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AU6353390A - Selected block copolymer novolak binder resins and their use in radiation-sensitive compositions - Google Patents

Selected block copolymer novolak binder resins and their use in radiation-sensitive compositions

Info

Publication number
AU6353390A
AU6353390A AU63533/90A AU6353390A AU6353390A AU 6353390 A AU6353390 A AU 6353390A AU 63533/90 A AU63533/90 A AU 63533/90A AU 6353390 A AU6353390 A AU 6353390A AU 6353390 A AU6353390 A AU 6353390A
Authority
AU
Australia
Prior art keywords
radiation
block copolymer
selected block
binder resins
sensitive compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU63533/90A
Inventor
Andrew J. Blakeney
Kenji Honda
Alfred J. Jeffries
Sobhy Tadros
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OCG Microelectronic Materials Inc
Original Assignee
Olin Hunt Specialty Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Hunt Specialty Products Inc filed Critical Olin Hunt Specialty Products Inc
Publication of AU6353390A publication Critical patent/AU6353390A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
AU63533/90A 1989-09-07 1990-08-02 Selected block copolymer novolak binder resins and their use in radiation-sensitive compositions Abandoned AU6353390A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40413989A 1989-09-07 1989-09-07
US404139 1989-09-07

Publications (1)

Publication Number Publication Date
AU6353390A true AU6353390A (en) 1991-04-18

Family

ID=23598330

Family Applications (1)

Application Number Title Priority Date Filing Date
AU63533/90A Abandoned AU6353390A (en) 1989-09-07 1990-08-02 Selected block copolymer novolak binder resins and their use in radiation-sensitive compositions

Country Status (2)

Country Link
AU (1) AU6353390A (en)
WO (1) WO1991004512A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
US8617641B2 (en) 2009-11-12 2013-12-31 Guardian Industries Corp. Coated article comprising colloidal silica inclusive anti-reflective coating, and method of making the same
US8173745B2 (en) 2009-12-16 2012-05-08 Momentive Specialty Chemicals Inc. Compositions useful for preparing composites and composites produced therewith

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100077A1 (en) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE CONTAINING A NAPHTHOCHINONDIAZIDESULPHONIC ACID ESTER, AND METHOD FOR PRODUCING THE NAPHTHOCHINONDIAZIDESULPHONIC ACID ESTER
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
DD211415A1 (en) * 1983-02-16 1984-07-11 Fotochem Werke Berlin Veb POSITIVE PHOTO COPYLIGHT WITH IMPROVED PROPERTIES
JPS59184337A (en) * 1983-04-04 1984-10-19 Hitachi Ltd Photosensitive heat resistant material
DE3323343A1 (en) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND COPY MATERIAL MADE THEREOF
JPS6097347A (en) * 1983-11-01 1985-05-31 Hitachi Chem Co Ltd Image forming photosensitive composition
JPH0654384B2 (en) * 1985-08-09 1994-07-20 東京応化工業株式会社 Positive photoresist composition
JP2729284B2 (en) * 1986-12-23 1998-03-18 シップレー・カンパニー・インコーポレーテッド Photoresist method and composition used in this method
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Also Published As

Publication number Publication date
WO1991004512A1 (en) 1991-04-04

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