AU4930099A - Illuminator and projection exposure apparatus - Google Patents

Illuminator and projection exposure apparatus

Info

Publication number: AU4930099A
Authority: AU; Australia
Prior art keywords: illuminator; exposure apparatus; projection exposure; projection; exposure
Prior art date: 1998-08-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU49300/99A

Inventor

Taro Ogata

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-08-18

Filing date

1999-07-29

Publication date

2000-03-14

1999-07-29 Application filed by Nikon Corp filed Critical Nikon Corp

2000-03-14 Publication of AU4930099A publication Critical patent/AU4930099A/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU49300/99A 1998-08-18 1999-07-29 Illuminator and projection exposure apparatus Abandoned AU4930099A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP10/231499		1998-08-18
JP23149998		1998-08-18
PCT/JP1999/004087 WO2000011706A1 (en)	1998-08-18	1999-07-29	Illuminator and projection exposure apparatus

Publications (1)

Publication Number	Publication Date
AU4930099A true AU4930099A (en)	2000-03-14

Family

ID=16924459

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU49300/99A Abandoned AU4930099A (en)	1998-08-18	1999-07-29	Illuminator and projection exposure apparatus

Country Status (2)

Country	Link
AU (1)	AU4930099A (en)
WO (1)	WO2000011706A1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6628370B1 (en) *	1996-11-25	2003-09-30	Mccullough Andrew W.	Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
JP2002359176A (en)	2001-05-31	2002-12-13	Canon Inc	Illumination apparatus, illumination control method, exposure apparatus, device manufacturing method and device
US7333178B2 (en)	2002-03-18	2008-02-19	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7170587B2 (en)	2002-03-18	2007-01-30	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
KR101503992B1 (en) *	2003-04-09	2015-03-18	가부시키가이샤 니콘	Exposure method and apparatus, and device manufacturing method
TWI511179B (en)	2003-10-28	2015-12-01	尼康股份有限公司	Optical illumination device, exposure device, exposure method and device manufacturing method
TWI512335B (en)	2003-11-20	2015-12-11	尼康股份有限公司	Beam conversion element, optical illumination device, exposure device, and exposure method
TWI379344B (en)	2004-02-06	2012-12-11	Nikon Corp	Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP4936499B2 (en) *	2004-06-21	2012-05-23	株式会社ニコン	Exposure apparatus and exposure method
KR101452145B1 (en)	2005-05-12	2014-10-16	가부시키가이샤 니콘	Projection optical system, exposure apparatus and exposure method
JP2007188927A (en) *	2006-01-11	2007-07-26	Canon Inc	Exposure apparatus, exposure method, and device manufacturing method
US8451427B2 (en)	2007-09-14	2013-05-28	Nikon Corporation	Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en)	2007-10-12	2013-08-21	株式会社ニコン	Illumination optical apparatus, exposure apparatus, and device manufacturing method
EP2179330A1 (en)	2007-10-16	2010-04-28	Nikon Corporation	Illumination optical system, exposure apparatus, and device manufacturing method
EP2179329A1 (en)	2007-10-16	2010-04-28	Nikon Corporation	Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en)	2007-10-24	2013-02-19	Nikon Corporation	Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en)	2007-11-06	2015-08-25	Nikon Corporation	Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN105606344B (en)	2008-05-28	2019-07-30	株式会社尼康	Illumination optical system, illumination method, exposure device, and exposure method
JP5604813B2 (en) *	2009-06-15	2014-10-15	株式会社ニコン	Illumination optical system, exposure apparatus, and device manufacturing method
JP5326928B2 (en) *	2009-08-19	2013-10-30	株式会社ニコン	Illumination optical system, exposure apparatus, and device manufacturing method
WO2013018799A1 (en) *	2011-08-04	2013-02-07	株式会社ニコン	Illumination device
NL2017493B1 (en)	2016-09-19	2018-03-27	Kulicke & Soffa Liteq B V	Optical beam homogenizer based on a lens array
CN113272737B (en) *	2019-01-09	2024-03-15	株式会社尼康	Exposure device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS61150330A (en) *	1984-12-25	1986-07-09	Hoya Corp	Illuminance correcting plate for exposure device
JP2852169B2 (en) *	1993-02-25	1999-01-27	日本電気株式会社	Projection exposure method and apparatus

1999
- 1999-07-29 WO PCT/JP1999/004087 patent/WO2000011706A1/en not_active Ceased
- 1999-07-29 AU AU49300/99A patent/AU4930099A/en not_active Abandoned

Also Published As

Publication number	Publication date
WO2000011706A1 (en)	2000-03-02

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Legal Events

Date	Code	Title	Description
2001-05-17	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase