BE754166A - Couches sensibles a la lumiere pour reproduction photomecanique - Google Patents
Couches sensibles a la lumiere pour reproduction photomecaniqueInfo
- Publication number
- BE754166A BE754166A BE754166DA BE754166A BE 754166 A BE754166 A BE 754166A BE 754166D A BE754166D A BE 754166DA BE 754166 A BE754166 A BE 754166A
- Authority
- BE
- Belgium
- Prior art keywords
- light sensitive
- sensitive layers
- photomechanical reproduction
- photomechanical
- reproduction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/58—Coupling substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MX11307769 | 1969-08-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE754166A true BE754166A (fr) | 1970-12-31 |
Family
ID=19745276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE754166D BE754166A (fr) | 1969-08-06 | Couches sensibles a la lumiere pour reproduction photomecanique |
Country Status (6)
| Country | Link |
|---|---|
| BE (1) | BE754166A (xx) |
| DE (1) | DE2038864A1 (xx) |
| ES (1) | ES382354A1 (xx) |
| FR (1) | FR2056611A5 (xx) |
| NL (1) | NL7011608A (xx) |
| ZA (1) | ZA705266B (xx) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56161537A (en) * | 1980-05-16 | 1981-12-11 | Kimoto & Co Ltd | Photosensitive material and its developing method |
-
0
- BE BE754166D patent/BE754166A/xx unknown
-
1970
- 1970-07-30 ZA ZA705266*A patent/ZA705266B/xx unknown
- 1970-07-31 ES ES382354A patent/ES382354A1/es not_active Expired
- 1970-08-05 NL NL7011608A patent/NL7011608A/xx unknown
- 1970-08-05 FR FR7028879A patent/FR2056611A5/fr not_active Expired
- 1970-08-05 DE DE19702038864 patent/DE2038864A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| ZA705266B (en) | 1971-05-27 |
| DE2038864A1 (de) | 1971-02-18 |
| ES382354A1 (es) | 1972-11-16 |
| FR2056611A5 (en) | 1971-05-14 |
| NL7011608A (xx) | 1971-02-09 |
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