BR9000462A - Mistura sensivel a luz e material de registro sensivel a luz - Google Patents

Mistura sensivel a luz e material de registro sensivel a luz

Info

Publication number: BR9000462A
Authority: BR; Brazil
Prior art keywords: light sensitive; registration material; mixture; sensitive mixture; light
Prior art date: 1989-02-02

Application number

BR909000462A

Other languages

English (en)

Inventor

Klaus Joerg

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-02-02

Filing date

1990-02-02

Publication date

1991-01-15

1990-02-02 Application filed by Hoechst Ag filed Critical Hoechst Ag

1991-01-15 Publication of BR9000462A publication Critical patent/BR9000462A/pt

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/54—Diazonium salts or diazo anhydrides
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Printing Plates And Materials Therefor (AREA)

BR909000462A 1989-02-02 1990-02-02 Mistura sensivel a luz e material de registro sensivel a luz BR9000462A (pt)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE3903001A DE3903001A1 (de)	1989-02-02	1989-02-02	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number	Publication Date
BR9000462A true BR9000462A (pt)	1991-01-15

Family

ID=6373242

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR909000462A BR9000462A (pt)	1989-02-02	1990-02-02	Mistura sensivel a luz e material de registro sensivel a luz

Country Status (8)

Country	Link
US (1)	US5143813A (pt)
EP (1)	EP0381043B1 (pt)
JP (1)	JPH02245753A (pt)
KR (1)	KR900013343A (pt)
AU (1)	AU4900290A (pt)
BR (1)	BR9000462A (pt)
CA (1)	CA2009093A1 (pt)
DE (2)	DE3903001A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE4030056A1 (de) *	1990-09-22	1992-03-26	Hoechst Ag	Lichtempfindliches aufzeichnungsmaterial
GB9110418D0 (en) *	1991-05-14	1991-07-03	Du Pont Howson Ltd	Radiation-sensitive material
DE19518118C2 (de) *	1995-05-17	1998-06-18	Sun Chemical Corp	Lichtempfindliche Zusammensetzung
DE19525050C2 (de) *	1995-07-10	1999-11-11	Kodak Polychrome Graphics Llc	Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE69705137T2 (de) *	1996-02-19	2002-01-31	Agfa-Gevaert N.V., Mortsel	Blindplatte für den Offsetdruck
US5786127A (en) *	1996-08-15	1998-07-28	Western Litho Plate & Supply Co.	Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
DE19644515A1 (de) *	1996-10-25	1998-06-25	Sun Chemical Corp	Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19847616C2 (de) *	1998-10-15	2001-05-10	Kodak Polychrome Graphics Gmbh	Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
US6270938B1 (en)	2000-06-09	2001-08-07	Kodak Polychrome Graphics Llc	Acetal copolymers and use thereof in photosensitive compositions
EP1270259A3 (en)	2001-06-29	2003-10-29	Agfa-Gevaert N.V.	Dummy plate for offset printing
US8703283B2 (en)	2004-10-18	2014-04-22	Topas Advanced Polymers Gmbh	Polymer blends for producing films with a reduced number of defects
JP5758263B2 (ja) *	2011-10-11	2015-08-05	メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋＰａｔｅｎｔＧｍｂＨ	微細レジストパターン形成用組成物およびそれを用いたパターン形成方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4289838A (en) *	1972-12-14	1981-09-15	Polychrome Corporation	Diazo-unsaturated monomer light sensitive compositions
US4171974A (en) *	1978-02-15	1979-10-23	Polychrome Corporation	Aqueous alkali developable negative working lithographic printing plates
NL8001085A (nl) *	1979-02-27	1980-08-29	Minnesota Mining & Mfg	Fotogevoelige materialen en voorwerpen.
DE3130987A1 (de) *	1981-08-05	1983-02-24	Hoechst Ag, 6000 Frankfurt	Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten
JPS5953836A (ja) *	1982-09-21	1984-03-28	Fuji Photo Film Co Ltd	感光性平版印刷版
US4539285A (en) *	1984-03-14	1985-09-03	American Hoechst Corporation	Photosensitive negative diazo composition with two acrylic polymers for photolithography
DE3425328A1 (de) *	1984-07-10	1986-01-16	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
US4851319A (en) *	1985-02-28	1989-07-25	Hoechst Celanese Corporation	Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US4707437A (en) *	1985-08-02	1987-11-17	Hoechst Celanese Corporation	Radiation-polymerizable composition and element containing a photopolymer composition
DE3528309A1 (de) *	1985-08-07	1987-02-12	Hoechst Ag	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial

1989
- 1989-02-02 DE DE3903001A patent/DE3903001A1/de not_active Withdrawn
1990
- 1990-01-25 EP EP90101456A patent/EP0381043B1/de not_active Expired - Lifetime
- 1990-01-25 DE DE59007661T patent/DE59007661D1/de not_active Expired - Fee Related
- 1990-01-31 KR KR1019900001033A patent/KR900013343A/ko not_active Withdrawn
- 1990-02-01 CA CA002009093A patent/CA2009093A1/en not_active Abandoned
- 1990-02-01 AU AU49002/90A patent/AU4900290A/en not_active Abandoned
- 1990-02-01 US US07/473,402 patent/US5143813A/en not_active Expired - Fee Related
- 1990-02-02 BR BR909000462A patent/BR9000462A/pt unknown
- 1990-02-02 JP JP2024295A patent/JPH02245753A/ja active Pending

Also Published As

Publication number	Publication date
AU4900290A (en)	1990-08-09
US5143813A (en)	1992-09-01
EP0381043A2 (de)	1990-08-08
DE3903001A1 (de)	1990-08-16
DE59007661D1 (de)	1994-12-15
CA2009093A1 (en)	1990-08-02
EP0381043A3 (de)	1991-06-26
EP0381043B1 (de)	1994-11-09
JPH02245753A (ja)	1990-10-01
KR900013343A (ko)	1990-09-05

Publication	Publication Date	Title
FI930869A7 (fi)	1993-02-26	Lastplattform framstaelld av korrugerad material
DE69408470D1 (de)	1998-03-12	Gefärbtes material
DE68926401D1 (de)	1996-06-13	Lichtempfindliches Material
FI921618A7 (fi)	1992-04-10	Modifioitu biologinen materiaali
BR9000443A (pt)	1991-01-15	Misturas e sua aplicacao
DE59010250D1 (de)	1996-05-09	Fluoreszenz-Material
BR8600553A (pt)	1986-10-21	Mistura sensivel a luz e material de registro sensivel a luz
FI905140A7 (fi)	1991-04-21	Materiaali
BR9000462A (pt)	1991-01-15	Mistura sensivel a luz e material de registro sensivel a luz
FI885505L (fi)	1990-02-04	Muoviaine
FI923047L (fi)	1993-01-06	Absorberande material och dess anvaendning
BR9104425A (pt)	1992-06-09	Mistura elastomera endurecivel a luz e material de registro endurecivel a luz obtido da mesma
DE69027946D1 (de)	1996-09-05	Lichtempfindliches Farbmaterial
FR2649247B1 (fr)	1991-09-13	Detecteur infrarouge a base de materiau pyroelectrique
BR8902919A (pt)	1990-02-06	Mistura sensivel a irradiacoes e material de registro sensivel a irradiacoes
DE69218641D1 (de)	1997-05-07	Kontaktlinsenmaterial und Kontaktlinse
KR900007486A (ko)	1990-06-01	마스킹재
KR900009755U (ko)	1990-06-01	마스킹재
BR9003674A (pt)	1991-08-27	Polimero de enxerto,mistura endurecivel a luz,e material de registro
DE69024393D1 (de)	1996-02-08	Hitzebeständige Klebematerialien
FI881840L (fi)	1988-10-21	Rekisteröimismateriaali
BR9004822A (pt)	1991-09-10	Material de registro eletrofotografico
DE69027623D1 (de)	1996-08-08	Photographisches Direktpositivmaterial
DE69027003D1 (de)	1996-06-20	Farbphotographisches Direktpsitivmaterial
DE69027234D1 (de)	1996-07-11	Lichtempfindliches Farbmaterial