CN104155810B - Mask - Google Patents

Abstract

The invention relates to the technical field of displays, and discloses a mask. The mask comprises an exposure area corresponding to a non-display area of a display device and a test area, the test area is used for mask alignment or observation of the distance between the mask and a substrate, exposure patterns are arranged in the exposure area, the test area is covered with an ultraviolet cutoff filter coating allowing visible light to transmit, and exposure patterns are arranged on the ultraviolet cutoff filter coating. Through the mask, box thickness abnormities of the peripheral positions of a display panel can be decreased, and display effect of the display device is improved.

Description

a mask plate

technical field

The invention relates to the technical field of display preparation, in particular to a mask plate.

Background technique

Thin film transistor liquid crystal display devices are the mainstream of flat panel displays at present. The panel of the thin film transistor liquid crystal display device includes a thin film transistor array substrate and a color filter substrate arranged in parallel, and a liquid crystal layer is arranged between them. In order to control the stability and uniformity of the thickness of the liquid crystal layer, a spacer is arranged between the two substrates thing. At present, columnar spacers are often used in high-performance thin film transistor liquid crystal display devices. When the thin film transistor liquid crystal display device works at high temperature, the liquid crystal molecules will move with the gravitational field, so that the gravitational water ripple phenomenon will appear, which will affect the display quality of the thin film transistor liquid crystal display device. In addition, when the liquid crystal is injected into the liquid crystal layer, if the liquid crystal accumulates too much in the peripheral area, it will cause peripheral water ripples, and in severe cases, a large area of light leakage will occur at the lower end of the thin film transistor liquid crystal display device. By setting the height of the columnar spacers in the peripheral region of the liquid crystal layer to be higher than the height of the columnar spacers in the middle region of the liquid crystal layer, the gravitational water ripple phenomenon and the gravitational water ripple phenomenon can be effectively solved.

In the production process of the thin film transistor liquid crystal display device, columnar spacers can be formed by exposure using a mask. As shown in Figure 1, Figure 1 is a schematic diagram of the mask structure in the prior art. The existing mask is usually made of metal light-shielding material, and the mask generally includes an exposure area corresponding to the non-display area of the display panel. 01 and the test area 02 for aligning or observing the distance between the mask and the substrate. Generally, the exposure area 01 is provided with an exposure pattern 011 that allows ultraviolet light to pass through to form columnar spacers. Because the test area 02 requires Therefore, the part of the mask plate in the prior art corresponding to the test area is generally a gap. The setting of the gap will cause the exposure pattern to be unable to be set in the test area, that is, the part of the substrate corresponding to the test area will not be formed. Spacers, this will lead to abnormal thickness of the box around the display panel and poor display screen.

Contents of the invention

The invention provides a mask plate, which can reduce the occurrence of abnormal box thickness at the peripheral position of the display panel and improve the display effect of the display device.

To achieve the above object, the present invention provides the following technical solutions:

The present invention provides a mask plate, including: an exposure area corresponding to a non-display area of a display device and a test area, the test area is used for aligning the mask plate or observing the distance between the mask plate and the substrate. An exposure pattern is set in the exposure area, and the test area is covered with an ultraviolet cut-off filter film that allows visible light to pass through, and the exposure pattern is set on the ultraviolet cut-off filter film.

The mask plate provided by the present invention can also form a spacer on the part corresponding to the substrate and the test area through the ultraviolet cut-off filter film arranged on the test area and the exposure pattern provided on the ultraviolet cut-off filter film, so as to avoid Abnormal box thickness around the display panel occurs. At the same time, because the UV cut-off filter film can block ultraviolet light and allow visible light to pass through, the UV cut-off filter film can facilitate alignment and observation of the distance between the mask and the substrate.

Therefore, the mask plate provided by the present invention can reduce the occurrence of abnormal cell thickness at the periphery of the display panel and improve the display effect of the display device.

In some optional embodiments, the ultraviolet cutoff filter film is a titanium oxide-cerium oxide film layer.

In some optional embodiments, an ultraviolet absorber or light stabilizer is provided in the ultraviolet cutoff filter film.

In some optional embodiments, the UV absorber or light stabilizer includes: salicylates, benzophenones, benzotriazoles, substituted acrylonitriles, triazines and hindered amines one or more.

In some optional implementation manners, the ultraviolet cutoff filter film is coated on the test area.

In some optional implementation manners, the material of the exposure area is light-shielding metal.

In some optional implementation manners, the exposure pattern is a plurality of holes distributed at intervals.

In some optional embodiments, the mask is a columnar spacer mask.

Description of drawings

FIG. 1 is a schematic structural diagram of a mask plate in the prior art;

FIG. 2 is a schematic structural diagram of a mask plate provided in an embodiment of the present invention.

In the picture:

01-Exposure area 011-Exposure pattern

02-Test area 1-Exposure area

2-Exposure pattern 3-UV cut filter film

detailed description

The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

As shown in FIG. 2, FIG. 2 is a schematic structural diagram of the mask provided in the embodiment of the present invention. The mask provided in the embodiment of the present invention includes: an exposure area 1 and a test area corresponding to the non-display area of the display device, The test area is used for aligning the mask or observing the distance between the mask and the substrate. The exposure area 1 is provided with an exposure pattern 2, and the test area is covered with a UV cut-off filter film 3 that allows visible light to pass through. The exposure pattern 2 is arranged on the filter film 3 .

When preparing the spacer, the material for the preparation of the spacer (usually liquid, commonly used such as PR glue, etc.) is placed on the substrate, the mask is covered on the substrate, and the ultraviolet light is exposed through the mask. Pattern 2 is irradiated on the material for preparing the spacer, so that the material for preparing the spacer in the corresponding area is solidified to form a spacer. In the prior art, in order to facilitate the alignment of the mask plate and the observation of the mask plate and the substrate Generally, there will be a test area on the mask plate. This area needs to be transparent, so the exposure pattern cannot be set in this area. Spacers will not be formed on the corresponding positions of the corresponding substrates. When the box is used, it is easy to cause abnormal box thickness around the display panel.

The mask plate provided by the present invention can also form a spacer on the part corresponding to the substrate and the test area through the ultraviolet cut-off filter film 3 provided on the test area and the exposure pattern 2 provided on the ultraviolet cut-off filter film 3 objects, to avoid the occurrence of abnormal box thickness around the display panel, and at the same time, because the ultraviolet cut filter film 3 can block ultraviolet light and allow visible light to pass through, the ultraviolet cut filter film 3 can facilitate alignment and observation of the mask plate and the substrate distance between.

Therefore, the mask plate provided by the present invention can reduce the occurrence of abnormal cell thickness at the periphery of the display panel and improve the display effect of the display device.

The specific material of the above-mentioned ultraviolet cut-off filter film can be various. In a specific embodiment provided by the present invention, the ultraviolet cut-off filter film is a titanium oxide-cerium oxide film layer.

The UV cut-off filter film in the prior art realizes the method of blocking ultraviolet light, which is generally the method of ultraviolet light absorption, and a UV absorber or light stabilizer is usually provided in the UV cut-off filter film. The ultraviolet absorber or light stabilizer may include one or more of salicylates, benzophenones, benzotriazoles, substituted acrylonitriles, and triazine hindered amines. That is, it can be formed by compounding one or more kinds of materials. Of course, the ultraviolet absorber or light stabilizer can also be formed by compounding other materials, which will not be repeated here.

In a specific implementation manner, the ultraviolet cutoff filter film is coated on the test area. Of course, the UV cut-off filter film can also be covered on the test area by other methods, such as pasting, etc., which will not be repeated here.

Optionally, the material of the exposure area 1 is light-shielding metal. The light-shielding metal can block the passage of ultraviolet light and visible light. Of course, the exposure area 1 can also be made of other light-shielding materials, which will not be repeated here.

The specific shapes of the above-mentioned exposure pattern can be various, for example, circular holes, triangular holes, polygonal holes, etc., which will not be repeated here. In a specific embodiment provided by the present invention, as shown in Figure 2, the exposure The pattern is a plurality of spaced holes.

The above-mentioned mask plate may be any mask plate used in the process of preparing the array substrate or the color filter substrate. In the embodiment of the present invention, the mask plate is a columnar spacer mask plate as an example for illustration. But not limited to the columnar spacer mask.

Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, the present invention also intends to include these modifications and variations.

Claims (8)

1. A mask plate, comprising: an exposure area corresponding to a non-display area of a display device and a test area, the test area is used for alignment of the mask plate or observing the distance between the mask plate and the substrate, the exposure area An exposure pattern is provided in the area, and the feature is that the test area is covered with an ultraviolet cut-off filter film that allows visible light to pass through, and the exposure pattern is provided on the ultraviolet cut-off filter film. 2 . The mask according to claim 1 , wherein the ultraviolet cutoff filter film is a titanium oxide-cerium oxide film layer. 3 . The mask plate according to claim 1 , wherein an ultraviolet absorber or a light stabilizer is disposed in the ultraviolet cutoff filter film. 4 . 4. The mask plate according to claim 3, wherein the ultraviolet absorber or light stabilizer comprises: salicylates, benzophenones, benzotriazoles, substituted acrylonitriles, three One or more of azines and hindered amines. 5 . The mask plate according to claim 1 , wherein the ultraviolet cutoff filter film is coated on the test area. 6 . 6 . The mask plate according to claim 5 , wherein the material of the exposure area is light-shielding metal. 7. The mask plate according to claim 5, wherein the exposure pattern is a plurality of holes distributed at intervals. 8. The mask according to claim 5, wherein the mask is a columnar spacer mask.