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BR8801789A - Composicao revelavel em agua,curavel por radiacao,processo para a formacao de uma foto-mascara em um substrato e processo para a formacao de um painel de circuito impresso - Google Patents

Composicao revelavel em agua,curavel por radiacao,processo para a formacao de uma foto-mascara em um substrato e processo para a formacao de um painel de circuito impresso

Info

Publication number
BR8801789A
BR8801789A BR8801789A BR8801789A BR8801789A BR 8801789 A BR8801789 A BR 8801789A BR 8801789 A BR8801789 A BR 8801789A BR 8801789 A BR8801789 A BR 8801789A BR 8801789 A BR8801789 A BR 8801789A
Authority
BR
Brazil
Prior art keywords
forming
revelable
curable
radiation
substrate
Prior art date
Application number
BR8801789A
Other languages
English (en)
Inventor
Alan Robert Browne
David Ray Kyle
Charles Robert Morgan
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Publication of BR8801789A publication Critical patent/BR8801789A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F267/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00
    • C08F267/06—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR8801789A 1987-04-16 1988-04-14 Composicao revelavel em agua,curavel por radiacao,processo para a formacao de uma foto-mascara em um substrato e processo para a formacao de um painel de circuito impresso BR8801789A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3903487A 1987-04-16 1987-04-16

Publications (1)

Publication Number Publication Date
BR8801789A true BR8801789A (pt) 1988-11-16

Family

ID=21903306

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8801789A BR8801789A (pt) 1987-04-16 1988-04-14 Composicao revelavel em agua,curavel por radiacao,processo para a formacao de uma foto-mascara em um substrato e processo para a formacao de um painel de circuito impresso

Country Status (4)

Country Link
EP (1) EP0287019A3 (pt)
JP (1) JPS63280245A (pt)
KR (1) KR880013042A (pt)
BR (1) BR8801789A (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5114830A (en) * 1988-10-28 1992-05-19 W. R. Grace & Co.-Conn. Solder mask resins having improved stability containing a multifunctional epoxide and a partial ester or styrene-maleic anhydride copolymer
ES2075092T3 (es) * 1989-06-16 1995-10-01 Ciba Geigy Ag Fotorreservas.
JPH087445B2 (ja) * 1989-10-13 1996-01-29 ツアイトワン フアーレン コンイエ ジシュウ イエンジオウ ユエン チオール化合物を含む水性の現像可能なフオトレジスト
DE4121811A1 (de) * 1991-07-02 1993-01-07 Roehm Gmbh Verfahren zur herstellung von polyalkylmethacrylat-makromonomeren und ihre verwendung zur herstellung von kammpolymeren
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JPH0915857A (ja) * 1995-06-29 1997-01-17 Hitachi Chem Co Ltd 着色画像形成材料、これを用いた感光液、感光性エレメント及びカラーフィルタの製造法
US5665828A (en) * 1996-10-31 1997-09-09 Dow Corning Corporation Acryl-functional polybutylene
GB9626193D0 (en) 1996-12-18 1997-02-05 Ici Plc Functionalised polymer,a method for producing same and curable compositions containing same
US6340733B2 (en) 1996-12-18 2002-01-22 Imperial Chemical Industries Plc Functionalized polymer, a method for producing same and curable compositions containing same
US9410049B2 (en) * 2002-05-06 2016-08-09 Sun Chemical Corporation Single phase water based energy curable polymers and method of preparing coatings and printing inks
JP2010266768A (ja) * 2009-05-18 2010-11-25 Sanyo Chem Ind Ltd 感光性樹脂組成物
JP4976575B1 (ja) * 2011-07-07 2012-07-18 ナミックス株式会社 樹脂組成物
ES2642377T3 (es) * 2013-11-05 2017-11-16 Construction Research & Technology Gmbh Recubrimientos para uso como adhesivos
ES2597162T3 (es) * 2013-12-02 2017-01-16 Allnex Belgium, S.A. Estabilizante para composiciones de tiol-eno
DE102023123022A1 (de) * 2023-08-28 2025-03-06 Voco Gmbh Zusammensetzung zur Verwendung als dentales Adhäsiv oder zur Verwendung als Komponente eines dentalen Mehrkomponentenadhäsivs sowie Herstellverfahren und Anwendungen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4008341A (en) * 1968-10-11 1977-02-15 W. R. Grace & Co. Curable liquid polymer compositions
US3767398A (en) * 1971-10-26 1973-10-23 C Morgan Solid photoresist comprising a polyene and a polythiol
US3950569A (en) * 1972-05-05 1976-04-13 W. R. Grace & Co. Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols
US4120721A (en) * 1977-06-02 1978-10-17 W. R. Grace & Co. Radiation curable compositions for coating and imaging processes and method of use
US4415651A (en) * 1981-03-30 1983-11-15 E. I. Du Pont De Nemours And Company Aqueous processable, positive-working photopolymer compositions
US4722947A (en) * 1985-08-05 1988-02-02 Pony Industries, Inc. Production of radiation curable partial esters of anhydride-containing copolymers

Also Published As

Publication number Publication date
JPS63280245A (ja) 1988-11-17
EP0287019A2 (en) 1988-10-19
KR880013042A (ko) 1988-11-29
EP0287019A3 (en) 1990-07-11

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Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: C08F 8/14 (2006.01), C08F 267/06 (2006.0