reflected light is used as the reference light, and the transmitted light is used as the measuring light.

4)参考光先经过快轴沿45°放置的1/4波片10后被四面体11反射,反射光再次经过45°放置的1/4波片10,参考光的偏振方向旋转90°,再次经过PBS9时变为透射光。4) The reference light first passes through the 1/4 wave plate 10 placed along the fast axis at 45°, and then is reflected by the tetrahedron 11. The reflected light passes through the 1/4 wave plate 10 placed at 45° again, and the polarization direction of the reference light is rotated by 90°. It becomes transmitted light when passing through PBS9 again.

5)测量光经过快轴沿45°放置的1/4波片12和无限筒长的显微物镜13投射在待测样品表面14,测量光经样品反射回,经过显微物镜13后,再次通过1/4波片12,使其偏振方向也旋转90°,到达PBS9后被反射,并与参考光合光。5) The measurement light is projected on the surface 14 of the sample to be tested through the 1/4 wave plate 12 placed along the fast axis at 45° and the microscope objective lens 13 with infinite tube length, the measurement light is reflected back by the sample, and after passing through the microscope objective lens 13, it is again After passing through the 1/4 wave plate 12, its polarization direction is also rotated by 90°, and after reaching the PBS9, it is reflected and combined with the reference light.

6)合成光通过BS15分成两部分,透射光经过光阑16和会聚透镜17后由探测器18检偏接收形成相位测量信号,与参考信号进行相位测量,从而使双频共焦显微镜的分辨率提高到1纳米以下。6) The synthesized light is divided into two parts by the BS15, and the transmitted light is analyzed and received by the detector 18 after passing through the diaphragm 16 and the converging lens 17 to form a phase measurement signal, and the phase measurement is performed with the reference signal, so that the resolution of the dual-frequency confocal microscope increased to less than 1 nm.

7)反射光经过格兰棱镜19滤去参考光,并由胶合透镜20(与胶合透镜8相同)会聚经针孔21后,入射到探测器22接收,测量信号通过锁相放大器得到光强值,由光强变化得到轴向位移偏离焦点量的信息,从而克服纯相位测量单值性问题,使纵向测量量程达到5微米以上,同时还有效的减少杂散光干扰。7) The reflected light passes through the Glan prism 19 to filter out the reference light, and after being converged by the cemented lens 20 (the same as the cemented lens 8) through the pinhole 21, it is incident on the detector 22 for reception, and the measurement signal is obtained through a lock-in amplifier to obtain the light intensity value , the information of the axial displacement away from the focal point is obtained from the change of the light intensity, so as to overcome the single value problem of the pure phase measurement, make the longitudinal measurement range reach more than 5 microns, and effectively reduce the stray light interference.

在本方法中,采用共焦显微技术与外差干涉测量技术,同时满足了较大测量量程和高测量分辨率的需要。光强测量利用了锁相原理,克服了纯粹测直流光强容易受杂散光影响的问题。利用FPGA相位卡实现外差干涉信号的相位测量,分辨率可以达到0.1°,对应约0.1纳米的分辨率。光强测量结果和相位测量结果分别通过计算机接收。In this method, the confocal microscopic technique and the heterodyne interferometry technique are adopted, and the requirements of a large measuring range and a high measuring resolution are met at the same time. The light intensity measurement uses the phase-locking principle, which overcomes the problem that purely measuring DC light intensity is easily affected by stray light. The phase measurement of the heterodyne interference signal is realized by using the FPGA phase card, and the resolution can reach 0.1°, corresponding to a resolution of about 0.1 nanometer. Light intensity measurements and phase measurements are received separately by a computer.

本发明的实施例主要器件的型号及参数:Models and parameters of the main components of embodiments of the present invention:

采用横向塞曼激光器1频差在几十到几百千赫,BS2的透射率为90%、反射率为10%,探测器3、18、22为PIN管,法拉第盒4使偏振方向旋转45°,1/2波片5的快轴方向与水平方向夹角为22.5°,胶合透镜8的焦距为150mm,1/4波片10、12与水平方向夹角为45°,BS15透射与反射比为1∶1。Transverse Zeeman laser 1 frequency difference is tens to hundreds of kilohertz, the transmittance of BS2 is 90%, the reflectivity is 10%, the detectors 3, 18, 22 are PIN tubes, and the Faraday box 4 rotates the polarization direction by 45 °, the angle between the fast axis direction of the 1/2 wave plate 5 and the horizontal direction is 22.5°, the focal length of the cemented lens 8 is 150mm, the angle between the 1/4 wave plate 10, 12 and the horizontal direction is 45°, BS15 transmission and reflection The ratio is 1:1.

为标定本实施例系统的测量准确性,采用差动纳米干涉仪SJD5标定本系统,方法如图4所示。由压电陶瓷PZT驱动微位移工作台,分别用本发明共焦显微干涉系统和差动纳米干涉仪SJD5(本干涉仪经计量院标定,测量分辨率为亚纳米,非线性误差2.8纳米)进行测量,采用计算机进行测量同步控制,结果也由计算机采集。图5给出了一组实验曲线,横坐标为PZT驱动工作台时SJD5的测量结果,纵坐标左边为共焦显微干涉系统的相位测量结果,纵坐标右边为光强测量结果,实验结果表明相位测量的非线性误差在不超过7纳米。In order to calibrate the measurement accuracy of the system in this embodiment, the differential nano-interferometer SJD5 is used to calibrate the system, and the method is shown in Figure 4. The micro-displacement workbench is driven by the piezoelectric ceramic PZT, and the confocal micro-interference system of the present invention and the differential nano-interferometer SJD5 (this interferometer is calibrated by the Institute of Metrology, the measurement resolution is sub-nanometer, and the nonlinear error is 2.8 nanometers) are used for measurement. , the computer is used for measurement synchronization control, and the results are also collected by the computer. Figure 5 shows a set of experimental curves. The abscissa is the measurement result of SJD5 when the PZT drives the worktable, the left side of the ordinate is the phase measurement result of the confocal micro-interference system, and the right side of the ordinate is the light intensity measurement result. The experimental results show that the phase measurement The nonlinear error is not more than 7 nm.

Claims (1)

1、一种双频共焦台阶高度显微测量装置,其特征在于,包括横向塞曼双频激光器,依次放置在该激光器发射端轴线上的第一块分光镜、法拉第盒、以快轴为22.5度放置的1/2波片、透镜、第一针孔、胶合透镜和偏振分光镜;放置在该偏振分光镜反射光路上的以快轴为45度放置的第一1/4波片和四面体棱镜,放置在该偏振分光镜透射光路上的以快轴为45度放置的第二1/4波片、显微物镜;还包括设置在该偏振分光镜的合光光路上的第二块分光镜,分别放置在该第二块分光镜的反射光路上的格兰棱镜、会聚透镜、第二针孔和光电探测器,在该第二块分光镜的透射光路上的会聚透镜和光电探测器。1. A dual-frequency confocal step height microscopic measurement device is characterized in that it comprises a transverse Zeeman dual-frequency laser, and is placed on the first beam splitter, Faraday cell, and fast axis on the axis of the laser emitting end successively. 1/2 wave plate, lens, first pinhole, cemented lens and polarizing beam splitter placed at 22.5 degrees; the first 1/4 wave plate and the first 1/4 wave plate placed on the reflection light path of the polarizing beam splitter with the fast axis as 45 degrees A tetrahedral prism, a second 1/4 wave plate and a microscopic objective lens placed on the transmission light path of the polarization beam splitter with the fast axis at 45 degrees; A beamsplitter, a Glan prism, a converging lens, a second pinhole and a photodetector placed on the reflected light path of the second beamsplitter, a converging lens and a photoelectric detector on the transmitted light path of the second beamsplitter detector.
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Publication number Priority date Publication date Assignee Title
JP4522724B2 (en) * 2004-03-16 2010-08-11 株式会社トプコン Optical image measuring device
CN1300550C (en) * 2004-03-22 2007-02-14 财团法人工业技术研究院 Device and method for measuring surface profile of object to be measured
ES2243129B1 (en) * 2004-04-23 2006-08-16 Universitat Politecnica De Catalunya OPTICAL PROFILE OF DUAL TECHNOLOGY (CONFOCAL AND INTERFEROMETRIC) FOR THE INSPECTION AND THREE-DIMENSIONAL MEASUREMENT OF SURFACES.
FR2880945B1 (en) * 2005-01-14 2007-04-06 Essilor Int OPTICAL PROBE AS WELL AS DEVICE AND METHOD IMPLEMENTING THE SAME.
CN1323309C (en) * 2005-11-21 2007-06-27 哈尔滨工业大学 Reflective Multibeam Confocal Interference Microscopy with Tens of Nanometers Lateral Resolution
CN101413783B (en) * 2008-07-23 2012-06-27 中国航空工业第一集团公司北京长城计量测试技术研究所 Double-frequency laser interferometry apparatus
CN102645178B (en) * 2011-02-18 2015-01-21 上海微电子装备有限公司 Dual-frequency interference based facial contour measuring device and method
CN102645179B (en) * 2011-02-18 2015-01-21 上海微电子装备有限公司 Surface type measuring device and method based on double-frequency interference
CN102841506B (en) * 2011-06-22 2014-11-12 上海微电子装备有限公司 Laser interferometer measuring system and measuring method
JP5954979B2 (en) * 2011-12-15 2016-07-20 キヤノン株式会社 Measuring device with multi-wavelength interferometer
CN102937411B (en) * 2012-11-09 2015-01-21 清华大学 Double-frequency grating interferometer displacement measurement system
CN103134444B (en) * 2013-02-01 2015-07-29 同济大学 The varifocal three-dimension measuring system of double-view field
CN103900467B (en) * 2014-03-20 2017-01-04 哈尔滨工业大学 Single fiber coupling ball minute yardstick sensor based on polarization state detection
TWI553294B (en) * 2014-11-05 2016-10-11 Univ Nat Taiwan Optical interference imaging apparatus, system and method of the application of the same
CN104613881A (en) * 2015-02-12 2015-05-13 江苏宇迪光学股份有限公司 Lens center thickness measuring device and method based on double face confocal measurement
CN109855743B (en) * 2019-01-04 2020-10-09 北方工业大学 Device and method for measuring large-size optical plane by double-frequency laser heterodyne interference phase
CN111474734B (en) * 2020-04-13 2022-11-22 宁波大学 A large-range high-response optical confocal probe
CN111624161B (en) * 2020-07-01 2025-03-11 中国科学院上海技术物理研究所 A microscopic angle-resolved transmitted light phase information characterization system and its measurement method
CN113030109A (en) * 2021-03-23 2021-06-25 广西师范大学 Microprobe system for detecting object surface
CN114216864B (en) * 2021-12-10 2024-08-20 清华大学 Confocal microscopy method and device based on laser feedback

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