CN1171189C - Plasma display panel and method for manufacturing the same - Google Patents

Abstract

A plasma display panel and its manufacturing method, directly form the square grid shape barrier rib on the back base plate of the plasma display panel, and form the column shape lug corresponding to the dent gap on the barrier rib on the front base plate of the plasma display panel, not only the preparation method is simple, but also the alignment of the front and back base plates is not difficult. In addition, the size of the openings of the grid barrier walls and the size of the concave gaps can be easily adjusted according to the application requirements in the manufacturing process.

Description

Plasma display panel and manufacturing method thereof

The invention relates to a plasma display panel and a manufacturing method thereof, in particular to a structure and a manufacturing method of a grid-shaped barrier wall thereof.

The barrier rib (rib) of a plasma display panel (Plasma Display Panel; hereinafter referred to as PDP) generally adopts a strip structure. At present, there are also those that adopt a grid structure, as disclosed by NEC Corporation in its U.S. Patent (US 5701056). However, the structure disclosed by NEC is formed by forming a strip-shaped barrier wall on the rear substrate of the PDP, and forming a grid-shaped barrier wall on the front substrate, and then combining the front and rear substrates; as shown in the figure 1. Considering carefully the structure disclosed by NEC, there are still four shortcomings to be overcome as follows.

The structure of NEC, because the front substrate has an extra barrier rib manufacturing process, so the cost is relatively high.

When the front and rear substrates are combined, the alignment accuracy of the two is very strict, which increases the difficulty of the manufacturing process.

In order to ensure accurate alignment of the front and rear substrates, it is often necessary to increase the thickness of the rear substrate or the barrier wall of the front substrate. Therefore, the aperture ratio of the PDP is also sacrificed.

Due to the thickness of the barrier wall, the effective area of the coated phosphor is reduced.

The object of the present invention is to provide a plasma display panel structure and a manufacturing method thereof, the grid-shaped barrier ribs of which not only have a simple manufacturing process, but also can overcome the problems encountered by NEC.

Another object of the present invention is to provide a method for manufacturing PDP grid-shaped barrier ribs, which can define the required size of the recessed gaps through simple steps.

The purpose of the present invention is achieved by providing a plasma display panel, which includes: a first substrate; a second substrate, arranged parallel to the first substrate, so that the first substrate A discharge space is formed between the second substrate; a plurality of columnar bumps are formed on the second substrate, the columnar bumps are formed relative to the position of the recessed notch on the first substrate, and a grid-like barrier A wall is formed on the first substrate, and the grid-shaped barrier wall includes a plurality of first strip regions, and the plurality of first strip regions define the discharge space into a plurality of column discharge spaces; a plurality of second strip regions Strip regions, each of the above-mentioned second strip regions is interlaced with each of the above-mentioned first strip regions, and in each of the above-mentioned column discharge spaces, each of the above-mentioned second strip regions has a recessed gap, so that the gas can pass through The recess is breached to communicate in the column discharge space.

The present invention also provides a method for manufacturing a plasma display panel, including: providing a first substrate, on which an air extraction hole is provided; forming a plurality of strip-shaped electrodes on the first substrate, and each The strip-shaped electrodes are parallel to a first direction; a covering layer is formed on the above-mentioned strip-shaped electrodes and the above-mentioned first substrate; a second substrate is provided, arranged parallel to the first substrate, so that the first substrate and the first substrate A discharge space is formed between the second substrates, and the discharge space is connected to the air extraction hole; a grid-shaped barrier wall is formed on the first substrate, and the grid-shaped barrier wall includes a plurality of first strip regions , the plurality of first strip areas define the discharge space into a plurality of column discharge spaces, a plurality of second strip areas, each of the above-mentioned second strip areas is interlaced with each of the above-mentioned first strip areas, and in In each of the row discharge spaces, each of the second elongated regions has a recessed gap, so that the gas can pass through the recessed gap and circulate in the row discharge space; a plurality of columnar bumps are formed on the second substrate, The stud bump is formed at a position corresponding to the concave notch on the first substrate; the peripheral edge of the first substrate is combined with the peripheral edge of the second substrate to seal the discharge space; Air extraction is carried out, so that the gas in the discharge space of the column passes through the recessed gap and is extracted from the air extraction port.

Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, wherein:

Figure 1 is a structural diagram of the PDP barrier disclosed by NEC;

2A to 2E are three-dimensional cross-sectional flow charts of the first manufacturing method for forming a grid-like barrier wall;

3A is a combined schematic diagram of the partial structure of the front and rear substrates of the PDP;

Figure 3B is a cross-sectional view along the A-A' direction after the combination of Figure 3A is completed;

4A to 4B are three-dimensional cross-sectional flow charts of the second manufacturing method for forming a grid-like barrier wall;

5A to 5C are three-dimensional cross-sectional flowcharts of a third manufacturing method for forming a grid-like barrier wall;

6A to 6D are three-dimensional cross-sectional flow charts of a fourth manufacturing method for forming grid-like barrier ribs.

Referring to FIG. 3A and FIG. 3B , FIG. 3A shows a schematic diagram of the assembly of the front and rear substrate structures of the PDP; FIG. 3B shows a cross-sectional view along the A-A' direction after the assembly of FIG. 3A is completed. The plasma display panel disclosed in the present invention includes: a first substrate 300; a second substrate 304 arranged parallel to the first substrate 300, so that the relationship between the first substrate 300 and the second substrate 304 A discharge space is formed between them. Wherein, on the above-mentioned first substrate 300 , a grid-shaped barrier wall 302 is formed; on the above-mentioned second substrate 304 , a multi-column bump 312 and an air extraction hole 316 are formed.

The grid-shaped barrier ribs 302 on the first substrate 300 include:

A plurality of first strip regions 302 ₁ , the plurality of first strip regions 302 ₁ define the discharge space into a plurality of column discharge spaces 308;

A plurality of second strip regions 302 ₂ , each of the above-mentioned second strip regions 302 ₂ is interlaced with each of the above-mentioned first strip regions 302 ₁ , and in each of the above-mentioned row discharge spaces 308, each of the above-mentioned second strip regions The strip region 302 ₂ has a recessed notch 306 , so that the gas can flow through the recessed notch 306 in the column discharge space.

A plurality of columnar bumps 312 on the second substrate 304 form a position relative to the concave notch 306 on the first substrate 300; moreover, the protruding height of the columnar bumps is H ₂ less than the depth H ₁ of the concave notch 306 .

Therefore (see FIG. 3B ), when the above-mentioned first substrate 300 is combined with the above-mentioned second substrate 304, when the stud bump 312 on the above-mentioned second substrate 304 is embedded in the recessed notch 306 on the above-mentioned first substrate 300, it will A channel 314 remains in the above-mentioned recessed gap 306, so that the gas can still pass through the channel 314 and circulate in the row of discharge spaces.

The manufacturing method of the plasma display panel that the present invention proposes, then comprises the following steps:

(9) The first substrate 300 is provided, and the first substrate 300 is provided with an air extraction hole 316 .

(10) Forming a plurality of strip-shaped electrodes (not shown in FIGS. 3A-3B ) on the first substrate 300 , each of the strip-shaped electrodes being parallel to a first direction.

(11)) A covering layer (not shown in FIGS. 3A-3B ) is formed on the elongated electrodes and the first substrate 300 .

(12) A second substrate 304 is provided, and the second substrate and the first substrate 300 are arranged parallel to each other; a discharge space is formed between the first substrate 300 and the second substrate 304, and the discharge space and the air extraction hole 316 is turned on.

(13) A grid-like barrier wall 302 is formed on the first substrate 300, and the grid-like barrier wall 302 includes a plurality of first elongated regions 302 ₁ and a plurality of second elongated regions 302 ₂ . A plurality of first strip regions 302 ₁ define the discharge space into a plurality of column discharge spaces 308, each of the above-mentioned second strip regions 302 ₂ is interlaced with each of the above-mentioned first strip regions 302 ₁ ; and in each of the above-mentioned In the column discharge space 308, each of the above-mentioned second elongated regions ₃₀₂₂ has a recessed notch 306, and the recessed notch 306 of the second elongated region ₃₀₂₂₂ has a recessed depth _H1 , so that the gas can pass through the recessed notch 306 And flow in the column discharge space 308 .

(14) A plurality of columnar bumps 312 are formed on the second substrate 304, the columnar bumps 312 are formed at positions corresponding to the recessed notches 306 on the first substrate 300, and the columnar bumps 312 have a protruding height _H2 , and the protrusion height H ₂ is smaller than the depression depth H ₁ .

(15) Combining the peripheral edge of the first substrate 300 with the peripheral edge of the second substrate 304 to seal the discharge space, so that the stud bump 312 on the second substrate 304 will be embedded in the first substrate 300 The notch 306 is recessed, and a channel 314 is reserved in the notch 306 , so that the gas can still circulate in the row of discharge spaces 308 through the channel 314 .

(16) Pump the discharge space through the pump hole 316 , so that the gas in the row of discharge spaces 308 passes through the channel 314 and is drawn out of the discharge space from the pump port 316 .

The manufacturing process of the columnar bump 312 can be: before the surface protection layer (MgO) is coated on the second substrate 304, a number of columnar protrusions are formed on the semi-finished surface of the second substrate 304 by using a screen printing or optical etching process; After the last MgO coating, the stud bumps 312 are formed at the corresponding stud protrusions.

In this embodiment, each pixel discharge space is isolated by the first strip region ₃₀₂₁ and the second strip region ₃₀₂₂ , and only the channel 314 is connected to each pixel discharge space belonging to the same row of discharge spaces 308, and passes through the columnar bump The height H ₂ of 312 is limited such that the channel 314 is at least H ₂ away from the surface of the front substrate 304 . Because the discharge space of each pixel is blocked by the columnar bump 312 adjacent to the surface of the front substrate 304, this can reduce the interference between different pixels when the XY electrodes on the front board drive the ionized gas back and forth during the sustain period of the driving signal (Sustain Period). cross talk) phenomenon. However, the stud bump 312 is a structure that can be omitted, and the discharge space of each pixel can also be isolated only by the first strip region 302 ₁ and the second strip region 302 ₂ , which also has the effect of reducing the interference between pixels.

There are four manufacturing methods for forming grid-like barrier ribs on the above-mentioned first substrate (rear substrate).

【First method】

2A to FIG. 2E show a three-dimensional cross-sectional flow chart of the first manufacturing method for forming a grid-like barrier wall according to the present invention.

First, a substrate 200 is provided; wherein, a plurality of strip-shaped electrodes 202 are disposed on the substrate 200 , and each of the strip-shaped electrodes 200 is parallel to a first direction (indicated by an arrow D). In this embodiment, for the sake of brevity, only two strip-shaped electrodes are shown.

Next, an overcoat layer 204 is formed on the elongated electrodes 202 and the substrate 200 ; as shown in FIG. 2A .

A shaping layer 206 is further formed on the covering layer 204 . As shown in Figure 2B, the surface of the above-mentioned plastic layer 206 is formed with a plurality of strip-shaped protruding parts 206a; each of the above-mentioned protruding parts 206a is located in the center of the area between every two above-mentioned strip-shaped electrodes 202, and is parallel to the first direction above.

In this embodiment, the shaping layer 206 shown in FIG. 2B has two possible fabrication methods as follows.

(1) The first method: First, print a solid print on the cover layer 204 to print multiple layers (for example, 7-8 layers) of paste, and form the platform part 206b after baking. Next, use screen printing (pattem print) to print 1-3 layers of paste, and form the above-mentioned elongated protruding portion 206a after baking.

(2) The second method: first use screen printing to print 1 to 3 layers of paste; after baking, form a plurality of strip-shaped protruding areas along the above-mentioned first direction, and use them as strip-shaped protruding areas. the bottom of portion 206a. Then perform full-surface printing, and print multiple layers (for example, 7 to 8 layers) of paste on the above-mentioned covering layer 204 and on the above-mentioned elongated protruding area, and after baking (baking), the above-mentioned Shaping layer 206 .

After the shaping layer 206 is completed, a dry film photoresist layer is formed on the shaping layer by pressing a film.

Next, exposing and developing the above-mentioned dry film photoresist layer to form a limited mask 208 on the above-mentioned shaping layer 206 . The above-mentioned limiting mask 208, as shown in FIG. 2C, has a grid-like structure, including a plurality of first strip regions 208 ₁ , and a plurality of second strip regions 208 ₂ ; each of the above-mentioned first strip regions 208 ₁ is parallel to the first direction and formed on one of the elongated protruding portions 206a; each of the above-mentioned second elongated regions 208 ₂ is perpendicular to the first direction and formed between a plurality of elongated protruding portions 206a and A stagger is formed on the land portion 206b.

Carry out sandblasting (sand blast) process, remove the plastic layer 206 that is exposed outside the above-mentioned limiting mask 208, until the above-mentioned cover layer 204 is exposed, and form grid-like barrier walls 212 (comprising: a plurality of first elongated walls region 212 ₁ and a plurality of second elongated wall regions 212 ₂ ); as shown in FIG. 2D .

After the barrier ribs are completed, the above-mentioned limiting mask 208 (that is, the developed dry film photoresist) is removed, and then the phosphor 210 is printed on, that is, the rear substrate of the PDP; as shown in FIG. 2E . It should be noted that: on each of the second elongated wall regions 212 ₂ in the barrier walls 212, a recessed notch 209 is formed.

Finally, after the above-mentioned rear substrate is combined with a front substrate, subsequent procedures can be performed.

According to the method of the present invention, with reference to Fig. 2C and Fig. 2E, it can be known that the width L ₁ of the first elongated region 208 ₁ and the width L ₂ of the above-mentioned second elongated region 208 ₂ are changed (the mask layer 208) respectively, and can be adjusted. The thickness of the barrier wall affects the grid size of each pixel to obtain an appropriate aperture ratio.

In addition, referring to FIG. 2C and FIG. 2E , changing the width L ₃ and the height L ₄ of the platform portion 206 b of the shaping layer 206 respectively can control the width and depth of the concave notch 209 .

【Second method】

4A to 4B show a three-dimensional cross-sectional flowchart of a second manufacturing method for forming a grid-like barrier wall according to the present invention.

First, a substrate 400 is provided; wherein, a plurality of strip-shaped electrodes 402 are disposed on the substrate 400 , and each of the strip-shaped electrodes 402 is parallel to a first direction (indicated by an arrow D). In this embodiment, for the sake of brevity, only two strip-shaped electrodes are shown.

A covering layer 404 is formed on the elongated electrodes 402 and the substrate 400 .

Next, pattern printing is used to form a grid-shaped shaping layer 406 on the covering layer 404, that is, the grid-shaped barrier walls of the PDP are formed. As shown in FIG. 4A , the shaping layer 406 includes a plurality of first elongated regions 406 a and a plurality of second elongated regions 406 b. Each of the first elongated regions 406a is located on the covering layer 404 between every two elongated electrodes 402 and is parallel to the first direction; each of the second elongated regions 406b is parallel to the first direction, And perpendicular to the above-mentioned first direction, intersecting with a plurality of strip-shaped electrodes 402 .

The shaping layer 406 is screen-printed, and multiple layers (for example, 7-8 layers) of paste are printed on the covering layer 404, and then formed after being baked. Since the plurality of elongated electrodes 402 are relatively low in height, after multi-layer screen printing, the top of the second elongated region 406b of the shaping layer is still close to a flat surface.

Finally, a plurality of third elongated regions 407 are formed on each of the above-mentioned first elongated regions 406a by screen printing. After the baking is completed, the third elongated area 407 becomes the top wall portion of the first elongated area 406a. Also, every two third elongated regions 407 and any second elongated region 406b form a recessed gap; thus, after the front and rear substrates are combined, the gas can pass through the recessed gap and circulate in each column discharge space .

The above-mentioned third elongated area 407 is formed by printing multiple elongated paste layers by screen printing and baking.

【Third method】

5A to FIG. 5C show a three-dimensional cross-sectional flowchart of a third manufacturing method for forming a grid-like barrier wall according to the present invention.

First, a substrate 500 is provided; wherein, a plurality of strip-shaped electrodes 502 are disposed on the substrate 500 , and each of the strip-shaped electrodes 502 is parallel to a first direction (indicated by an arrow D). In this embodiment, for simplicity, only two strip-shaped electrodes are shown.

A covering layer 504 is formed on the multi-strip electrodes 502 and the substrate 500 . A shaping layer 506 is then formed on the covering layer 504; as shown in FIG. 5A. In this embodiment, the above-mentioned plastic layer 506 is made by printing multiple layers (for example, 7-8 layers) of paste on the above-mentioned covering layer 504 by means of solid printing, and after baking And done.

A dry film photoresist layer is formed on the above-mentioned shaping layer 506 .

exposing and developing the dry film photoresist layer, and forming a limited mask 508 on the shaping layer 506 . As shown in FIG. 5B , the definition mask 508 includes a plurality of first strip regions 508 ₁ and a plurality of second strip regions 508 ₂ . Each of the above-mentioned first elongated regions 508 ₁ is parallel to the above-mentioned first direction and located on the above-mentioned plastic layer 506 between every two of the above-mentioned elongated electrodes 502 . Each of the above-mentioned second strip regions 508 ₂ extends along the second direction and is perpendicular to each of the above-mentioned first strip regions 508 ₁ ; each of the above-mentioned second strip regions 508 ₂ is between every two first strip regions A disconnection region CR is formed between the regions ₅₀₈₁ to expose the above-mentioned shaping layer 506 .

Finally, a sandblasting process is performed to remove the shaping layer 506 exposed outside the above-mentioned limiting mask 508, exposing the covering layer 504, and forming a grid-like barrier wall 512 (including a plurality of first elongated wall regions ₅₁₂₁ and A plurality of second elongated wall regions 512 ₂ ); as shown in FIG. 5C . Wherein, because the width L ₇ of the disconnected area CR is much smaller than the size of the grid-shaped opening, the depth of erosion during sandblasting will be much smaller than the eroded depth of the grid-shaped opening area; A part of the plastic layer 506 remains in the open region CR; a recessed gap 510 is formed on the barrier wall by the boundary of the disconnected region CR.

According to the method of the present invention, referring to FIG. 5B and FIG. 5C, it can be seen that the grid of the barrier wall 512 can be adjusted by changing the width L ₅ of the first elongated region 508 ₁ and the width L ₆ of the second elongated region 508 ₂ respectively. size to obtain an appropriate aperture ratio.

By changing the width L ₇ of the disconnected area, the width of the recessed notch 510 can be adjusted.

【Fourth method】

6A to FIG. 6D show a three-dimensional cross-sectional flowchart of a fourth manufacturing method for forming a grid-like barrier wall according to the present invention.

Firstly, a substrate 600 is provided; wherein, a plurality of strip-shaped electrodes 602 are disposed on the substrate 600 , and each of the strip-shaped electrodes is parallel to a first direction (indicated by an arrow D). In this embodiment, for simplicity, only two strip-shaped electrodes are shown.

A covering layer 604 is formed on the elongated electrodes 602 and the substrate 600 .

A shaping layer 606 is formed on the covering layer 604; as shown in FIG. 6A. In this embodiment, the shaping layer 606 is fabricated by printing multiple layers (for example, 7-8 layers) of paste on the cover layer 604 in a full-surface printing manner, and then it is completed after being baked.

Next, a grid-like photosensitive limiting layer 608 is formed on the above-mentioned shaping layer 606 . As shown in FIG. 6B , the photosensitive defined layer 608 includes a plurality of first elongated regions 608 ₁ and a plurality of second elongated regions 608 ₂ . Each of the first elongated regions 608 ₁ is located on the shaping layer 606 between every two elongated electrodes 602 and is parallel to the first direction. Each of the above-mentioned second elongated regions 608 ₂ is parallel to a second direction and perpendicular to the above-mentioned first direction. The height of the first elongated area 608 ₁ is greater than the height of the second elongated area 608 ₂ .

The material of the photosensitive defined layer 608 is formed by mixing photosensitive material and slurry. In addition, in this embodiment, the photosensitive limiting layer 608 has the following two possible fabrication methods.

(1) The first method: use screen printing (pattern print) first, and print a multi-layer grid-like first photosensitive limiting layer on the above-mentioned plastic layer 606, so that it becomes the second strip area 608 ₂ and The bottom of the first elongated area 608 ₁ ; then use screen printing to print a strip-shaped second photosensitive defined layer on the first photosensitive defined layer along the first direction, so that the first elongated area 608 ₁ On top, a photosensitive defined layer 608 as shown in FIG. 6B is formed.

(2) The second method: use screen printing to print a multi-layer strip-shaped second photosensitive limiting layer on the above-mentioned plastic layer 606 along the above-mentioned first direction, so that it becomes the bottom of the first strip area ₆₀₈₁ ; Using screen printing, a multi-layer grid-shaped first photosensitive defined layer is printed on the above-mentioned second photosensitive defined layer to form a photosensitive defined layer 608 as shown in FIG. 6B .

Next, the photosensitive defined layer 608 is exposed with ultraviolet rays to form a defined mask 610 on the shaped layer 606 ; as shown in FIG. 6C .

Finally, a sandblasting process is performed to remove the shaping layer 606 exposed outside the limiting mask 610 to expose the covering layer 604 and form a grid-like barrier wall; as shown in FIG. 6D .

To sum up, the plasma display panel disclosed by the present invention includes: a first substrate (rear substrate); a second substrate (front substrate), arranged parallel to the first substrate, so that the first substrate A discharge space is formed between a substrate and the second substrate. Wherein, on the above-mentioned first substrate, a grid-shaped barrier wall is formed; on the above-mentioned second substrate, there are formed a multi-column bump and an air extraction hole.

The grid-shaped barrier walls on the first substrate include: a plurality of first strip regions, and the plurality of first strip regions define the discharge space into a plurality of column discharge spaces; a plurality of second strip regions , each of the above-mentioned second elongated regions is interlaced with each of the above-mentioned first elongated regions, and in each of the above-mentioned row discharge spaces, each of the above-mentioned second elongated regions has a recessed gap, so that the gas can pass through the recessed gap And flow in the column discharge space.

The plurality of columnar bumps on the second substrate are formed relative to the position of the recess on the first substrate; moreover, the protruding height H ₂ of the columnar bump is smaller than the depth H ₁ of the recess.

The manufacturing method of the plasma display panel proposed by the present invention includes the following steps: (1) providing a first substrate, and a gas extraction hole is arranged on the first substrate. (2) Forming a plurality of strip-shaped electrodes on the first substrate, each of the strip-shaped electrodes being parallel to a first direction. (3) Forming a covering layer on the elongated electrodes and the first substrate. (4) A second substrate is provided, the second substrate and the first substrate are arranged parallel to each other; a discharge space is formed between the first substrate and the second substrate, and the discharge space is connected to the air extraction hole. (5) Forming a grid-shaped barrier wall on the first substrate, the grid-shaped barrier wall includes a plurality of first strip regions and a plurality of second strip regions, and the plurality of first strip regions The discharge space is defined as a plurality of column discharge spaces, each of the above-mentioned second strip regions is interlaced with each of the above-mentioned first strip regions; and in each of the above-mentioned column discharge spaces, each of the above-mentioned second strip regions has A recessed notch, the recessed notch of the second elongated region has a recessed depth H ₁ , so that the gas can pass through the recessed notch to circulate in the row of discharge spaces. (6) A plurality of stud bumps are formed on the second substrate, the stud bumps are formed at positions corresponding to the recesses on the first substrate, the stud bumps have a protruding height H ₂ , and the protruding height H ₂ is smaller than the recess depth H ₁ . (7) combining the peripheral edge of the first substrate with the peripheral edge of the second substrate to seal the discharge space, so that the stud bump on the second substrate will be embedded in part of the concave notch on the first substrate, and A channel is reserved in the recess, so that the gas can still pass through the channel and circulate in the row of discharge spaces. (8) The discharge space is pumped through the pump hole, so that the gas in the row of discharge spaces passes through the channel and is pumped out of the discharge space from the pump port.

According to the present invention, there are four manufacturing methods for forming grid-like barrier ribs on the first substrate (rear substrate) as follows.

The first method of manufacturing barrier ribs according to the present invention includes the following steps. (a) First, a substrate is provided, wherein a plurality of strip-shaped electrodes are disposed on the substrate, and each of the strip-shaped electrodes is parallel to a first direction. (b) Forming a covering layer on the elongated electrode and the substrate. (c) forming a plastic layer on the above-mentioned covering layer; wherein, the surface of the above-mentioned plastic layer is formed with a plurality of strip-shaped protrusions; shape layer, and parallel to the above-mentioned first direction. (d) Next, a dry film photoresist layer is formed on the above-mentioned shaping layer. (e) re-exposing and developing the above-mentioned dry film photoresist layer to form a limited mask on the above-mentioned plastic layer; wherein, the above-mentioned limited mask includes a plurality of first strip regions, and a plurality of second Elongated areas; each of the above-mentioned first elongated areas is formed on each of the above-mentioned elongated protruding parts; each of the above-mentioned second elongated areas is parallel to a second direction and perpendicular to the above-mentioned first direction. (f) Finally, perform a sandblasting process to remove the shaping layer exposed outside the above-mentioned limiting mask, so as to expose the above-mentioned covering layer, and form the above-mentioned grid-like barrier walls.

The second method of manufacturing barrier ribs according to the present invention includes the following steps. (a) Firstly, a substrate is provided; wherein, a plurality of strip-shaped electrodes are disposed on the substrate, and each of the strip-shaped electrodes is parallel to a first direction. (b) Forming a covering layer on the above-mentioned elongated electrodes and the above-mentioned substrate. (c) Screen printing is used to form a grid-shaped shaping layer on the cover layer. Wherein, the above-mentioned plastic layer includes a plurality of first strip regions, and a plurality of second strip regions; each of the above-mentioned first strip regions is located on the above-mentioned covering layer between every two above-mentioned strip-shaped electrodes, and is parallel to In the first direction; each of the second elongated regions is parallel to the second direction and perpendicular to the first direction. (d) Finally, use screen printing to form a plurality of third elongated regions on the above-mentioned shaping layer; wherein, each of the above-mentioned third elongated layers is respectively formed on the first above-mentioned first elongated layer, thereby The aforementioned grid-like barrier walls are formed.

The third method of manufacturing barrier ribs according to the present invention includes the following steps. (a) Firstly, a substrate is provided; wherein, a plurality of strip-shaped electrodes are disposed on the substrate, and each of the strip-shaped electrodes is parallel to a first direction. (b) Forming a covering layer on the multi-strip electrodes and the substrate. (c) Forming a shaping layer on the above-mentioned covering layer. (d) forming a dry film photoresist layer on the above-mentioned shaping layer. (e) exposing and developing the above-mentioned dry film photoresist layer, and forming a limited mask on the above-mentioned shaping layer. Wherein, the above-mentioned limiting mask includes a plurality of first strip regions, and a plurality of second strip regions; each of the above-mentioned first strip regions is parallel to the above-mentioned first direction, and is located between every two of the above-mentioned strip-shaped electrodes. On the above-mentioned plastic layer; each of the above-mentioned second elongated regions extends along the second direction and is perpendicular to each of the above-mentioned first elongated regions; each of the above-mentioned second elongated regions is in contact with each of the above-mentioned elongated electrodes A disconnection area is formed at the intersection to expose the above-mentioned shaping layer. (f) Finally, perform a sandblasting process to remove the plastic layer exposed outside the above-mentioned limiting mask, expose the above-mentioned covering layer, and form the above-mentioned grid-like barrier wall; There is the aforementioned shaping layer.

According to the present invention, the fourth method of manufacturing barrier ribs includes the following steps. (a) Firstly, a substrate is provided; wherein, a plurality of strip-shaped electrodes are disposed on the substrate, and each of the strip-shaped electrodes is parallel to a first direction. (b) Forming a covering layer on the elongated electrode and the substrate. (c) Forming a shaping layer on the above-mentioned covering layer. (d) Forming a grid-like photosensitive limiting layer on the above-mentioned shaping layer. Wherein, the photosensitive defined layer includes a plurality of first elongated regions, and a plurality of second elongated regions; each of the above-mentioned first elongated regions is located on the above-mentioned shaping layer between every two elongated electrodes, and parallel to the first direction; each second elongated area is parallel to a second direction and perpendicular to the first direction; the height of the first elongated area is greater than the height of the second elongated area. (e) exposing and developing the photosensitive defined layer, and forming a defined mask on the shaped layer. (f) Finally, perform a sandblasting process to remove the shaping layer exposed outside the above-mentioned limiting mask, so as to expose the above-mentioned covering layer, and form the above-mentioned grid-like barrier walls.

It can be seen from the above four manufacturing methods of barrier ribs that the manufacturing process of the present invention has the following advantages:

① In the manufacturing process of the present invention, the barrier ribs are only fabricated on the rear substrate, so when the PDP is combined, the alignment of the front and rear substrates is obviously simpler than that disclosed by NEC.

② The opening area of the barrier wall can be easily adjusted to obtain a better opening ratio and increase the coating area of the phosphor, so better luminance can be obtained.

③ There are recesses and gaps formed on the barrier walls, so it is easy to carry out vacuum process (Vacuum process) and gas filling (fill gas) during packaging.

Although the present invention has been disclosed in conjunction with the above preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection should be defined by the appended claims.

Claims (16)

1. plasma display, this plasma display panel comprises:

One first substrate;

One second substrate disposes in parallel with each other with this first substrate, makes and forms a discharge space between this first substrate and this second substrate;

A plurality of column-like projection blocks are formed on this second substrate, and this column-like projection block forms the position with respect to the breach that should cave on this first substrate, and

One square grid shape barrier rib is formed on this first substrate, and this square grid shape barrier rib includes

A plurality of first stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space;

A plurality of second stripe region, each above-mentioned second stripe region crisscrosses each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this.

2. plasma display as claimed in claim 1, wherein this column-like projection block has a projecting height H ₂, this depression breach of this second stripe region has a cup depth H ₁, and this projecting height H ₂Less than this cup depth H ₁When this first substrate and this second substrate junction fashionable, this column-like projection block on this second substrate can embed this depression breach of part on this first substrate, and keeps a passage in this depression breach, and gas still can be circulated in this row discharge space by this passage.

3. the manufacture method of a plasma display comprises:

One first substrate is provided, and this first substrate is provided with an aspirating hole;

Form a plurality of strip electrodes on this first substrate, each above-mentioned strip electrode is parallel to a first direction;

On above-mentioned strip electrode and above-mentioned first substrate, form an overlayer;

One second substrate is provided, disposes in parallel with each other, make and form a discharge space, this discharge space and this aspirating hole conducting between this first substrate and this second substrate with this first substrate;

On this first substrate, form a square grid shape barrier rib, this square grid shape barrier rib includes a plurality of first stripe region, these a plurality of first stripe region are defined as a plurality of row discharge spaces with this discharge space, a plurality of second stripe region, each above-mentioned second stripe region is staggered in each above-mentioned first stripe region, and in each above-mentioned row discharge space, each above-mentioned second stripe region has a depression breach, makes gas cave in breach and circulate in this row discharge space by this;

Form a plurality of column-like projection blocks on this second substrate, this column-like projection block is formed on the position that corresponds to this depression breach on this first substrate;

The periphery of this first substrate is combined with the periphery of this second substrate, to seal this discharge space;

By this aspirating hole this discharge space is bled, make gas this bleeding point extraction certainly in this row discharge space by this depression breach.

4. plasma display manufacture method as claimed in claim 3, its step also comprises: this column-like projection block has a projecting height H ₂, this depression breach of this second stripe region has a cup depth H ₁, and this projecting height H ₂Less than this cup depth H ₁When this first substrate with after this second substrate combines, this column-like projection block on this second substrate can embed this depression breach of part on this first substrate, and keeps a passage in this depression breach, and gas still can be circulated in this row discharge space by this passage.

5. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:

On above-mentioned overlayer, form moulding layer; Wherein, the surface of above-mentioned moulding layer is formed with a plurality of strip projections; Each above-mentioned projection is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips, and is parallel to above-mentioned first direction;

On above-mentioned moulding layer, form dry film photoresist layer;

Exposure, the above-mentioned dry film photoresist layer that develops, and on above-mentioned moulding layer, form the qualification shade; Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is formed on each above-mentioned strip projection; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction;

Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form above-mentioned square grid shape barrier rib.

6. plasma display manufacture method as claimed in claim 5 wherein, is made above-mentioned moulding layer and is comprised the steps: the mode of elder generation with whole printing, prints multilayer first pulp layer on above-mentioned overlayer; Above-mentioned first pulp layer is toasted; Use screen painting, print second pulp layer of multilayer strip, on above-mentioned first pulp layer; And above-mentioned second pulp layer toasted.

7. plasma display manufacture method as claimed in claim 5 wherein, is made above-mentioned moulding layer and is comprised the steps: to use earlier screen painting, prints second pulp layer of multilayer strip on above-mentioned overlayer; Above-mentioned first pulp layer is toasted; Re-use the mode of whole printing, on above-mentioned second pulp layer, print multilayer first pulp layer; Above-mentioned second pulp layer is toasted.

8. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:

Use screen painting, with the moulding layer that forms square grid shape on above-mentioned overlayer; Wherein, above-mentioned moulding floor comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned overlayer of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction;

Use screen painting, on above-mentioned moulding floor, form a plurality of the 3rd rectangular district; Wherein, each the above-mentioned the 3rd rectangular district is formed at respectively on each above-mentioned first sliver layer, forms above-mentioned square grid shape barrier rib with this.

9. plasma display manufacture method as claimed in claim 8, wherein, above-mentioned moulding layer uses screen painting, prints the multilayer slurry on above-mentioned overlayer, after toasting and form.

10. plasma display manufacture method as claimed in claim 8, wherein, the above-mentioned the 3rd rectangular district uses screen painting, prints multilayer strip pulp layer, after toasting and form.

11. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:

On above-mentioned overlayer, form moulding layer;

On above-mentioned moulding layer, form dry film photoresist layer;

Exposure, the above-mentioned dry film photoresist layer that develops limit shade and form on above-mentioned moulding layer; Wherein, above-mentioned qualification shade comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is parallel to above-mentioned first direction, is positioned on the interelectrode above-mentioned moulding layer of per two above-mentioned strips; Extend along second direction in each above-mentioned second rectangular district, and perpendicular to each above-mentioned first rectangular district; Each above-mentioned second rectangular district is formed with at the place of reporting to the leadship after accomplishing a task with each above-mentioned strip electrode and disconnects the district, to expose above-mentioned moulding layer;

Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form the barrier rib of above-mentioned square grid shape; Wherein, still residual in each above-mentioned disconnection district have an above-mentioned moulding floor.

12. plasma display manufacture method as claimed in claim 11, wherein, the making of above-mentioned moulding layer in the mode of whole printing, is printed the multilayer slurry on above-mentioned overlayer, finish through baking.

13. plasma display manufacture method as claimed in claim 3, its step also comprises the manufacture method of following this square grid shape barrier rib, comprising:

One substrate is provided; Wherein, how long aforesaid substrate is provided with strip shaped electric poles, and each above-mentioned strip electrode is parallel to a first direction;

On above-mentioned strip electrode and aforesaid substrate, form overlayer;

On above-mentioned overlayer, form moulding layer;

The sensitization that forms square grid shape on above-mentioned moulding layer limits layer; Wherein, above-mentioned sensitization limits floor and comprises a plurality of first rectangular district, and a plurality of second rectangular district; Each above-mentioned first rectangular district is positioned on the interelectrode above-mentioned moulding floor of per two above-mentioned strips, and is parallel to above-mentioned first direction; Each above-mentioned second rectangular district is parallel to a second direction, and perpendicular to above-mentioned first direction; The height in the above-mentioned first rectangular district is greater than the height in the above-mentioned second rectangular district;

The above-mentioned sensitization that exposes limits layer, limits layer shade and form on above-mentioned moulding layer;

Carry out grit blast procedure, remove and to be exposed to the outer moulding layer of above-mentioned qualification shade, exposing above-mentioned overlayer, and form the barrier rib of above-mentioned square grid shape.

14. plasma display manufacture method as claimed in claim 13, wherein, above-mentioned sensitization limits the material of layer, is to be mixed and constituted by photoactive substance and slurry.

15. plasma display manufacture method as claimed in claim 13, wherein, the making step that above-mentioned sensitization limits layer comprises: use screen painting earlier, first sensitization of printing the square grid shape of multilayer on above-mentioned moulding layer limits layer; Re-use screen painting, limit second sensitization of printing strip on the layer along above-mentioned first direction in above-mentioned first sensitization and limit layer.

16. plasma display manufacture method as claimed in claim 13, wherein, the making step that above-mentioned sensitization limits layer comprises: use screen painting, second sensitization of printing the multilayer strip along above-mentioned first direction on above-mentioned moulding layer limits layer; Re-use screen painting, first sensitization that limits the square grid shape of printing multilayer on the layer in above-mentioned second sensitization limits layer.

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