CN107960008A - A kind of integrated circuit plate - Google Patents
A kind of integrated circuit plate Download PDFInfo
- Publication number
- CN107960008A CN107960008A CN201711424428.9A CN201711424428A CN107960008A CN 107960008 A CN107960008 A CN 107960008A CN 201711424428 A CN201711424428 A CN 201711424428A CN 107960008 A CN107960008 A CN 107960008A
- Authority
- CN
- China
- Prior art keywords
- integrated circuit
- circuit plate
- insulating layer
- layer
- gas sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- 239000011435 rock Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 19
- 230000005611 electricity Effects 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 3
- 229920002521 macromolecule Polymers 0.000 claims description 2
- 239000011888 foil Substances 0.000 claims 1
- 239000003990 capacitor Substances 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 53
- 230000035945 sensitivity Effects 0.000 description 13
- 239000012491 analyte Substances 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 230000008859 change Effects 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005236 sound signal Effects 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0272—Adaptations for fluid transport, e.g. channels, holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/183—Components mounted in and supported by recessed areas of the printed circuit board
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10151—Sensor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
Description
Claims (10)
- A kind of 1. integrated circuit plate, it is characterised in that including:Pcb board, it has a groove body;Metal layer, it is formed in the bottom surface of the groove body;Insulating layer, it is formed in the upper surface of the metal layer;Array gas sensor, it is formed in the upper surface of the insulating layer, and is arranged in the insulating layer in array fashion Upper surface at;Conductive contact, it is arranged on the metal layer, and extends to the upper surface of the insulating layer, by the array gas Sensor is connected with external circuit;The air gap on the array gas sensor top is formed in, it is that sacrifice layer on the array gas sensor top is gone Except what is formed afterwards;The support column being formed in the air gap;WithMetallic cover layer, it is formed in the top of the support column, and has at least one venthole at the cap rock, for inciting somebody to action Gas is introduced in the air gap, and then is contacted with the array gas sensor;Wherein, the insulating layer conformation is small into U shape, including bottom wall and side wall, the thickness of the bottom wall of the insulating layer The thickness of any side wall in two side surfaces of the insulating layer.
- 2. integrated circuit plate according to claim 1, it is characterised in that the metal layer and the metallic cover layer are as electricity Two electrodes of container.
- 3. integrated circuit plate according to claim 1, it is characterised in that the integrated circuit plate further includes:First conducting wire, its one end are in contact with the conductive contact, and the other end is connected with the external circuit;Wherein, first conducting wire, which buries, overlays in the side wall of the insulating layer.
- 4. integrated circuit plate according to claim 1, it is characterised in that the integrated circuit plate further includes:Second conducting wire, its one end are in contact with the metallic cover layer, and the other end is connected with the external circuit;Wherein, second conducting wire, which buries, overlays in the side wall of the insulating layer.
- 5. according to the integrated circuit plate any one of claim 1-4, it is characterised in that the metal layer is metal foil Film, the thickness of the metallic film is 100-1000nm.
- 6. integrated circuit plate according to claim 5, it is characterised in that the support column is insulator.
- 7. integrated circuit plate according to claim 6, it is characterised in that the metallic cover layer be arranged to just with the groove Planes align where the mouth of body.
- 8. according to the integrated circuit plate any one of claim 1-4, it is characterised in that the material of the insulating layer is soft Property high molecular material, the material of the metallic cover layer is flexible macromolecule.
- 9. integrated circuit plate according to claim 8, it is characterised in that the thickness of the air gap is greater than or equal to described exhausted 1-2 times of the sum of the thickness of edge layer and the metallic cover layer.
- 10. integrated circuit plate according to claim 8, it is characterised in that the array gas sensor is circular array Or square array.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711424428.9A CN107960008B (en) | 2017-12-25 | 2017-12-25 | Integrated circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711424428.9A CN107960008B (en) | 2017-12-25 | 2017-12-25 | Integrated circuit board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107960008A true CN107960008A (en) | 2018-04-24 |
| CN107960008B CN107960008B (en) | 2020-06-12 |
Family
ID=61956958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711424428.9A Expired - Fee Related CN107960008B (en) | 2017-12-25 | 2017-12-25 | Integrated circuit board |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107960008B (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19544303A1 (en) * | 1994-11-29 | 1997-06-05 | Martin Hausner | Device and method for controlling the selectivity of gas-sensitive chemical compounds via external potentials |
| US20020027086A1 (en) * | 2000-05-13 | 2002-03-07 | Saffell John R. | Electrochemical sensor for determining analyte in the presence of interferent |
| CN101825511A (en) * | 2010-05-04 | 2010-09-08 | 电子科技大学 | Minitype capacitance type gas sensor and preparation method thereof |
| CN204681590U (en) * | 2015-05-29 | 2015-09-30 | 歌尔声学股份有限公司 | MEMS microphone, pressure sensor integrated morphology |
| CN105264365A (en) * | 2013-01-11 | 2016-01-20 | 精量电子(法国)公司 | Capacitive sensor integrated onto semiconductor circuit |
| US20160209344A1 (en) * | 2015-01-15 | 2016-07-21 | Samsung Electro-Mechanics Co., Ltd. | Complex sensor and method of manufacturing the same |
| CN106365105A (en) * | 2016-09-24 | 2017-02-01 | 苏州捷研芯纳米科技有限公司 | MEMS technology based gas sensor package and batch processing method thereof |
| CN206033221U (en) * | 2016-09-24 | 2017-03-22 | 苏州捷研芯纳米科技有限公司 | Gas sensor packaging part based on MEMS technique |
| WO2017055806A1 (en) * | 2015-09-30 | 2017-04-06 | Cambridge Cmos Sensors Limited | Gas sensor with a gas permeable region |
| CN206362480U (en) * | 2016-12-20 | 2017-07-28 | 歌尔科技有限公司 | A kind of integrating device and encapsulating structure of pressure sensor and gas sensor |
-
2017
- 2017-12-25 CN CN201711424428.9A patent/CN107960008B/en not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19544303A1 (en) * | 1994-11-29 | 1997-06-05 | Martin Hausner | Device and method for controlling the selectivity of gas-sensitive chemical compounds via external potentials |
| US20020027086A1 (en) * | 2000-05-13 | 2002-03-07 | Saffell John R. | Electrochemical sensor for determining analyte in the presence of interferent |
| CN101825511A (en) * | 2010-05-04 | 2010-09-08 | 电子科技大学 | Minitype capacitance type gas sensor and preparation method thereof |
| CN105264365A (en) * | 2013-01-11 | 2016-01-20 | 精量电子(法国)公司 | Capacitive sensor integrated onto semiconductor circuit |
| US20160209344A1 (en) * | 2015-01-15 | 2016-07-21 | Samsung Electro-Mechanics Co., Ltd. | Complex sensor and method of manufacturing the same |
| CN204681590U (en) * | 2015-05-29 | 2015-09-30 | 歌尔声学股份有限公司 | MEMS microphone, pressure sensor integrated morphology |
| WO2017055806A1 (en) * | 2015-09-30 | 2017-04-06 | Cambridge Cmos Sensors Limited | Gas sensor with a gas permeable region |
| CN106365105A (en) * | 2016-09-24 | 2017-02-01 | 苏州捷研芯纳米科技有限公司 | MEMS technology based gas sensor package and batch processing method thereof |
| CN206033221U (en) * | 2016-09-24 | 2017-03-22 | 苏州捷研芯纳米科技有限公司 | Gas sensor packaging part based on MEMS technique |
| CN206362480U (en) * | 2016-12-20 | 2017-07-28 | 歌尔科技有限公司 | A kind of integrating device and encapsulating structure of pressure sensor and gas sensor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107960008B (en) | 2020-06-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20190626 Address after: 610000 Xinzhai Village, Jinniu Town, Wusheng County, Guang'an City, Sichuan Province, 2 Groups 36 Applicant after: Gao Kexin Address before: 528000 No. 107 Yucai Road, Southwest Street, Sanshui District, Foshan City, Guangdong Province Applicant before: Foshan carpenter carpenter automobile articles Co., Ltd. |
|
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20200520 Address after: 186 Xindu East Avenue, Jinchuan street, Changshan County, Quzhou City, Zhejiang Province 324000 Applicant after: Zhejiang Changshan Juhua Electronic Co., Ltd Address before: 610000 Xinzhai Village, Jinniu Town, Wusheng County, Guang'an City, Sichuan Province, 2 Groups 36 Applicant before: Gao Kexin |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200612 Termination date: 20201225 |