CN104166269A - Display substrate, manufacturing method of display substrate and display device - Google Patents

Abstract

The invention discloses a display substrate, a manufacturing method thereof and a display device. The display substrate includes a base substrate and a black matrix and a color matrix pattern formed on the base substrate, a first covering layer is formed between the black matrix and the color matrix pattern, and the black matrix and the color matrix pattern are formed between the black matrix and the color matrix pattern. A second covering layer is formed above the color matrix pattern. In the technical scheme of the present invention, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding the generation of overlapping gaps between the black matrix and the color matrix graphics and the generation of bubbles in the color matrix graphics; the black matrix and the color matrix graphics The first covering layer is formed between the matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, avoiding the larger angle difference between the black matrix and the color matrix graphics caused by the larger the slope angle of the black matrix The problem is that the flatness of the surface of the second covering layer is improved, thereby improving the flatness of the surface of the display substrate.

Description

Display substrate, manufacturing method thereof, and display device

technical field

The invention relates to the field of display technology, in particular to a display substrate, a manufacturing method thereof, and a display device.

Background technique

Liquid crystal display devices are currently the most commonly used flat panel displays, and thin film transistor liquid crystal display devices (Thin Film Transistor Liquid Crystal Display, TFT-LCD for short) are mainstream products in liquid crystal display devices. A liquid crystal display panel is an important component in a liquid crystal display device. The liquid crystal display panel is formed by combining an array substrate and a color filter substrate through a cell-to-cell process, and a liquid crystal layer is filled between the array substrate and the color filter substrate. Fig. 1 is a structural schematic diagram of a color filter substrate in the prior art. As shown in Fig. 1, the color filter substrate includes a base substrate 11, a black matrix 12, a color matrix pattern 13 and a cover layer 14, a black matrix 12 and a color matrix pattern 13 is formed on the base substrate 11, the black matrix 12 is located between the color matrix patterns 13 and the black matrix 12 is located under the color matrix patterns 13, and the cover layer 14 is located on the color matrix patterns 13. Further, a back electrode layer 15 is also formed on the back surface of the base substrate 11 . Wherein, the color matrix pattern 13 may be a red matrix pattern, a green matrix pattern or a blue matrix pattern.

With the improvement of product resolution, the pixel (Pixel) size of the color filter substrate is getting smaller and smaller, resulting in the line width of the black matrix and color matrix graphics becoming thinner and thinner. In order to realize the black matrix and color matrix graphics with fine line width, it is impossible to simply rely on the reduction of the opening size of the mask plate. Usually, in the exposure process, it is realized by reducing the exposure gap (Gap) as much as possible, wherein the exposure gap may be the distance between the lower surface of the mask plate and the upper surface of the photoresist. Taking the black matrix as an example, assuming that the target line width of the black matrix is a, then the black matrix with a<10 μm belongs to the black matrix with thin line width. Figure 2 is a schematic diagram of the slope angle of the black matrix. As shown in Figure 2, when a < 10 μm, the process condition of the exposure pitch ≤ 150 μm is basically required to achieve it, and the slope angle θ of the black matrix formed at this time is usually greater than 70° , the slope angle of the black matrix is larger. With the further refinement of the line width of the black matrix, the exposure pitch needs to be further reduced, and the slope angle of the formed black matrix will continue to increase until the slope angle is increased to 90°.

In the prior art, the large slope angle of the black matrix will cause the following technical problems:

1) Fig. 3 is a schematic diagram of overlapping gaps generated between black matrix and color matrix graphics, and Fig. 4 is a schematic diagram of bubbles generated by color matrix graphics, as shown in Fig. 3 and Fig. 4, on the black matrix 12 that has been made. When the color matrix pattern 13 is produced, overlapping gaps 16 are easily generated between the black matrix 12 and the color matrix pattern 13, and bubbles (Bubble) 17 are formed in the color matrix pattern.

2) As shown in Figure 1, the larger the slope angle of the black matrix, the larger the angular difference between the overlapping area of the black matrix and the color matrix graphics, resulting in poor flatness of the color filter substrate surface.

Contents of the invention

The invention provides a display substrate, its manufacturing method and a display device, which are used to avoid overlapping gaps between black matrix and color matrix graphics and bubbles in the color matrix graphics, and improve the flatness of the display substrate surface.

In order to achieve the above object, the present invention provides a display substrate, including a base substrate and a black matrix and a color matrix pattern formed above the base substrate, a second display is formed between the black matrix and the color matrix pattern A covering layer, a second covering layer is formed above the black matrix and the color matrix pattern.

Optionally, the first covering layer is a flat layer, and the second covering layer is a flat layer.

Optionally, the black matrix is located on the base substrate, the first cover layer is located on the black matrix, the color matrix pattern is located on the first cover layer, and the second an overlay over said color matrix graphic; or

The color matrix pattern is located on the base substrate, the first covering layer is located on the color matrix pattern, the black matrix is located on the first covering layer, and the second covering layer is located on the above the black matrix.

Optionally, if the first covering layer is located on the black matrix, the thickness of the first covering layer is 1.0 μm to 2.0 μm, and the thickness of the black matrix is 0.9 μm to 2.0 μm;

If the first covering layer is located on the color matrix pattern, the thickness of the first covering layer is 1.0 μm to 3.0 μm, and the thickness of the color matrix pattern is 1.0 μm to 3.0 μm.

Optionally, a common electrode layer is further included, and the common electrode layer is formed on the second covering layer.

Optionally, an alignment layer is further included, and the alignment layer is formed above the second covering layer.

To achieve the above object, the present invention provides a display device, comprising the above-mentioned display substrate and an opposite substrate disposed opposite to each other.

To achieve the above object, the present invention provides a method for manufacturing a display substrate, comprising:

forming a black matrix, a color matrix pattern and a first cover layer on the base substrate, the first cover layer is located between the black matrix and the color matrix pattern;

A second covering layer is formed on the black matrix and the color matrix pattern.

Optionally, forming the black matrix, the color matrix pattern and the first covering layer on the base substrate includes:

forming the black matrix on the base substrate;

forming the first covering layer on the black matrix;

forming a color matrix pattern on the first covering layer;

Said forming a second covering layer above said black matrix and said color matrix graphics comprises:

The second covering layer is formed on the color matrix pattern.

Optionally, the forming the first cover layer on the black matrix includes:

The first covering layer is formed on the black matrix through a full surface coating process.

The present invention has the following beneficial effects:

In the technical scheme of the display substrate and its manufacturing method and display device provided by the present invention, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and the Bubbles are generated in the color matrix graphics; the first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the black matrix and the color matrix caused by the larger slope angle of the black matrix. The larger the angular segment difference of the overlapping area of the graphics improves the flatness of the surface of the second covering layer, thereby improving the flatness of the surface of the display substrate.

Description of drawings

FIG. 1 is a schematic structural diagram of a color filter substrate in the prior art;

Fig. 2 is a schematic diagram of the slope angle of the black matrix;

Fig. 3 is a schematic diagram of overlapping gaps generated between black matrix and color matrix graphics;

Fig. 4 is the schematic diagram that color matrix figure produces bubble;

FIG. 5 is a schematic structural diagram of a display substrate provided by Embodiment 1 of the present invention;

Fig. 6 is a sectional view along A-A in Fig. 5;

FIG. 7 is a schematic structural diagram of a display substrate provided by Embodiment 2 of the present invention;

FIG. 8 is a flow chart of a method for manufacturing a display substrate provided by Embodiment 5 of the present invention;

Figure 9a is a schematic diagram of forming a black matrix;

Figure 9b is a schematic diagram of forming a first covering layer;

Figure 9c is a schematic diagram of forming a color matrix graphic;

Figure 9d is a schematic diagram of forming a second covering layer;

FIG. 10 is a flow chart of a method for manufacturing a display substrate provided by Embodiment 6 of the present invention;

FIG. 11 is a schematic diagram of forming a common electrode layer.

Detailed ways

In order for those skilled in the art to better understand the technical solution of the present invention, the display substrate provided by the present invention, its manufacturing method, and the display device are described in detail below with reference to the accompanying drawings.

FIG. 5 is a schematic structural view of a display substrate provided by Embodiment 1 of the present invention. FIG. 6 is a cross-sectional view along A-A in FIG. 5. As shown in FIGS. 5 and 6, the display substrate includes a base substrate 21 and a The black matrix 22 and the color matrix pattern on the substrate 21, a first covering layer 23 is formed between the black matrix 22 and the color matrix pattern, and a second covering layer 24 is formed above the black matrix 22 and the color matrix pattern.

In this embodiment, the black matrices 22 are arranged vertically and horizontally. The color matrix graphics are located between the black matrices 22 arranged in a criss-cross pattern. Wherein, the color matrix pattern can be a red matrix pattern R, a green matrix pattern G or a blue matrix pattern B, and then the red matrix pattern R, the green matrix pattern G and the blue matrix pattern B are arranged in sequence.

In this embodiment, preferably, the first covering layer 23 is a flat layer, and the second covering layer 24 is a flat layer.

In this embodiment, the black matrix 22 is located on the base substrate 21, the first cover layer 23 is located on the black matrix 22, the color matrix pattern is located on the first cover layer 23, and the second cover layer 24 is located on the color matrix pattern. superior.

Since the first covering layer 23 covers the black matrix 22 , the thickness of the first covering layer 23 can be set according to the thickness of the black matrix 22 . In order to achieve the purpose of reducing the material usage of the first covering layer 23 , it is generally better to set the thickness of the first covering layer 23 as small as possible. Preferably, the thickness of the first covering layer 23 is 1.0 μm to 2.0 μm, and the thickness of the black matrix is 0.9 μm to 2.0 μm. In this embodiment, the thickness of the first covering layer 23 is greater than that of the black matrix 22 . In practical applications, the thickness of the first covering layer 23 may also be less than or equal to the thickness of the black matrix 22 , which is not specifically shown in this case.

In this embodiment, the display substrate may be a color filter substrate. When the color filter substrate is applied to an Advanced Super Dimension Switch (ADS) display device, further, the display substrate may further include a back electrode layer 25 formed on the back electrode layer 25. the back side of the base substrate 21 .

Further, the display substrate may further include an alignment layer 26 formed on the second cover layer 24 .

Further, a spacer can also be formed on the alignment layer 26 , and the spacer is located above the black matrix. The spacer is not specifically drawn in the figure.

In the technical solution of the display substrate provided in this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and bubbles in the color matrix graphics A first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlapping area between the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular segment difference improves the flatness of the surface of the second covering layer, thereby improving the flatness of the surface of the display substrate. In this embodiment, the alignment layer is formed on the second covering layer, and the surface of the second covering layer has relatively high flatness, thereby improving the coating spreadability of the alignment layer formed on the second covering layer.

Fig. 7 is a schematic structural diagram of a display substrate provided by Embodiment 2 of the present invention. As shown in Fig. 7, the display substrate includes a base substrate 21, a black matrix 22 and a color matrix pattern formed on the base substrate 21, black A first covering layer 23 is formed between the matrix 22 and the color matrix pattern, and a second covering layer 24 is formed above the black matrix 22 and the color matrix pattern.

In this embodiment, the black matrices 22 are arranged vertically and horizontally. The color matrix graphics are located between the black matrices 22 arranged in a criss-cross pattern. Wherein, the color matrix pattern can be a red matrix pattern R, a green matrix pattern G or a blue matrix pattern B, and then the red matrix pattern R, the green matrix pattern G and the blue matrix pattern B are arranged in sequence.

In this embodiment, preferably, the first covering layer 23 is a flat layer, and the second covering layer 24 is a flat layer.

In this embodiment, the black matrix 22 is located on the base substrate 21, the first cover layer 23 is located on the black matrix 22, the color matrix pattern is located on the first cover layer 23, and the second cover layer 24 is located on the color matrix pattern. superior.

Since the first covering layer 23 covers the black matrix 22 , the thickness of the first covering layer 23 can be set according to the thickness of the black matrix 22 . In order to achieve the purpose of reducing the material usage of the first covering layer 23 , it is generally better to set the thickness of the first covering layer 23 as small as possible. Preferably, the thickness of the first covering layer 23 is 1.0 μm to 2.0 μm, and the thickness of the black matrix is 0.9 μm to 2.0 μm. In this embodiment, the thickness of the first covering layer 23 is greater than that of the black matrix 22 . In practical applications, the thickness of the first covering layer 23 may also be less than or equal to the thickness of the black matrix 22 , which is not specifically shown in this case.

In this embodiment, the display substrate may be a color filter substrate. When the color filter substrate is applied in a twisted nematic (twisted nematic, referred to as: TN) display device, further, the display substrate can also include a common electrode layer 27, and the common electrode layer 27 is formed on the second covering layer 24 .

Further, the display substrate may further include an alignment layer 26 formed on the common electrode layer 27 .

Further, a spacer can also be formed on the alignment layer 26 , and the spacer is located above the black matrix. The spacer is not specifically drawn in the figure.

In the technical solution of the display substrate provided in this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and bubbles in the color matrix graphics A first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlapping area between the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular step difference, the flatness of the display substrate surface is improved. In this embodiment, the common electrode layer is located on the second covering layer, and the surface of the second covering layer has relatively high flatness, thereby reducing the phenomenon of film breakage and cracking of the common electrode layer located above the overlapping area. In this embodiment, the alignment layer is formed above the second covering layer, and the surface of the second covering layer is relatively flat, thereby improving the coating spreadability of the alignment layer formed on the second covering layer.

In the first or second embodiment of the present invention, optionally, the color matrix pattern can also be located on the base substrate, the first covering layer is located on the color matrix pattern, and the black matrix is located on the first covering layer, The second covering layer is on top of the black matrix. Since the first covering layer covers the color matrix graphics, the thickness of the first covering layer can be set according to the thickness of the color matrix graphics. In order to achieve the purpose of reducing the amount of materials used in the first covering layer, generally the thickness of the first covering layer should be set as small as possible. Preferably, the thickness of the first covering layer is 1.0 μm to 3.0 μm, and the thickness of the color matrix pattern is 1.0 μm to 3.0 μm. The thickness of the first covering layer may be greater than, less than or equal to that of the black matrix. For the description of other structures in the display substrate, reference may be made to the above-mentioned first or second embodiment, and this case will not be drawn in detail.

Embodiment 3 of the present invention provides a display device. The display device includes a display substrate and an opposite substrate disposed opposite to each other. The display substrate provided in Embodiment 1 or Embodiment 2 above can be used as the display substrate.

In this embodiment, the display substrate may be a color filter substrate, and the opposite substrate may be an array substrate. When the display device is an ADS display device, the display substrate can be the display substrate provided in Embodiment 1; when the display device is a TN display device, the display substrate can be the display substrate provided in Embodiment 2.

In the technical solution of the display device provided by this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding the generation of overlapping gaps between the black matrix and the color matrix graphics and the generation of air bubbles in the color matrix graphics A first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlapping area between the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular step difference, the flatness of the display substrate surface is improved.

Embodiment 4 of the present invention provides a method for manufacturing a display substrate, the method comprising:

Step 101 , forming a black matrix, a color matrix pattern and a first covering layer on a base substrate, and the first covering layer is located between the black matrix and the color matrix pattern.

Step 102, forming a second covering layer on top of the black matrix and color matrix graphics.

In the technical solution of the manufacturing method of the display device provided by this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and the occurrence of overlapping gaps between the color matrix graphics. Bubbles are generated in the middle; the first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlap of the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular segment difference of the contact area, the flatness of the surface of the display substrate is improved.

FIG. 8 is a flow chart of a method for manufacturing a display substrate provided in Embodiment 5 of the present invention. As shown in FIG. 8 , the method includes:

Step 201, forming a black matrix on the base substrate.

FIG. 9 a is a schematic diagram of forming a black matrix. As shown in FIG. 9 a , a black matrix material layer is formed on a base substrate 21 , and a black matrix 22 is formed by patterning the black matrix material layer. Before forming the black matrix material layer, the base substrate 21 can also be cleaned; after the black matrix material layer is formed, the black matrix material layer can also be pre-baked; after the black matrix 22 is formed, the black matrix 22 can also be cleaned. Perform a post bake.

Step 202, forming a first covering layer on the black matrix.

FIG. 9 b is a schematic diagram of forming the first covering layer. As shown in FIG. 9 b , the first covering layer 23 is formed on the black matrix 22 through a full surface coating process. Before forming the first covering layer 23 , the base substrate 21 after step 201 may be cleaned; after forming the first covering layer 23 , post-baking may be performed on the first covering layer 23 .

Step 203, forming a color matrix pattern on the first covering layer.

Fig. 9c is a schematic diagram of forming a color matrix pattern. As shown in Fig. 9c, a color matrix material layer is formed on the first cover layer, and a patterning process is performed on the color matrix material layer to form a color matrix pattern. For example: in this step, the above steps can be repeated to form the red matrix pattern R, the green matrix pattern G and the blue matrix pattern B. Before forming the color matrix material layer, the base substrate 21 that has completed step 202 can also be cleaned; after the color matrix material layer is formed, the color matrix material layer can also be pre-baked; after the color matrix pattern is formed, it can also be Postbake color matrix graphics.

Step 204, forming a second covering layer on the color matrix pattern.

Fig. 9d is a schematic diagram of forming the second covering layer. As shown in Fig. 9d, the second covering layer 24 is formed on the color matrix pattern by a full-surface coating process. Before forming the second covering layer 24 , the base substrate 21 completed in step 203 may also be cleaned; after forming the second covering layer 24 , post-baking may also be performed on the second covering layer 24 .

Further, the method may also include:

Step 205, forming an alignment layer on the second covering layer.

As shown in FIG. 6 , an alignment layer 26 is coated on the second covering layer 24 .

Optionally, the method may also include:

Step 206 , forming spacers on the alignment layer, where the spacers are located above the black matrix.

Specifically, a spacer material layer is formed on the alignment layer, and a patterning process is performed on the spacer material layer to form the spacer. Before forming the spacer material layer, the base substrate 21 that has completed step 205 can also be cleaned; after the spacer material layer is formed, the spacer material layer can also be pre-baked; The spacer can also be post-baked afterwards. Spacers are not specifically drawn in the drawings.

It should be noted that each structure formed from step 201 to step 206 is located on the front side of the base substrate 21 .

Step 207, forming a back electrode layer on the back surface of the base substrate.

As shown in FIG. 6 , a back electrode layer 25 is formed on the back surface of the base substrate 21 by a magnetron sputtering process.

The method for manufacturing a display substrate provided in this embodiment can be used to manufacture the display substrate provided in Embodiment 1 above. For a specific description of the display substrate, please refer to Embodiment 1, which will not be repeated here.

In the technical scheme of the manufacturing method of the display substrate provided by this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and the occurrence of overlapping gaps between the color matrix graphics. Bubbles are generated in the middle; the first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlap of the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular difference of the contact area, the higher the flatness of the surface of the second covering layer, thereby improving the flatness of the surface of the display substrate. In this embodiment, the alignment layer is formed on the second covering layer, and the surface of the second covering layer has relatively high flatness, thereby improving the coating spreadability of the alignment layer formed on the second covering layer.

FIG. 10 is a flow chart of a method for manufacturing a display substrate provided in Embodiment 6 of the present invention. As shown in FIG. 10 , the method includes:

Step 301 , forming a black matrix on a base substrate.

For details, refer to FIG. 9 a and the description in step 201 .

Step 302, forming a first covering layer on the black matrix.

For details, refer to FIG. 9 b and the description in step 202 .

Step 303, forming a color matrix pattern on the first covering layer.

For details, refer to FIG. 9 c and the description in step 203 .

Step 304, forming a second covering layer on the color matrix pattern.

For details, refer to FIG. 9 d and the description in step 204 .

Further, the method may also include:

Step 305, forming a common electrode layer on the second covering layer.

FIG. 11 is a schematic diagram of forming a common electrode layer. As shown in FIG. 11 , a common electrode layer 27 is formed on the second covering layer 24 through a magnetron sputtering process.

Step 306, forming an alignment layer on the common electrode layer.

As shown in FIG. 7 , an alignment layer 26 is coated on the common electrode layer 27 .

Step 307 , forming spacers on the alignment layer, where the spacers are located above the black matrix.

For details, refer to the description in step 206.

The method for manufacturing a display substrate provided in this embodiment can be used to manufacture the display substrate provided in Embodiment 2 above. For a specific description of the display substrate, refer to Embodiment 2, which will not be repeated here.

In the technical scheme of the manufacturing method of the display substrate provided by this embodiment, a first covering layer is formed between the black matrix and the color matrix graphics, thereby avoiding overlapping gaps between the black matrix and the color matrix graphics and the occurrence of overlapping gaps between the color matrix graphics. Bubbles are generated in the middle; the first covering layer is formed between the black matrix and the color matrix graphics, so that the black matrix does not need to be overlapped with the color matrix graphics, and avoids the overlap of the black matrix and the color matrix graphics caused by the larger slope angle of the black matrix The larger the angular segment difference of the contact area, the flatness of the surface of the display substrate is improved. In this embodiment, the common electrode layer is located on the second covering layer, and the surface of the second covering layer has relatively high flatness, thereby reducing the phenomenon of film breakage and cracking of the common electrode layer located above the overlapping area. In this embodiment, the alignment layer is formed above the second covering layer, and the surface of the second covering layer is relatively flat, thereby improving the coating spreadability of the alignment layer formed on the second covering layer.

It can be understood that, the above embodiments are only exemplary embodiments adopted for illustrating the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.

Claims (10)

1. A display substrate, characterized in that it comprises a base substrate and a black matrix and a color matrix pattern formed above the base substrate, a first covering layer is formed between the black matrix and the color matrix pattern , a second covering layer is formed above the black matrix and the color matrix pattern. 2. The display substrate according to claim 1, wherein the first covering layer is a flat layer, and the second covering layer is a flat layer. 3. The display substrate according to claim 1, wherein the black matrix is located on the base substrate, the first cover layer is located on the black matrix, and the color matrix pattern is located on the on the first cover layer, and the second cover layer is on the color matrix graphic; or The color matrix pattern is located on the base substrate, the first covering layer is located on the color matrix pattern, the black matrix is located on the first covering layer, and the second covering layer is located on the above the black matrix. 4. The display substrate according to claim 3, wherein if the first covering layer is located on the black matrix, the thickness of the first covering layer is 1.0 μm to 2.0 μm, and the black matrix The thickness is 0.9μm to 2.0μm; If the first covering layer is located on the color matrix pattern, the thickness of the first covering layer is 1.0 μm to 3.0 μm, and the thickness of the color matrix pattern is 1.0 μm to 3.0 μm. 5. The display substrate according to claim 1, further comprising a common electrode layer formed on the second covering layer. 6. The display substrate according to claim 1, further comprising an alignment layer formed above the second covering layer. 7. A display device, characterized in that it comprises a display substrate and an opposite substrate arranged oppositely, and the display substrate adopts the display substrate according to any one of claims 1 to 6 above. 8. A method for manufacturing a display substrate, comprising: forming a black matrix, a color matrix pattern and a first cover layer on the base substrate, the first cover layer is located between the black matrix and the color matrix pattern; A second covering layer is formed on the black matrix and the color matrix pattern. 9. The method for manufacturing a display substrate according to claim 8, wherein: Said forming a black matrix, a color matrix pattern and a first covering layer on the base substrate comprises: forming the black matrix on the base substrate; forming the first covering layer on the black matrix; forming a color matrix pattern on the first covering layer; Said forming a second covering layer above said black matrix and said color matrix graphics comprises: The second covering layer is formed on the color matrix pattern. 10. The method for manufacturing a display substrate according to claim 9, wherein the forming the first covering layer on the black matrix comprises: The first covering layer is formed on the black matrix through a full surface coating process.