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AU6140790A - Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions - Google Patents

Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Info

Publication number
AU6140790A
AU6140790A AU61407/90A AU6140790A AU6140790A AU 6140790 A AU6140790 A AU 6140790A AU 61407/90 A AU61407/90 A AU 61407/90A AU 6140790 A AU6140790 A AU 6140790A AU 6140790 A AU6140790 A AU 6140790A
Authority
AU
Australia
Prior art keywords
phenolic
compositions
radiation
selected block
sensitive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU61407/90A
Inventor
Andrew J. Blakeney
Kenji Honda
Alfred J. Jeffries
Sobhy Tadros
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OCG Microelectronic Materials Inc
Original Assignee
Olin Hunt Specialty Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Hunt Specialty Products Inc filed Critical Olin Hunt Specialty Products Inc
Publication of AU6140790A publication Critical patent/AU6140790A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
AU61407/90A 1989-09-07 1990-07-30 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions Abandoned AU6140790A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40413889A 1989-09-07 1989-09-07
US404138 1989-09-07

Publications (1)

Publication Number Publication Date
AU6140790A true AU6140790A (en) 1991-04-08

Family

ID=23598324

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61407/90A Abandoned AU6140790A (en) 1989-09-07 1990-07-30 Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Country Status (2)

Country Link
AU (1) AU6140790A (en)
WO (1) WO1991003448A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0769485B1 (en) * 1995-10-18 2002-03-13 Sumitomo Chemical Company, Limited Positive resist composition and photosensitizers
US5859153A (en) * 1996-06-21 1999-01-12 Minnesota Mining And Manufacturing Company Novolak compounds useful as adhesion promoters for epoxy resins
US8173745B2 (en) 2009-12-16 2012-05-08 Momentive Specialty Chemicals Inc. Compositions useful for preparing composites and composites produced therewith

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3384618A (en) * 1960-11-24 1968-05-21 Imoto Minoru Method of producing synthetic resins from aromatic glycols and a phenol
US3422068A (en) * 1966-02-25 1969-01-14 Weyerhaeuser Co Method of producing an ortho-directed phenolic resin by condensing phenol and hcho in the presence of a bivalent metal ion and then adding resorcinol,and the resultant product
US4146739A (en) * 1976-12-08 1979-03-27 Akutin Modest S Process for producing phenol-formaldehyde oligomers of ortho-specific structure
EP0032060B1 (en) * 1979-12-27 1984-10-24 Mitsui Petrochemical Industries, Ltd. Novolak resin composition and products formed therefrom
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
CA1213995A (en) * 1981-11-05 1986-11-12 Shinji Yamamoto Fiber-reinforced rubber composition and production process thereof and fiber-reinforced elastic product
DE3323343A1 (en) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND COPY MATERIAL MADE THEREOF
JPS60260611A (en) * 1984-06-08 1985-12-23 Mitsubishi Petrochem Co Ltd Method for producing high molecular weight cresol novolak resin
JPH0654384B2 (en) * 1985-08-09 1994-07-20 東京応化工業株式会社 Positive photoresist composition
IT1203607B (en) * 1985-12-20 1989-02-15 So F Ter Spa PROCEDURE FOR PREPARING PLASTO-ELASTOMERIC COMPOSITIONS BASED ON POLYOLEFINS AND EPDM TERPOLYMERS AND PLASTIC-ELASTOMERIC COMPOSITIONS SO OBTAINED
JP2729284B2 (en) * 1986-12-23 1998-03-18 シップレー・カンパニー・インコーポレーテッド Photoresist method and composition used in this method
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Also Published As

Publication number Publication date
WO1991003448A1 (en) 1991-03-21

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