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CN106806256A - A kind of after-sun restorative mask - Google Patents

A kind of after-sun restorative mask Download PDF

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Publication number
CN106806256A
CN106806256A CN201710075604.6A CN201710075604A CN106806256A CN 106806256 A CN106806256 A CN 106806256A CN 201710075604 A CN201710075604 A CN 201710075604A CN 106806256 A CN106806256 A CN 106806256A
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CN
China
Prior art keywords
mask
sun restorative
sun
fiber
restorative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710075604.6A
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Chinese (zh)
Inventor
黄云薇
其他发明人请求不公开姓名
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Jiangxi Dengyun health beauty industry Internet Ltd.
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Foshan Qianru Cosmetics Co Ltd
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Priority to CN201710075604.6A priority Critical patent/CN106806256A/en
Publication of CN106806256A publication Critical patent/CN106806256A/en
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/97Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/02Cosmetics or similar toiletry preparations characterised by special physical form
    • A61K8/0212Face masks
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/34Alcohols
    • A61K8/345Alcohols containing more than one hydroxy group
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/004Aftersun preparations

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Biotechnology (AREA)
  • Botany (AREA)
  • Microbiology (AREA)
  • Mycology (AREA)
  • Dermatology (AREA)
  • Emergency Medicine (AREA)
  • Cosmetics (AREA)

Abstract

The invention discloses a kind of after-sun restorative mask, described after-sun restorative mask is included:(1)Mask substrate;And facial mask essence, the facial mask essence includes:(a)Water-soluble thickener;With(b)The NMF of 0.1wt% 20wt%, the NMF includes polyalcohol, tremella polysaccharides;With(c)The after-sun restorative composition of 0.1wt% 10wt%, the after-sun restorative composition includes sweet mary/leaf/stem water, beta glucan, European horse-chestnut seed extract;With(d)Aqueous carrier.Described after-sun restorative mask have it is refrigerant, calm, promote collagen and elastin laminin increases in skin, antioedematous, it is impervious go out, protection blood vessel the effects such as, burning heat sensation that the maintenance that can effectively releive sunburn causes, red, swell phenomenon.

Description

A kind of after-sun restorative mask
Technical field
The invention belongs to cosmetic field, a kind of after-sun restorative mask is specifically related to.
Background technology
In recent years, with the improvement of living standards, people possess more conditions and enjoy life, and sunlight seabeach, clear water are blue Its object chased as everybody.Direct sunlight carrys out the bad phenomenons such as photosensitized reaction, pigment disorder to the skin tape of people, sun-proof Product turns into the necessity of outdoor activities.But sunscreen product is in the presence of itself photostability is poor, water resistant ability is weak, guard time is short The deficiency such as need to smear repeatedly, cause sunburn to happen occasionally, after-sun restorative turns into the problem of market urgent need to resolve.
Under this trend, after-sun restorative facial mask turns into market favorite.As Chinese patent ZL201310495655.6 is disclosed A kind of Post-basking repairing mask, the facial mask includes lemon juice, pearl tomato, Celery Juice, radix polygonati officinalis extract solution, honey ultrafine powder And flour, declare containing substantial amounts of VA, VC and VE, effectively moisturizing, water lock, suppression melanin can be formed, repair epidermal cell Post-basking repairing mask.As Chinese patent application CN201610434921.8 discloses a kind of Post-basking repairing mask, contain sophora flower Extract solution, scutellaria extract solution, dried orange peel extract solution, angelica extract, honey, lemon juice, the red sage root, evodia rutaecarpa, pearl powder, sea-buckthorn Oil, sodium dehydroacetate, declare with good after-sun effect and have no toxic side effect, moreover it is possible to be that skin and hair provide nutrition With the skin that compacts, and acted on certain ultra-violet radiation resisting.
But, inventor has found that the research object of the mask that prior art is provided is generally facial mask essence, does not account for The interaction of facial mask essence and its carrier mask substrate, in fact, mask substrate is to the adsorption capacity of Essence, ventilative The factors such as the affinity of property and skin have material impact to the use feeling and effect of mask.Based on this, the invention provides A kind of after-sun restorative mask unlike the prior art, the after-sun restorative mask is constituted and facial mask base to the formula of Essence Cloth is optimized selection, with more preferably use feeling and after-sun restorative effect, so as to complete the present invention.
The content of the invention
Based on this, present invention aim at a kind of mask with after-sun restorative effect of offer.Above-mentioned technology is solved to ask The technical scheme of topic is as follows:
A kind of after-sun restorative mask, the mask is included:
(1) mask substrate;With
(2) facial mask essence, the facial mask essence includes:
A () water-soluble thickener, the thickener makes the facial mask essence have gluing for 1mPas to 10000mPas Degree;With
B the NMF of () 0.1wt%-20wt%, the NMF includes polyalcohol, white fungus (TREMELLA FUCIFORMIS) polysaccharide;With
C the after-sun restorative composition of () 0.1wt%-10wt%, the after-sun restorative composition includes sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water, beta glucan, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract;With
(d) aqueous carrier.
Wherein in some embodiments, after-sun restorative composition of the present invention also includes grape (VITIS VINIFERA) seed extract, aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract.
Preferably, the filmogen of mask substrate of the present invention can be hydrogel, biological fiber, silk fiber, angle egg White fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, pearl fiber, viscose fiber, CUP, Modal fibre, shell Glycan fiber, alginate fibre, terylene/viscose fiber, one or more mixing of wood pulp/viscose fiber.Wherein one In a little embodiments, the filmogen of described mask substrate is biological fiber.
Preferably, water-soluble thickener of the present invention can be reversion emulsifying agent, xanthans, hydroxyethyl cellulose, card Ripple nurse, Carbomer sodium, acrylic acid (ester) analog copolymer, polyvinylpyrrolidone, Magnesiumaluminumsilicate, mosanom, acrylic acid (ester) class/ C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, the grafting of polyacrylate cross-linked polymer -6, Sodium Polyacrylate Starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, AVC, acrylic acid (ester) Class/the methacrylate copolymer of docosyl alcohol polyethers -25, Sodium Polyacrylate, gellan gum, pectin, Sodium Hyaluronate, polyglutamic acid Sodium, carragheen, locust bean gum, dehydroxanthan, hydrolysis pyrenomycetes (SCLEROTIUM ROLFSSII) glue, pyrenomycetes (SCLEROTIUM ROLFSSII) glue, white fungus (TREMELLA FUCIFORMIS) fruiting body extract, Chondrus crispus One or more the mixing of (CHONDRUS CRISPUS) powder.Wherein in some embodiments, described water-soluble increasing Thick dose be dehydroxanthan and hydroxyethyl cellulose mixture, described dehydroxanthan and the quality of hydroxyethyl cellulose it Than being (1-10):(1-10).
Preferably, polyalcohol of the present invention can be glycerine, 1,3-PD, 1,2-PD, butanediol, double third sweet Alcohol, glycerin polyether -26, sorb (sugar) alcohol, diglycerol, 1,2- pentanediols, PEG-8, polyethylene glycol -32, Natrulon H-10, Polyglycereol -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, ethanol, pungent glycol one or more Mixing.Wherein in some embodiments, described polyalcohol is glycerine, the mixing of polyglycereol -8, described glycerine, polyglycereol -8 Mass ratio be (1-10):(1-10).
Prior art is compared, the invention has the advantages that:1st, the after-sun restorative mask that the present invention is provided contains Polyalcohol, white fungus (TREMELLA FUCIFORMIS) polysaccharide, can keep the moisture of skin appropriateness, lift skin gloss Sense, and performance to after-sun restorative effect has booster action;The after-sun restorative composition for containing includes sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water, beta glucan, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract, tool Have it is refrigerant, calm, promote collagen and elastin laminin increases in skin, antioedematous, it is impervious go out, the effects such as protect blood vessel, can Burning heat sensation, red, swollen phenomenon that maintenance sunburn of effectively releiving causes.2nd, the after-sun restorative mask that the present invention is provided is to Essence Formula composition is optimized selection with mask substrate, with more preferably use feeling and skin-care effect;3rd, the present invention is provided Mask simple production process, the device simple for being used, it is easy to accomplish large-scale industrial production.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, embodiment of the present invention will be made into one below Step ground is described in detail, but embodiments of the present invention not limited to this, for especially not dated technological parameter or condition, be can refer to Routine techniques is carried out.
Heretofore described " wt% " is the meaning of percentage by weight.
Mask of the present invention is one kind of facial mask, is as base with inert matter (synthesis or natural flake fibre object) Body, coordinates the mask product of corresponding shin moisturizer infiltration, is overlying on human skin, taken off after a period of time from, clean or retain, Play the product of colonization or cleaning action.
After-sun restorative mask of the invention includes mask substrate, and mask substrate adsorbs facial mask essence as medium, can To be fixed on face's ad-hoc location, confining bed is formed, promote the absorption of Essence.Mask substrate to the adsorption capacity of Essence, The factors such as the affinity of gas permeability and skin have material impact to the use feeling and effect of mask.The film forming of mask substrate Material can be hydrogel, biological fiber, silk fiber, keratin fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, treasure Pearl fiber, viscose fiber, CUP, Modal fibre, chitin fiber, alginate fibre, terylene/viscose fiber, wood pulp/glue One or more mixing of viscous fiber.
CUP of the present invention, a kind of regenerated celulose fibre, it is by natural cellulosic feedstocks such as cotton linters It is dissolved in the liquor ammoniae fortis of Kocide SD or alkaline cupric salt, is made into spinning solution, the CUP element molecular chemistry in coagulating bath Thing disintegrating and regeneration goes out cellulose, and the hydrate cellulose of generation is to obtain CUP through post-processing.CUP it is dry by force with it is glutinous Glue fiber is approached, but wet is higher than by force viscose fiber, and wearability is also soft with fiber also superior to viscose rayon, and gloss is suitable, inhales It is moist good, the characteristics of performance is similar to silk.
Chitin fiber of the present invention, is, with shitosan as primary raw material, to be dissolved in appropriate solvent, is matched somebody with somebody Certain density colloid spinning solution is made, then through techniques such as spinneret, solidification forming, stretchings, is prepared into strong with certain machinery The high molecular functional material of degree.Shitosan as lower animal organize in fibre composition, from macromolecular structure, it Both similar in appearance to the cellulosic structure in plant tissue and similar with collagen structures in higher mammal tissue, therefore shell Glycan fiber has good biocompatibility.Further, chitin fiber has broad spectrum antibacterial.Proposed from Allan in 1979 Since the antibiotic property of shitosan, its antibiotic property and Antibacterial Mechanism are always the focus of domestic and foreign scholars research, although to its antibacterial Mechanism is still disputable, but its anti-microbial property has been an admitted facts.
Biological fiber of the present invention is the micro organism cellulose that acetobacter xylinum spontaneous fermentation is produced, with excellent docile Water holding capacity, bio-compatible is good, non-stimulated.
Bamboo-carbon fibre facial mask of the present invention is to take mao bamboon for raw material, and forging for time delay is intercepted using pure oxygen high temperature and nitrogen Burn new technology and new technology so that the micropore that bamboo charcoal innately has more refine with honeycomb, then again with cellular micropore Structure trend polyester modification section melt spinning and be made.
After-sun restorative mask of the invention includes water-soluble thickener.Water-soluble thickener of the invention is water miscible Or the polymer being dispersed in water can be mixed with water.They can improve the viscosity of composition, and enable facial mask essence preferably It is attracted on mask substrate.
Water-soluble thickener of the invention includes anionic polymer and non-ionic polymers, can be reversion emulsification Agent, xanthans, hydroxyethyl cellulose, Carbomer, Carbomer sodium, acrylic acid (ester) analog copolymer, polyvinylpyrrolidone, silicic acid Magnalium, mosanom, acrylic acid (ester) class/C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, polyacrylate are handed over Linked polymer -6, Sodium Polyacrylate graft starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, acryloyldimethyl ox sulphur Sour ammonium/VP copolymers, acrylic acid (ester) class/methacrylate copolymer of docosyl alcohol polyethers -25, Sodium Polyacrylate, gellan gum, Pectin, polyglutamic acid sodium, carragheen, locust bean gum, hydrolysis pyrenomycetes (SCLEROTIUM ROLFSSII) glue, pyrenomycetes One or more the mixing of (SCLEROTIUM ROLFSSII) glue, Chondrus crispus (CHONDRUS CRISPUS) powder.
Water-soluble thickener is chosen such that the viscosity so that needed for the fluid composition of the present composition, required Viscosity be for about 1mPas to about 10000mPas, preferably from about 100mPas is more preferably from about for about to about 1000mPas 300mPas to about 700mPas.In terms of the weight of facial mask essence, the amount of water-soluble thickener is preferably from about 0.05wt% To about 1wt%, or even further preferably it is for about 0.2wt% to about 0.5wt%.
Reversion emulsifying agent of the present invention, is the pre-neutralized good polymer of a class (such as Sodium Polyacrylate, polyacrylamide Amine, hydroxy-ethyl acrylate/sodium acryloyldimethyl taurate copolymers, acrylamide/ammonium acrylate copolymer), it is present in In the emulsion of reversion, it is in a liquid state, meets water and invert immediately, derivatized polymers expand rapidly, quickly forms a kind of the solidifying of stabilization Glue.As LASERSON companies GELINNOV products, consisting of:Sodium Polyacrylate, C18-21 alkane, trideceth -6; The SIMULGEL EG products of SEPPIC companies, consisting of:PAA/sodium acryloyldimethyl taurate copolymers, different ten Six alkane, Polyoxyethylene Sorbitan Monooleate;The SIMULGEL NS products of SEPPIC companies, consisting of:Hydroxy-ethyl acrylate/acryloyl two N-methyltaurine sodium copolymer, saualane, polysorbate -60;The products of SEPIPLUS 265 of SEPPIC companies, its composition For:Acrylamide/ammonium acrylate copolymer, polyisobutene, polysorbate -20;The SEPIPLUS 400 of SEPPIC companies is produced Product, consisting of:Polyacrylate -13, polyisobutene, polysorbate -20;The SIMULGEL INS 100 of SEPPIC companies Product, consisting of:Hydroxy-ethyl acrylate/sodium acryloyldimethyl taurate copolymers, isohexadecane, polysorbate -60.
After-sun restorative mask of the invention includes NMF, and described NMF includes polyalcohol, white fungus (TREMELLA FUCIFORMIS) polysaccharide.NMF is chosen such that so that mask of the present invention has good moistening effect, the guarantor The amount of humectant is for about 0.1wt% to about 20wt%, preferably from about 10wt% to about 15wt%.
Polyalcohol of the present invention can be glycerine, 1,3- propane diols, 1,2- propane diols, butanediol, dipropylene glycol, sweet It is oily polyethers -26, sorb (sugar) alcohol, diglycerol, 1,2- pentanediols, PEG-8, polyethylene glycol -32, Natrulon H-10, poly- sweet Oil -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, ethanol, one or more mixed of pungent glycol Close.
White fungus (TREMELLA FUCIFORMIS) polysaccharide of the present invention, with fungi plant white fungus as raw material, passes through Modern crafts Hydrolysis kinetics are formed, and are described as " plant hyaluronic acid ".Its main active is α-mannosan, through studying table It is bright, substantial amounts of hydroxyl is contained in polysaccharide molecule, carboxyl isopolarity group makes it have unique and lasting smooth skin sense and pole Strong water lock moisture-keeping efficacy.Meanwhile, white fungus mannosan has good enhancing cutaneous immunisation and anti-oxidation efficacy, thin to improving Born of the same parents' vigor has remarkable result.
After-sun restorative mask of the invention includes after-sun restorative composition, and the after-sun restorative composition includes sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water, beta glucan, grape (VITIS VINIFERA) seed extract.Repaiied after solarization Shield composition is chosen such that so that mask of the present invention has good after-sun restorative effect, required after-sun restorative combination The amount of thing is for about 0.1wt% to about 10wt%, preferably from about 1wt% to about 5wt%.
Sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water of the present invention, is extracted by sweet mary and is obtained, With it is refrigerant, calm, calm the nerves the effect of.
Beta glucan of the present invention, a kind of polysaccharide being widely present in microorganism, gill fungus and higher plant, its structure Stabilization is biological strong.Divided by its source, it can be divided into yeast dextran, oat beta-glucan, the poly- pool in highland barley Portugal, ganoderma lucidum again The species such as mushroom glucan.Beta glucan by the Receptor recognition on immunocompetent cell film and can activate immunocompetent cell, EGF (EGF) can also be increased, promote collagen and elastin laminin increase in skin, so as to improve outside skin See.
European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract of the present invention, carries from horse chestnut seed Take prepared, main active is Aescin, it be play antioedematous, it is impervious go out, protection blood vessel the effects such as main component.
Grape (VITIS VINIFERA) seed extract of the present invention, the effective active extracted from natural grape seed Nutrition, can effectively remove free radical unnecessary in human body, with anti-oxidant and strengthen immunity effect.
Aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract of the present invention, water white transparency to brown is slightly The liquid of stickiness, the anthraquinone analog compound and polysaccharide of aloe have makes the performance of skin contraction, softness, moisturizing, anti-inflammatory.
After-sun restorative mask of the invention includes aqueous carrier, and aqueous carrier is mainly water, can also comprising whitening agent, Other conditioners to skin beneficiating such as anti-sensitizer, can also containing pH value conditioning agent, preservative, essence and flavoring agent, stabilizer etc. into Point, so that mask produces optimal using effect.PH value conditioning agent has triethanolamine, citric acid, NaOH, hydroxide Potassium, sodium citrate, lactic acid, sodium lactate etc.;Stabilizer has EDETATE SODIUM, sodium pyrosulfite, cyclodextrin etc.;Preservative has oxybenzene first Ester, ethyl hydroxy benzoate, Phenoxyethanol, methylisothiazolinone etc..
Embodiment 1-5
A kind of after-sun restorative mask, each component containing following weight/mass percentage composition:
The preparation technology of embodiment 1-5:To addition water, white fungus (TREMELLA FUCIFORMIS) polysaccharide, hydroxyl in agitated kettle Ethyl cellulose, methyl hydroxybenzoate, EDETATE SODIUM, dipotassium glycyrrhizinate, stir;Then dehydroxanthan is dispersed in polyalcohol In (glycerine, polyglycereol -8), put into agitated kettle;It is heated to 85 DEG C, homogeneous 3 minutes, the lower insulation of stirring 30 minutes;Cool to 48 DEG C, sequentially add Phenoxyethanol, after-sun restorative composition (such as:Sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water, Beta glucan, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract, grape (VITIS VINIFERA) seed are carried Take thing, aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract), stir, 35 DEG C of dischargings;After the assay was approved, pass through Facial mask essence is poured into and is pre-loaded with the facial mask of mask substrate bag by bottle placer.
Comparative example 1-5
A kind of after-sun restorative mask, each component containing following weight/mass percentage composition:
The preparation technology of comparative example 1-5:To addition water, white fungus (TREMELLA FUCIFORMIS) polysaccharide, hydroxyl in agitated kettle Ethyl cellulose, methyl hydroxybenzoate, EDETATE SODIUM, dipotassium glycyrrhizinate, stir;Then dehydroxanthan is dispersed in polyalcohol In (glycerine, polyglycereol -8), put into agitated kettle;It is heated to 85 DEG C, homogeneous 3 minutes, the lower insulation of stirring 30 minutes;Cool to 48 DEG C, sequentially add Phenoxyethanol, after-sun restorative composition (such as:Sweet mary (MELISSA OFFICINALIS) flower/leaf/stem water, Beta glucan, European horse-chestnut (AESCULUS HIPPOCASTANUM) seed extract, grape (VITIS VINIFERA) seed are carried Take thing, aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract), stir, 35 DEG C of dischargings;After the assay was approved, pass through Facial mask essence is poured into and is pre-loaded with the facial mask of mask substrate bag by bottle placer.
Embodiment 6
Efficacy assessments are carried out to the after-sun restorative mask of embodiment 1-5 and comparative example 1-6, and (comparative example 6 is a commercially available After-sun restorative mask).Specific method of testing is as follows:Each experimental group chooses 10 volunteers, age 20-50 Sui, exists , there is skin burns sense, red, swollen phenomenon in sunburn;Application method:Apply and thrown off after 15 minutes on the face, clean, 1 evening 1 time, continuously It is on probation 3 days, mug.Evaluation method:(1) effect:Contrast the 0th day and the 3rd day photo and inquire the use feeling of volunteer, its Middle skin burns sense, it is red, swollen be eliminated for effective;Skin burns sense, it is red, swollen be eased for effective;Skin problem It is invalid without improvement;(2) use feeling:More than 80% people is very soft when feeling face on facial mask, pastes skin, breathe freely, have tight Sense is caused, is then chosen as " +++ ", 60%-80% is then chosen as " ++ ", less than 60% is chosen as "+".Specific test result such as table 1.
The after-sun restorative mask test recording table of table 1
Show that the result of table 1 is visible by contrast experiment:
1st, effect aspect:Embodiment 1-5 contrasts visible with comparative example 6, after-sun restorative mask tool provided by the present invention There is good after-sun restorative effect;Embodiment 3 contrasts visible with embodiment 1-2, grape (VITIS VINIFERA) seed extract, The addition of aloe barbadensis Miller (ALOE BARBADENSIS) leaf extract has after-sun restorative castering action;Embodiment 4 and embodiment 3rd, embodiment 5 contrasts visible, and with the lifting of the addition of after-sun restorative composition, effect is lifted therewith, and using biological fine The best results during mask substrate of dimension, illustrate the mask substrate of biological fiber has promotion to the efficacy exertion of after-sun restorative composition Effect;Embodiment 4 contrasts visible with comparative example 1-3, and each raw material of after-sun restorative composition is better when sharing, after illustrating to shine There is synergistic function between each composition of maintenance composition;Embodiment 4 contrasts visible with comparative example 4, and the addition of tremella polysaccharides is right The performance of after-sun restorative effect has facilitation, illustrates that the selection of NMF also produces booster action to after-sun restorative effect.
2nd, use feeling aspect:Embodiment 4 contrasts visible with embodiment 1-3, embodiment 5, the materials'use life of mask substrate Use feeling is optimal during fibres;Embodiment 4 contrasts visible with comparative example 4, and the addition of tremella polysaccharides has rush to the use feeling of facial mask Enter effect;Embodiment 4 contrasts visible with comparative example 5, and water-soluble thickener hydroxyethyl cellulose, dehydroxanthan are used when sharing Sense gets a promotion.
The above, is only presently preferred embodiments of the present invention, and any formal limitation is not done to the present invention, therefore All contents without departing from technical solution of the present invention, any simply repair according to technical spirit of the invention to made for any of the above embodiments Change, equivalent variations and modification, still fall within the range of technical solution of the present invention.

Claims (10)

1. a kind of after-sun restorative mask, it is characterised in that described after-sun restorative mask is included:
(1)Mask substrate;With
(2)Facial mask essence, the facial mask essence includes:
(a)Water-soluble thickener, the thickener makes the facial mask essence have the viscosity of 1mPas to 10000mPas;With
(b)The NMF of 0.1wt%-20wt%, the NMF includes polyalcohol, white fungus(TREMELLA FUCIFORMIS)Polysaccharide; With
(c)The after-sun restorative composition of 0.1wt%-10wt%, the after-sun restorative composition includes sweet mary(MELISSA OFFICINALIS)Flower/leaf/stem water, beta glucan, European horse-chestnut(AESCULUS HIPPOCASTANUM)Seed extract;With
(d)Aqueous carrier.
2. after-sun restorative mask according to claim 1, it is characterised in that the after-sun restorative composition also includes Portugal Grape(VITIS VINIFERA)Seed extract, aloe barbadensis Miller(ALOE BARBADENSIS)Leaf extract.
3. after-sun restorative mask according to claim 1 and 2, it is characterised in that the filmogen of the mask substrate It is hydrogel, biological fiber, silk fiber, keratin fiber, cotton fiber, wood fibre, bamboo-carbon fibre, silk, pearl fiber, glue Viscous fiber, CUP, Modal fibre, chitin fiber, alginate fibre, terylene/viscose fiber, wood pulp/viscose fiber One or more mixing.
4. after-sun restorative mask according to claim 3, it is characterised in that the filmogen of described mask substrate is Biological fiber.
5. after-sun restorative mask according to claim 1 and 2, it is characterised in that the water-soluble thickener is reversion Emulsifying agent, xanthans, hydroxyethyl cellulose, Carbomer, Carbomer sodium, acrylic acid(Ester)Analog copolymer, polyvinylpyrrolidone, Magnesiumaluminumsilicate, mosanom, acrylic acid(Ester)Class/C10-30 alkylol acrylamide acid esters cross-linked polymer, sodium metasilicate magnesium lithium, polypropylene Acid esters cross-linked polymer -6, Sodium Polyacrylate graft starch, hydroxypropyl methyl cellulose, polyethylene glycol -90M, acryloyl diformazan Base taurine ammonium/VP copolymers, acrylic acid(Ester)Class/the methacrylate copolymer of docosyl alcohol polyethers -25, polyacrylic acid Sodium, gellan gum, pectin, Sodium Hyaluronate, polyglutamic acid sodium, carragheen, locust bean gum, dehydroxanthan, hydrolysis pyrenomycetes (SCLEROTIUM ROLFSSII)Glue, pyrenomycetes(SCLEROTIUM ROLFSSII)Glue, white fungus(TREMELLA FUCIFORMIS)Fruiting body extract, Chondrus crispus(CHONDRUS CRISPUS)One or more mixing of powder.
6. after-sun restorative mask according to claim 5, it is characterised in that described water-soluble thickener is yellow dehydrogenation The mixture of virgin rubber and hydroxyethyl cellulose, described dehydroxanthan and the mass ratio of hydroxyethyl cellulose are(1-10): (1-10).
7. after-sun restorative mask according to claim 1 and 2, it is characterised in that the addition of the water-soluble thickener Measure as 0.05wt% to 1wt%.
8. after-sun restorative mask according to claim 1 and 2, it is characterised in that the polyalcohol is glycerine, 1,3- third Glycol, 1,2- propane diols, butanediol, dipropylene glycol, glycerin polyether -26, sorb(Sugar)Alcohol, diglycerol, 1,2- pentanediols, poly- second Glycol -8, polyethylene glycol -32, Natrulon H-10, polyglycereol -8,1,2- hexylene glycols, isoprene, PPG-24- glycerin polyethers -24, One or more mixing of ethanol, pungent glycol.
9. after-sun restorative mask according to claim 8, it is characterised in that described polyalcohol be glycerine, polyglycereol- 8 mixing, described glycerine, the mass ratio of polyglycereol -8 are(1-10):(1-10).
10. after-sun restorative mask according to claim 1 and 2, it is characterised in that required after-sun restorative composition adds Dosage is 1wt% to 5wt%.
CN201710075604.6A 2017-02-11 2017-02-11 A kind of after-sun restorative mask Pending CN106806256A (en)

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CN110090167A (en) * 2018-06-26 2019-08-06 浙江立恩生物科技有限公司 Biological polyoses and its application for ultraviolet injury repair
CN110680789A (en) * 2019-11-22 2020-01-14 成都珂萝瑞诗化妆品有限公司 A kind of after-sun repair mask and preparation method thereof
WO2020258219A1 (en) * 2019-06-28 2020-12-30 L'oreal Kit for caring for the skin

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CN102429837A (en) * 2011-12-20 2012-05-02 广州市科能化妆品科研有限公司 A night repairing moisturizing facial mask and preparation method thereof
CN105663020A (en) * 2016-02-19 2016-06-15 天津天狮生物发展有限公司 Spraying water with long-acting moisture-preserving capacity and preparation method thereof
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CN1348758A (en) * 2000-10-17 2002-05-15 上海家化联合股份有限公司 Melatonin containing composite and its application in cosmetics
CN101756835A (en) * 2008-11-24 2010-06-30 范开云 Melissa officinalis skin control cream
CN102429837A (en) * 2011-12-20 2012-05-02 广州市科能化妆品科研有限公司 A night repairing moisturizing facial mask and preparation method thereof
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Publication number Priority date Publication date Assignee Title
CN110090167A (en) * 2018-06-26 2019-08-06 浙江立恩生物科技有限公司 Biological polyoses and its application for ultraviolet injury repair
WO2020258219A1 (en) * 2019-06-28 2020-12-30 L'oreal Kit for caring for the skin
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CN110680789A (en) * 2019-11-22 2020-01-14 成都珂萝瑞诗化妆品有限公司 A kind of after-sun repair mask and preparation method thereof

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