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BRPI1007989A2 - composição multiuso de limpeza de microeletrônicos á base de solvente orgânico ácido - Google Patents

composição multiuso de limpeza de microeletrônicos á base de solvente orgânico ácido

Info

Publication number
BRPI1007989A2
BRPI1007989A2 BRPI1007989A BRPI1007989A BRPI1007989A2 BR PI1007989 A2 BRPI1007989 A2 BR PI1007989A2 BR PI1007989 A BRPI1007989 A BR PI1007989A BR PI1007989 A BRPI1007989 A BR PI1007989A BR PI1007989 A2 BRPI1007989 A2 BR PI1007989A2
Authority
BR
Brazil
Prior art keywords
multipurpose
organic solvent
cleaning composition
solvent based
acid organic
Prior art date
Application number
BRPI1007989A
Other languages
English (en)
Inventor
Chen-Pin S Hsu
Glenn Westwood
William R Gemmill
Original Assignee
Avantor Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avantor Performance Mat Inc filed Critical Avantor Performance Mat Inc
Publication of BRPI1007989A2 publication Critical patent/BRPI1007989A2/pt

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/08Acids
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/34Organic compounds containing sulfur
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • H10P70/234
    • H10P70/27
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/36Organic compounds containing phosphorus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
BRPI1007989A 2009-02-25 2010-01-14 composição multiuso de limpeza de microeletrônicos á base de solvente orgânico ácido BRPI1007989A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15530909P 2009-02-25 2009-02-25
PCT/US2010/020974 WO2010098899A1 (en) 2009-02-25 2010-01-14 Multipurpose acidic, organic solvent based microelectronic cleaning composition

Publications (1)

Publication Number Publication Date
BRPI1007989A2 true BRPI1007989A2 (pt) 2016-03-01

Family

ID=42077359

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI1007989A BRPI1007989A2 (pt) 2009-02-25 2010-01-14 composição multiuso de limpeza de microeletrônicos á base de solvente orgânico ácido

Country Status (16)

Country Link
US (1) US8557757B2 (pt)
EP (1) EP2401655B1 (pt)
JP (1) JP2014132094A (pt)
KR (1) KR101831452B1 (pt)
CN (1) CN102334069B (pt)
AU (1) AU2010218426A1 (pt)
BR (1) BRPI1007989A2 (pt)
CA (1) CA2753399A1 (pt)
IL (1) IL214728A (pt)
MX (1) MX2011008787A (pt)
MY (1) MY152051A (pt)
RU (1) RU2011139104A (pt)
SG (1) SG173834A1 (pt)
TW (1) TWI500760B (pt)
WO (1) WO2010098899A1 (pt)
ZA (1) ZA201106933B (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8754021B2 (en) 2009-02-27 2014-06-17 Advanced Technology Materials, Inc. Non-amine post-CMP composition and method of use
EP2463410B1 (en) * 2010-12-13 2018-07-04 Rohm and Haas Electronic Materials LLC Electrochemical etching of semiconductors
CN103958640B (zh) * 2011-10-21 2016-05-18 安格斯公司 无胺cmp后组合物及其使用方法
US8951950B2 (en) * 2012-03-12 2015-02-10 Ekc Technology Aluminum post-etch residue removal with simultaneous surface passivation
TW201713751A (zh) * 2015-10-06 2017-04-16 聯華電子股份有限公司 酸槽補酸系統與方法
CN108251895A (zh) * 2016-12-29 2018-07-06 江苏鲁汶仪器有限公司 一种氟化氢气相腐蚀设备及方法
KR20230052123A (ko) * 2021-10-12 2023-04-19 삼성전자주식회사 반도체 패키지 제조 방법
CN115799063A (zh) * 2023-01-31 2023-03-14 广州粤芯半导体技术有限公司 一种氧化物层的刻蚀方法

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US3629124A (en) * 1969-08-27 1971-12-21 Monsanto Co Bleaching sterilizing disinfecting and deterging compositions
US4215005A (en) 1978-01-30 1980-07-29 Allied Chemical Corporation Organic stripping compositions and method for using same
US6368421B1 (en) 1998-07-10 2002-04-09 Clariant Finance (Bvi) Limited Composition for stripping photoresist and organic materials from substrate surfaces
US6562726B1 (en) 1999-06-29 2003-05-13 Micron Technology, Inc. Acid blend for removing etch residue
US6531436B1 (en) 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
AU2001259135A1 (en) * 2000-04-24 2001-11-07 Optiva, Inc. Liquid crystal display including o-type and e-type polarizer
WO2001081525A1 (en) 2000-04-26 2001-11-01 Daikin Industries, Ltd. Detergent composition
EP1360077A4 (en) * 2000-07-10 2009-06-24 Ekc Technology Inc COMPOSITION FOR CLEANING SEMICONDUCTORS OF ORGANIC AND REST OF PLASMA-ACTION
US6799589B2 (en) * 2000-11-08 2004-10-05 Sony Corporation Method and apparatus for wet-cleaning substrate
KR100958069B1 (ko) * 2002-06-07 2010-05-17 말린크로트 베이커, 인코포레이티드 산화제 및 유기 용매를 포함하는 마이크로일렉트로닉 세정조성물
CN102135735A (zh) * 2002-06-07 2011-07-27 安万托特性材料股份有限公司 用于微电子基底的清洁组合物
JP2004029346A (ja) 2002-06-25 2004-01-29 Mitsubishi Gas Chem Co Inc レジスト剥離液組成物
US7166419B2 (en) * 2002-09-26 2007-01-23 Air Products And Chemicals, Inc. Compositions substrate for removing etching residue and use thereof
EP1664935B1 (en) * 2003-08-19 2007-10-17 Mallinckrodt Baker, Inc. Stripping and cleaning compositions for microelectronics
CN1875325B (zh) * 2003-10-29 2011-01-26 马林克罗特贝克公司 含有金属卤化物腐蚀抑制剂的碱性后等离子体蚀刻/灰化残余物去除剂和光致抗蚀剂剥离组合物
WO2005083523A1 (en) * 2004-02-11 2005-09-09 Mallinckrodt Baker Inc. Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
ATE488570T1 (de) * 2004-03-01 2010-12-15 Mallinckrodt Baker Inc Nanoelektronik- und mikroelektronik- reinigungsmittel
BRPI0513315A (pt) * 2004-07-15 2008-05-06 Mallinckrodt Baker Inc composições de limpeza microeletrÈnicas não-aquosas contendo frutose
JP2006041446A (ja) * 2004-07-30 2006-02-09 Sumitomo Chemical Co Ltd 電子部品洗浄液
US8178482B2 (en) * 2004-08-03 2012-05-15 Avantor Performance Materials, Inc. Cleaning compositions for microelectronic substrates
KR20060064441A (ko) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 비수성 비부식성 마이크로전자 세정 조성물
CA2591477A1 (en) * 2004-12-10 2006-06-22 Mallinckrodt Baker, Inc. Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
TW200734482A (en) 2005-03-18 2007-09-16 Applied Materials Inc Electroless deposition process on a contact containing silicon or silicide
KR101251594B1 (ko) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 레지스트 스트리퍼 제거용 케미칼 린스 조성물
US20100261632A1 (en) * 2007-08-02 2010-10-14 Advanced Technology Materials, Inc. Non-fluoride containing composition for the removal of residue from a microelectronic device

Also Published As

Publication number Publication date
IL214728A (en) 2015-10-29
CN102334069B (zh) 2013-07-10
MY152051A (en) 2014-08-15
CN102334069A (zh) 2012-01-25
MX2011008787A (es) 2011-09-29
RU2011139104A (ru) 2013-04-10
KR101831452B1 (ko) 2018-02-22
JP2014132094A (ja) 2014-07-17
US20110306534A1 (en) 2011-12-15
SG173834A1 (en) 2011-09-29
US8557757B2 (en) 2013-10-15
KR20110136820A (ko) 2011-12-21
WO2010098899A1 (en) 2010-09-02
IL214728A0 (en) 2011-11-30
EP2401655B1 (en) 2014-03-12
TW201035308A (en) 2010-10-01
JP2012518715A (ja) 2012-08-16
ZA201106933B (en) 2012-05-30
CA2753399A1 (en) 2010-09-02
JP5730790B2 (ja) 2015-06-10
TWI500760B (zh) 2015-09-21
EP2401655A1 (en) 2012-01-04
AU2010218426A1 (en) 2011-10-20

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]
B350 Update of information on the portal [chapter 15.35 patent gazette]