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MX2011008787A - Composicion limpiadora microelectronica basada en solvente organico acido multiproposito. - Google Patents

Composicion limpiadora microelectronica basada en solvente organico acido multiproposito.

Info

Publication number
MX2011008787A
MX2011008787A MX2011008787A MX2011008787A MX2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A MX 2011008787 A MX2011008787 A MX 2011008787A
Authority
MX
Mexico
Prior art keywords
cleaning composition
acid
multiproposite
organic solvent
composition based
Prior art date
Application number
MX2011008787A
Other languages
English (en)
Inventor
Chien-Pin S Hsu
Glenn Westwood
William R Gemmill
Original Assignee
Avantor Performance Mat Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avantor Performance Mat Inc filed Critical Avantor Performance Mat Inc
Publication of MX2011008787A publication Critical patent/MX2011008787A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • H10P70/234—
    • H10P70/27—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/36—Organic compounds containing phosphorus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

Una composición limpiadora para limpiar dispositivos microelectrónicos o nanoelectrónicos, la composición limpiadora que tiene HF como el único ácido y el único compuesto de fluoruro en la composición, al menos un solvente primario seleccionado del grupo que consiste de sulfonas y selenonas, al menos un co-solvente de alcohol polihidroxil-alquílico o -arílico que tiene sitios de unión o formación de complejos de iones metálicos, y agua, y opcionalmente al menos un compuesto inhibidor de corrosión de ácido fosfónico y en donde la composición limpiadora está libre de aminas, bases y otras sales.
MX2011008787A 2009-02-25 2010-01-14 Composicion limpiadora microelectronica basada en solvente organico acido multiproposito. MX2011008787A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15530909P 2009-02-25 2009-02-25
PCT/US2010/020974 WO2010098899A1 (en) 2009-02-25 2010-01-14 Multipurpose acidic, organic solvent based microelectronic cleaning composition

Publications (1)

Publication Number Publication Date
MX2011008787A true MX2011008787A (es) 2011-09-29

Family

ID=42077359

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2011008787A MX2011008787A (es) 2009-02-25 2010-01-14 Composicion limpiadora microelectronica basada en solvente organico acido multiproposito.

Country Status (16)

Country Link
US (1) US8557757B2 (es)
EP (1) EP2401655B1 (es)
JP (1) JP2014132094A (es)
KR (1) KR101831452B1 (es)
CN (1) CN102334069B (es)
AU (1) AU2010218426A1 (es)
BR (1) BRPI1007989A2 (es)
CA (1) CA2753399A1 (es)
IL (1) IL214728A (es)
MX (1) MX2011008787A (es)
MY (1) MY152051A (es)
RU (1) RU2011139104A (es)
SG (1) SG173834A1 (es)
TW (1) TWI500760B (es)
WO (1) WO2010098899A1 (es)
ZA (1) ZA201106933B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8754021B2 (en) 2009-02-27 2014-06-17 Advanced Technology Materials, Inc. Non-amine post-CMP composition and method of use
SG182081A1 (en) * 2010-12-13 2012-07-30 Rohm & Haas Elect Mat Electrochemical etching of semiconductors
CN105869997A (zh) * 2011-10-21 2016-08-17 安格斯公司 无胺cmp后组合物及其使用方法
US8951950B2 (en) * 2012-03-12 2015-02-10 Ekc Technology Aluminum post-etch residue removal with simultaneous surface passivation
TW201713751A (zh) * 2015-10-06 2017-04-16 聯華電子股份有限公司 酸槽補酸系統與方法
CN108251895A (zh) * 2016-12-29 2018-07-06 江苏鲁汶仪器有限公司 一种氟化氢气相腐蚀设备及方法
KR20230052123A (ko) * 2021-10-12 2023-04-19 삼성전자주식회사 반도체 패키지 제조 방법
CN115799063A (zh) * 2023-01-31 2023-03-14 广州粤芯半导体技术有限公司 一种氧化物层的刻蚀方法

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US3629124A (en) * 1969-08-27 1971-12-21 Monsanto Co Bleaching sterilizing disinfecting and deterging compositions
US4215005A (en) 1978-01-30 1980-07-29 Allied Chemical Corporation Organic stripping compositions and method for using same
US6368421B1 (en) 1998-07-10 2002-04-09 Clariant Finance (Bvi) Limited Composition for stripping photoresist and organic materials from substrate surfaces
US6562726B1 (en) * 1999-06-29 2003-05-13 Micron Technology, Inc. Acid blend for removing etch residue
US6531436B1 (en) 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
WO2001081991A1 (en) * 2000-04-24 2001-11-01 Optiva, Inc. Liquid crystal display including o-type & e-type polarizer
KR100540525B1 (ko) 2000-04-26 2006-01-11 다이킨 고교 가부시키가이샤 세정용 조성물
KR100764888B1 (ko) * 2000-07-10 2007-10-09 이케이씨 테크놀로지, 인코포레이티드 반도체 장치용의 유기 및 플라즈마 식각된 잔사의 세척을위한 조성물
US6799589B2 (en) 2000-11-08 2004-10-05 Sony Corporation Method and apparatus for wet-cleaning substrate
BR0311830A (pt) * 2002-06-07 2005-03-29 Mallinckrodt Baker Inc Composições removedoras de arco e de limpeza de microeletrÈnicos
CN102061228B (zh) * 2002-06-07 2013-02-13 安万托特性材料股份有限公司 包含氧化剂和有机溶剂的微电子清洁组合物
JP2004029346A (ja) 2002-06-25 2004-01-29 Mitsubishi Gas Chem Co Inc レジスト剥離液組成物
US7166419B2 (en) * 2002-09-26 2007-01-23 Air Products And Chemicals, Inc. Compositions substrate for removing etching residue and use thereof
JP4522408B2 (ja) * 2003-08-19 2010-08-11 マリンクロッド・ベイカー・インコーポレイテッド マイクロエレクトロニクス用のストリッピングおよび洗浄組成物
WO2005043245A2 (en) * 2003-10-29 2005-05-12 Mallinckrodt Baker Inc. Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
US7521406B2 (en) * 2004-02-11 2009-04-21 Mallinckrodt Baker, Inc Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
EP1720966B1 (en) * 2004-03-01 2010-11-17 Mallinckrodt Baker, Inc. Nanoelectronic and microelectronic cleaning compositions
WO2006019402A1 (en) * 2004-07-15 2006-02-23 Mallinckrodt Baker, Inc. Non-aqueous microelectronic cleaning compositions containing fructose
JP2006041446A (ja) * 2004-07-30 2006-02-09 Sumitomo Chemical Co Ltd 電子部品洗浄液
US8178482B2 (en) * 2004-08-03 2012-05-15 Avantor Performance Materials, Inc. Cleaning compositions for microelectronic substrates
KR20060064441A (ko) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 비수성 비부식성 마이크로전자 세정 조성물
CN101076760B (zh) * 2004-12-10 2010-12-22 马林克罗特贝克公司 含有聚合物腐蚀抑制剂的非水的、无腐蚀性的微电子清洁组合物
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KR101251594B1 (ko) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 레지스트 스트리퍼 제거용 케미칼 린스 조성물
JP2010535422A (ja) * 2007-08-02 2010-11-18 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド マイクロ電子デバイスから残渣を除去するための非フッ化物含有組成物

Also Published As

Publication number Publication date
ZA201106933B (en) 2012-05-30
KR20110136820A (ko) 2011-12-21
MY152051A (en) 2014-08-15
JP2012518715A (ja) 2012-08-16
TWI500760B (zh) 2015-09-21
JP5730790B2 (ja) 2015-06-10
JP2014132094A (ja) 2014-07-17
US20110306534A1 (en) 2011-12-15
RU2011139104A (ru) 2013-04-10
CA2753399A1 (en) 2010-09-02
TW201035308A (en) 2010-10-01
BRPI1007989A2 (pt) 2016-03-01
AU2010218426A1 (en) 2011-10-20
CN102334069A (zh) 2012-01-25
IL214728A0 (en) 2011-11-30
EP2401655A1 (en) 2012-01-04
EP2401655B1 (en) 2014-03-12
IL214728A (en) 2015-10-29
US8557757B2 (en) 2013-10-15
SG173834A1 (en) 2011-09-29
KR101831452B1 (ko) 2018-02-22
WO2010098899A1 (en) 2010-09-02
CN102334069B (zh) 2013-07-10

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