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BR8202749A - Processo para a producao de copias em relevo - Google Patents

Processo para a producao de copias em relevo

Info

Publication number
BR8202749A
BR8202749A BR8202749A BR8202749A BR8202749A BR 8202749 A BR8202749 A BR 8202749A BR 8202749 A BR8202749 A BR 8202749A BR 8202749 A BR8202749 A BR 8202749A BR 8202749 A BR8202749 A BR 8202749A
Authority
BR
Brazil
Prior art keywords
layer
light
copies
hardenable
exposed
Prior art date
Application number
BR8202749A
Other languages
English (en)
Inventor
Werner Frass
Klaus Horn
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8202749A publication Critical patent/BR8202749A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
BR8202749A 1981-05-13 1982-05-12 Processo para a producao de copias em relevo BR8202749A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813118884 DE3118884A1 (de) 1981-05-13 1981-05-13 Verfahren zur herstellung von reliefkopien

Publications (1)

Publication Number Publication Date
BR8202749A true BR8202749A (pt) 1983-04-19

Family

ID=6132126

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8202749A BR8202749A (pt) 1981-05-13 1982-05-12 Processo para a producao de copias em relevo

Country Status (13)

Country Link
US (1) US4447510A (pt)
EP (1) EP0064733B1 (pt)
JP (1) JPS57195250A (pt)
KR (1) KR880001436B1 (pt)
AT (1) ATE14945T1 (pt)
AU (1) AU549198B2 (pt)
BR (1) BR8202749A (pt)
CA (1) CA1183382A (pt)
DE (2) DE3118884A1 (pt)
HK (1) HK54086A (pt)
IL (1) IL65736A (pt)
MY (1) MY8600738A (pt)
ZA (1) ZA823008B (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3418854A1 (de) * 1984-05-21 1985-11-21 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur erzeugung von strukturen in resistschichten
DE3418856A1 (de) * 1984-05-21 1985-11-21 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur beeinflussung von strukturprofilen in resistschichten
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
JPH0766186B2 (ja) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 感光性組成物
JP2758604B2 (ja) * 1988-04-27 1998-05-28 本田技研工業株式会社 排気消音器
JPH0299953A (ja) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd パターン形成材料
JPH02106753A (ja) * 1988-10-14 1990-04-18 Matsushita Electric Ind Co Ltd パターン形成方法
JP2903159B2 (ja) * 1989-03-27 1999-06-07 コニカ株式会社 光重合開始剤含有感光材料の現像方法
JPH0418564A (ja) * 1990-01-22 1992-01-22 Asahi Chem Ind Co Ltd 感光性エラストマー組成物用現像剤
JP3002255B2 (ja) * 1990-11-28 2000-01-24 三菱電機株式会社 パターン形成方法
US7029798B1 (en) 2002-06-28 2006-04-18 Seagate Technology Llc Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661660A (en) * 1968-02-21 1972-05-09 Grace W R & Co Method for ultrasonic etching of polymeric printing plates
IL39449A (en) * 1971-05-17 1976-01-30 Energy Conversion Devices Inc Method for producing images
BE792499A (fr) * 1971-12-10 1973-03-30 Siemens Ag Procede de traitement pour le blanchiment par attaque chimique de plaques photographiques et de films exposes et
GB1420958A (en) * 1972-06-30 1976-01-14 Ici Ltd Photo-polymerisable composition
FR2352853A1 (fr) * 1976-05-28 1977-12-23 Sumitomo Chemical Co Procede et dispositif de nettoyage et/ou de revetement par immersion d'articles en resine synthetique notamment
DK156099C (da) * 1980-05-07 1989-11-06 Eskofot As Fremgangsmaade ved fremkaldelse

Also Published As

Publication number Publication date
EP0064733B1 (de) 1985-08-14
ATE14945T1 (de) 1985-08-15
IL65736A (en) 1985-03-31
KR830010405A (ko) 1983-12-30
JPH0148534B2 (pt) 1989-10-19
MY8600738A (en) 1986-12-31
EP0064733A1 (de) 1982-11-17
HK54086A (en) 1986-07-25
CA1183382A (en) 1985-03-05
ZA823008B (en) 1983-03-30
AU549198B2 (en) 1986-01-16
DE3118884A1 (de) 1982-12-02
AU8320482A (en) 1982-11-18
US4447510A (en) 1984-05-08
DE3265385D1 (en) 1985-09-19
KR880001436B1 (ko) 1988-08-08
IL65736A0 (en) 1982-08-31
JPS57195250A (en) 1982-11-30

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