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BR8700222A - Composicao fotossensivel,artigo,processo para laminar um filme fotossensivel em um substrato - Google Patents

Composicao fotossensivel,artigo,processo para laminar um filme fotossensivel em um substrato

Info

Publication number
BR8700222A
BR8700222A BR8700222A BR8700222A BR8700222A BR 8700222 A BR8700222 A BR 8700222A BR 8700222 A BR8700222 A BR 8700222A BR 8700222 A BR8700222 A BR 8700222A BR 8700222 A BR8700222 A BR 8700222A
Authority
BR
Brazil
Prior art keywords
photosensitive
laminate
article
substrate
photosensitive composition
Prior art date
Application number
BR8700222A
Other languages
English (en)
Inventor
Michael Fryd
Terry Roland Suess
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of BR8700222A publication Critical patent/BR8700222A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
BR8700222A 1986-01-22 1987-01-20 Composicao fotossensivel,artigo,processo para laminar um filme fotossensivel em um substrato BR8700222A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/821,330 US4753865A (en) 1986-01-22 1986-01-22 Photosensitive compositions containing microgels

Publications (1)

Publication Number Publication Date
BR8700222A true BR8700222A (pt) 1987-12-01

Family

ID=25233095

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8700222A BR8700222A (pt) 1986-01-22 1987-01-20 Composicao fotossensivel,artigo,processo para laminar um filme fotossensivel em um substrato

Country Status (8)

Country Link
US (1) US4753865A (pt)
EP (1) EP0230936B1 (pt)
JP (1) JPH0711700B2 (pt)
KR (1) KR870007451A (pt)
CN (1) CN1016467B (pt)
BR (1) BR8700222A (pt)
CA (1) CA1288538C (pt)
DE (1) DE3765643D1 (pt)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
JP2582089B2 (ja) * 1987-09-23 1997-02-19 千秋 東 感光性ミクロゲル超微粒子
US5886101A (en) * 1988-03-02 1999-03-23 E. I. Du Pont De Nemours And Company Solvent dispersible interpenetrating polymer networks
US5075192A (en) * 1988-08-30 1991-12-24 E. I. Du Pont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US4956252A (en) * 1988-08-30 1990-09-11 E. I. Dupont De Nemours And Company Aqueous processible photosensitive compositions containing core shell microgels
US4894315A (en) * 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
US5229434A (en) * 1988-12-20 1993-07-20 Toyo Ink Manufacturing Co., Ltd. Process for the production of reactive microgel and resin composition containing the microgel
US5002854A (en) * 1989-04-21 1991-03-26 E. I. Du Pont De Nemours And Company Solid imaging method using compositions containing core-shell polymers
CA2020180C (en) * 1989-06-30 2000-01-04 Stephen A. Zager Method for making optically readable media containing embossed information
US5279689A (en) * 1989-06-30 1994-01-18 E. I. Du Pont De Nemours And Company Method for replicating holographic optical elements
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
US4970037A (en) * 1989-10-31 1990-11-13 E. I. Du Pont De Nemours And Company Process for the manufacture of photosensitive materials having a low heat history
DE3941446C1 (pt) * 1989-12-15 1990-12-20 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
US5292622A (en) * 1989-12-15 1994-03-08 E. I. Du Pont De Nemours And Company Process for preparation of images on tonable light-sensitive layers
US5210001A (en) * 1989-12-15 1993-05-11 E. I. Du Pont De Nemours And Company Process for the preparation of images on tonable, light-sensitive layers
US5135837A (en) * 1990-09-05 1992-08-04 E. I. Du Pont De Nemours And Company Photosensitive elastomeric element having improved solvent resistance
CA2061877A1 (en) * 1991-02-28 1992-08-29 Eugene G. Sommerfeld Solvent dispersible interpenetrating polymer networks
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
JP2629120B2 (ja) * 1991-08-09 1997-07-09 東洋インキ製造株式会社 感光性樹脂組成物、その製造方法及びフレキソ印刷用原版
WO1993003423A1 (fr) * 1991-08-09 1993-02-18 Toyo Ink Manufacturing Co., Ltd. Composition de resine photosensible, production de cette composition et materiau pour plaque flexographique
WO1994023341A1 (fr) * 1993-03-31 1994-10-13 Toyo Ink Manufacturing Co., Ltd. Microgel reactif, composition de resine photosensible le contenant et materiau pour plaque flexographique
US6210854B1 (en) * 1993-08-27 2001-04-03 E. I. Du Pont De Nemours And Company Aqueous developable flexographic printing plate
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5721088A (en) * 1995-12-20 1998-02-24 Ppg Industries, Inc. Electrodepositable photoimageable compositions with improved edge coverage
US5811220A (en) * 1996-10-10 1998-09-22 Polaroid Corporation On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
EP0970499A1 (en) * 1997-03-25 2000-01-12 E.I. Du Pont De Nemours And Company Field emitter cathode backplate structures for display panels
KR100607582B1 (ko) 1998-06-29 2006-08-02 셀 인터나쵸나아레 레사아치 마아츠샤피 비이부이 광경화성 중합체 조성물 및 이를 함유한 플렉서 인쇄판
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US7398812B2 (en) 2003-12-31 2008-07-15 E.I. Du Pont De Nemours And Company Apparatus for thermal development having a removable support member
US7682775B2 (en) * 2004-03-05 2010-03-23 E. I. Du Pont De Nemours And Company Process for preparing a flexographic printing plate
US8142987B2 (en) 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
US20060027113A1 (en) 2004-08-03 2006-02-09 Hackler Mark A Method and apparatus for thermal development with supporting surface for a development medium
US7503258B2 (en) 2004-08-03 2009-03-17 E. I. Du Pont De Nemours & Company Method and apparatus for thermal development with development medium remover
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US20060234152A1 (en) 2005-04-19 2006-10-19 Hackler Mark A Method for thermal development of a photosensitive element using an oriented development medium
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
US7358026B2 (en) * 2005-09-15 2008-04-15 E. I. Du Pont De Nemours And Company Method for thermal development of a photosensitive element using a development medium having a support
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
US7846639B2 (en) 2006-06-30 2010-12-07 E. I. Du Pont De Nemours And Company Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element
KR20090079946A (ko) 2006-11-15 2009-07-22 쓰리엠 이노베이티브 프로퍼티즈 컴파니 기판으로의 전사 중에 경화하는 플렉소그래픽 인쇄
WO2008060875A1 (en) * 2006-11-15 2008-05-22 3M Innovative Properties Company Solvent removal assisted material transfer for flexographic printing
US7691550B2 (en) 2007-06-20 2010-04-06 E.I. Du Pont De Nemours And Company Method for making a relief printing form
EP2026132B1 (en) 2007-08-16 2013-03-13 E. I. Du Pont de Nemours and Company Process for making a cylindrically-shaped photosensitive element for use as a printing form
US8470518B2 (en) 2007-09-14 2013-06-25 E I Du Pont De Nemours And Company Photosensitive element having reinforcing particles and method for preparing a printing form from the element
US8236479B2 (en) 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
EP2085820B1 (en) 2008-01-30 2015-02-25 E. I. du Pont de Nemours and Company Apparatus and method for preparing relief printing form
US9057958B2 (en) 2008-03-31 2015-06-16 E I Du Pont De Nemours And Company Apparatus for thermal development with a conformable support
US8492073B2 (en) * 2008-03-31 2013-07-23 E I Du Pont De Nemours And Company Method for thermal development with a conformable support
EP2112556B1 (en) 2008-03-31 2015-04-29 E.I. Dupont De Nemours And Company Method and apparatus for thermal development with a conformable support
EP2154572B1 (en) 2008-08-15 2017-05-03 E. I. du Pont de Nemours and Company Process for making a cylindrically-shaped photosensitive element for use as a printing form
US8465904B2 (en) 2008-10-31 2013-06-18 E I Du Pont De Nemours And Company Method for preparing a printing form from a photopolymerizable element
EP2448764B1 (en) 2009-07-02 2016-03-02 E. I. du Pont de Nemours and Company Method for preparing a relief printing form and use thereof in a method for printing a material onto a substrate
US9069252B2 (en) 2011-08-26 2015-06-30 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US9032877B2 (en) 2011-11-02 2015-05-19 E I Du Pont De Nemours And Company Method and an apparatus having a compressible collar for thermally treating a photosensitive precursor
US8985020B2 (en) 2011-11-02 2015-03-24 E I Du Pont De Nemours And Company Method and apparatus for thermal treatment of printing surface in relief printing
US8895228B2 (en) 2011-11-02 2014-11-25 E I Du Pont De Nemours And Company Method for thermal treatment of relief surface for a relief printing form
US20130139714A1 (en) 2011-12-02 2013-06-06 E.I. Du Pont De Nemours And Company Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy
US9134612B2 (en) 2012-03-27 2015-09-15 E I Du Pont De Nemours And Company Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
JP6651500B2 (ja) 2014-07-17 2020-02-19 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア 生物医学的応用のための制御可能な自己アニーリング型ミクロゲル粒子
WO2016126801A1 (en) 2015-02-04 2016-08-11 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
CN107850838A (zh) 2015-06-17 2018-03-27 爱克发有限公司 柔性版印刷原版及其磁性显影
WO2017142879A1 (en) 2016-02-16 2017-08-24 The Regents Of The University Of California Methods for immune system modulation with microporous annealed particle gels
AU2017394923B2 (en) 2016-12-29 2022-07-14 Tempo Therapeutics, Inc. Methods and systems for treating a site of a medical implant
EP3354477A1 (en) 2017-01-25 2018-08-01 Anheuser-Busch Inbev Sa/Nv Printing process for a beverage container
US11822246B2 (en) 2017-10-10 2023-11-21 Flint Group Germany Gmbh Relief precursor having low cupping and fluting
US12474639B2 (en) 2022-04-27 2025-11-18 Miraclon Corporation Flexographic printing mask with laser thermal imaging film
US12496846B2 (en) 2022-06-16 2025-12-16 Miraclon Corporation Mask for low contrast printed highlights
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Also Published As

Publication number Publication date
JPS62173455A (ja) 1987-07-30
CA1288538C (en) 1991-09-03
CN1016467B (zh) 1992-04-29
EP0230936B1 (en) 1990-10-24
JPH0711700B2 (ja) 1995-02-08
US4753865A (en) 1988-06-28
EP0230936A3 (en) 1988-02-03
EP0230936A2 (en) 1987-08-05
KR870007451A (ko) 1987-08-19
DE3765643D1 (de) 1990-11-29
CN87100720A (zh) 1987-08-26

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