AU6021800A - Exposing method and apparatus - Google Patents

Exposing method and apparatus

Info

Publication number: AU6021800A
Authority: AU; Australia
Prior art keywords: exposing method; exposing
Prior art date: 1999-07-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU60218/00A

Inventor

Naomasa Shiraishi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-07-23

Filing date

2000-07-21

Publication date

2001-02-13

2000-07-21 Application filed by Nikon Corp filed Critical Nikon Corp

2001-02-13 Publication of AU6021800A publication Critical patent/AU6021800A/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
- H10P72/0402—

Landscapes

Health & Medical Sciences (AREA)
Epidemiology (AREA)
Public Health (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Toxicology (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU60218/00A 1999-07-23 2000-07-21 Exposing method and apparatus Abandoned AU6021800A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP20987099		1999-07-23
JP11/209870		1999-07-23
PCT/JP2000/004871 WO2001008204A1 (en)	1999-07-23	2000-07-21	Exposing method and apparatus

Publications (1)

Publication Number	Publication Date
AU6021800A true AU6021800A (en)	2001-02-13

Family

ID=16580012

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU60218/00A Abandoned AU6021800A (en)	1999-07-23	2000-07-21	Exposing method and apparatus

Country Status (3)

Country	Link
KR (1)	KR20020019121A (en)
AU (1)	AU6021800A (en)
WO (1)	WO2001008204A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4878082B2 (en) *	2001-02-28	2012-02-15	キヤノン株式会社	Exposure apparatus and device manufacturing method
JP2003068630A (en) *	2001-08-29	2003-03-07	Kyocera Corp	Exposure equipment
US20050288485A1 (en) *	2004-06-24	2005-12-29	Mahl Jerry M	Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
US7701550B2 (en)	2004-08-19	2010-04-20	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
KR101944492B1 (en) *	2016-07-26	2019-02-01	에이피시스템 주식회사	Laser Apparatus, Laser Processing Equipment having the same, and Preventing Dust Method of thereof
DE102016217633A1 (en) *	2016-09-15	2018-03-15	Carl Zeiss Smt Gmbh	Optical arrangement, in particular in a projection exposure apparatus for EUV lithography

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04188100A (en) *	1990-11-22	1992-07-06	Matsushita Electric Ind Co Ltd	Gas replacement method for X-ray exposure equipment
JPH10242029A (en) *	1997-02-27	1998-09-11	Canon Inc	Exposure equipment
JPH11195585A (en) *	1997-12-26	1999-07-21	Nikon Corp	Exposure apparatus and exposure method

2000
- 2000-07-21 WO PCT/JP2000/004871 patent/WO2001008204A1/en not_active Ceased
- 2000-07-21 AU AU60218/00A patent/AU6021800A/en not_active Abandoned
- 2000-07-21 KR KR1020027000268A patent/KR20020019121A/en not_active Withdrawn

Also Published As

Publication number	Publication date
WO2001008204A1 (en)	2001-02-01
KR20020019121A (en)	2002-03-09

Publication	Publication Date	Title
AU1160801A (en)	2001-05-14	Apparatus and method
AU1078700A (en)	2000-05-29	Exposure method and exposure apparatus
AU3543400A (en)	2000-11-14	Application apparatus and method
AU7484500A (en)	2001-04-17	Cargo-transfer apparatus and method
AU5175600A (en)	2000-12-28	An improved simulation method and apparatus
AU4810800A (en)	2000-11-10	Prosthetic apparatus and method
AU3398700A (en)	2000-10-09	Assistance method and apparatus
AU3970899A (en)	1999-12-06	Ferrographic method and apparatus
AU1555001A (en)	2001-07-03	Exposure method and apparatus
SG83810A1 (en)	2001-10-16	Exposure method and exposure apparatus
AU4143000A (en)	2000-11-17	Exposure method and apparatus
AU4949900A (en)	2000-12-18	Exposure method and apparatus
AU2327800A (en)	2000-08-29	Exposure method and apparatus
AUPP855599A0 (en)	1999-03-04	Apparatus and method
AU1554901A (en)	2001-06-25	Exposure method and exposure apparatus
AU1689899A (en)	1999-07-19	Exposure method and exposure apparatus
AU4216000A (en)	2000-10-23	Illumination apparatus and method
AUPP754398A0 (en)	1999-01-07	Method and apparatus for compsting
AU5876000A (en)	2001-01-09	Dosimeter apparatus and method
AU3271801A (en)	2001-06-12	Dual-stage lithography apparatus and method
AU4061099A (en)	2000-01-05	Exposure method and exposure apparatus
AU4395099A (en)	2001-01-22	Exposure method and device
AU3729999A (en)	1999-12-06	Exposure method and apparatus
AU2940600A (en)	2000-10-09	Exposure method and apparatus
AU2944500A (en)	2000-10-16	Exposure method and apparatus

Legal Events

Date	Code	Title	Description
2002-05-02	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase