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AU4143000A - Exposure method and apparatus - Google Patents

Exposure method and apparatus

Info

Publication number
AU4143000A
AU4143000A AU41430/00A AU4143000A AU4143000A AU 4143000 A AU4143000 A AU 4143000A AU 41430/00 A AU41430/00 A AU 41430/00A AU 4143000 A AU4143000 A AU 4143000A AU 4143000 A AU4143000 A AU 4143000A
Authority
AU
Australia
Prior art keywords
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU41430/00A
Inventor
Takashi Aoki
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU4143000A publication Critical patent/AU4143000A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU41430/00A 1999-04-28 2000-04-27 Exposure method and apparatus Abandoned AU4143000A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/122906 1999-04-28
JP12290699 1999-04-28
PCT/JP2000/002761 WO2000067303A1 (en) 1999-04-28 2000-04-27 Exposure method and apparatus

Publications (1)

Publication Number Publication Date
AU4143000A true AU4143000A (en) 2000-11-17

Family

ID=14847549

Family Applications (1)

Application Number Title Priority Date Filing Date
AU41430/00A Abandoned AU4143000A (en) 1999-04-28 2000-04-27 Exposure method and apparatus

Country Status (2)

Country Link
AU (1) AU4143000A (en)
WO (1) WO2000067303A1 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19959742A1 (en) 1999-12-10 2001-06-13 Zeiss Carl System for compensating for changes in direction and position of a light generated by a laser
JPWO2002031570A1 (en) 2000-10-10 2004-02-19 株式会社ニコン Evaluation method of imaging performance
JP4489982B2 (en) * 2001-02-05 2010-06-23 大日本印刷株式会社 Exposure equipment
WO2003003429A1 (en) * 2001-06-28 2003-01-09 Nikon Corporation Projection optical system, exposure system and method
JP4305611B2 (en) 2002-07-18 2009-07-29 株式会社ニコン Illumination optical apparatus, exposure apparatus, and exposure method
KR101503992B1 (en) 2003-04-09 2015-03-18 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI511179B (en) * 2003-10-28 2015-12-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI512335B (en) 2003-11-20 2015-12-11 尼康股份有限公司 Beam conversion element, optical illumination device, exposure device, and exposure method
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
KR101233879B1 (en) 2004-01-16 2013-02-15 칼 짜이스 에스엠티 게엠베하 Polarization-modulating optical element
TWI395068B (en) 2004-01-27 2013-05-01 尼康股份有限公司 Optical system, exposure device and method of exposure
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP4380391B2 (en) * 2004-03-31 2009-12-09 株式会社ニコン Artificial quartz member selection method
JP4776891B2 (en) * 2004-04-23 2011-09-21 キヤノン株式会社 Illumination optical system, exposure apparatus, and device manufacturing method
KR101452145B1 (en) 2005-05-12 2014-10-16 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179329A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN105606344B (en) 2008-05-28 2019-07-30 株式会社尼康 Illumination optical system, illumination method, exposure device, and exposure method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2679337B2 (en) * 1990-03-05 1997-11-19 株式会社ニコン Illumination optical device, exposure apparatus including the same, and exposure method
JP2502360B2 (en) * 1989-02-15 1996-05-29 キヤノン株式会社 Exposure equipment
JPH1164778A (en) * 1997-08-25 1999-03-05 Nikon Corp Illumination optics

Also Published As

Publication number Publication date
WO2000067303A1 (en) 2000-11-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase