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BR9814690A - Composto e processo para preparar um composto - Google Patents

Composto e processo para preparar um composto

Info

Publication number
BR9814690A
BR9814690A BR9814690-4A BR9814690A BR9814690A BR 9814690 A BR9814690 A BR 9814690A BR 9814690 A BR9814690 A BR 9814690A BR 9814690 A BR9814690 A BR 9814690A
Authority
BR
Brazil
Prior art keywords
compound
carbamate
starch
ring
substituted
Prior art date
Application number
BR9814690-4A
Other languages
English (en)
Inventor
Ram B Gupta
Dennis J Jakiela
Gottfried Haacke
Thomas P Sassi
Original Assignee
Cytec Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cytec Tech Corp filed Critical Cytec Tech Corp
Publication of BR9814690A publication Critical patent/BR9814690A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D251/00Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D207/00Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C07D207/444Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
    • C07D207/448Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/44Iso-indoles; Hydrogenated iso-indoles
    • C07D209/48Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D303/00Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02Compounds containing oxirane rings
    • C07D303/48Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477Six-membered rings
    • C08K5/3492Triazines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Optical Filters (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

"COMPOSTO E PROCESSO PARA PREPARAR UM COMPOSTO". A invenção refere-se geralmente a trisaril-1,3,5-triazinas substituídas com amido ou carbamato e ao uso das mesmas para proteger contra degradação por forças ambientais, inclusive de luz ultravioleta, radiação actínica, oxidação, umidade, poluentes atmosféricos e combinações dos mesmos. A nova classe de trisaril-1,3,5-triazinas compreende um anel arila fixado ao anel triazina (e preferivelmente um anel arila contendo um grupo hidroxila, seja livre ou bloqueado para formar um estabilizador latente, orto para o ponto de fixação do anel triazina), substituído com um grupo compreendendo um grupo contendo amido/ carbamato ligável para- no ponto de fixação do anel triazina. Estes materiais podem, sob as circunstâncias apropriadas, ser ligados a formulações compreendendo revestimentos, polímeros, resinas, compostos orgânicos, e outros, via reação de funcionalidade ligável com os materiais da formulação. Um processo para estabilizar um material por incorporação destas trisaril-1,3,5-triazinas substituídas com amido ou carbamato é também descrito.
BR9814690-4A 1997-11-21 1998-11-20 Composto e processo para preparar um composto BR9814690A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6635797P 1997-11-21 1997-11-21
PCT/US1998/024698 WO1999026935A1 (en) 1997-11-21 1998-11-20 Trisaryl-1,3,5-triazine ultraviolet light absorbers

Publications (1)

Publication Number Publication Date
BR9814690A true BR9814690A (pt) 2000-10-03

Family

ID=22068984

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9814690-4A BR9814690A (pt) 1997-11-21 1998-11-20 Composto e processo para preparar um composto

Country Status (14)

Country Link
US (2) US6265576B1 (pt)
EP (1) EP1034169B1 (pt)
JP (1) JP2001524474A (pt)
KR (1) KR20010032250A (pt)
CN (1) CN1278798A (pt)
AT (1) ATE259358T1 (pt)
AU (1) AU748175B2 (pt)
BR (1) BR9814690A (pt)
CA (1) CA2311538A1 (pt)
DE (1) DE69821645T2 (pt)
IL (1) IL136256A0 (pt)
NO (1) NO20002161L (pt)
WO (1) WO1999026935A1 (pt)
ZA (1) ZA9810605B (pt)

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JP2002037850A (ja) * 2000-07-27 2002-02-06 Dainippon Ink & Chem Inc マレイミド誘導体の製造方法
TWI316513B (en) * 2001-07-02 2009-11-01 Ciba Sc Holding Ag Highly compatible hydroxyphenyltriazine uv-absorbers
EP1308308A3 (en) 2001-10-31 2005-08-17 EASTMAN KODAK COMPANY (a New Jersey corporation) Ink jet recording element and printing method
EP1308311A3 (en) 2001-10-31 2005-08-17 Eastman Kodak Company Ink jet recording element and printing method
US6612692B2 (en) 2001-10-31 2003-09-02 Eastman Kodak Company Ink jet printing method
EP1451248B1 (en) * 2001-11-30 2008-11-26 Ciba Holding Inc. 2-hydroxyphenyl-s-triazine crosslinkers for polymer networks
AU2002348236A1 (en) * 2001-12-27 2003-07-24 Cytec Technology Corp. Uv stabilized thermoplastic olefins
JP3852593B2 (ja) 2002-07-17 2006-11-29 日産化学工業株式会社 反射防止膜形成組成物
DE60315081T2 (de) * 2003-12-25 2008-04-03 Council Of Scientific And Industrial Research Antiozonant funktionalisierte benzotriazole uv absorber und ihre herstellungsverfahren
US7998886B2 (en) * 2005-10-24 2011-08-16 Milliken & Company Hindered amine treated textiles
JP2007126530A (ja) * 2005-11-02 2007-05-24 Taisei Fine Chemical Co Ltd 紫外線吸収能を有する非水液状組成物
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
BRPI0716516B1 (pt) 2006-09-06 2018-07-03 Carl Zeiss Vision Australia Holdings Limited Elemento de lente óptico absorvedor de uv, lente oftálmica absorvedora de luz, e, método para formar um elemento de lente óptico absorvedor de uv
JP5119767B2 (ja) * 2007-07-05 2013-01-16 コニカミノルタアドバンストレイヤー株式会社 光学フィルム、偏光板、その製造方法及び液晶表示装置
JP5675647B2 (ja) 2009-01-19 2015-02-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 有機黒色顔料およびその製造
DE102010028062A1 (de) * 2010-04-22 2011-10-27 Evonik Degussa Gmbh Verfahren zur Herstellung vernetzter organischer Polymere
EP2447236A1 (de) 2010-10-12 2012-05-02 Bayer MaterialScience AG Spezielle UV-Absorber für härtbare UV-Schutz Beschichtungen
DE102011007468A1 (de) * 2011-04-15 2012-10-18 Evonik Goldschmidt Gmbh Zusammensetzung, enthaltend spezielle Carbamat-artige Verbindungen, geeignet zur Herstellung von Polyurethanschäumen
CN103946251B (zh) 2011-09-16 2017-06-23 宾视研发公司 疏水性人工晶状体
US9561302B2 (en) 2011-09-16 2017-02-07 Benz Research & Development Corp. Ultraviolet light absorbing materials for intraocular lens and uses thereof
US9441123B2 (en) 2012-08-15 2016-09-13 Penn Color, Inc. Cationic water based polymers for ink, coating, and film applications
US9434849B2 (en) 2012-10-19 2016-09-06 Penn Color, Inc. Water based anionic polymers for ink, coating, and film applications
EP2786987B1 (en) * 2013-04-01 2016-06-15 Shin-Etsu Chemical Co., Ltd. Reactive UV absorber, making method, coating composition, and coated article
CN106574066B (zh) * 2014-06-12 2020-03-03 埃克阿泰克有限责任公司 有机树脂层压体
JP6354665B2 (ja) * 2014-06-23 2018-07-11 信越化学工業株式会社 光硬化性コーティング組成物及び被覆物品
ES2632783T3 (es) 2014-12-19 2017-09-15 Evonik Degussa Gmbh Sistemas de redes de cubierta para láminas de encapsulación que comprenden compuestos de bis-(alquenilamidas)
CN104591655A (zh) * 2015-01-18 2015-05-06 浙江泰升节能科技有限公司 一种仿真贴面砖材料及其制备方法
US10196470B2 (en) 2016-05-16 2019-02-05 Benz Research And Development Corp. Hydrophobic intraocular lens
US10894111B2 (en) 2016-12-16 2021-01-19 Benz Research And Development Corp. High refractive index hydrophilic materials
JP2020519402A (ja) 2017-05-16 2020-07-02 ベンズ リサーチ アンド デベロップメント コーポレイションBenz Research And Development Corp. 微量注入可能な低色収差眼内レンズ材料
CN112267292A (zh) * 2020-10-31 2021-01-26 宁波丹盈服饰有限公司 一种抗菌抗静电面料及其制备方法

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CH469053A (de) * 1963-07-26 1969-02-28 Ciba Geigy Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviolettstrahlung für nichttextile organische Materialien
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Also Published As

Publication number Publication date
NO20002161L (no) 2000-07-14
ATE259358T1 (de) 2004-02-15
US6265576B1 (en) 2001-07-24
US20010037022A1 (en) 2001-11-01
DE69821645T2 (de) 2004-07-08
WO1999026935A1 (en) 1999-06-03
EP1034169A1 (en) 2000-09-13
KR20010032250A (ko) 2001-04-16
JP2001524474A (ja) 2001-12-04
US6365652B2 (en) 2002-04-02
CA2311538A1 (en) 1999-06-03
ZA9810605B (en) 1999-05-25
AU748175B2 (en) 2002-05-30
DE69821645D1 (de) 2004-03-18
IL136256A0 (en) 2001-05-20
EP1034169B1 (en) 2004-02-11
CN1278798A (zh) 2001-01-03
NO20002161D0 (no) 2000-04-27
AU1592599A (en) 1999-06-15

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 8A ANUIDADE

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1912 DE 28/08/2007.