BR9706264A - Fotogeração de aminas a partir de alfa-aminoacetofenonas - Google Patents
Fotogeração de aminas a partir de alfa-aminoacetofenonasInfo
- Publication number
- BR9706264A BR9706264A BR9706264A BR9706264A BR9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A BR 9706264 A BR9706264 A BR 9706264A
- Authority
- BR
- Brazil
- Prior art keywords
- formula
- radical
- phenyl
- inter alia
- aminoacetophenones
- Prior art date
Links
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 title 1
- 150000001412 amines Chemical class 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 125000004956 cyclohexylene group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP97810593 | 1997-08-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9706264A true BR9706264A (pt) | 1999-07-27 |
Family
ID=8230353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9706264A BR9706264A (pt) | 1997-08-22 | 1997-12-23 | Fotogeração de aminas a partir de alfa-aminoacetofenonas |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US6057380A (pt) |
| JP (1) | JP3250072B2 (pt) |
| KR (1) | KR100264256B1 (pt) |
| CN (1) | CN1086399C (pt) |
| AT (1) | ATE194872T1 (pt) |
| AU (1) | AU750819B2 (pt) |
| BR (1) | BR9706264A (pt) |
| CA (1) | CA2224441C (pt) |
| DE (1) | DE69702605T2 (pt) |
| RU (1) | RU2210798C2 (pt) |
| SG (1) | SG63787A1 (pt) |
| TW (1) | TW436491B (pt) |
| ZA (1) | ZA9710985B (pt) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1105368B1 (de) | 1998-08-21 | 2002-10-30 | Ciba SC Holding AG | Photoaktivierbare stickstoffhaltige basen |
| AU4752200A (en) * | 1999-05-10 | 2000-11-21 | Ciba Specialty Chemicals Holding Inc. | Novel photoinitiators and their applications |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| DE10018918C2 (de) * | 2000-04-17 | 2002-07-18 | 3M Espe Ag | Katalysatorkomponente |
| RU2265035C2 (ru) * | 2000-05-26 | 2005-11-27 | Акцо Нобель Н.В. | Фотоактивируемая композиция покрытия |
| DE10237950A1 (de) * | 2002-08-20 | 2004-03-11 | Tesa Ag | UV-initiiert thermisch vernetzte Acrylathaftklebemassen |
| JP2005208562A (ja) * | 2003-12-25 | 2005-08-04 | Kansai Paint Co Ltd | 光導波路の形成方法及びその方法により得られた光導波路 |
| JP4843955B2 (ja) * | 2004-02-16 | 2011-12-21 | 三菱瓦斯化学株式会社 | 光塩基発生剤 |
| KR100590881B1 (ko) * | 2004-05-14 | 2006-06-19 | 삼성전자주식회사 | 광경화성 수지 조성물 및 그의 패터닝 방법 |
| AU2006290828A1 (en) * | 2005-09-15 | 2007-03-22 | Basf Se | Coating compositions comprising a latent activator for marking substrates |
| US7914641B2 (en) * | 2005-10-03 | 2011-03-29 | Mitsui Chemicals, Inc. | Sealing material for flat panel display |
| JPWO2007111092A1 (ja) | 2006-03-24 | 2009-08-06 | コニカミノルタエムジー株式会社 | 透明バリア性シートおよび透明バリア性シートの製造方法 |
| KR101174949B1 (ko) * | 2006-05-17 | 2012-08-17 | 아메리칸 다이 소스, 인코포레이티드 | 석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 |
| US9522967B2 (en) * | 2006-06-09 | 2016-12-20 | Dentsply International Inc. | Photopolymerizable compositions featuring novel amine accelerator for improved color stability and reduced polymerization stress thereby |
| EP2066721B1 (en) * | 2006-09-29 | 2017-12-27 | Basf Se | Photolatent bases for systems based on blocked isocyanates |
| DE112008001404T5 (de) * | 2007-06-14 | 2010-04-22 | Sekisui Chemical Co., Ltd. | Photohärtbare Haftklebstoffzusammensetzung |
| US9333786B2 (en) * | 2007-07-18 | 2016-05-10 | Datalase, Ltd. | Laser-sensitive coating formulations |
| WO2009010393A1 (en) * | 2007-07-18 | 2009-01-22 | Basf Se | Coating compositions |
| TWI409280B (zh) * | 2007-07-31 | 2013-09-21 | American Dye Source Inc | 聚合物染料、塗覆層組合物及熱微影印刷板 |
| CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
| RU2011120235A (ru) | 2008-10-23 | 2012-11-27 | Дейталейз Лимитед | Теплопоглощающие добавки |
| WO2010049282A1 (en) | 2008-10-27 | 2010-05-06 | Basf Se | Coating composition for marking substrates |
| CN102232065B (zh) * | 2008-12-02 | 2014-11-05 | 和光纯药工业株式会社 | 光产碱剂 |
| EP2428199A1 (en) | 2010-09-09 | 2012-03-14 | 3M Innovative Properties Company | Curable composition, process of production and use thereof |
| EP2638077B1 (en) * | 2010-11-12 | 2015-01-07 | Coloplast A/S | Novel polymeric photoinitiators |
| JP6036703B2 (ja) | 2011-12-16 | 2016-11-30 | 株式会社スリーボンド | 硬化性樹脂組成物 |
| DE102012205951B4 (de) * | 2012-04-12 | 2016-09-01 | Chemetall Gmbh | Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems |
| JP5949123B2 (ja) * | 2012-05-11 | 2016-07-06 | 住友化学株式会社 | 偏光板 |
| JP6105858B2 (ja) * | 2012-05-17 | 2017-03-29 | 太陽インキ製造株式会社 | パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板 |
| WO2013171888A1 (ja) * | 2012-05-17 | 2013-11-21 | 太陽インキ製造株式会社 | アルカリ現像型の熱硬化性樹脂組成物、プリント配線板 |
| CN104380197B (zh) * | 2012-05-17 | 2019-01-01 | 太阳油墨制造株式会社 | 碱显影型的热固化性树脂组合物、印刷电路板 |
| CN102660190A (zh) * | 2012-05-23 | 2012-09-12 | 江苏海田技术有限公司 | 一种uv印铁底油 |
| JP6306296B2 (ja) * | 2013-07-09 | 2018-04-04 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 |
| EP3023462A4 (en) | 2013-07-18 | 2017-04-12 | Cemedine Co., Ltd. | Photocurable composition |
| JP2015043793A (ja) * | 2013-08-27 | 2015-03-12 | ディーダブルエス エス・アール・エル | 人工歯の製造方法 |
| US9718999B2 (en) | 2013-12-13 | 2017-08-01 | Cemedine Co., Ltd | Photocurable composition having adhesive properties |
| JP6572213B2 (ja) * | 2014-08-01 | 2019-09-04 | 株式会社Adeka | 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物 |
| CN104371518A (zh) * | 2014-11-13 | 2015-02-25 | 青岛厚科信息工程有限公司 | 一种耐候性好的涂料 |
| CN104449373A (zh) * | 2014-11-17 | 2015-03-25 | 青岛厚科信息工程有限公司 | 一种转化形油漆 |
| CN104371389A (zh) * | 2014-11-17 | 2015-02-25 | 青岛厚科信息工程有限公司 | 一种含有新型光引发剂的涂料 |
| CN104403563A (zh) * | 2014-11-24 | 2015-03-11 | 青岛市市南区隆德中医药研究所 | 一种保光性好的涂料 |
| JP6520134B2 (ja) * | 2015-01-16 | 2019-05-29 | セメダイン株式会社 | 光硬化性組成物 |
| CN107531886B (zh) * | 2015-04-29 | 2020-08-07 | 3M创新有限公司 | 由多硫醇和聚环氧化合物制备聚合物网络的方法 |
| WO2018085190A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| EP3535621A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| CN109952349A (zh) * | 2016-11-03 | 2019-06-28 | 3M创新有限公司 | 将密封剂施用到飞机部件的方法 |
| TWI774931B (zh) | 2018-03-02 | 2022-08-21 | 日商日本化藥股份有限公司 | 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物 |
| US11286400B2 (en) * | 2018-07-12 | 2022-03-29 | Ppg Industries Ohio, Inc. | Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate |
| CN112752803A (zh) | 2018-09-27 | 2021-05-04 | 3M创新有限公司 | 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法 |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| CN110105799B (zh) * | 2019-05-07 | 2021-10-01 | 广东华润涂料有限公司 | 木器用涂料组合物以及由其制成的木制品 |
| WO2024053609A1 (ja) * | 2022-09-05 | 2024-03-14 | 株式会社日本触媒 | アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3365773D1 (en) * | 1982-02-26 | 1986-10-09 | Ciba Geigy Ag | Coloured photo-hardenable composition |
| EP0138754B1 (de) * | 1983-08-15 | 1988-05-25 | Ciba-Geigy Ag | Photohärtbare Gemische |
| ATE89262T1 (de) * | 1987-03-26 | 1993-05-15 | Ciba Geigy Ag | Neue alpha-aminoacetophenone als photoinitiatoren. |
| JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
| EP0555749B1 (en) * | 1992-02-14 | 1999-05-19 | Shipley Company Inc. | Radiation sensitive compositions and processes |
| TW434456B (en) * | 1994-12-30 | 2001-05-16 | Novartis Ag | A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate |
| JP3190251B2 (ja) * | 1995-06-06 | 2001-07-23 | 太陽インキ製造株式会社 | アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物 |
| DE10139936B4 (de) * | 2001-08-14 | 2005-04-28 | Siemens Ag | Verfahren und Anordnung zur Steuerung von Datenpaketen |
-
1997
- 1997-09-27 TW TW086114260A patent/TW436491B/zh not_active IP Right Cessation
- 1997-12-04 AT AT97810948T patent/ATE194872T1/de not_active IP Right Cessation
- 1997-12-04 DE DE69702605T patent/DE69702605T2/de not_active Expired - Lifetime
- 1997-12-05 US US08/985,984 patent/US6057380A/en not_active Expired - Lifetime
- 1997-12-08 ZA ZA9710985A patent/ZA9710985B/xx unknown
- 1997-12-09 AU AU47658/97A patent/AU750819B2/en not_active Ceased
- 1997-12-10 CA CA002224441A patent/CA2224441C/en not_active Expired - Fee Related
- 1997-12-10 JP JP36974197A patent/JP3250072B2/ja not_active Expired - Fee Related
- 1997-12-11 RU RU97120883/04A patent/RU2210798C2/ru not_active IP Right Cessation
- 1997-12-13 KR KR1019970070581A patent/KR100264256B1/ko not_active Expired - Lifetime
- 1997-12-17 SG SG1997004521A patent/SG63787A1/en unknown
- 1997-12-23 BR BR9706264A patent/BR9706264A/pt not_active Application Discontinuation
-
1998
- 1998-01-19 CN CN98103997A patent/CN1086399C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP3250072B2 (ja) | 2002-01-28 |
| KR100264256B1 (ko) | 2000-09-01 |
| CA2224441C (en) | 2003-01-21 |
| JPH1171450A (ja) | 1999-03-16 |
| CA2224441A1 (en) | 1999-02-22 |
| DE69702605T2 (de) | 2001-03-29 |
| CN1209442A (zh) | 1999-03-03 |
| SG63787A1 (en) | 1999-03-30 |
| AU4765897A (en) | 1999-03-04 |
| AU750819B2 (en) | 2002-07-25 |
| CN1086399C (zh) | 2002-06-19 |
| DE69702605D1 (de) | 2000-08-24 |
| RU2210798C2 (ru) | 2003-08-20 |
| TW436491B (en) | 2001-05-28 |
| KR19990022661A (ko) | 1999-03-25 |
| ATE194872T1 (de) | 2000-08-15 |
| ZA9710985B (en) | 1999-02-22 |
| US6057380A (en) | 2000-05-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |